CN204694954U - A kind of electrochromic intelligent glass - Google Patents
A kind of electrochromic intelligent glass Download PDFInfo
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- CN204694954U CN204694954U CN201520276545.5U CN201520276545U CN204694954U CN 204694954 U CN204694954 U CN 204694954U CN 201520276545 U CN201520276545 U CN 201520276545U CN 204694954 U CN204694954 U CN 204694954U
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Abstract
The utility model provides a kind of electrochromic intelligent glass, this glass comprises substrate, and substrate is provided with the first anti-reflection layer, the second anti-reflection layer, the first transparency conducting layer, electrochromic layer, ion conductive layer, ion storage layer, the second transparency conducting layer and the 3rd anti-reflection layer successively.Sheath is provided with between described ion storage layer and the second described transparency conducting layer.The all layers of the utility model are all solid films, so there is no the corrosion between rete, improve homogeneity and the stability of rete; By regulating transparency conducting layer, the color change of rete can be accelerated; Anti-reflection layer can regulate the transmitance of rete, improves visual comfort.
Description
Technical field
The utility model belongs to dimming glass technical field, is specifically related to a kind of electrochromic intelligent glass.
Background technology
Electrochromism refers to the change of the optical property generation continuous reversible of some material under extra electric field, and these optical properties comprise the color of material, transmitance, reflectivity and absorptivity.Electrochomeric glass optionally absorbs or reflect ambient heat radiation and stop internal heat diffusion, and the air-conditioning saving buildings summer take and the heating cost in winter, regulates indoor lighting and temperature, and while can ensure to view and admire the visual field to outdoor.Except for buildings, electrochomeric glass can also be used for the vehicles such as automobile, train, aircraft and steamer and other relates to the field of adjustment light, such as automobile calash, train side window and sunglasses etc.
Along with earth energy Supply and demand trend constantly worsens and the continuous pursuit of people to high quality of the life, the market outlook of electrochomeric glass are further wide.Although the sixties in last century have been found that electrochromism phenomenon, but due to technical restriction, such as color change is slow, visual comfort is not high, homogeneity and poor stability and complex manufacturing etc., and these all cause the application potential of electrochomeric glass also far not played.
Summary of the invention
The utility model the technical matters that will solve be exactly that the electrochromic intelligent glass and manufacture method thereof that a kind of color change is fast, visual comfort is high, homogeneity is good, stability is high will be provided.
Realize the technical scheme of this practicality object: a kind of electrochromic intelligent glass, this glass comprises substrate, and substrate is provided with the first anti-reflection layer, the second anti-reflection layer, the first transparency conducting layer, electrochromic layer, ion conductive layer, ion storage layer, the second transparency conducting layer and the 3rd anti-reflection layer successively.
A kind of electrochromic intelligent glass as above, it is provided with sheath between described ion storage layer and the second described transparency conducting layer.The thickness of described sheath is 0 ~ 50 nanometer; When sheath consists of lithium or hydrogen, lithium and hydrogen trap enter ion storage layer, and now ion layer thickness is 0; Sheath consists of the monox or aluminium oxide of mixing lithium, and now ion layer thickness is greater than 0 nanometer, is less than 50 nanometers.
A kind of electrochromic intelligent glass as above, the thickness of the substrate described in it is 1 ~ 10 millimeter, and it consists of simple glass or ultra-clear glasses; The thickness of the first described anti-reflection layer is 5 ~ 50 nanometers, and it consists of the oxide of niobium or the oxide of vanadium.
A kind of electrochromic intelligent glass as above, the thickness of the second anti-reflection layer described in it is 5 ~ 50 nanometers, and it consists of oxide or the titanyl compound of silicon; The thickness of the first described transparency conducting layer is 200 ~ 800 nanometers, and it consists of tin indium oxide or Al-Doped ZnO.
A kind of electrochromic intelligent glass as above, the thickness of the electrochromic layer described in it is 325 ~ 750 nanometers, and it consists of one or more potpourris in tungsten oxide, vanadium oxide, zirconia.
A kind of electrochromic intelligent glass as above, the thickness of the ion conductive layer described in it is 5 ~ 100 nanometers, its consist of the monox mixing lithium, the vanadium oxide mixing lithium, mix lithium zirconia, mix the zinc paste of lithium or mix the aluminium oxide of lithium.
A kind of electrochromic intelligent glass as above, the thickness of the ion storage layer described in it is 100 ~ 800 nanometers, and it consists of one or more potpourris in vanadium oxide, niobium oxide, indium oxide, nickel oxide, tungsten oxide, cobalt oxide, zirconia, molybdena.
A kind of electrochromic intelligent glass as above, the thickness of the second transparency conducting layer described in it is 100 ~ 700 nanometers, and it consists of tin indium oxide or Al-Doped ZnO.
A kind of electrochromic intelligent glass as above, the thickness of the 3rd anti-reflection layer described in it is 50 ~ 300 nanometers, and it consists of aluminium oxide, monox, titanium dioxide or zirconia.
Effect of the present utility model is: electrochromic intelligent glass described in the utility model, it comprises substrate, the first anti-reflection layer, the second anti-reflection layer, the first transparency conducting layer, electrochromic layer, ion conductive layer, ion storage layer, sheath, the second transparency conducting layer, the 3rd anti-reflection layer, all layers are all solid films, so there is no the corrosion between rete, improve homogeneity and the stability of rete.The above-mentioned rete of the utility model can be produced on magnetron sputtering plating streamline, and its technique is simple, and homogeneity is good, easily controls and optimizes; By regulating transparency conducting layer, the color change of rete can be accelerated; Anti-reflection layer can regulate the transmitance of rete, improves visual comfort.
Accompanying drawing explanation
Fig. 1 is a kind of electrochromic intelligent glass schematic diagram described in the utility model.
Fig. 2 is the coloured state of the electrochromic intelligent glass of the utility model embodiment 1 and bleaches the transmitance variation diagram that state is 300 ~ 2000 nanometers in spectral range.
In figure: 10. substrate; 11. first anti-reflection layers; 12. second anti-reflection layers; 13. first transparency conducting layers; 14. electrochromic layers; 15. ion conductive layers; 16. ion storage layer; 17. sheaths; 18. second transparency conducting layers; 19. the 3rd anti-reflection layers.
Embodiment
As shown in Figure 1, a kind of electrochromic intelligent glass described in the utility model, it comprises substrate 10, and substrate 10 is followed successively by the first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19.
Wherein:
Substrate 10 is simple glass or ultra-clear glasses, and thickness is 1 ~ 10 millimeter.
The thickness of the first anti-reflection layer 11 is 5 ~ 50 nanometers, and its composition is the oxide of niobium (Nb) or the oxide of vanadium (V).
The thickness of the second anti-reflection layer 12 is 5 ~ 50 nanometers, and its composition is the oxide of silicon (Si) or the oxide of titanium (Ti).
The thickness of the first transparency conducting layer 13 is 200 ~ 800 nanometers, and its composition is tin indium oxide (ITO) or Al-Doped ZnO (AZO).
The thickness of electrochromic layer 14 is 325 ~ 750 nanometers, and its composition is tungsten oxide (WOx), vanadium oxide (VOx), zirconia (ZrOx) or these hopcalites.
The thickness of ion conductive layer 15 is 5 ~ 100 nanometers, its composition be mix lithium monox (Li+SiOx), mix lithium vanadium oxide (VOx), mix lithium zirconia (ZrOx), mix the zinc paste (ZnOx) of lithium or mix the aluminium oxide (AlOx) of lithium, lithium doping atomic ratio is 5 ~ 60%.
The thickness of ion storage layer 16 is 100 ~ 800 nanometers, and its composition is vanadium oxide (VOx), niobium oxide (NbOx), indium oxide (InOx), nickel oxide (NiOx), tungsten oxide (WOx), cobalt oxide (CoOx), zirconia (ZrOx), molybdena (MoOx) or these hopcalites.
Sheath 17 is provided with between described ion storage layer 16 and the second described transparency conducting layer 18; The thickness of described sheath 17 is 0 ~ 50 nanometer; When sheath 17 consists of lithium or hydrogen, lithium and hydrogen trap enter ion storage layer, and now sheath 17 thickness is 0; Sheath 17 consists of the monox or aluminium oxide of mixing lithium, and now sheath 17 thickness is greater than 0 nanometer, is less than 50 nanometers.
The thickness of the second transparency conducting layer 18 is 100 ~ 700 nanometers, and its composition is tin indium oxide (ITO) or Al-Doped ZnO (AZO).
The thickness of the 3rd anti-reflection layer 19 is 50 ~ 300 nanometers, and its composition is aluminium oxide (AlOx), monox (SiOx), titanium dioxide (TiOx) or zirconia (ZrOx).
Above-mentioned first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19 all adopt sputtering method to be coated on substrate 10, preferentially adopt magnetron sputtering method.The target of all formation retes can be planar cathode or rotating cathode, preferentially adopts rotating cathode.
Below in conjunction with the drawings and specific embodiments, a kind of electrochromic intelligent glass described in the utility model and manufacture method thereof are further described.
Embodiment 1
As shown in Figure 1, a kind of electrochromic intelligent glass described in the utility model, it comprises substrate 10, and substrate 10 is followed successively by the first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19.
Wherein:
Substrate 10 is simple glass, and thickness is 4 millimeters.
The thickness of the first anti-reflection layer 11 is 20 nanometers, and its composition is the oxide (Nb of niobium
2o
3).
The thickness of the second anti-reflection layer 12 is 18 nanometers, and its composition is titanyl compound (TiO
2).
The thickness of the first transparency conducting layer 13 is 400 nanometers, and its composition is tin indium oxide (ITO).
The thickness of electrochromic layer 14 is 300 nanometers, and its composition is tungsten oxide (WO
3).
The thickness of ion conductive layer 15 is 100 nanometers, and its composition is the oxidation alum (Li+V mixing lithium
2o
5), lithium doping atomic ratio is 20%.
The thickness of ion storage layer 16 is 320 nanometers, and its composition is niobium oxide (Nb
2o
3).
The thickness of sheath 17 is 0 nanometer, and its composition is lithium, and lithium is all diffused into ion storage layer.
The thickness of the second transparency conducting layer 18 is 400 nanometers, and its composition is tin indium oxide (ITO).
The thickness of the 3rd anti-reflection layer 19 is 20 nanometers, and its composition is aluminium oxide (Al
2o
3).
Above-mentioned first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19 all adopt sputtering method to be coated on substrate 10, preferentially adopt magnetron sputtering method.The target of all formation retes can be planar cathode or rotating cathode, preferentially adopts rotating cathode.
Fig. 2 is the coloured state of the electrochromic intelligent glass of the utility model embodiment 1 and bleaches the transmitance variation diagram that state is 300 ~ 2000 nanometers in spectral range.
Embodiment 2
As shown in Figure 1, a kind of electrochromic intelligent glass described in the utility model, it comprises substrate 10, as shown in Figure 1, a kind of electrochromic intelligent glass described in the utility model, it comprises substrate 10, and substrate 10 is followed successively by the first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19.
Wherein:
Substrate 10 is simple glass, and thickness is 6 millimeters.
The thickness of the first anti-reflection layer 11 is 18 nanometers, and its composition is the oxide (V of alum
2o
5).
The thickness of the second anti-reflection layer 12 is 18 nanometers, and its composition is titanyl compound (TiO
2).
The thickness of the first transparency conducting layer 13 is 450 nanometers, and its composition is tin indium oxide (ITO).
The thickness of electrochromic layer 14 is 350 nanometers, and its composition is tungsten oxide (WO
3).
The thickness of ion conductive layer 15 is 80 nanometers, and its composition is the zinc paste (Li+ZnO) mixing lithium, and lithium doping atomic ratio is 5%.
The thickness of ion storage layer 16 is 280 nanometers, and its composition is zirconia (ZrO
2).
The thickness of sheath 17 is 28 nanometers, and its composition is the monox (Li+SiO mixing lithium
2).
The thickness of the second transparency conducting layer 18 is 400 nanometers, and its composition is tin indium oxide (ITO).
The thickness of the 3rd anti-reflection layer 19 is 20 nanometers, and its composition is monox (SiO
2).
Above-mentioned first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19 all adopt sputtering method to be coated on substrate 10, preferentially adopt magnetron sputtering method.The target of all formation retes can be planar cathode or rotating cathode, preferentially adopts rotating cathode.
Embodiment 3
As shown in Figure 1, a kind of electrochromic intelligent glass described in the utility model, it comprises substrate 10, and substrate 10 is followed successively by the first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19.
Wherein:
Substrate 10 is simple glass, and thickness is 5 millimeters.
The thickness of the first anti-reflection layer 11 is 16 nanometers, and its composition is the oxide (Nb of niobium
2o
3).
The thickness of the second anti-reflection layer 12 is 21 nanometers, and its composition is titanyl compound (TiO
2).
The thickness of the first transparency conducting layer 13 is 350 nanometers, and its composition is Al-Doped ZnO (AZO).
The thickness of electrochromic layer 14 is 450 nanometers, and its composition is zirconia (ZrO
2).
The thickness of ion conductive layer 15 is 80 nanometers, and its composition is the zirconia (Li+ZrO mixing lithium
2), lithium doping atomic ratio is 60%.
The thickness of ion storage layer 16 is 700 nanometers, and its composition is nickel oxide (NiO).
The thickness of sheath 17 is 30 nanometers, and its composition is the aluminium oxide (Li+Al mixing lithium
2o
3).
The thickness of the second transparency conducting layer 18 is 600 nanometers, and its composition is tin indium oxide (ITO).
The thickness of the 3rd anti-reflection layer 19 is 200 nanometers, and its composition is zirconia (ZrO
2).
Above-mentioned first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19 all adopt sputtering method to be coated on substrate 10, preferentially adopt magnetron sputtering method.The target of all formation retes can be planar cathode or rotating cathode, preferentially adopts rotating cathode.
Embodiment 4
As shown in Figure 1, a kind of electrochromic intelligent glass described in the utility model, it comprises substrate 10, and substrate 10 is followed successively by the first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19.
Wherein:
Substrate 10 is simple glass, and thickness is 8 millimeters.
The thickness of the first anti-reflection layer 11 is 36 nanometers, and its composition is the oxide (Nb of niobium
2o
3).
The thickness of the second anti-reflection layer 12 is 21 nanometers, and its composition is titanyl compound (TiO
2).
The thickness of the first transparency conducting layer 13 is 380 nanometers, and its composition is tin indium oxide (ITO).
The thickness of electrochromic layer 14 is 560 nanometers, and its composition is zirconia (ZrO
2).
The thickness of ion conductive layer 15 is 60 nanometers, and its composition is the aluminium oxide (Li+Al mixing lithium
2o
3), lithium doping atomic ratio is 40%.
The thickness of ion storage layer 16 is 300 nanometers, and its composition is tungsten oxide (WO
3).
The thickness of sheath 17 is 20 nanometers, and its composition is the aluminium oxide (Li+Al mixing lithium
2o
3).
The thickness of the second transparency conducting layer 18 is 500 nanometers, and its composition is tin indium oxide (ITO).
The thickness of the 3rd anti-reflection layer 19 is 200 nanometers, and its composition is titanium dioxide (TiO
2).
Above-mentioned first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19 all adopt sputtering method to be coated on substrate 10, preferentially adopt magnetron sputtering method.The target of all formation retes can be planar cathode or rotating cathode, preferentially adopts rotating cathode.
Embodiment 5
As shown in Figure 1, a kind of electrochromic intelligent glass described in the utility model, it comprises substrate 10, and substrate 10 is followed successively by the first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19.
Wherein:
Substrate 10 is simple glass, and thickness is 5 millimeters.
The thickness of the first anti-reflection layer 11 is 18 nanometers, and its composition is the oxide (V of alum
2o
5).
The thickness of the second anti-reflection layer 12 is 18 nanometers, and its composition is titanyl compound (TiO
2).
The thickness of the first transparency conducting layer 13 is 350 nanometers, and its composition is Al-Doped ZnO (AZO).
The thickness of electrochromic layer 14 is 450 nanometers, and its composition is zirconia (ZrO
2).
The thickness of ion conductive layer 15 is 20 nanometers, and its composition is zinc paste (Li+ZnO) the lithium doping atomic ratio mixing lithium is 10%.
The thickness of ion storage layer 16 is 580 nanometers, and its composition is zirconia (ZrO
2).
The thickness of sheath 17 is 25 nanometers, and its composition is the monox (Li+SiO mixing lithium
2).
The thickness of the second transparency conducting layer 18 is 480 nanometers, and its composition is tin indium oxide (ITO).
The thickness of the 3rd anti-reflection layer 19 is 50 nanometers, and its composition is titanium dioxide (TiO
2).
Above-mentioned first anti-reflection layer 11, second anti-reflection layer 12, first transparency conducting layer 13, electrochromic layer 14, ion conductive layer 15, ion storage layer 16, sheath 17, second transparency conducting layer 18 and the 3rd anti-reflection layer 19 all adopt sputtering method to be coated on substrate 10, preferentially adopt magnetron sputtering method.The target of all formation retes can be planar cathode or rotating cathode, preferentially adopts rotating cathode.
Electrochromic intelligent glass of the present utility model may be used for the windowpane etc. of the glass curtain wall of buildings, skylight, indoor compartment, the vehicles such as outdoor special efficacy advertisement and automobile, aircraft, train, steamer.
The utility model embodiment is only for being further detailed the utility model; the restriction to the utility model protection domain can not be interpreted as; those skilled in the art makes some nonessential improvement and adjustment according to above-mentioned content of the present utility model, all belongs to the utility model protection domain.
Claims (10)
1. an electrochromic intelligent glass, it is characterized in that: this glass comprises substrate (10), substrate (10) is provided with the first anti-reflection layer (11), the second anti-reflection layer (12), the first transparency conducting layer (13), electrochromic layer (14), ion conductive layer (15), ion storage layer (16), the second transparency conducting layer (18) and the 3rd anti-reflection layer (19) successively.
2. a kind of electrochromic intelligent glass according to claim 1, is characterized in that: between described ion storage layer (16) and described the second transparency conducting layer (18), be provided with sheath (17).
3. a kind of electrochromic intelligent glass according to claim 2, is characterized in that: the thickness of described sheath (17) is 0 ~ 50 nanometer.
4. a kind of electrochromic intelligent glass according to claim 1, is characterized in that: the thickness of described substrate (10) is 1 ~ 10 millimeter; The thickness of described the first anti-reflection layer (11) is 5 ~ 50 nanometers.
5. a kind of electrochromic intelligent glass according to claim 1, is characterized in that: the thickness of described the second anti-reflection layer (12) is 5 ~ 50 nanometers; The thickness of described the first transparency conducting layer (13) is 200 ~ 800 nanometers.
6. a kind of electrochromic intelligent glass according to claim 1, is characterized in that: the thickness of described electrochromic layer (14) is 325 ~ 750 nanometers.
7. a kind of electrochromic intelligent glass according to claim 1, is characterized in that: the thickness of described ion conductive layer (15) is 5 ~ 100 nanometers.
8. a kind of electrochromic intelligent glass according to claim 1, is characterized in that: the thickness of described ion storage layer (16) is 100 ~ 800 nanometers.
9. a kind of electrochromic intelligent glass according to claim 1, is characterized in that: the thickness of described the second transparency conducting layer (18) is 100 ~ 700 nanometers.
10. a kind of electrochromic intelligent glass according to claim 1, is characterized in that: the thickness of the 3rd described anti-reflection layer (19) is 50 ~ 300 nanometers.
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|---|---|---|---|
| CN201520276545.5U CN204694954U (en) | 2015-04-30 | 2015-04-30 | A kind of electrochromic intelligent glass |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107085339A (en) * | 2017-03-01 | 2017-08-22 | 江苏繁华玻璃股份有限公司 | A kind of preparation method of full-solid electrochromic device |
-
2015
- 2015-04-30 CN CN201520276545.5U patent/CN204694954U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107085339A (en) * | 2017-03-01 | 2017-08-22 | 江苏繁华玻璃股份有限公司 | A kind of preparation method of full-solid electrochromic device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| CB03 | Change of inventor or designer information |
Inventor after: You Shaoxin Inventor after: You Shaoxiong Inventor before: You Shaoxiong |
|
| COR | Change of bibliographic data | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20160927 Address after: 100076, Room 102, building B, Fu Cheng office, No. 93 West Palace Road, Daxing District, Beijing Patentee after: You Shaoxin Address before: 100076, Beijing, Daxing District West Road, No. 93, Fu Cheng, block B, 102 Patentee before: You Shaoxiong |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20210927 Address after: 431800 workshop B9, auto parts Industrial Park, Jingshan Economic Development Zone, Jingmen City, Hubei Province Patentee after: Hubei Ruirsheng Technology Co.,Ltd. Address before: Room 102, block B, Litong Fucheng office building, No. 93, Jiugong West Road, Daxing District, Beijing 100076 Patentee before: You Shaoxin |