CN204973470U - 一种用于单晶炉真空系统的气体过滤装置 - Google Patents
一种用于单晶炉真空系统的气体过滤装置 Download PDFInfo
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 6
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104941387A (zh) * | 2015-07-14 | 2015-09-30 | 北京世纪金光半导体有限公司 | 一种用于单晶炉真空系统的气体过滤装置 |
CN111013342A (zh) * | 2020-01-02 | 2020-04-17 | 北京机械设备研究所 | 一种用于真空环境的除湿装置及除湿方法 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104941387A (zh) * | 2015-07-14 | 2015-09-30 | 北京世纪金光半导体有限公司 | 一种用于单晶炉真空系统的气体过滤装置 |
CN111013342A (zh) * | 2020-01-02 | 2020-04-17 | 北京机械设备研究所 | 一种用于真空环境的除湿装置及除湿方法 |
CN111013342B (zh) * | 2020-01-02 | 2021-09-28 | 北京机械设备研究所 | 一种用于真空环境的除湿装置及除湿方法 |
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