CN209303378U - Photoresist feeding pipe cleaning system - Google Patents
Photoresist feeding pipe cleaning system Download PDFInfo
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- CN209303378U CN209303378U CN201821581714.6U CN201821581714U CN209303378U CN 209303378 U CN209303378 U CN 209303378U CN 201821581714 U CN201821581714 U CN 201821581714U CN 209303378 U CN209303378 U CN 209303378U
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- feeding pipe
- photoresist feeding
- photoresist
- switch valve
- bottle
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Abstract
The utility model provides a kind of photoresist feeding pipe cleaning system, and photoresist feeding pipe cleaning system includes: cleaning solution bottle, for holding cleaning solution；Cleaning solution bottle includes bottle body and bottle cap, and bottle cap covers on the bottleneck of the bottle body；Photoresist feeding pipe, one end are inserted into cleaning solution bottle via bottle cap, and the other end is connected with nozzle；First switch valve is located on photoresist feeding pipe；Inlet pipe, one end are connected with feed flow source, and the other end is connected with photoresist feeding pipe, and are connected between cleaning solution bottle and first switch valve；Second switch valve is located in inlet pipe；And drain line, one end are inserted into cleaning solution bottle via bottle cap.The utility model can realize the cleaning of all photoresist feeding pipes by the cleaning of two steps, do not need frequently to be replaced and cleaned liquid bottle, will not there are problems that part photoresist feeding pipe can not clean.
Description
Technical field
The utility model belongs to technical field of integrated circuits, more particularly to a kind of photoresist feeding pipe cleaning system.
Background technique
In the photoetching process of existing semiconductor, before installing and using new photoresist, need using cleaning solution to light
Photoresist feeding pipe is cleaned.Existing photoresist feeding pipe cleaning system is generally as shown in Figures 1 and 2；A kind of cleaning
Mode is directly cleans using cleaning solution in cleaning solution bottle 10 to photoresist feeding pipe 11, though as shown in Figure 1, which
Entire photoresist feeding pipe 11 can so be cleaned, but it is a large amount of to provide to need repeatedly to be replaced and cleaned liquid bottle 10 manually
Cleaning solution is cleaned, complicated for operation, increases the labor intensity of people；Another cleaning way is to use factory service center liquid-supplying system
Via inlet pipe 13 provide cleaning solution photoresist feeding pipe 11 is cleaned, as shown in Fig. 2, but the cleaning way can not
13 junction of inlet pipe to the photoresist feeding pipe 11 between the cleaning solution bottle 10 is cleaned,
Grain defect (particle) can be generated when subsequent progress jet-coating photoresit.
Utility model content
In view of the foregoing deficiencies of prior art, the purpose of this utility model is to provide a kind of photoresist feeding pipes
Cleaning system, it is existing when for solving in the prior art to clean photoresist feeding pipe to need repeatedly replacement manually clearly
Bottle for handling liquid toilet or cosmetic substance, it is complicated for operation, the problem of waste of manpower, and can not be to inlet pipe junction to the photoetching between cleaning solution bottle
The problem of glue feeding pipe is cleaned, and is easy to produce grain defect in subsequent jet-coating photoresit.
In order to achieve the above objects and other related objects, the utility model provides a kind of photoresist feeding pipe cleaning system
System, the photoresist feeding pipe cleaning system include:
Cleaning solution bottle, for holding cleaning solution；The cleaning solution bottle includes bottle body and bottle cap, and the bottle cap is covered in the bottle
On the bottleneck of body；
Photoresist feeding pipe, one end are inserted into the cleaning solution bottle via the bottle cap, and the other end is connected with nozzle
It connects；
First switch valve is located on the photoresist feeding pipe；
Inlet pipe, one end are connected with feed flow source, and the other end is connected with the photoresist feeding pipe, and is connected to
Between the cleaning solution bottle and the first switch valve；
Second switch valve is located in the inlet pipe；And
Drain line, one end are inserted into the cleaning solution bottle via the bottle cap.
As a kind of preferred embodiment of the utility model, the photoresist feeding pipe cleaning system further include:
Third switch valve, the third switch valve are located in the drain line；And
First drawing liquid pump is located in the drain line.
As a kind of preferred embodiment of the utility model, the photoresist feeding pipe cleaning system further includes sealing dress
It sets, the sealing device is between the bottle cap and the bottle body.
As a kind of preferred embodiment of the utility model, the feed flow source includes factory service center liquid-supplying system.
As a kind of preferred embodiment of the utility model, the drain line other end is connected with factory service drainage system.
As a kind of preferred embodiment of the utility model, the photoresist feeding pipe cleaning system further include:
Supply air line, one end are inserted into the cleaning solution bottle via the bottle cap, and the other end is connected with gas source；
Surge tank is located on the photoresist feeding pipe, and between the first switch valve and the nozzle；
Filter is located on the photoresist feeding pipe, and between the surge tank and the nozzle；
Second drawing liquid pump is located on the photoresist feeding pipe, and between the filter and the nozzle；
Flowmeter is located on the photoresist feeding pipe, and between second drawing liquid pump and the nozzle；And
4th switch valve is located on the photoresist feeding pipe, and between the flowmeter and the nozzle.
As a kind of preferred embodiment of the utility model, the first switch valve, the second switch valve, the third are opened
It closes valve and the 4th switch valve includes pneumatic operated valve.
The utility model also provides a kind of photoresist feeding pipe cleaning method, the photoresist feeding pipe cleaning method
Include the following steps:
1) photoresist feeding pipe cleaning system described in any of the above-described scheme is provided；
2) the first switch valve and the second switch valve are opened；And
3) using cleaning solution to the photoresist feeding pipe, the cleaning solution bottle, the drain line and the nozzle
It is cleaned simultaneously.
The utility model also provides a kind of photoresist feeding pipe cleaning method, the photoresist feeding pipe cleaning method
Include the following steps:
1) the photoresist feeding pipe cleaning system as described in above-mentioned either a program is provided；
2) the first switch valve and the second switch valve are opened, and closes the third switch valve；
3) use cleaning solution pair and the inlet pipe junction to the photoresist feeding pipe between the nozzle
And the nozzle is cleaned；
4) the first switch valve is closed, and opens third switch valve；And
5) it is supplied using cleaning solution pair and the inlet pipe junction to the photoresist between the cleaning solution bottle
Pipeline, the cleaning solution bottle and the drain line are cleaned.
The utility model also provides a kind of photoresist feeding pipe cleaning method, the photoresist feeding pipe cleaning method
Include the following steps:
1) the photoresist feeding pipe cleaning system as described in above-mentioned either a program is provided；
2) the second switch valve and the third switch valve are opened, and closes the first switch valve；
3) it is supplied using cleaning solution pair and the inlet pipe junction to the photoresist between the cleaning solution bottle
Pipeline, the cleaning solution bottle and the drain line are cleaned；
4) the third switch valve is closed, and opens first switch valve；And
5) use cleaning solution pair and the inlet pipe junction to the photoresist feeding pipe between the nozzle
And the nozzle is cleaned.
As described above, the utility model photoresist feeding pipe cleaning system, has the advantages that the utility model
The cleaning that all photoresist feeding pipes can be realized by the cleaning of two steps, does not need frequently to be replaced and cleaned liquid bottle, will not
There are problems that part photoresist feeding pipe can not clean.
Detailed description of the invention
Fig. 1 and Fig. 2 is shown as photoresist feeding pipe cleaning system in the prior art and carries out to photoresist feeding pipe
The schematic diagram of cleaning.
Fig. 3 is shown as the structural representation of the photoresist feeding pipe cleaning system provided in the utility model embodiment one
Figure.
The photoresist feeding pipe cleaning system that Fig. 4 and Fig. 5 is shown as providing in the utility model embodiment one is to photoetching
The structural schematic diagram that glue feeding pipe is cleaned.
Fig. 6 is shown as the flow chart of the photoresist feeding pipe cleaning method provided in the utility model embodiment two.
Fig. 7 is shown as the flow chart of the photoresist feeding pipe cleaning method provided in the utility model embodiment three.
Fig. 8 is shown as the flow chart of the photoresist feeding pipe cleaning method provided in the utility model embodiment four.
Component label instructions
10 cleaning solution bottles
11 photoresist feeding pipes
12 nozzles
13 inlet pipes
20 cleaning solution bottles
201 bottle caps
202 bottle bodies
21 photoresist feeding pipes
22 first switch valves
23 inlet pipes
24 second switch valves
25 drain lines
26 third switch valves
27 first drawing liquid pumps
28 sealing devices
29 supply air lines
30 surge tanks
31 filters
32 second drawing liquid pumps
33 flowmeters
34 the 4th switch valves
35 nozzles
Specific embodiment
Illustrate the embodiments of the present invention below by way of specific specific example, those skilled in the art can be by this theory
Content disclosed by bright book understands other advantages and effect of the utility model easily.The utility model can also be by addition
Different specific embodiments are embodied or practiced, and the various details in this specification can also be based on different viewpoints and answer
With carrying out various modifications or alterations under the spirit without departing from the utility model.
Fig. 3 is please referred to Fig. 8.It should be noted that diagram provided in the present embodiment only illustrates this in a schematic way
The basic conception of utility model, though it is only shown with related component in the utility model rather than when according to actual implementation in diagram
Component count, shape and size are drawn, when actual implementation form, quantity and the ratio of each component can arbitrarily change for one kind
Become, and its assembly layout form may also be increasingly complex.
Embodiment one
Referring to Fig. 3, the utility model provides a kind of photoresist feeding pipe cleaning system, the photoresist feeding pipe
Cleaning system includes:
Cleaning solution bottle 20, the cleaning solution bottle 20 is for holding cleaning solution；The cleaning solution bottle 20 includes bottle body 202 and bottle
Lid 201, the bottle cap 201 cover on the bottleneck of the bottle body 202；
Photoresist feeding pipe 21, described 21 one end of photoresist feeding pipe are inserted into described clear via the bottle cap 201
In bottle for handling liquid toilet or cosmetic substance 20, the other end is connected with nozzle 35；
First switch valve 22, the first switch valve 22 are located on the photoresist feeding pipe 21；
Inlet pipe 23, described 23 one end of inlet pipe are connected with feed flow source (not shown), the other end and the photoetching
Glue feeding pipe 21 is connected, and the inlet pipe 23 far from the one end in the feed flow source be connected to the cleaning solution bottle 20 with
Between the first switch valve 22；
Second switch valve 24, the second switch valve 24 are located in the inlet pipe 23；And
Drain line 25, described 25 one end of drain line are inserted into the cleaning solution bottle 20 via the bottle cap 201, separately
One end extends to outside the cleaning solution bottle 20.
As an example, the first switch valve 22 may include but be not limited only to pneumatic operated valve (AOV), the second switch valve
24 may include but be not limited only to pneumatic operated valve.
As an example, the photoresist feeding pipe cleaning system further include:
Third switch valve 26, the third switch valve 26 are located in the drain line 25；And
First drawing liquid pump 27, first drawing liquid pump 27 are located in the drain line 25.
As an example, the third switch valve 26 may include but be not limited only to pneumatic operated valve.First drawing liquid pump 27 can
To include but are not limited to mechanical pump.
As an example, first drawing liquid pump 27 can be located at the third switch valve 26 and the cleaning solution bottle 20 it
Between, side of the third switch valve 26 far from the cleaning solution bottle 20 can also be located at.
As an example, the photoresist feeding pipe cleaning system further includes sealing device 28, the sealing device 28
Between the bottle cap 201 and the bottle body 202.The sealing device 28 is for sealing the cleaning solution bottle 20, to prevent
Cleaning solution in the cleaning solution bottle 20 is excessive.
As an example, the feed flow source may include but be not limited only to factory service center liquid-supplying system, the factory service center is supplied
It liquid system dawn known to those skilled in the art, is not repeated herein.
As an example, 25 other end of drain line is connected with factory service drainage system, i.e., the described drain line 25 is remote
One end from the cleaning solution bottle 20 is connected with the factory service drainage system.The factory service drainage system is those skilled in the art
Member is known, is not repeated herein.
