CN205281091U - Display substrate and display panel - Google Patents

Display substrate and display panel Download PDF

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Publication number
CN205281091U
CN205281091U CN201620008586.0U CN201620008586U CN205281091U CN 205281091 U CN205281091 U CN 205281091U CN 201620008586 U CN201620008586 U CN 201620008586U CN 205281091 U CN205281091 U CN 205281091U
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Prior art keywords
black matrix
chock insulator
insulator matter
barricade
base plate
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CN201620008586.0U
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高贞龙
陈卓
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
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Abstract

The utility model provides a display substrate and display panel belongs to display substrates technical field, and it can solve present display panel mesophragma underbed needs to produce easily the colour contamination between preparation alone and each sub -pixel problem. The utility model discloses a display substrates includes a plurality of sub -pixels, every be equipped with colored filter coating in the sub -pixel, be equipped with black matrix between each sub -pixel, and at least part be equipped with barricade, barricade and the black matrix structure as an organic whole of bar on the black matrix. The utility model discloses a display panel includes foretell display substrates.

Description

Display base plate, display panel
Technical field
The utility model belongs to display base plate technical field, is specifically related to a kind of display base plate, display panel.
Background technology
Between two substrates of display panel (such as display panels), it is necessary to the distance of chock insulator matter to maintain between two substrates is set. In order to not affect display, the position that these chock insulator matters to be arranged between each sub-pixel is also exactly the position being located at black matrix place.
But, these chock insulator matters need prepare (such as being prepared by composition technique with transparent photomask glue) by independent technique or dispense, and this can make the preparation section of display panel increase, complex process.
In addition, owing to the distance between each sub-pixel is very little, and the height of black matrix is identical with the height of color filter film or lower, therefore the light that each sub-pixel sends may oblique enter in adjacent sub-pixel, and turn into other colors through the color filter film of different colours, thus cause " colour contamination " phenomenon, impact display.
Practical novel content
The utility model needs the problem easily producing colour contamination between separately preparation and each sub-pixel for chock insulator matter in existing display panel, it is provided that one need not prepare separately chock insulator matter, and can avoid the display base plate of colour contamination, display panel,
The technical scheme that solution the utility model technical problem adopts is a kind of display base plate, and it comprises multiple sub-pixel, is provided with color filter film in sub-pixel described in each, is provided with black matrix between each sub-pixel, and
At least part of described black matrix is provided with the barricade of bar shaped, and barricade and black matrix are structure as a whole.
Preferably, described black matrix being also provided with chock insulator matter, described chock insulator matter and black matrix are structure as a whole.
Further preferably, described chock insulator matter comprises main chock insulator matter and auxiliary chock insulator matter, and the height of described main chock insulator matter is greater than the height of auxiliary chock insulator matter.
Further preferably, the height of described barricade equals the height of auxiliary chock insulator matter.
Further preferably, described black matrix comprises the corresponding black matrix of grid line and the black matrix of respective data lines, and described chock insulator matter is located on the black matrix of corresponding grid line.
Preferably, described black matrix comprises the corresponding black matrix of grid line and the black matrix of respective data lines, and described barricade is located on the black matrix of respective data lines.
Preferably, length direction along described barricade is provided with an opening every a segment distance.
Preferably, the height of described black matrix is less than the thickness of the thinnest color filter film.
Preferably, described black matrix is made up of black photoresist material.
The technical scheme that solution the utility model technical problem adopts is a kind of display panel, and it comprises above-mentioned display base plate.
Display base plate of the present utility model comprises barricade, barricade is from black matrix projection, thus the supporting role of similar chock insulator matter can be played, and it is synchronously formed with black matrix, thus do not need to prepare by independent technique, therefore the preparation technology of display panel can be simplified, and thus put forward high yield, reduce costs; Meanwhile, barricade is inevitable to be made up of the black material identical with black matrix, and gear is between adjacent sub-pixel, therefore it can stop the light of each sub-pixel to enter in adjacent sub-pixel, thus avoids colour contamination phenomenon.
Accompanying drawing explanation
Fig. 1 is the fragmentary top TV structure schematic diagram of a kind of display base plate of embodiment of the present utility model;
Fig. 2 is the partial face structural representation of the barricade of a kind of display base plate of embodiment of the present utility model;
Fig. 3 is the partial face structural representation of the chock insulator matter of a kind of display base plate of embodiment of the present utility model;
Fig. 4 is the chock insulator matter of a kind of display base plate of embodiment of the present utility model and the partial face structural representation of color filter film;
Wherein, Reference numeral is: 1, black matrix; 11, barricade; 111, opening; 12, chock insulator matter; 121, main chock insulator matter; 122, auxiliary chock insulator matter; 2, color filter film; 51, grid line; 52, data line; 9, substrate.
Embodiment
For making those skilled in the art understand the technical solution of the utility model better, below in conjunction with the drawings and specific embodiments, the utility model is described in further detail.
Embodiment 1:
As shown in Figures 1 to 4, the present embodiment provides a kind of display base plate, and it comprises multiple sub-pixel, is provided with color filter film 2 in each sub-pixel, is provided with black matrix 1 between each sub-pixel.
That is, the display base plate of the present embodiment comprises the sub-pixel lining up array, is filled with the color filter film 2 of the respective color being located in substrate 9 in each sub-pixel, the light penetrated from this sub-pixel is changed into corresponding color; Position between each sub-pixel is then provided with the black matrix 1 being positioned in substrate, for stoping light to penetrate from these positions. Thus, this display base plate can be color membrane substrates, such as the color membrane substrates for liquid crystal indicator, certainly, if this display base plate is the array substrate of COA (ColorOnArray) pattern, is also feasible.
Wherein, at least part of black matrix 1 of display base plate is provided with the barricade 11 of bar shaped, and barricade 11 and black matrix 1 are structure as a whole.
That is, as shown in Figure 1 and Figure 2, the black matrix 1 of display base plate is also provided with the strip projected parts (i.e. barricade 11) that the length direction along the interval between two sub-pixels distributes, and barricade 11 is integrative-structure with black matrix 1, thus they must be formed with same material in same one-time process, or says that the two is synchronous formation.
Visible, above barricade 11 is from black matrix 1 projection, thus can play the supporting role of similar chock insulator matter 12, and it 1 is synchronously formed with black matrix, therefore do not need with the preparation of independent technique, thus the preparation technology of display panel can be simplified, and thus put forward high yield, reduce costs; Meanwhile, barricade 11 is inevitable to be made up of the black material identical with black matrix 1, and gear is between adjacent sub-pixel, therefore it can stop the light of each sub-pixel to enter in adjacent sub-pixel, thus avoids colour contamination phenomenon.
Preferably, length direction along barricade 11 is provided with an opening 111 every a segment distance.
That is, as shown in Figure 2, barricade 11 is not the strip running through whole display panel, but is provided with an opening 111 every a segment distance (such as some tens of pm), or saying, each barricade 11 also can be regarded " the sub-barricade " arranged along a linear interval by multistage as and form.
Wherein, black matrix 1 (barricade 11) generally manufactures prior to color filter film 2, and color filter film 2 is generally formed by composition technique by the photoresist material of respective color, namely first it is coated with complete photoresist layer by revolving the modes such as painting, again the photoresist layer not needed is removed afterwards and make remainder be divided into color filter film 2. And photoresist material to be flowed in coating process, but barricade 11 is higher than black matrix 1, therefore the flowing of photoresist material is had more obvious barrier effect by it, for this reason, multiple opening 111 is preferably set on barricade 11, using the passage flowed as photoresist material, is convenient to the formation of color filter film 2.
Preferably, the height of black matrix 1 is less than the thickness of the thinnest color filter film 2.
That is, as shown in Figure 3, not having the position of the structures such as barricade 11, the height of simple black matrix 1 should be less than the thickness of the thinnest color filter film 2 (being generally blue filter coating). This is because the flowing of photoresist material is also had barrier effect by black matrix 1, and the existence due to barricade 11 etc., therefore the flowing of the photoresist material of color filter film 2 is more difficult than during only conventional black matrix 1 in the present embodiment, therefore, the thickness of black matrix 1 should be also lower than the thinnest color filter film 2, flow to ensure the photoresist material of all color filter films 2 and all can cover barricade 11, thus form the uniform color filter film 2 of thickness.
Preferably, black matrix 1 being also provided with chock insulator matter 12, chock insulator matter 12 and black matrix 1 are structure as a whole.
That is, as shown in Fig. 1, Fig. 3, Fig. 4, except above barricade 11, black matrix 1 is also provided with chock insulator matter 12 (different positions is located at by certain and barricade 11) that be structure as a whole with it, cylinder shape, the form of this chock insulator matter 12, height etc. are similar with existing chock insulator matter, therefore can improve support effect further. And be also structure as a whole with black matrix 1 due to chock insulator matter 12, therefore its also with the synchronous formation of black matrix 1 (with barricade 11), and do not need to increase independent preparation technology.
Preferably, chock insulator matter 12 comprises main chock insulator matter 121 and auxiliary chock insulator matter 122, and the height of main chock insulator matter 121 is greater than the height of auxiliary chock insulator matter 122.
That is, as shown in Figure 4, preferably include two kinds of highly different chock insulator matters 12, higher is main chock insulator matter 121, general height is at about 3��3.4 ��m, and lower be auxiliary chock insulator matter 122, it is generally low than main chock insulator matter 121 about 0.4��0.5 ��m, and the number ratio of main chock insulator matter 121 and auxiliary chock insulator matter 122 is generally about 1: 60. Wherein, main chock insulator matter 121 is for playing a supporting role under normal conditions, and when display panel is stressed and is out of shape, auxiliary chock insulator matter 122 also starts contact substrate, thus provides stronger support.
Preferably, the height of barricade 11 equals the height of auxiliary chock insulator matter 122.
That is, barricade 11 height can be substantially suitable with the height of auxiliary chock insulator matter 122, and also low than main chock insulator matter 121 about 0.4��0.5 ��m, thus, supporting role and the auxiliary chock insulator matter 122 of barricade 11 are similar. This is because the general length of barricade 11 is relatively big, therefore the auxiliary chock insulator matter 122 that its supporting role should be just more with original quantity is similar.
Preferably, black matrix 1 comprises the corresponding black matrix 1 of grid line 51 and the black matrix 1 of respective data lines 52, and barricade 11 is located on the black matrix 1 of respective data lines 52, and chock insulator matter 12 is located on the black matrix 1 of corresponding grid line 51.
That is, between each sub-pixel, (black matrix 1) is generally for setting grid line 51 and data line 52 (certainly can be arranged in array substrate), and above barricade 11 is preferably located on the black matrix 1 corresponding with data line 52, chock insulator matter 12 then can be located on the black matrix 1 of corresponding grid line 51.
Typically, the width of the width ratio data line 52 of grid line 51 is big, therefore as shown in Figure 1, the black matrix 1 of corresponding grid line 51 is also wider than the black matrix 1 of respective data lines 52, therefore, it is located on wider black matrix 1 to obtain more stable basis by chock insulator matter 12 (especially main chock insulator matter 121) stronger for supporting role, and be located on narrower black matrix 1 by the barricade 11 with the effect of being in the light can play better prevent colour contamination effect (because of the sub-pixel obviously easier colour contamination of narrower black matrix 1 both sides, therefore also more needing barricade 11).
Preferably, black matrix 1 is made up of black photoresist material.
That is, black matrix 1 can be made up of the photoresist material of black, and certainly, barricade 11 and chock insulator matter 12 (if any) are also made up of black photoresist material.
Photoresist material is by composition (exposure) processes, and composition technique can once form the different photoresist material pattern of each position thickness, therefore the black matrix 1 (comprising positive photoresist and negative photoresist) with photoresist and forming is convenient to preparation more.
Concrete, when to be formed above black matrix 1 simultaneously, barricade 11, during chock insulator matter 12, ladder exposure technology can be adopted, namely gray level mask plate or intermediate tone mask version is adopted to expose, thus the depth of exposure making the different positions of photoresist layer is different, when developing, the photoresist layer of some position can be retained completely like this, and form main chock insulator matter 121, the photoresist layer of some position is then partly solubilized, form auxiliary chock insulator matter 122, barricade 11, simple black matrix 1 etc., the photoresist layer of rest position is then completely dissolved, form the position of the color filter film 2 of corresponding each sub-pixel.
It thus is seen that use being also advantageous in that of black photoresist material, wherein the height of the thickness of black matrix 1 and barricade 11, chock insulator matter 12 all controls simply separately by adjustment exposure technology, thus is convenient to the structural adjustment of display base plate.
Certainly, owing to be formed barricade 11 and chock insulator matter 12 simultaneously, therefore the black matrix 1 of the present embodiment is in the preparation, and the thickness of the black photoresist layer of coating can be bigger than prior art. It should be noted that select the coating apparatus that can be coated with relatively (according to appointment 9 ��m) thick photoresist, photoresist material that exposure can be completed when thickness is bigger, test set etc. that current black matrix structure can be detected.
Embodiment 2:
The present embodiment provides a kind of display panel, and it comprises above-mentioned display base plate.
Concrete, this display panel is preferably display panels; Certainly, it also can be other forms such as Organic Light Emitting Diode (OLED) display panel.
It should be appreciated that the illustrative embodiments that above enforcement mode is only used to principle of the present utility model is described and adopts, but the utility model is not limited thereto. For those skilled in the art, when not departing from spirit of the present utility model and essence, it is possible to make various modification and improvement, these modification and improvement are also considered as protection domain of the present utility model.

Claims (10)

1. a display base plate, comprises multiple sub-pixel, is provided with color filter film in sub-pixel described in each, is provided with black matrix between each sub-pixel, it is characterised in that,
At least part of described black matrix is provided with the barricade of bar shaped, and barricade and black matrix are structure as a whole.
2. display base plate according to claim 1, it is characterised in that,
Also being provided with chock insulator matter on described black matrix, described chock insulator matter and black matrix are structure as a whole.
3. display base plate according to claim 2, it is characterised in that,
Described chock insulator matter comprises main chock insulator matter and auxiliary chock insulator matter, and the height of described main chock insulator matter is greater than the height of auxiliary chock insulator matter.
4. display base plate according to claim 3, it is characterised in that,
The height of described barricade equals the height of auxiliary chock insulator matter.
5. display base plate according to claim 2, it is characterised in that,
Described black matrix comprises the corresponding black matrix of grid line and the black matrix of respective data lines, and described chock insulator matter is located on the black matrix of corresponding grid line.
6. display base plate according to claim 1, it is characterised in that,
Described black matrix comprises the corresponding black matrix of grid line and the black matrix of respective data lines, and described barricade is located on the black matrix of respective data lines.
7. display base plate according to claim 1, it is characterised in that,
Length direction along described barricade is provided with an opening every a segment distance.
8. display base plate according to claim 1, it is characterised in that,
The height of described black matrix is less than the thickness of the thinnest color filter film.
9. display base plate according to claim 1, it is characterised in that,
Described black matrix is made up of black photoresist material.
10. a display panel, it is characterised in that, comprise the display base plate described in any one in claim 1 to 9.
CN201620008586.0U 2016-01-04 2016-01-04 Display substrate and display panel Active CN205281091U (en)

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105974636A (en) * 2016-07-18 2016-09-28 深圳市华星光电技术有限公司 Method for manufacturing liquid crystal display panel
CN105974651A (en) * 2016-07-18 2016-09-28 深圳市华星光电技术有限公司 Method for manufacturing liquid crystal display panel
CN106647012A (en) * 2017-03-15 2017-05-10 京东方科技集团股份有限公司 Colorful color filter and display device with same
CN106990670A (en) * 2017-05-02 2017-07-28 深圳市华星光电技术有限公司 Black matrix light shield, the manufacture method of black matrix and array base palte
CN109801559A (en) * 2019-03-29 2019-05-24 上海天马微电子有限公司 Display panel and display device
CN110109294A (en) * 2019-05-24 2019-08-09 京东方科技集团股份有限公司 A kind of liquid crystal display panel, production method and display device
CN111708194A (en) * 2020-06-11 2020-09-25 深圳市华星光电半导体显示技术有限公司 Display device and splicing device
CN111933037A (en) * 2020-08-31 2020-11-13 京东方科技集团股份有限公司 Display substrate and quantum dot display panel
CN114236916A (en) * 2021-11-15 2022-03-25 滁州惠科光电科技有限公司 Display panel and display device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105974651B (en) * 2016-07-18 2019-05-31 深圳市华星光电技术有限公司 The production method of liquid crystal display panel
CN105974651A (en) * 2016-07-18 2016-09-28 深圳市华星光电技术有限公司 Method for manufacturing liquid crystal display panel
CN105974636A (en) * 2016-07-18 2016-09-28 深圳市华星光电技术有限公司 Method for manufacturing liquid crystal display panel
CN105974636B (en) * 2016-07-18 2019-05-31 深圳市华星光电技术有限公司 The production method of liquid crystal display panel
CN106647012A (en) * 2017-03-15 2017-05-10 京东方科技集团股份有限公司 Colorful color filter and display device with same
CN106990670A (en) * 2017-05-02 2017-07-28 深圳市华星光电技术有限公司 Black matrix light shield, the manufacture method of black matrix and array base palte
CN109801559A (en) * 2019-03-29 2019-05-24 上海天马微电子有限公司 Display panel and display device
CN109801559B (en) * 2019-03-29 2021-07-23 上海天马微电子有限公司 Display panel and display device
CN110109294A (en) * 2019-05-24 2019-08-09 京东方科技集团股份有限公司 A kind of liquid crystal display panel, production method and display device
CN111708194A (en) * 2020-06-11 2020-09-25 深圳市华星光电半导体显示技术有限公司 Display device and splicing device
CN111708194B (en) * 2020-06-11 2021-09-24 深圳市华星光电半导体显示技术有限公司 Display device and splicing device
CN111933037A (en) * 2020-08-31 2020-11-13 京东方科技集团股份有限公司 Display substrate and quantum dot display panel
CN114236916A (en) * 2021-11-15 2022-03-25 滁州惠科光电科技有限公司 Display panel and display device

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