CN204559672U - A kind of imitative metal hand casing - Google Patents
A kind of imitative metal hand casing Download PDFInfo
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- CN204559672U CN204559672U CN201520314867.4U CN201520314867U CN204559672U CN 204559672 U CN204559672 U CN 204559672U CN 201520314867 U CN201520314867 U CN 201520314867U CN 204559672 U CN204559672 U CN 204559672U
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Abstract
The utility model discloses a kind of imitative metal hand casing, this mobile phone shell comprises housing (1), plasma modification layer (2), high-power sputtering sedimentation metal level (3), middle level (4), middle surface layer (5) and skin (6) from the inside to the outside successively, and the thickness of described high-power sputtering sedimentation metal level (3) is 200-600nm.The beneficial effects of the utility model are: plasma modification layer surface tension is high, effectively improve the adhesive property of plastic rubber substrate, and adhesive property is improved greatly, thus make adhesive force of metal layer good, sound construction and can not produce waste water, can not form pollution.UV enamelled coating divides three layers of setting, and thinner one deck UV enamelled coating and metal level are pasted, strengthen the adhesive force of skin and high-power sputtering sedimentation metal level and strengthen hardness, product surface hardness, resistance to wear and scratch resistance requirement can be met, Total Product wall thickness can be made again thinner, there is imitative metal effect.
Description
Technical field
The utility model relates to mobile phone protecting case technical field of structures, particularly a kind of imitative metal hand casing.
Background technology
The coat of metal prepared by electroplating technology has excellent resistance to wear, corrosion resistance, has obtained in electronic product and has widely applied.But existing electroplating technology can produce a large amount of waste water and heavy metal contaminants.And along with the fast development of electronics industry, the requirement of people to electronic product is also more and more higher, when quality is protected, electronic product has become an important component part of electronic product from the external overall appearance embodied.
Summary of the invention
The purpose of this utility model is the shortcoming overcoming prior art, provides one can meet product surface hardness, resistance to wear and scratch resistance requirement, can make again the imitative metal hand casing that Total Product wall thickness is thinner.
The purpose of this utility model is achieved through the following technical solutions: a kind of imitative metal hand casing, this mobile phone shell comprises housing, plasma modification layer, high-power sputtering sedimentation metal level, middle level, middle surface layer and skin from the inside to the outside successively, and the thickness of described high-power sputtering sedimentation metal level is 200-600nm.
Described plasma modification layer is that the plastic rubber substrate of mobile phone shell obtains through physical vapour deposition (PVD) plasma modification, ion source electric current is 0.3 ~ 0.5A, bias voltage 20 ~ 60V, duty ratio 40% ~ 80%, argon gas flow velocity 10 ~ 100SCCM, oxygen gas flow rate 0 ~ 150SCCM, time 5 ~ 10min, thus make the surface of gas and plastic rubber substrate that the interaction of chemistry or physics occur, make polarization on plastic rubber substrate surface molecular chain, surface tension significantly improves, change its surface activity, the surface physics change caused by the crosslinked of plastic rubber substrate surface and corrasion obviously improves contact angle and the surface energy on plastic rubber substrate surface, effective adhesive property improving plastic rubber substrate, adhesive property is improved greatly.
Described high-power sputtering sedimentation metal level is by high-power sputter-deposition technology, metal level is prepared on the plasma modification layer surface of mobile phone shell, the technological parameter of high-power sputter-deposition technology is: adopt high-power DC power supply, source current is 50 ~ 200A, and voltage is 400 ~ 600V, and sedimentation time is 10 ~ 15min, bias voltage 20 ~ 80V, duty ratio 40% ~ 80%, argon gas flow velocity 50 ~ 100SCCM, the metal of deposition is the one in aluminium, copper, nickel, chromium.
Described middle level, middle surface layer and skin are transparent UV enamelled coating.The hardness of UV paint is high, resistance to wear is good, but meet product requirement surely because UV paint differs with the attachment density of high-power sputtering sedimentation metal level, therefore between skin and high-power sputtering sedimentation metal level, middle level and middle surface layer is provided with, to strengthen the adhesive force of outer and high-power sputtering sedimentation metal level and to strengthen hardness.
The thickness of described housing is 1 ~ 1.2mm, and plasma modification layer thickness is 5 ~ 8 μm, and intima-media thickness is 8 ~ 10um, and middle surface thickness is 25 ~ 15 μm, and outer layer thickness is 15 ~ 25 μm.Product surface hardness, resistance to wear and scratch resistance requirement can be met, Total Product wall thickness can be made again thinner, there is imitative metal effect.
The utility model has the following advantages: plasma modification layer surface tension of the present utility model is high, effectively improve the adhesive property of plastic rubber substrate, adhesive property is improved greatly, thus make adhesive force of metal layer good, sound construction and can not produce waste water, can not form pollution.UV enamelled coating divides three layers of setting, and thinner one deck UV enamelled coating and metal level are pasted, strengthen the adhesive force of skin and high-power sputtering sedimentation metal level and strengthen hardness, product surface hardness, resistance to wear and scratch resistance requirement can be met, Total Product wall thickness can be made again thinner, there is imitative metal effect.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model
In figure, 1-housing, 2-plasma modification layer, the high-power sputtering sedimentation metal level of 3-, 4-middle level, surface layer in 5-, 6-is outer.
Embodiment
Below in conjunction with accompanying drawing, the utility model is further described:
As shown in Figure 1, a kind of imitative metal hand casing, this mobile phone shell comprises housing 1, plasma modification layer 2, high-power sputtering sedimentation metal level 3, middle level 4, middle surface layer 5 and outer 6 from the inside to the outside successively, and the thickness of described high-power sputtering sedimentation metal level 3 is 200-600nm.
Described plasma modification layer 2 is that the plastic rubber substrate of mobile phone shell obtains through physical vapour deposition (PVD) plasma modification, ion source electric current is 0.3 ~ 0.5A, bias voltage 20 ~ 60V, duty ratio 40% ~ 80%, argon gas flow velocity 10 ~ 100SCCM, oxygen gas flow rate 0 ~ 150SCCM, time 5 ~ 10min, thus make the surface of gas and plastic rubber substrate that the interaction of chemistry or physics occur, make polarization on plastic rubber substrate surface molecular chain, surface tension significantly improves, change its surface activity, the surface physics change caused by the crosslinked of plastic rubber substrate surface and corrasion obviously improves contact angle and the surface energy on plastic rubber substrate surface, effective adhesive property improving plastic rubber substrate, adhesive property is improved greatly.
Described high-power sputtering sedimentation metal level 3 is by high-power sputter-deposition technology, metal level is prepared on plasma modification layer 2 surface of mobile phone shell, the technological parameter of high-power sputter-deposition technology is: adopt high-power DC power supply, source current is 50 ~ 200A, and voltage is 400 ~ 600V, and sedimentation time is 10 ~ 15min, bias voltage 20 ~ 80V, duty ratio 40% ~ 80%, argon gas flow velocity 50 ~ 100SCCM, the metal of deposition is the one in aluminium, copper, nickel, chromium.
Described middle level 4, middle surface layer 5 and outer 6 are transparent UV enamelled coating.The hardness of UV paint is high, resistance to wear is good, but meet product requirement surely because UV paint differs with the attachment density of high-power sputtering sedimentation metal level 3, therefore between outer 6 and high-power sputtering sedimentation metal level 3, middle level 4 and middle surface layer 5 is provided with, to strengthen the adhesive force of outer 6 and high-power sputtering sedimentation metal level 3 and to strengthen hardness.
The thickness of described housing 1 is 1 ~ 1.2mm, and plasma modification layer 2 thickness is 5 ~ 8 μm, and middle level 4 thickness is 8 ~ 10um, and middle surface layer 5 thickness is 25 ~ 15 μm, and outer 6 thickness are 15 ~ 25 μm.Product surface hardness, resistance to wear and scratch resistance requirement can be met, Total Product wall thickness can be made again thinner, there is imitative metal effect.
Claims (3)
1. an imitative metal hand casing, it is characterized in that: this mobile phone shell comprises housing (1), plasma modification layer (2), high-power sputtering sedimentation metal level (3), middle level (4), middle surface layer (5) and skin (6) from the inside to the outside successively, and the thickness of described high-power sputtering sedimentation metal level (3) is 200-600nm.
2. one according to claim 1 imitates metal hand casing, it is characterized in that: described middle level (4), middle surface layer (5) and skin (6) are transparent UV enamelled coating.
3. one according to claim 1 imitates metal hand casing, it is characterized in that: the thickness of described housing (1) is 1 ~ 1.2mm, plasma modification layer (2) thickness is 5 ~ 8 μm, middle level (4) thickness is 8 ~ 10um, middle surface layer (5) thickness is 25 ~ 15 μm, and outer (6) thickness is 15 ~ 25 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520314867.4U CN204559672U (en) | 2015-05-17 | 2015-05-17 | A kind of imitative metal hand casing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520314867.4U CN204559672U (en) | 2015-05-17 | 2015-05-17 | A kind of imitative metal hand casing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204559672U true CN204559672U (en) | 2015-08-12 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520314867.4U Expired - Fee Related CN204559672U (en) | 2015-05-17 | 2015-05-17 | A kind of imitative metal hand casing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204559672U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107216477A (en) * | 2017-07-20 | 2017-09-29 | 华勤通讯技术有限公司 | The process of surface treatment and working of plastics of a kind of plastic basis material |
| CN108598670A (en) * | 2018-04-26 | 2018-09-28 | 维沃移动通信有限公司 | A kind of production method of antenna, terminal device and antenna |
-
2015
- 2015-05-17 CN CN201520314867.4U patent/CN204559672U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107216477A (en) * | 2017-07-20 | 2017-09-29 | 华勤通讯技术有限公司 | The process of surface treatment and working of plastics of a kind of plastic basis material |
| CN108598670A (en) * | 2018-04-26 | 2018-09-28 | 维沃移动通信有限公司 | A kind of production method of antenna, terminal device and antenna |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150812 Termination date: 20170517 |
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| CF01 | Termination of patent right due to non-payment of annual fee |