As an example, the photoresist feeding pipe cleaning system further include:
Supply air line 29, described 29 one end of supply air line are inserted into the cleaning solution bottle 20 via the bottle cap 201, separately
One end is connected with gas source (not shown)；
Surge tank 30, the surge tank 30 are located on the photoresist feeding pipe 21, and are located at the first switch valve
Between 22 and the nozzle 35；
Filter 31, the filter 31 are located on the photoresist feeding pipe 21, and be located at the surge tank 30 with
Between the nozzle 35；
Second drawing liquid pump 32, second drawing liquid pump 32 are located on the photoresist feeding pipe 21, and are located at the mistake
Between filter 31 and the nozzle 35；
Flowmeter 33, the flowmeter 33 are located on the photoresist feeding pipe 21, and are located at second drawing liquid pump
Between 32 and the nozzle 35；And
4th switch valve 34, the 4th switch valve 34 are located on the photoresist feeding pipe 21, and are located at the stream
Between meter 33 and the nozzle 35.
As an example, the 4th switch valve 34 may include but be not limited only to pneumatic operated valve.
It is clear that photoresist feeding pipe cleaning system described in the utility model carries out substep to the photoresist feeding pipe
The working principle washed are as follows: firstly, the first switch valve 22, the second switch valve 24 and the 4th switch valve 34 are opened,
The inlet pipe 23 provides wash liquid stream and passes through and 23 junction of inlet pipe to the photoetching between the nozzle 35
Glue feeding pipe 21, to 23 junction of inlet pipe to the photoresist feeding pipe 21 between the nozzle 35
It is cleaned, as shown in figure 4, at this time not to 23 junction of inlet pipe to the light between the cleaning solution bottle 20
Photoresist feeding pipe 21, the cleaning solution bottle 20 and the drain line 25 are cleaned, i.e., at this time not to as shown in Figure 4
The pipeline of dotted portion is cleaned；Then, close the first switch valve 22, open the third switch valve 26, it is described into
Liquid pipeline 23 provides wash liquid stream and passes through and 23 junction of inlet pipe to the photoresist between the cleaning solution bottle 20
Feeding pipe 21, the cleaning solution bottle 20 and the drain line 25 are cleaned, as shown in figure 5, at this point, not to it is described into
23 junction of liquid pipeline to the photoresist feeding pipe 21 between the nozzle 35 is cleaned, i.e., at this time not to such as Fig. 5
Shown in the pipeline of dotted portion cleaned.By above-mentioned cleaning step twice, can to from the cleaning solution bottle 20 to
The entire photoresist feeding pipe 21 between the nozzle 35 carries out Integral cleaning.
It is clear that photoresist feeding pipe cleaning system described in the utility model carries out a step to the photoresist feeding pipe
The working principle washed are as follows: open the first switch valve 22, the second switch valve 24, the third switch valve 26 and described
Four switch valves 34, the inlet pipe 23 provide wash liquid stream and pass through from the cleaning solution bottle 20 to entire between the nozzle 35
The photoresist feeding pipe 21, the cleaning solution bottle 20 and the drain line 25 synchronize cleaning.
Embodiment two
Incorporated by reference to Fig. 3 to Fig. 5 refering to Fig. 6, the utility model also provides a kind of photoresist feeding pipe cleaning method, described
Photoresist feeding pipe cleaning method includes the following steps:
1) the photoresist feeding pipe cleaning system as described in embodiment one is provided；The photoresist feeding pipe cleaning
The specific structure of system please refers to embodiment one, is not repeated herein；
2) the first switch valve 22 and the second switch valve 24 are opened；And
3) using cleaning solution to the photoresist feeding pipe 21, the cleaning solution bottle 20, the drain line 25 and institute
It states nozzle 35 while being cleaned.
As an example, in step 3), using the inlet pipe 23 to the photoresist feeding pipe 21, the cleaning solution
Bottle 20, the drain line 25 and the nozzle 35 provide the cleaning solution to the photoresist feeding pipe 21, institute simultaneously
It states cleaning solution bottle 20, the drain line 25 and the nozzle 35 while being cleaned.
As the further example of the present embodiment, the cleaning solution is deionized water, one in OK73, PGME and PGMEA
Kind or combination.
Embodiment three
Incorporated by reference to Fig. 3 to Fig. 5 refering to Fig. 7, the utility model also provides a kind of photoresist feeding pipe cleaning method, described
Photoresist feeding pipe cleaning method includes the following steps:
1) the photoresist feeding pipe cleaning system as described in embodiment one is provided；The photoresist feeding pipe cleaning
The specific structure of system please refers to embodiment one, is not repeated herein；
2) the first switch valve 22 and the second switch valve 24 are opened, and closes the third switch valve 26；
3) it is supplied using cleaning solution pair and 23 junction of the inlet pipe to the photoresist between the nozzle 35
Pipeline 21 and the nozzle 35 are cleaned；
4) the first switch valve 22 is closed, and opens third switch valve 26；And
5) use cleaning solution pair and 23 junction of the inlet pipe to the photoresist between the cleaning solution bottle 20
Feeding pipe 21, the cleaning solution bottle 20 and the drain line 25 are cleaned.
As an example, in step 3), using the inlet pipe 23 to 23 junction of inlet pipe to described
The photoresist feeding pipe 21 and the nozzle 35 between nozzle 35 carry out cleaning provide cleaning solution, with to the feed liquor
23 junction of pipeline between the nozzle 35 the photoresist feeding pipe 21 and the nozzle 35 cleaned.
As an example, in step 5), using the inlet pipe 23 to 23 junction of inlet pipe to described clear
The photoresist feeding pipe 21, the cleaning solution bottle 20 and the drain line 25 between bottle for handling liquid toilet or cosmetic substance 20 provide cleaning solution,
To 23 junction of inlet pipe to the photoresist feeding pipe 21 between the cleaning solution bottle 20, the cleaning
Liquid bottle 20 and the drain line 25 are cleaned.
As the further example of the present embodiment, the cleaning solution is deionized water, one in OK73, PGME and PGMEA
Kind or combination.
Example IV
Incorporated by reference to Fig. 3 to Fig. 5 refering to Fig. 8, the utility model also provides a kind of photoresist feeding pipe cleaning method, described
Photoresist feeding pipe cleaning method includes the following steps:
1) the photoresist feeding pipe cleaning system as described in embodiment one is provided；The photoresist feeding pipe cleaning
The specific structure of system please refers to embodiment one, is not repeated herein；
2) the second switch valve 24 and the third switch valve 26 are opened, and closes the first switch valve 22；
3) use cleaning solution pair and 23 junction of the inlet pipe to the photoresist between the cleaning solution bottle 20
Feeding pipe 21, the cleaning solution bottle 20 and the drain line 25 are cleaned；
4) the third switch valve 26 is closed, and opens first switch valve 22；And
5) it is supplied using cleaning solution pair and 23 junction of the inlet pipe to the photoresist between the nozzle 20
Pipeline 21 and the nozzle 35 are cleaned.
As an example, in step 3), using the inlet pipe 23 to 23 junction of inlet pipe to described clear
The photoresist feeding pipe 21, the cleaning solution bottle 20 and the drain line 25 between bottle for handling liquid toilet or cosmetic substance 20 provide cleaning solution,
To 23 junction of inlet pipe to the photoresist feeding pipe 21 between the cleaning solution bottle 20, the cleaning
Liquid bottle 20 and the drain line 25 are cleaned.
As an example, in step 5), using the inlet pipe 23 to 23 junction of inlet pipe to described
The photoresist feeding pipe 21 and the nozzle 35 between nozzle 35 carry out cleaning provide cleaning solution, with to the feed liquor
23 junction of pipeline between the nozzle 35 the photoresist feeding pipe 21 and the nozzle 35 cleaned.
As the further example of the present embodiment, the cleaning solution is deionized water, one in OK73, PGME and PGMEA
Kind or combination.
In conclusion the utility model provides a kind of photoresist feeding pipe cleaning system, the photoresist feeding pipe
Cleaning system includes: cleaning solution bottle, for holding cleaning solution；The cleaning solution bottle includes bottle body and bottle cap, and the bottle cap covers
On the bottleneck of the bottle body；Photoresist feeding pipe, one end are inserted into the cleaning solution bottle via the bottle cap, the other end with
Nozzle is connected；First switch valve is located on the photoresist feeding pipe；Inlet pipe, one end are connected with feed flow source, separately
One end is connected with the photoresist feeding pipe, and is connected between the cleaning solution bottle and the first switch valve；Second
Switch valve is located in the inlet pipe；And drain line, one end are inserted into the cleaning solution bottle via the bottle cap.This
Utility model can realize the cleaning of all photoresist feeding pipes by the cleaning of two steps, not need frequently to be replaced and cleaned liquid
Bottle, will not have that part photoresist feeding pipe can not clean.
The above embodiments are only illustrative of the principle and efficacy of the utility model, and not for limitation, this is practical new
Type.Any person skilled in the art can all carry out above-described embodiment under the spirit and scope without prejudice to the utility model
Modifications and changes.Therefore, such as those of ordinary skill in the art without departing from the revealed essence of the utility model
All equivalent modifications or change completed under mind and technical idea, should be covered by the claim of the utility model.
Claims (7)
1. a kind of photoresist feeding pipe cleaning system, which is characterized in that the photoresist feeding pipe cleaning system includes:
Cleaning solution bottle, for holding cleaning solution；The cleaning solution bottle includes bottle body and bottle cap, and the bottle cap is covered in the bottle body
On bottleneck；
Photoresist feeding pipe, one end are inserted into the cleaning solution bottle via the bottle cap, and the other end is connected with nozzle；
First switch valve is located on the photoresist feeding pipe；
Inlet pipe, one end are connected with feed flow source, and the other end is connected with the photoresist feeding pipe, and are connected to described
Between cleaning solution bottle and the first switch valve；
Second switch valve is located in the inlet pipe；And
Drain line, one end are inserted into the cleaning solution bottle via the bottle cap.
2. photoresist feeding pipe cleaning system according to claim 1, which is characterized in that the photoresist feeding pipe
Cleaning system further include:
Third switch valve, the third switch valve are located in the drain line；And
First drawing liquid pump is located in the drain line.
3. photoresist feeding pipe cleaning system according to claim 1, which is characterized in that the photoresist feeding pipe
Cleaning system further includes sealing device, and the sealing device is between the bottle cap and the bottle body.
4. photoresist feeding pipe cleaning system according to claim 1, which is characterized in that the feed flow source includes factory service
Central liquid-supplying system.
5. photoresist feeding pipe cleaning system according to claim 1, which is characterized in that the drain line other end
It is connected with factory service drainage system.
6. photoresist feeding pipe cleaning system according to any one of claim 1 to 5, which is characterized in that the light
Photoresist feeding pipe cleaning system further include:
Supply air line, one end are inserted into the cleaning solution bottle via the bottle cap, and the other end is connected with gas source；
Surge tank is located on the photoresist feeding pipe, and between the first switch valve and the nozzle；
Filter is located on the photoresist feeding pipe, and between the surge tank and the nozzle；
Second drawing liquid pump is located on the photoresist feeding pipe, and between the filter and the nozzle；
Flowmeter is located on the photoresist feeding pipe, and between second drawing liquid pump and the nozzle；And
4th switch valve is located on the photoresist feeding pipe, and between the flowmeter and the nozzle.
7. photoresist feeding pipe cleaning system according to claim 6, which is characterized in that the first switch valve, institute
Stating second switch valve and the 4th switch valve includes pneumatic operated valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821581714.6U CN209303378U (en) | 2018-09-27 | 2018-09-27 | Photoresist feeding pipe cleaning system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821581714.6U CN209303378U (en) | 2018-09-27 | 2018-09-27 | Photoresist feeding pipe cleaning system |
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| Publication Number | Publication Date |
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| CN209303378U true CN209303378U (en) | 2019-08-27 |
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ID=67670380
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821581714.6U Active CN209303378U (en) | 2018-09-27 | 2018-09-27 | Photoresist feeding pipe cleaning system |
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| Country | Link |
|---|---|
| CN (1) | CN209303378U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110947707A (en) * | 2018-09-27 | 2020-04-03 | 长鑫存储技术有限公司 | Photoresist supply pipeline cleaning system and method |
-
2018
- 2018-09-27 CN CN201821581714.6U patent/CN209303378U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110947707A (en) * | 2018-09-27 | 2020-04-03 | 长鑫存储技术有限公司 | Photoresist supply pipeline cleaning system and method |
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