CN205193431U - Wet -type is developed to assist and is rocked mechanism - Google Patents
Wet -type is developed to assist and is rocked mechanism Download PDFInfo
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- CN205193431U CN205193431U CN201521004826.1U CN201521004826U CN205193431U CN 205193431 U CN205193431 U CN 205193431U CN 201521004826 U CN201521004826 U CN 201521004826U CN 205193431 U CN205193431 U CN 205193431U
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- wet developing
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Abstract
The utility model relates to a wet -type is developed to assist and is rocked mechanism, hang axle (1) including the installation, stainless steel shell (2) and carrier (3), axle (1) fixed connection is hung on stainless steel shell (2) top to the installation, stainless steel shell (2) inside be equipped with servo motor (4) and speed reducer (5), the output of speed reducer (5) is connected with drive gear (6), pivot (7) is connected to the output of drive gear (6), the other end of pivot (7) is equipped with rocking arm (8), rocking arm (8) fixed connection is on carrier (3), be equipped with the basket of flowers (10) that are used for placing wafer (9) on carrier (3), compared with the prior art, the utility model, make each wafer be at the uniform velocity circular motion with adjustable speed and adjustable motion radius in development liquid to development liquid stream field around auxiliary physics power makes is evenly controllable, has improved development homogeneity and development speed, the appearance not enough or the overdevelop condition of having avoided developing.
Description
[technical field]
The utility model relates to wet developing equipment technical field, and specifically a kind of wet developing is auxiliary rocks mechanism.
[background technology]
In LED processing procedure, development is indispensable technology.Visualization way conventional at present has: 1. whole box silicon chip immersion development (BatchDevelopment), and the consumption of which developer solution is very large, and developing uniformity is poor; 2. spray development (ContinuousSprayDevelopment)/automatic rotation develops (Auto-rotationDevelopment) continuously, which by one or more nozzles spray developer solution at silicon chip surface, silicon chip low speed rotation (100 ~ 500rpm) simultaneously, nozzle spray pattern and silicon slice rotating speed are the crucial regulating parameter of the repeatability realizing dissolution rate and homogeneity between silicon chip; 3. puddle (revolve and cover submergence) formula development (PuddleDevelopment), namely spraying enough (can not be too many, minimize back side humidity) developer solution to silicon chip surface, and (flowing of developer solution keeps lower to form puddle shape, to reduce the change of edge developing rate), silicon chip is fixed or is slowly rotated, general employing is repeatedly revolved and is covered developer solution: first time coating, maintenance 10 ~ 30 seconds, removal, coating for the second time, maintenance, removal, then use deionized water rinsing (removing all chemicals on silicon chip two sides) and rotation dries.Program advantage is that developer solution consumption is few, and silicon chip development evenly, minimizes thermograde.
May be there are three problems in developing process: 1. not exclusively (IncompleteDevelopment), surface also remains photoresist in development, and this is caused by developer solution deficiency.2. development not (UnderDevelopment), the sidewall out of plumb of development, and this is caused by development time deficiency.3. overdevelop (OverDevelopment), the photoresist near surface is developed liquid excessive dissolution, and form step, this causes because development time is oversize.
In current LED industry, whole box silicon chip immersion development (BatchDevelopment) still occupies larger market because of the advantage of its high-level efficiency, low cost.As equipment manufacturers, in order to improve the developing uniformity of whole box silicon chip immersion development (BatchDevelopment), avoid developing incomplete or crossing development, propose various mode, such as adopt circulation processing procedure groove, ultrasonic assistant, up and down oscillating mechanism auxiliary, and it is applied to board, assisting by physical force, achieves more significant effect.But supplementary mode conventional is at present compared as follows table 1:
Table 1
[utility model content]
The purpose of this utility model is exactly will solve above-mentioned deficiency and provide that a kind of wet developing is auxiliary rocks mechanism, each wafer is made to do uniform circular motion with adjustable speed and adjustable moving radius in developer solution, make the developer solution even flow field of surrounding controlled with auxiliary physical force, improve developing uniformity and developing rate, avoid and develop not or the appearance of overdevelop situation.
Design that a kind of wet developing is auxiliary rocks mechanism for achieving the above object, comprise and hanging axis 1, stainless steel casing 2 and carrier 3 are installed, described installation hanging axis 1 is fixedly connected on stainless steel casing 2 top, servomotor 4 and reductor 5 are equipped with in described stainless steel casing 2 inside, the output terminal of described reductor 5 is connected with transmission gear 6, the output terminal connection rotating shaft 7 of described transmission gear 6, the other end of described rotating shaft 7 is equipped with rocking arm 8, described rocking arm 8 is fixedly connected on carrier 3, and described carrier 3 is provided with the gaily decorated basket 10 for placing wafer 9.
Described transmission gear 6 comprises driving gear and is positioned at the follower gear of the driving gear left and right sides, and described driving gear and follower gear are connected with a joggle, and described follower gear is equipped with rotating shaft 7, and described driving gear, follower gear are plastic gear.
On described stainless steel casing 2, the output of reductor 5 is provided with position transducer, and described position transducer is by connection servomotor 4 and reductor 5.
Be provided with processing procedure groove 11 below the described gaily decorated basket 10, fill developer solution in described processing procedure groove 11, the described gaily decorated basket 10 is immersed in developer solution.
Web joint 12 is provided with between described rocking arm 8 and carrier 3.
Described installation hanging axis 1 adopts PFA coated.
Described carrier 3, transmission gear 6, rotating shaft 7, rocking arm 8, web joint 12 all adopt NPP or PTFE material to make.
Described processing procedure groove 11 adopts NPP material to make, and the described gaily decorated basket 10 adopts PFA material to make.
Described stainless steel casing 2 adopts sus304 material to make, and described stainless steel casing 2 surface spraying has PTFE layer.
Described stainless steel casing 2 adopts PP material to make.
The utility model compared with the existing technology, novel structure, simply, reasonable in design, by installation hanging axis is fixedly connected on stainless steel casing top, in stainless steel casing inside, servomotor and reductor are housed, the output terminal of reductor is connected with transmission gear, transmission gear drives rocking arm by rotating shaft, and rocking arm is fixedly connected on is placed with on the carrier of wafer, thus make each wafer do uniform circular motion with adjustable speed and adjustable moving radius in developer solution, make the developer solution even flow field of surrounding controlled with auxiliary physical force, improve developing uniformity and developing rate, avoid and develop not or the appearance of overdevelop situation, in addition, described in the utility modelly rock that mechanism's assembling is simple, cost is lower, all have good applicability to different technique and processing procedure, improves developing uniformity, Be very effective, reduce the working strength of rework rate and operating personnel to a great extent, improve production efficiency.
[accompanying drawing explanation]
Fig. 1 is decomposing schematic representation of the present utility model;
Fig. 2 is one-piece construction schematic diagram of the present utility model;
In figure: 1, hanging axis 2, stainless steel casing 3, carrier 4, servomotor 5, reductor 6, transmission gear 7, rotating shaft 8, rocking arm 9, wafer 10, the gaily decorated basket 11, processing procedure groove 12, web joint are installed.
[embodiment]
Below in conjunction with accompanying drawing, following further illustrating is done to the utility model:
As shown in drawings, the utility model comprises: install hanging axis 1, stainless steel casing 2 and carrier 3, hanging axis 1 is installed and is fixedly connected on stainless steel casing 2 top, servomotor 4 and reductor 5 are equipped with in stainless steel casing 2 inside, the output terminal of reductor 5 is connected with transmission gear 6, the output terminal connection rotating shaft 7 of transmission gear 6, the other end of rotating shaft 7 is equipped with rocking arm 8, rocking arm 8 is fixedly connected on carrier 3, web joint 12 is provided with between rocking arm 8 and carrier 3, carrier 3 is provided with the gaily decorated basket 10 for placing wafer 9, processing procedure groove 11 is provided with below the gaily decorated basket 10, developer solution is filled in processing procedure groove 11, the gaily decorated basket 10 is immersed in developer solution.Wherein, transmission gear 6 comprises driving gear and is positioned at the follower gear of the driving gear left and right sides, and driving gear and follower gear are connected with a joggle, and follower gear is equipped with rotating shaft 7, and driving gear, follower gear are plastic gear; On stainless steel casing 2, the output of reductor 5 is provided with position transducer, and position transducer is by connection servomotor 4 and reductor 5.
Because developer solution has slight erosion, and very high to purity requirements, therefore, for avoiding metal ion pollution, in the utility model, hanging axis 1 being installed and adopting PFA coated; Carrier 3, transmission gear 6, rotating shaft 7, rocking arm 8, web joint 12 all adopt NPP or PTFE material to make; Processing procedure groove 11 adopts NPP material to make, and the gaily decorated basket 10 is standard items, adopts PFA material to make; Stainless steel casing 2 adopts sus304 material to make, and carries out PTFE spraying at sus304 material surface, or adopts PP material to make.
Principle of work of the present utility model is: utilize steady circular's variable bit carrying mechanism (namely rocking mechanism), each wafer is made to do uniform circular motion with adjustable speed (rocking mechanism speed 10-300rpm adjustable) and adjustable moving radius (rocking radius adjustable extent 20-60mm) in developer solution, make the developer solution even flow field of surrounding controlled with auxiliary physical force, improve developing uniformity and developing rate, avoid and develop not or the appearance of overdevelop situation.
Wet developing described in the utility model is auxiliary to be rocked mechanism and is applied in developing apparatus, developing process can be assisted to realize, raising developing uniformity and controllability; This rocks the volume of mechanism and quality will control in certain scope, and machinery and electric interfaces will carry out modularity design, to tackle the embedding requirement of following different process apparatus; This rocks mechanism by the Serve Motor Control being applicable to clean environment, and velocity-stabilization is adjustable, by two position transducer inductions, guarantees to rock stop position controlled, so that follow-up full automatic process operations; This rocks mechanism by plastic gear transmission, and noise is little, stable, avoids the pollution of metallic ion simultaneously, improves cleanliness factor.
In addition, this rocks the radius of a circle that mechanism regulates it to rock by the connecting rod rocker arm body of oneself making, auxiliary rock mechanism and client direct correlation parts are carrier (workpiece), only need adjust the wafer that carrier size can adapt to different size, also can consider to be applied to other processing procedures simultaneously, such as etch or remove photoresist processing procedure, and the embeddability for different processing procedure is better; Rock mechanism to be protected by stainless steel casing, avoid impurity to fall into developer solution, play the object that mechanism is rocked in protection simultaneously; Rock the cost performance of mechanism by the development utility appliance more than 20% higher than routine; Rock mechanism test produce a desired effect after, further standardization modularity, the complete cost of batch making will higher than 30,000 yuan, thus reduce cost.
The auxiliary mechanism structure of rocking of this wet developing is simple, selects a large amount of standard components, reduces cost and processing assembling difficulty; Lifting for developing rate and developing uniformity has good effect, possesses larger cost or advantageous effect; This is auxiliary rock mechanism rock speed and rock radius easy to adjust, range of adjustment (rocks speed adjustable extent 10 ~ 300rpm comparatively greatly, rock radius adjustable extent 20 ~ 60mm), only need adjust Serve Motor Control to export and rocking arm (workpiece), can realize the demand of different client, range of application is very wide.
The utility model is not by the restriction of above-mentioned embodiment; change, the modification done under other any does not deviate from Spirit Essence of the present utility model and principle, substitute, combine, simplify; all should be the substitute mode of equivalence, be included within protection domain of the present utility model.
Claims (10)
1. a wet developing is assisted and is rocked mechanism, it is characterized in that: comprise and hanging axis (1) is installed, stainless steel casing (2) and carrier (3), described installation hanging axis (1) is fixedly connected on stainless steel casing (2) top, servomotor (4) and reductor (5) are equipped with in described stainless steel casing (2) inside, the output terminal of described reductor (5) is connected with transmission gear (6), the output terminal connection rotating shaft (7) of described transmission gear (6), the other end of described rotating shaft (7) is equipped with rocking arm (8), described rocking arm (8) is fixedly connected on carrier (3), described carrier (3) is provided with the gaily decorated basket (10) for placing wafer (9).
2. wet developing as claimed in claim 1 is auxiliary rocks mechanism, it is characterized in that: described transmission gear (6) comprises driving gear and is positioned at the follower gear of the driving gear left and right sides, described driving gear and follower gear are connected with a joggle, described follower gear is equipped with rotating shaft (7), described driving gear, follower gear are plastic gear.
3. wet developing as claimed in claim 1 or 2 is auxiliary rocks mechanism, it is characterized in that: the output of the upper reductor (5) of described stainless steel casing (2) is provided with position transducer, and described position transducer is by connection servomotor (4) and reductor (5).
4. wet developing as claimed in claim 3 is auxiliary rocks mechanism, it is characterized in that: the described gaily decorated basket (10) below is provided with processing procedure groove (11), fill developer solution in described processing procedure groove (11), the described gaily decorated basket (10) is immersed in developer solution.
5. wet developing as claimed in claim 4 is auxiliary rocks mechanism, it is characterized in that: be provided with web joint (12) between described rocking arm (8) and carrier (3).
6. wet developing as claimed in claim 5 is auxiliary rocks mechanism, it is characterized in that: described installation hanging axis (1) adopts PFA coated.
7. wet developing as claimed in claim 6 is auxiliary rocks mechanism, it is characterized in that: described carrier (3), transmission gear (6), rotating shaft (7), rocking arm (8), web joint (12) all adopt NPP or PTFE material to make.
8. wet developing as claimed in claim 7 is auxiliary rocks mechanism, and it is characterized in that: described processing procedure groove (11) adopts NPP material to make, the described gaily decorated basket (10) adopts PFA material to make.
9. wet developing as claimed in claim 8 is auxiliary rocks mechanism, it is characterized in that: described stainless steel casing (2) adopts sus304 material to make, and described stainless steel casing (2) surface spraying has PTFE layer.
10. wet developing as claimed in claim 8 is auxiliary rocks mechanism, it is characterized in that: described stainless steel casing (2) adopts PP material to make.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521004826.1U CN205193431U (en) | 2015-12-04 | 2015-12-04 | Wet -type is developed to assist and is rocked mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521004826.1U CN205193431U (en) | 2015-12-04 | 2015-12-04 | Wet -type is developed to assist and is rocked mechanism |
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| Publication Number | Publication Date |
|---|---|
| CN205193431U true CN205193431U (en) | 2016-04-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201521004826.1U Active CN205193431U (en) | 2015-12-04 | 2015-12-04 | Wet -type is developed to assist and is rocked mechanism |
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| CN (1) | CN205193431U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873625A (en) * | 2018-05-28 | 2018-11-23 | 华灿光电（浙江）有限公司 | A kind of developing apparatus in the photoetching process of light-emitting diode chip for backlight unit manufacture |
| CN112540514A (en) * | 2020-12-17 | 2021-03-23 | 中国电子科技集团公司第十三研究所 | Developing apparatus |
| CN113126456A (en) * | 2021-05-06 | 2021-07-16 | 艾斯尔光电(南通)有限公司 | Photomask exposure developing process |
| CN113597127A (en) * | 2021-08-31 | 2021-11-02 | 安徽商贸职业技术学院 | Computer circuit board etching device |
-
2015
- 2015-12-04 CN CN201521004826.1U patent/CN205193431U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873625A (en) * | 2018-05-28 | 2018-11-23 | 华灿光电（浙江）有限公司 | A kind of developing apparatus in the photoetching process of light-emitting diode chip for backlight unit manufacture |
| CN108873625B (en) * | 2018-05-28 | 2021-11-05 | 华灿光电（浙江）有限公司 | Developing device in photoetching process for manufacturing light-emitting diode chip |
| CN112540514A (en) * | 2020-12-17 | 2021-03-23 | 中国电子科技集团公司第十三研究所 | Developing apparatus |
| CN113126456A (en) * | 2021-05-06 | 2021-07-16 | 艾斯尔光电(南通)有限公司 | Photomask exposure developing process |
| CN113597127A (en) * | 2021-08-31 | 2021-11-02 | 安徽商贸职业技术学院 | Computer circuit board etching device |
| CN113597127B (en) * | 2021-08-31 | 2022-07-12 | 安徽商贸职业技术学院 | Computer circuit board etching device |
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