CN205111538U - Polishing apparatus - Google Patents
Polishing apparatus Download PDFInfo
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- CN205111538U CN205111538U CN201520845727.XU CN201520845727U CN205111538U CN 205111538 U CN205111538 U CN 205111538U CN 201520845727 U CN201520845727 U CN 201520845727U CN 205111538 U CN205111538 U CN 205111538U
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- extension
- polissoir
- wish
- adsorption structure
- accommodation space
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Abstract
The utility model provides a polishing apparatus, includes: the board body that has the accommodation space, locate the fixing device of this accommodation space upside, and locate the burnishing device of this accommodation space downside, and this fixing device contains adjacent service portion and extension, relative this extension of this service portion is salient towards the direction of this second side, with fixed at least one desire polishing member, and this extension is separated by, and a clearance is fixed should desire polishing member, with when carrying out polishing operations, can the fixed edge that this desires polishing member, and can avoid the emergence of this desire polishing member's edge because of the vibrations damage.
Description
Technical field
The utility model about a kind of process equipment, espespecially a kind of polissoir that can improve operational reliability.
Background technology
In existing manufacture of semiconductor, wafer is after manufacture completes, and can carry out thinning processing, it comprises grinding operation and polishing operation, just can carry out afterwards cutting the processing procedure such as list, encapsulation.
As shown in Figure 1, existing polishing machine 1 comprises: a platform body (figure slightly), a fixture 11, be located on the upside of this platform body are located at the bogey 13 that this fixture 11 is located at by burnishing device on the downside of this platform body 12 and.This fixture 11 comprises a vacuum cup 111 and around the fixed mount 112 fixing this vacuum cup 111, and this vacuum cup 111 protrudes this fixed mount 112, is beneficial to adsorb this bogey 13.This bogey 13 comprises one and is incorporated into the pad pasting 130 on this vacuum cup 111 and supplies to arrange an iron hoop 131 of this pad pasting 130.
In time carrying out polishing operation, first the wish polished part 9 just like wafer is pasted on this pad pasting 130, adsorb (upward direction of arrow as shown in the figure) this pad pasting 130 with this vacuum cup 111 again, this bogey 13 is fixed in this fixture 11.Afterwards, this burnishing device 12 coordinates slurries (inflow direction F as shown in Figure 1) to polish the surface of this wish polished part 9.
But, in existing polishing machine 1, be unsettled between this fixed mount 112 and this iron hoop 131, there is no support force between the two, therefore in time carrying out polishing operation, this iron hoop 131 easily shakes, cause this wish polished part 9 easily shaken and damage (as wafer is cracked).
Therefore, how overcoming the problem of prior art, is an important topic in fact.
Utility model content
For solving the problem of above-mentioned prior art, the utility model discloses a kind of polissoir then, can avoid the generation that the edge of this wish polished part damages because of vibrations.
Polissoir of the present utility model comprises: platform body, and it has the first relative side and the second side, and the accommodation space between this first side and second side; Fixture, its the first side being located at this platform body is arranged in this accommodation space, and this fixture comprises adjacent service portion and extension, this service portion protrudes relative to the direction of this extension towards this second side with fixing at least one for polished part, and this wish polished part is fixed in this extension gap that is separated by; And burnishing device, its second side being located at this platform body is arranged in this accommodation space.
In aforesaid polissoir, this service portion is adsorption structure, for adhesion arrangement or clamping structure, such as, this adsorption structure is vacuum type adsorption structure or magnetic-type adsorption structure.
In aforesaid polissoir, this extension is formed at the lateral margin of this service portion.
In aforesaid polissoir, this extension has adsorption structure.Such as, this adsorption structure is magnetic-type adsorption structure.
In aforesaid polissoir, in this extension, be provided with magnetic part, to attract this wish polished part.Again, in this extension, be also provided with stop part, expose to this extension surface to make this stop part.
In aforesaid polissoir, also comprise the bogey carrying this wish polished part, it is incorporated in this fixture, and in accommodation space between this fixture and this burnishing device.Such as, between this bogey and this extension, there is gap.Or this bogey comprises the supporting part carrying this wish polished part and the support portion be located on this supporting part.
As from the foregoing, in polissoir of the present utility model, mainly fix the design of this wish polished part by this extension gap that is separated by, to fix the edge of this wish polished part, therefore compared to prior art, in time carrying out polishing operation, the generation that polissoir of the present utility model can avoid the edge of this wish polished part to damage because of vibrations.
Accompanying drawing explanation
Fig. 1 is the generalized section of existing polissoir;
Fig. 2 is the generalized section of the first embodiment of polissoir of the present utility model; Wherein, Fig. 2 ' local top view that is Fig. 2;
Fig. 3 is the generalized section of the second embodiment of polissoir of the present utility model; And
Fig. 4 A to Fig. 4 D is the part section enlarged diagram of the various embodiments of the extension of polissoir of the present utility model.
Wherein, description of reference numerals is as follows:
1 polishing machine
11,21 fixtures
111 vacuum cups
112 fixed mounts
12,22 burnishing devices
13,33 bogeys
130 pad pastings
131 iron hoops
2,3 polissoirs
20 platform body
20a first side
20b second side
210 adsorption structures
211 service portions
212 extensions
330 supporting parts
331 support portions
40,40 ' perforate
41 magnetic parts
42,42 ' stop part
43 support members
9 for polished part
9a exposed surface
S accommodation space
T gap.
Detailed description of the invention
By particular specific embodiment, embodiment of the present utility model is described below, those skilled in the art can understand other advantages of the present utility model and effect easily by content disclosed in the present specification.
Notice, structure, ratio, size etc. that this description institute accompanying drawings illustrates, content all only in order to coordinate description to disclose, understand for those skilled in the art and read, and be not used to limit the enforceable qualifications of the utility model, therefore the not technical essential meaning of tool, the adjustment of the modification of any structure, the change of proportionate relationship or size, do not affecting under effect that the utility model can produce and the object that can reach, still all should drop on technology contents that the utility model discloses and obtain in the scope that can contain.Simultaneously, quote in this description as " on ", " first ", " second " and " one " etc. term, be also only be convenient to describe understand, and be not used to limit the enforceable scope of the utility model, the change of its relativeness or adjustment, under changing technology contents without essence, when being also considered as the enforceable category of the utility model.
Fig. 2 is the generalized section of the first embodiment of polissoir 2 of the present utility model.
As shown in Figure 2, this polissoir 2 comprises: platform body 20, fixture 21 and a burnishing device 22.
Described platform body 20 has the first relative side 20a and the second side 20b, and the accommodation space S between this first side 20a and the second side 20b.
In the present embodiment, this first side 20a is upside, and this second side 20b is downside.
In addition, for simplification illustrates this platform body 20 in figure, but not the practical set-up of this platform body 20 is represented.
The first side 20a that described fixture 21 is located at this platform body 20 is arranged in this accommodation space S, and this fixture 21 comprises adjacent service portion 211 and an extension 212, this service portion 211 this extension 212 relative protrudes towards the direction of this second side 20b, fix one for polished part 9 with contact, and this wish polished part 9 is fixed in this extension 212 gap that is separated by.
In the present embodiment, this service portion 211 is disk body (can with reference to figure 2 '), and it is vacuum type adsorption structure (such as having multiple duct), makes this fixture 21 become adsorbent equipment, but also can be magnetic-type adsorbent equipment, there is no particular restriction.In other embodiment, this service portion 211 also can be for adhesion arrangement or clamping structure etc., therefore this fixture 21 is of a great variety, is not limited to above-mentioned.
In addition, this extension 212 is the ring body (can with reference to figure 2 ') of this service portion 211 of blocking, and with around this service portion 211, and this extension 212 has magnetic-type adsorption structure 210.
In addition, this wish polished part 9 of a great variety, as wafer, glass etc., there is no particular restriction.
The second side 20b that this platform body 20 is located at by described burnishing device 22 is arranged in this accommodation space S, makes this wish polished part 9 between this burnishing device 22 and this fixture 21.
In time carrying out polishing operation, first this wish polished part 9 is adsorbed in (upward direction of arrow as shown in Figure 2) on this service portion 211, this wish polished part 9 is made to be fixed on this service portion 211 contiguously, and utilize the magnetic attraction (upward direction of arrow as shown in Figure 2) of this adsorption structure 210, (i.e. clearance t) is fixed on this extension 212 with making the marginating compartment of this wish polished part 9, coordinates slurries to polish the exposed surface 9a of this wish polished part 9 afterwards with this burnishing device 22.
Therefore, the utility model fixes the edge of this wish polished part 9 by this extension 212 gap that is separated by, therefore in time carrying out polishing operation, this wish polished part 9 overall is all subject to support force and fixes, and the edge of this wish polished part 9 thus can be avoided to damage because of vibrations.
Fig. 3 is the generalized section of the second embodiment of polissoir 3 of the present utility model.The difference of the present embodiment and the first embodiment is newly-increased element, therefore identical structure with reference to above-mentioned and correlation indices, thus can repeat no more and exist together mutually.
As shown in Figure 3, this polissoir 3 also comprises a bogey 33, and it to be incorporated in this fixture 21 and in accommodation space S between this fixture 21 and this burnishing device 22.Particularly, this bogey 33 comprises a supporting part 330 and and is located at support portion 331 on this supporting part 330.
In the present embodiment, this supporting part 330 is the pad pasting of tool viscosity, and it is in order to this wish polished part 9 of bonding carrying, but should understandably, various in order to the structure species carrying this wish polished part 9, therefore the structure of this supporting part 330 is not limited to above-mentioned.
In addition, this support portion 331 is metal ring body (as iron hoop), has clearance t between itself and this extension 212 (or this adsorption structure 210).
In time carrying out polishing operation, first this wish polished part 9 is pasted on this supporting part 330, this supporting part 330 is adsorbed again with this service portion 211, this supporting part 330 is made to be fixed on this service portion 211 contiguously, and utilize this adsorption structure 210, this compartment of terrain, support portion 331 (i.e. clearance t) is fixed on this extension 212 (or this adsorption structure 210).Slurries are coordinated to polish the exposed surface 9a of this wish polished part 9 with this burnishing device 22 afterwards.
Therefore, the utility model fixes the design of this support portion 331 by this extension 212 interval, the edge of this wish polished part 9 is fixed with the gap that is indirectly separated by, therefore in time carrying out polishing operation, this support portion 331 can not be shaken, and thus can avoid the problem that the edge of this wish polished part 9 damages because of vibrations.
Fig. 4 A to Fig. 4 D is the generalized section of the various embodiments of extension 212 of the present utility model.
As shown in Figure 4 A, in this extension 212, be provided with at least one magnetic part 41, using as adsorption structure.Particularly, upper surface in this extension 212 forms at least one perforate 40 not being communicated with the lower surface of this extension 212, this magnetic part 41 is made not expose the lower surface of this extension 212, but this magnetic part 41 is because providing enough magnetic force, therefore this magnetic part 41 still can suspend bottom this perforate 40 of interval and attracts this support portion 331 (or this wish polished part 9).
As shown in Figure 4 B, this perforate 40 ' also can be communicated with the lower surface of this extension 212, makes this magnetic part 41 expose the lower surface of this extension 212, with magnetic floating adsorb this support portion 331.
As shown in Figure 4 C, this extension 212 also has the stop part 42 being arranged in this perforate 40 ', as lid, and this stop part 42 is positioned between this magnetic part 41 and this support portion 331 (or this wish polished part 9), this perforate 40 ' is exposed to make this stop part 42, and this magnetic part 41 does not expose the lower surface of this extension 212, but this magnetic part 41 is because providing enough magnetic force, thus this magnetic part 41 still can this stop part 42 of interval and suspend attract this support portion 331 (or this wish polished part 9).
As shown in Figure 4 D, this extension 212 also has and stretches into support the support member 43 (as mechanical hand) of this magnetic part 41 in this perforate 40 ', and this stop part 42 ' is in body, with the lower surface of this magnetic part 41 coated and side.
In addition, the utility model is by the design of this stop part 42, in time carrying out polishing operation, these slurries can be avoided to enter in this fixture 21 or in this platform body 20 along this perforate 40 ', these slurries thus can be avoided to destroy the internals of this fixture 21 or this platform body 20.
In sum, polissoir 2,3 of the present utility model, it, by the design of this extension 212 interval absorption, with in time carrying out polishing operation, can be avoided the problem that the edge of this wish polished part 9 damages because of vibrations, thus significantly can improve the yield of this wish polished part 9.
Above-described embodiment in order to illustrative principle of the present utility model and effect thereof, but not for limiting the utility model.Any those skilled in the art all without prejudice under spirit of the present utility model and category, can modify to above-described embodiment.Therefore rights protection scope of the present utility model, should listed by claims.
Claims (11)
1. a polissoir, is characterized by, and this polissoir comprises:
Platform body, it has the first relative side and the second side, and the accommodation space between this first side and second side;
Fixture, its the first side being located at this platform body is arranged in this accommodation space, and this fixture comprises adjacent service portion and extension, this service portion relatively this extension protrudes towards the direction of this second side, with fixing at least one for polished part, and this wish polished part is fixed in this extension gap that is separated by; And
Burnishing device, its second side being located at this platform body is arranged in this accommodation space.
2. polissoir as claimed in claim 1, is characterized by, and this service portion is adsorption structure, supplies adhesion arrangement or clamping structure.
3. polissoir as claimed in claim 2, it is characterized by, this adsorption structure is vacuum type adsorption structure or magnetic-type adsorption structure.
4. polissoir as claimed in claim 1, it is characterized by, this extension is formed at the lateral margin of this service portion.
5. polissoir as claimed in claim 1, it is characterized by, this extension has adsorption structure.
6. polissoir as claimed in claim 5, it is characterized by, this adsorption structure is magnetic-type adsorption structure.
7. polissoir as claimed in claim 1, is characterized by, be provided with magnetic part in this extension, to attract this wish polished part.
8. polissoir as claimed in claim 7, is characterized by, be also provided with stop part in this extension, exposes to this extension surface to make this stop part.
9. polissoir as claimed in claim 1, it is characterized by, this polissoir also comprises the bogey carrying this wish polished part, and it is incorporated in this fixture, and in accommodation space between this fixture and this burnishing device.
10. polissoir as claimed in claim 9, is characterized by, have gap between this bogey and this extension.
11. polissoirs as claimed in claim 9, is characterized by, and this bogey comprises the supporting part carrying this wish polished part and the support portion be located on this supporting part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520845727.XU CN205111538U (en) | 2015-10-28 | 2015-10-28 | Polishing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520845727.XU CN205111538U (en) | 2015-10-28 | 2015-10-28 | Polishing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205111538U true CN205111538U (en) | 2016-03-30 |
Family
ID=55567185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520845727.XU Active CN205111538U (en) | 2015-10-28 | 2015-10-28 | Polishing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205111538U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106129194A (en) * | 2016-08-05 | 2016-11-16 | 华灿光电（浙江）有限公司 | Manufacturing method of red-yellow light emitting diode |
-
2015
- 2015-10-28 CN CN201520845727.XU patent/CN205111538U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106129194A (en) * | 2016-08-05 | 2016-11-16 | 华灿光电（浙江）有限公司 | Manufacturing method of red-yellow light emitting diode |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |