CN204638150U - EDC feeding device in a kind of ethylene oxide production - Google Patents
EDC feeding device in a kind of ethylene oxide production Download PDFInfo
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- CN204638150U CN204638150U CN201520263964.5U CN201520263964U CN204638150U CN 204638150 U CN204638150 U CN 204638150U CN 201520263964 U CN201520263964 U CN 201520263964U CN 204638150 U CN204638150 U CN 204638150U
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- Prior art keywords
- edc
- nitrogen
- arranges
- gas outlet
- ethylene oxide
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- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 83
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 38
- 239000007789 gas Substances 0.000 claims abstract description 15
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract description 11
- 238000006243 chemical reaction Methods 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 5
- 238000007086 side reaction Methods 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 41
- 239000003112 inhibitor Substances 0.000 description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000002309 gasification Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
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- Epoxy Compounds (AREA)
Abstract
An EDC feeding device in ethylene oxide production, belongs to chemical reaction systems technology field.It comprises nitrogen buffer tank and EDC basin, nitrogen buffer tank top arranges nitrogen inlet, bottom arranges nitrogen gas outlet, nitrogen inlet connecting line arranges pressure-regulating valve, EDC tank top arranges nitrogen inlet, bottom arranges mixed gas outlet, EDC basin also arranges EDC feed pot, and nitrogen gas outlet is connected with nitrogen inlet, and mixed gas outlet is connected with ethylene oxide reactor feed system.The utility model is by adopting above-mentioned technology, the feed postition of former EDC adding apparatus is optimized, high pressure nitrogen boosts, the mode of pressurization is utilized directly the EDC of liquid state to be pressed in ethylene oxide reactor feed system, solve gas addition method of the prior art bring the change of Yin Wendu, the problem of EDC addition instability, while raising production stability, avoid the side reaction that the instability because of EDC is brought, reduce production cost.
Description
Technical field
The utility model belongs to chemical reaction systems technology field, is specifically related to the EDC feeding device in the ethylene oxide production of a kind of reinforced convenience, good stability.
Background technology
The employing chlorohydrination technique that ethylene oxide production has, in the method for ethylene oxide epoxy ethane, under silver catalyst effect in the reaction of ethylene epoxidizing epoxy ethane, the reaction heat of side reaction is more than 10 of main reaction.The generation of side reaction not only consumes feed ethylene, and produces a large amount of heats, controls the bad beds that will make and produces " temperature runaway ".Therefore on commercial plant, except selecting silver catalyst of good performance, in reaction raw materials, add appropriate inhibitor effectively can suppress side reaction, improves and generates the selective of oxirane.The main inhibitor that current industrial production oxirane adopts is EDC(1,2-dichloroethanes).As shown in Figure 1, the Adding Way of current EDC is by heating and gasifying, makes EDC join in circulating air by the mode of gas, controls selective, by recognizing the investigation of technological parameter, 1,2-dichloroethanes concentration of gasification, can change along with the change of temperature, addition easily produces fluctuation, be not suitable for the quiet run selected, its security performance is low, and affects reaction effect.
Utility model content
For the above-mentioned problems in the prior art, the purpose of this utility model is the EDC feeding device provided in the ethylene oxide production of a kind of reinforced convenience, good stability.
EDC feeding device in described a kind of ethylene oxide production, it is characterized in that comprising nitrogen buffer tank and EDC basin, described nitrogen buffer tank top arranges nitrogen inlet, bottom arranges nitrogen gas outlet, nitrogen inlet connecting line arranges pressure-regulating valve, EDC tank top arranges nitrogen inlet, bottom arranges mixed gas outlet, EDC basin also arranges EDC feed pot, described nitrogen gas outlet is connected by pipeline with nitrogen inlet, and mixed gas outlet is connected with ethylene oxide reactor feed system.
EDC feeding device in described a kind of ethylene oxide production, is characterized in that described pipeline arranges control valve, and this control valve 4 is pressure-regulating valve.
EDC feeding device in above-mentioned a kind of ethylene oxide production, comprise nitrogen buffer tank and EDC basin, described nitrogen buffer tank top arranges nitrogen inlet, bottom arranges nitrogen gas outlet, nitrogen inlet connecting line arranges pressure-regulating valve, EDC tank top arranges nitrogen inlet, and bottom arranges mixed gas outlet, and EDC basin also arranges EDC feed pot, nitrogen gas outlet is connected by pipeline with nitrogen inlet, and mixed gas outlet is connected with ethylene oxide reactor feed system.The utility model is by adopting above-mentioned technology, the feed postition of former EDC adding apparatus is optimized, high pressure nitrogen boosts, the mode of pressurization is utilized directly the EDC of liquid state to be pressed in ethylene oxide reactor feed system, solve gas addition method of the prior art bring the change of Yin Wendu, the problem of EDC addition instability, while raising production stability, avoid the side reaction that the instability because of EDC is brought, reduce production cost.
Accompanying drawing explanation
Fig. 1 is the utility model structural representation.
In figure: 1-nitrogen inlet, 2-nitrogen buffer tank, 3-nitrogen gas outlet, 6-nitrogen inlet, 4-control valve, 5-pipeline, 7-EDC basin, 8-mixed gas outlet.
Detailed description of the invention
Below in conjunction with Figure of description, the utility model will be further described, but protection domain of the present utility model is not limited in this:
As shown in the figure, EDC feeding device in a kind of ethylene oxide production of the present utility model, during for ethylene oxide production, inhibiting EDC uses, it comprises nitrogen buffer tank 2 and EDC basin 7, described nitrogen buffer tank 2 top arranges nitrogen inlet 1, bottom arranges nitrogen gas outlet 4, nitrogen inlet 1 connecting line arranges pressure-regulating valve, EDC basin 7 top arranges nitrogen inlet 6, bottom arranges mixed gas outlet 8, EDC basin 7 also arranges EDC feed pot, EDC basin 7 top arranges nitrogen inlet 6, bottom arranges mixed gas outlet 8, described nitrogen gas outlet 4 is connected by pipeline 5 with nitrogen inlet 6, mixed gas outlet 8 is connected with ethylene oxide reactor feed system, pipeline 5 is arranged control valve 4, this control valve 4 is self-supporting pressure-regulating valve.
As shown in the figure, to add formula process as follows for EDC of the present utility model: first create inhibitor EDC liquid phase feeding system; EDC feed pot is connected with EDC basin 7, and is positioned at above EDC basin 7, and the EDC in EDC feed pot is added in EDC basin 7 by deadweight; Open control valve 4, high pressure nitrogen enters the nitrogen buffer tank 2 of high pressure at 2400G through self-supporting pressure-regulating valve adjustment Stress control, EDC in EDC basin 7 is pressed into reactor feed system under pressure, use as inhibitor in the reaction, by EDC feed way of the present utility model, ensure the stable of its addition, thus avoid because of unstable hundred and make selective fluctuation.
Claims (2)
1. the EDC feeding device in an ethylene oxide production, it is characterized in that comprising nitrogen buffer tank (2) and EDC basin (7), described nitrogen buffer tank (2) top arranges nitrogen inlet (1), bottom arranges nitrogen gas outlet (3), nitrogen inlet (1) connecting line arranges pressure-regulating valve, EDC basin (7) top arranges nitrogen inlet (6), bottom arranges mixed gas outlet (8), (7) also arrange EDC feed pot with EDC basin, described nitrogen gas outlet (3) is connected by pipeline (5) with nitrogen inlet (6), mixed gas outlet (8) is connected with ethylene oxide reactor feed system.
2. the EDC feeding device in a kind of ethylene oxide production according to claim 1, is characterized in that described pipeline (5) arranges control valve (4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520263964.5U CN204638150U (en) | 2015-04-28 | 2015-04-28 | EDC feeding device in a kind of ethylene oxide production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520263964.5U CN204638150U (en) | 2015-04-28 | 2015-04-28 | EDC feeding device in a kind of ethylene oxide production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204638150U true CN204638150U (en) | 2015-09-16 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520263964.5U Expired - Fee Related CN204638150U (en) | 2015-04-28 | 2015-04-28 | EDC feeding device in a kind of ethylene oxide production |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204638150U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109529722A (en) * | 2018-12-20 | 2019-03-29 | 山东玉皇化工有限公司 | A kind of method and apparatus of low boiling material to high-pressure installation continuous feed |
-
2015
- 2015-04-28 CN CN201520263964.5U patent/CN204638150U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109529722A (en) * | 2018-12-20 | 2019-03-29 | 山东玉皇化工有限公司 | A kind of method and apparatus of low boiling material to high-pressure installation continuous feed |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150916 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |