CN204905227U - Split type PSS sculpture tray tool - Google Patents
Split type PSS sculpture tray tool Download PDFInfo
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- CN204905227U CN204905227U CN201520515294.1U CN201520515294U CN204905227U CN 204905227 U CN204905227 U CN 204905227U CN 201520515294 U CN201520515294 U CN 201520515294U CN 204905227 U CN204905227 U CN 204905227U
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- pallet
- split type
- pressure ring
- tool
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Abstract
The utility model discloses a split type PSS sculpture tray tool, apron and a plurality of clamping ring of making by metal material made including the tray, by quartzy material, the tray on arrange and to place a plurality of wafers, the apron on be provided with a plurality of trompils, every position and the tray of trompil on the corresponding so that wafer in the position of wafer expose from the trompil, every the edge of trompil nested have a clamping ring, the clamping ring be the annular and press the circumference edge at the wafer. Owing to adopted above technical scheme, the utility model discloses combined the advantage of quartzy advantage with the metalwork, had the better effect of improving to edge effect, especially, can play good substitution and transformation effect to the tool among the prior art, can both guarantee that marginal figure was effectively optimized, and proportion of ingredients has been relatively stable to the whole cost and artifical loss that brings of reforming transform of the equipment of having saved.
Description
Technical field
The utility model belongs to technical field of semiconductors.
Background technology
PSS etching to as if Sapphire Substrate, belong to micron order processing technology, one of technological requirement is uniformity high (<3%) in sheet, particularly requires that the figure of fringe region is wanted symmetrical and can not have adhesion.Along with the continuous lifting of industry standard, the quality of fringe region is more and more paid attention to, the thing followed is that the disposal ability of edge problem constitutes each PSS producer, and even the core competitiveness of ICP equipment vendors, and pallet tool is the key factor affecting edge problem in the process.
At present, market there are approximately following 2 kinds of structures for the pallet tool of PSS etching.
Structure one: metal tray coordinates quartz cover plate.The advantage of this tool is that manufacturing process is simple, cheap for manufacturing cost.Shortcoming is, the wafer due to etching needs to carry out compressing tablet by the edge of quartz, and quartzy material does not possess ductility, more fragile.So, often can there is the accident that damage is collapsed in quartz disk flanging place.Especially, in order to the convenience of etch by-products volatilization, the upper surface of quartz cover plate is low apart from the height of the upper surface that wafer is etched.In other words, in order to ensure the uniformity etched, quartz cover plate must be done thin, and this just reduce further the intensity of quartz cover plate, makes cover plate more fragile.In addition, because the material directly contacted with wafer is quartz, and quartz is insulator, this will cause argon-arc plasma field in the impact near the place of crystal round fringes due to insulator, and there is the deflection of electric field, thus make the etch rate of fringe region and entirety have larger gap, and due to the deflection of electric field, the pattern of etching figure out also can not be symmetrical.And asymmetric PSS structure can produce less desirable anomaly sxtructure in epitaxial process.
Structure two: metal tray complexed metal cover plate.The advantage of this tool is that manufacturing process is simple, and low manufacturing cost, edge effect is not obvious.Shortcoming is, metal cover board directly contacts energetic plasma in etching process, and the material of cover plate itself also can participate in physical-chemical reaction and go.The composition of product is more complicated, impacts the maintenance period of equipment.Similarly, in order to ensure that accessory substance can be pumped smoothly, metal cover board must be thin, but the ductility of metal self can make metal cover board in use deformation occur, thus cause the generation of cooling problem.
Affect because the structure of tool and the component ratio of material all can be formed the reflection power of ICP etching apparatus, in other words, certain jig structure and material composition be corresponding with other hardware configurations of equipment, match.This just means once after jig structure and composition determine, other hardware mechanisms of equipment have also just finalized the design almost.If carry out the replacing of tool type, just will inevitably relate to the change of device hardware structure, the cost of transformation and workload all can significantly rise.
Summary of the invention
The purpose of this utility model is the tool design used during solving a kind of ICP etches, both ubiquitous edge effect in ICP etching (ensureing edge pattern symmetry and adhesion) can have been weakened, the useful life of tool can be extended again, use and the operation of tool can also be simplified simultaneously.
In order to achieve the above object, the split type PSS of the one that the utility model provides etches pallet tool, comprise by quartz, the pallet that metal or ceramic material are made, the cover plate be made up of quartz material and a plurality of pressure ring be made up of metal material, on described pallet, multiple wafer is placed in arrangement, described cover plate is provided with multiple perforate, each described position of perforate is corresponding with the position of the wafer on pallet to make wafer expose from tapping, the edge of each described perforate is nested with pressure ring, described pressure ring ringwise and be pressed in the circumferential edge of wafer.
As further improvement, the thickness of described cover plate is 3 ~ 6mm.
As further improvement, each described perforate inwall is provided with takes rank for installation nested with pressure ring.
As further improvement, described pressure ring has unguiculus for compressing wafer or inner ring.
As further improvement, described wafer has gulde edge, and described pressure ring, perforate are also equipped with gulde edge.
As further improvement, the thickness of described pressure ring and the degree of depth of perforate adapt.
As further improvement, also comprise positioning disk, for wafer is put into pallet precalculated position.
Owing to have employed above technical scheme, the advantage of quartz piece and the advantages of metalwork are got up by the utility model, edge effect has improves effect preferably, especially, good substituting and transformation effect can be played for the tool mentioned in prior art, can both ensure that edge pattern was effectively optimized, and component ratio is relatively stable, thus saves cost and artificial loss that Whole Equipment transformation brings.
Accompanying drawing explanation
Fig. 1 describes the front view etching the pallet of pallet tool according to split type PSS of the present utility model;
Fig. 2 describes the front view etching the cover plate of pallet tool according to split type PSS of the present utility model;
Fig. 3 describes the partial sectional view etching the cover plate of pallet tool according to split type PSS of the present utility model;
Fig. 4 describes the front view etching the pressure ring of pallet tool according to split type PSS of the present utility model;
Fig. 5 describes the partial sectional view etching the pressure ring of pallet tool according to split type PSS of the present utility model;
Fig. 6 describes split type PSS in another embodiment and etches the front view of the pressure ring of pallet tool.
Embodiment
Below in conjunction with accompanying drawing, preferred embodiment of the present utility model is described in detail, to make advantage of the present utility model and feature can be easier to be readily appreciated by one skilled in the art, thus more explicit defining is made to protection range of the present utility model.
Embodiment one
Shown in accompanying drawing 1 to accompanying drawing 5, Fig. 1 describes the front view etching the pallet of pallet tool according to split type PSS of the present utility model; Fig. 2 describes the front view etching the cover plate of pallet tool according to split type PSS of the present utility model; Fig. 3 describes the partial sectional view etching the cover plate of pallet tool according to split type PSS of the present utility model; Fig. 4 describes the front view etching the pressure ring of pallet tool according to split type PSS of the present utility model; Fig. 5 describes the partial sectional view etching the pressure ring of pallet tool according to split type PSS of the present utility model.
If accompanying drawing 1 is with shown in accompanying drawing 2, split type PSS of the present utility model etches pallet tool, comprise pallet 1, the cover plate 2 be made up of quartz material and a plurality of pressure ring 3 be made up of metal material, also comprise positioning disk (not shown), for wafer 4 is put into pallet 1 precalculated position.The material of pallet 1 does not limit, and both can be quartz, can be again metal, can also be pottery, and pallet 1 places multiple wafer 4 by positioning disk arrangement to preferable alloy material in the present embodiment.The design of cover plate 2 is body matters of the present utility model, the material of cover plate 2 take quartz as material of main part, according to the size of pending wafer, and the thickness of metal pressure ring designs multiple perforate 5 on quartz body, and (concrete hole quantity of drawing designs by the quantity of process wafer, such as, 21 perforates in the present embodiment), the position of each perforate 5 is corresponding with the position of the wafer 4 on pallet 1 to make wafer 4 expose from perforate 5, the edge of each perforate 5 is nested with pressure ring 3, and pressure ring 3 ringwise and be pressed in the circumferential edge of wafer 4.For ensureing the intensity of quartz cover plate, take into account the timely discharge of accessory substance, the thickness of quartz cover plate will control at 3 ~ 6mm simultaneously.
As shown in Figure 3, be enclosed within quartz cover plate 2 securely to ensure that metal pressure ring can facilitate, position quartz cover plate being needed the collar is needed to process, each perforate 5 inwall is provided with takes rank 6 for installation nested with pressure ring 3, when pressure ring 3 is nested in perforate 5, the top of pressure ring 3 31 with take rank 6 and combine.
As shown in Figure 4 with shown in accompanying drawing 5, the thickness 32 of pressure ring 3 adapts with the degree of depth of perforate 5, simultaneously pressure ring 3 has unguiculus for compressing wafer 4 or inner ring 7, and the top 31 of pressure ring 3 can be designed as concordant with the surface of cover plate 2 after in quartzy perforate corresponding for becket press-in.
When needing operation, first with positioning disk wafer put on the correspondence position in metal tray, then remove positioning disk, the cover plate installing pressure ring is pressed on pallet, the top and the bottom of tool are fixed up, finally, are put in ICP etching apparatus and carry out etching operation.Owing to have employed above technical scheme, the advantage of quartz piece and the advantages of metalwork are got up by the utility model, edge effect has improves effect preferably, especially, good substituting and transformation effect can be played for the tool mentioned in prior art, can both ensure that edge pattern was effectively optimized, and component ratio is relatively stable, thus saves cost and artificial loss that Whole Equipment transformation brings.
Embodiment two
Shown in accompanying drawing 6, Fig. 6 describes split type PSS in another embodiment and etches the front view of the pressure ring of pallet tool.The ring structure that pressure ring in the present embodiment is overall and embodiment is a kind of is similar, and difference is that the wafer in reality is not often absolute circle, but there is a gulde edge, so corresponding pressure ring 3, perforate 5 all need Design Orientation limit 8.
Above execution mode is only for illustrating technical conceive of the present utility model and feature; its object is to allow person skilled in the art understand content of the present utility model and to be implemented; protection range of the present utility model can not be limited with this; all equivalences done according to the utility model Spirit Essence change or modify, and all should be encompassed in protection range of the present utility model.
Claims (7)
1. a split type PSS etches pallet tool, it is characterized in that: comprise by quartz, the pallet (1) that metal or ceramic material are made, the cover plate (2) be made up of quartz material and a plurality of pressure ring (3) be made up of metal material, multiple wafer (4) is placed in the upper arrangement of described pallet (1), described cover plate (2) is provided with multiple perforate (5), each described position of perforate (5) is corresponding with the position of the wafer (4) on pallet (1) to make wafer (4) expose from perforate (5), the edge of each described perforate (5) is nested with pressure ring (3), described pressure ring (3) ringwise and be pressed in the circumferential edge of wafer (4).
2. split type PSS according to claim 1 etches pallet tool, it is characterized in that: the thickness of described cover plate (2) is 3 ~ 6mm.
3. split type PSS according to claim 1 etches pallet tool, it is characterized in that: each described perforate (5) inwall be provided with for pressure ring (3) nested installation take rank (6).
4. split type PSS according to claim 1 etches pallet tool, it is characterized in that: described pressure ring (3) has unguiculus for compressing wafer (4) or inner ring (7).
5. split type PSS according to claim 1 etches pallet tool, and it is characterized in that: described wafer (4) has gulde edge, described pressure ring (3), perforate (5) are also equipped with gulde edge.
6. split type PSS according to claim 1 etches pallet tool, it is characterized in that: the thickness of described pressure ring (3) and the degree of depth of perforate (5) adapt.
7. split type PSS according to claim 1 etches pallet tool, it is characterized in that: also comprise positioning disk, for wafer (4) is put into pallet (1) precalculated position.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520515294.1U CN204905227U (en) | 2015-07-16 | 2015-07-16 | Split type PSS sculpture tray tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520515294.1U CN204905227U (en) | 2015-07-16 | 2015-07-16 | Split type PSS sculpture tray tool |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204905227U true CN204905227U (en) | 2015-12-23 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520515294.1U Active CN204905227U (en) | 2015-07-16 | 2015-07-16 | Split type PSS sculpture tray tool |
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| CN (1) | CN204905227U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107768299A (en) * | 2016-08-16 | 2018-03-06 | 北京北方华创微电子装备有限公司 | Bogey and semiconductor processing equipment |
-
2015
- 2015-07-16 CN CN201520515294.1U patent/CN204905227U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107768299A (en) * | 2016-08-16 | 2018-03-06 | 北京北方华创微电子装备有限公司 | Bogey and semiconductor processing equipment |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |