CN204434288U - A kind of fitting device for shifting graphene film - Google Patents
A kind of fitting device for shifting graphene film Download PDFInfo
- Publication number
- CN204434288U CN204434288U CN201420776038.3U CN201420776038U CN204434288U CN 204434288 U CN204434288 U CN 204434288U CN 201420776038 U CN201420776038 U CN 201420776038U CN 204434288 U CN204434288 U CN 204434288U
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- base plate
- fitting device
- graphene film
- fixed leg
- supporting layer
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Abstract
The utility model discloses a kind of fitting device for shifting graphene film, comprising base plate, the fixed leg be fixedly connected with base plate and pad; Described pad can pass fixed leg, for isolating graphene film supporting layer.The utility model can have the catalytic substrate of graphene film to etch to multiple growth simultaneously, enhances productivity, and fitting device has structure simply simultaneously, is easy to the advantage manufactured.
Description
Technical field
The utility model relates to a kind of fitting device, is related specifically to a kind of fitting device for shifting graphene film.
Background technology
Graphene is that carbon atom is by sp
2the monoatomic layer flat film of hybridized orbital composition hexangle type lattice, as a kind of novel semiconductor material, has the feature of high transmission rate, high conductivity.Process for preparing graphenes by chemical vapour deposition utilizes the carbon compounds such as methane as carbon source, obtains Graphene by the pyrolytic decomposition growth of carbon source on catalytic substrate surface.The thin slice that catalytic substrate generally selects the transition metals such as copper, nickel, platinum to make, because copper substrate shows when process for preparing graphenes by chemical vapour deposition unique " certainly limitting growth ", is therefore applicable to industrialization large-scale preparation of monolayer graphene film.
Current laboratory mainly adopts chemical gaseous phase depositing process to prepare graphene film in catalytic substrate, then at surperficial spin on organics supporting layer, Graphene with supporting layer is put into etching liquid, because organism supporting layer density is little, can allow film floating on the liquid level of etching liquid, after treating that catalytic substrate is etched, clean residual for the etching liquid of the graphenic surface with supporting layer, dry up, the supporting layer then removing surface just can be used for next step Graphene shifting process.The area of the graphene film that laboratory is used is generally at 2 cm × 2 cm, and industrialization scale operation obtain producing the area of graphene film after section and be at least 25 cm × 25 cm, large-area like this graphene film is after the surface laminating supporting layer supporting layer that particularly Thermal release adhesive tape or silica gel adhesive tape are soft like this, if directly put into etching liquid to dissolve, because whole supporting layer is soft, particularly after catalytic substrate is dissolved, because graphene layer comes out, if supporting layer does not have good fixing, then easily occur bending and deformation, cause the Graphene be attached on supporting layer to bend or be out of shape, destroy the integrity of Graphene, in addition, if graphene layer is not auxiliary fixing after etching starts or terminates, then when movable support layer, the situation that easy generation Graphene and etching liquid cell wall collide, thus cause Graphene to damage.For improving graphene product quality, auxiliary tooling device is needed to be fixed supporting layer, thus the possibility that minimizing graphene layer and surrounding objects collide, improve the quality of products.In addition, adopt traditional a slice supporting layer in the mode of etching liquid surface flotation, efficiency is low, for effectively improving the space availability ratio of whole etching liquid groove, needs a kind of fitting device that can carry out multi-disc catalytic substrate simultaneously and carry out etching.
Utility model content
In view of this, the purpose of this utility model is to provide a kind of fitting device for shifting graphene film, can carry out multi-disc catalytic substrate simultaneously etch.
Fitting device for shifting graphene film of the present utility model comprises base plate, the fixed leg be fixedly connected with base plate and pad; Described pad can pass fixed leg, for isolating graphene film supporting layer.
Further, the described fixed leg quantity be fixedly connected with base plate is 8.
Further, the described fixed leg be fixedly connected with base plate is for circular or square.
Further, the described fixed leg be fixedly connected with base plate is for time circular, and its diameter is 0.1 cm-3 cm.
Further, base plate, the fixed leg be fixedly connected with base plate and pad all adopt PVC or PTFE to make.
Further, described spacer thickness is 1 cm-10 cm.
The using method of the fitting device that the utility model provides is as follows:
1) getting length is 200-400 cm; width is that the Thermal release adhesive tape of 200-400 cm or silicone band are as supporting layer; the area of supporting layer and the base plate sizableness of fitting device; and according to the position of fixed leg on base plate, supporting layer is punched; afterwards; tear the protective membrane on release glue-line; then " volume to volume " mode is adopted; getting in catalytic substrate has the one side of Graphene to fit with release glue-line or layer of silica gel; catalytic substrate is at supporting layer region intermediate, and its area is less than the inside region of fixed leg.
2) on each fixed leg of base plate, overlap the identical pad of quantity, then put into according to the mode of catalytic substrate side towards base plate by supporting layer, now, supporting layer is just fixed by the fixed leg on base plate.Put one deck pad according on each fixed leg afterwards, the form of putting a slice supporting layer print is placed.
3) after having overlapped last pad, corrosion resistant rubber ring on fixed leg overlaps, fixed support layer print and pad.Then whole device being placed on slipping through the net, then slowly putting into etching liquid with slipping through the net, wait for that catalytic substrate is etched complete, mention and slip through the net, after device no longer drips etching liquid, will slip through the net and deliver to rinse bath with fitting device, and rinse well with clear water.After drying up, take off the rubber ring on fixed leg, then take out pad successively, take out the supporting layer exposing Graphene.
4) fitted in the Graphene face of supporting layer and target substrate (PET, glass, silicon-dioxide etc.).By to heat or supporting layer is separated by stripping mode, obtain the target substrate that there is Graphene on surface.
5) pad, to slip through the net and etching liquid groove, rinse bath all adopt the engineering plastics of acid-alkali-corrosive-resisting to make, wherein, the embedded lead of base plate of fitting device waits metallic substance, and ensure that fitting device can when etching, whole device can be submerged under etching liquid liquid level.Thus ensure that the catalytic substrate on all supporting layers can both contact with etching liquid.
Compared with prior art; the beneficial effect of the fitting device for shifting graphene film of the present utility model is: can etch multi-disc catalytic substrate simultaneously; enhance productivity; meanwhile, fitting device can pass through fixed support layer for the protection of Graphene in the process of transfer Graphene.It is simple that fitting device of the present utility model also has structure, is easy to the advantage manufactured.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the utility model is further described:
Fig. 1 is the perspective view of the fitting device for shifting graphene film of the present utility model;
Fig. 2 is the schematic top plan view of the fitting device for shifting graphene film of the present utility model;
In figure each mark corresponding to title be respectively: base plate 1, the fixed leg 2 be fixedly connected with base plate, pad 3.
Embodiment
Fig. 1 is the perspective view of the fitting device for shifting graphene film of the present utility model, Fig. 2 is the schematic top plan view of the fitting device for shifting graphene film of the present utility model, as shown in the figure: the present embodiment comprise base plate 1, the fixed leg 2 be fixedly connected with base plate and pad 3 for the fitting device shifting graphene film; Described pad 3 can pass fixed leg 2, for isolating graphene film supporting layer.
Principle of the present utility model is: first bore a hole at the specific position of graphene film supporting layer, and by the hole on supporting layer through on the fixed leg 2 be fixedly connected with base plate, for being fixed on fitting device of the present utility model, different graphene film supporting layers is isolated by pad 3, thus enable etching liquid flow between adjacent two panels graphene film supporting layer, and catalytic substrate is etched, this arrangement can etch the catalytic substrate on multi-disc Graphene supporting layer simultaneously, take full advantage of the space of etching liquid groove, improve production efficiency.
In the present embodiment, described fixed leg 2 quantity be fixedly connected with base plate is 8, fixed catalytic substrate that can be reliable and stable.
In the present embodiment, the described fixed leg 2 be fixedly connected with base plate, for circular or square, has the advantage that structure is simple, be easy to manufacture.
In the present embodiment, the described fixed leg 2 be fixedly connected with base plate is for time circular, and its diameter is 0.1 cm-3 cm.
In the present embodiment, described base plate 1, the fixed leg 2 be fixedly connected with base plate and pad 3 all adopt PVC or PTFE to make, and during etching, fitting device can not be corroded, and can repeatedly use.
In the present embodiment, described pad 3 thickness is 1 cm-10cm.
The using method of the fitting device that the utility model provides is as follows:
1) getting length is 200-400 cm; width is that the Thermal release adhesive tape of 200-400 cm or silicone band are as supporting layer; the area of supporting layer and base plate 1 sizableness of fitting device; and according to the position of fixed leg on base plate 1, supporting layer is punched; afterwards; tear the protective membrane on release glue-line; then " volume to volume " mode is adopted; getting in catalytic substrate has the one side of Graphene to fit with release glue-line or layer of silica gel; catalytic substrate is at supporting layer region intermediate, and its area is less than the inside region of fixed leg 2.
2) on each fixed leg of base plate, overlap the identical pad of quantity, then put into according to the mode of catalytic substrate side towards base plate by supporting layer, now, supporting layer is just fixed by the fixed leg on base plate.Put one deck pad according on each fixed leg afterwards, the form of putting a slice supporting layer print is placed.
3) after having overlapped last pad, corrosion resistant rubber ring on fixed leg overlaps, fixed support layer print and pad.Then whole device being placed on slipping through the net, then slowly putting into etching liquid with slipping through the net, wait for that catalytic substrate is etched complete, mention and slip through the net, after device no longer drips etching liquid, will slip through the net and deliver to rinse bath with fitting device, and rinse well with clear water.After drying up, take off the rubber ring on fixed leg, then take out pad successively, take out the supporting layer exposing Graphene.
4) fitted in the Graphene face of supporting layer and target substrate (PET, glass, silicon-dioxide etc.).By to heat or supporting layer is separated by stripping mode, obtain the target substrate that there is Graphene on surface.
5) pad 3, to slip through the net and etching liquid groove, rinse bath all adopt the engineering plastics of acid-alkali-corrosive-resisting to make, wherein, the embedded lead of base plate of fitting device waits metallic substance, and ensure that fitting device can when etching, whole device can be submerged under etching liquid liquid level.Thus ensure that the catalytic substrate on all supporting layers can both contact with etching liquid.
What finally illustrate is, above embodiment is only in order to illustrate the technical solution of the utility model and unrestricted, although be described in detail the utility model with reference to preferred embodiment, those of ordinary skill in the art is to be understood that, can modify to the technical solution of the utility model or equivalent replacement, and not departing from aim and the scope of technical solutions of the utility model, it all should be encompassed in the middle of right of the present utility model.
Claims (6)
1. for shifting a fitting device for graphene film, it is characterized in that: comprise base plate (1), the fixed leg (2) be fixedly connected with base plate and pad (3); Described pad (3) can pass fixed leg (2), for isolating graphene film supporting layer.
2. the fitting device for shifting graphene film according to claim 1, is characterized in that: described fixed leg (2) quantity be fixedly connected with base plate is 8.
3. the fitting device for shifting graphene film according to claim 1, is characterized in that: the described fixed leg (2) be fixedly connected with base plate is for circular or square.
4. the fitting device for shifting graphene film according to claim 1, is characterized in that: the described fixed leg (2) be fixedly connected with base plate is for time circular, and its diameter is 0.1cm-3 cm.
5. the fitting device for shifting graphene film according to claim 1, is characterized in that: described base plate (1), the fixed leg (2) be fixedly connected with base plate and pad (3) all adopt PVC or PTFE to make.
6. the fitting device for shifting graphene film according to claim 1, is characterized in that: described pad (3) thickness is 1 cm-10cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420776038.3U CN204434288U (en) | 2014-12-11 | 2014-12-11 | A kind of fitting device for shifting graphene film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420776038.3U CN204434288U (en) | 2014-12-11 | 2014-12-11 | A kind of fitting device for shifting graphene film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204434288U true CN204434288U (en) | 2015-07-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420776038.3U Withdrawn - After Issue CN204434288U (en) | 2014-12-11 | 2014-12-11 | A kind of fitting device for shifting graphene film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204434288U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104445172A (en) * | 2014-12-11 | 2015-03-25 | 重庆墨希科技有限公司 | Tooling device for transferring graphene thin film |
| CN106629693A (en) * | 2016-12-23 | 2017-05-10 | 烟台市烯能新材料股份有限公司 | Graphene film transfer equipment and transfer method thereof |
-
2014
- 2014-12-11 CN CN201420776038.3U patent/CN204434288U/en not_active Withdrawn - After Issue
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104445172A (en) * | 2014-12-11 | 2015-03-25 | 重庆墨希科技有限公司 | Tooling device for transferring graphene thin film |
| CN104445172B (en) * | 2014-12-11 | 2017-05-10 | 重庆墨希科技有限公司 | Tooling device for transferring graphene thin film |
| CN106629693A (en) * | 2016-12-23 | 2017-05-10 | 烟台市烯能新材料股份有限公司 | Graphene film transfer equipment and transfer method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20150701 Effective date of abandoning: 20170510 |
|
| AV01 | Patent right actively abandoned |
Granted publication date: 20150701 Effective date of abandoning: 20170510 |