CN204356398U - A kind of fixture system for chemical gaseous phase depositing process transfer graphene film - Google Patents
A kind of fixture system for chemical gaseous phase depositing process transfer graphene film Download PDFInfo
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- CN204356398U CN204356398U CN201420776166.8U CN201420776166U CN204356398U CN 204356398 U CN204356398 U CN 204356398U CN 201420776166 U CN201420776166 U CN 201420776166U CN 204356398 U CN204356398 U CN 204356398U
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- fixture
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- fixed leg
- graphene film
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Abstract
The utility model discloses a kind of for chemical gaseous phase depositing process transfer graphene film fixture system, comprise base plate, the fixed leg be fixedly connected with base plate, pad, cover plate fixture and fill liquid bucket; Described pad can pass fixed leg, for isolating graphene film supporting layer; Described cover plate is placed in the top of fixed leg, and for coordinating the lattice bumping post of dress liquid bucket to prevent fixture when catalytic substrate etches, fixture floats on etching liquid liquid level; Described dress liquid bucket comprises the retaining plate on casing and static housing top, and described casing is provided with small opening, and described retaining plate is provided with mechanical manipulator hook hole and lattice gear cylinder open holes; Described base plate, the fixed leg be fixedly connected with base plate, pad and cover plate have been assembled formed fixture and have been positioned over the box house filling liquid bucket.The utility model can have the catalytic substrate of graphene film to etch to multiple growth simultaneously, enhance productivity, fixture can be avoided when catalytic substrate etches by the cooperation of dress liquid bucket and cover plate, the cursory situation on etching liquid liquid level of fixture simultaneously.
Description
Technical field
The utility model relates to a kind of fixture system, is related specifically to a kind of fixture system for chemical gaseous phase depositing process transfer graphene film.
Background technology
Graphene is that carbon atom is by sp
2the monoatomic layer flat film of hybridized orbital composition hexangle type lattice, as a kind of novel semiconductor material, has the feature of high transmission rate, high conductivity.Chemical vapor deposition (CVD) legal system is utilize the carbon compounds such as methane as carbon source for Graphene, obtains Graphene by the pyrolytic decomposition growth of carbon source on catalytic substrate surface.The thin slice that catalytic substrate generally selects the transition metals such as copper, nickel, platinum to make, is therefore applicable to industrialization large-scale preparation of monolayer graphene film because copper substrate shows unique " certainly limitting growth " when process for preparing graphenes by chemical vapour deposition.
Current laboratory mainly adopts chemical vapor deposition (CVD) method to prepare graphene film in catalytic substrate, then at surperficial spin on organics supporting layer, Graphene with supporting layer is put into etching liquid, because organism supporting layer density is little, can allow film floating on the liquid level of etching liquid, after treating that catalytic substrate is etched, clean residual for the etching liquid of the graphenic surface with supporting layer, dry up, the supporting layer then removing surface just can be used for next step Graphene shifting process.The area of the graphene film that laboratory is used is generally at 2 cm × 2 cm, and industrialization scale operation obtain producing the area of graphene film after section and be at least 25 cm × 25 cm, large-area like this graphene film is after the surface laminating supporting layer supporting layer that particularly Thermal release adhesive tape or silica gel adhesive tape are soft like this, if directly put into etching liquid to dissolve, because whole supporting layer is soft, particularly after catalytic substrate is dissolved, because graphene layer comes out, if there is no external fixing protection, the easy flexural deformation of supporting layer, cause the Graphene be attached on supporting layer to bend or be out of shape, destroy the integrity of Graphene, in addition, if graphene layer is not auxiliary fixing after etching starts or terminates, then when movable support layer, the situation that easy generation Graphene and etching liquid cell wall collide, thus cause Graphene to damage.For improving graphene product quality, auxiliary mould system is needed to be fixed supporting layer, thus the possibility that minimizing graphene layer and surrounding objects collide, improve the quality of products.In addition, adopt traditional a slice supporting layer in the mode of etching liquid surface flotation, efficiency is low, for effectively improving the space availability ratio of whole etching liquid groove, needs a kind of fixture system that can carry out multi-disc catalytic substrate simultaneously and carry out etching.When carrying out etching operation, be floated on etching liquid for avoiding the clamp section of fixture system, catalytic substrate is caused fully not contact with etching liquid, cause etching not exclusively, a kind of dress liquid bucket is needed to coordinate fixture composition fixture system, fixing whole fixture, is convenient to carrying out smoothly of whole transfer process.
Utility model content
In view of this, the purpose of this utility model is to provide a kind of fixture system for chemical gaseous phase depositing process transfer graphene film, can carry out multi-disc catalytic substrate simultaneously etch.Meanwhile, fixture and dress liquid bucket coordinate the fixture system of composition, be convenient to fill in a transfer process to graphene film carry out fixing, and fixture can be avoided when catalytic substrate etches, the cursory situation on etching liquid liquid level of fixture.
Fixture system for chemical gaseous phase depositing process transfer graphene film of the present utility model comprises the fixture that is made up of base plate, the fixed leg be fixedly connected with base plate, pad, cover plate and fills liquid bucket; Described pad can pass fixed leg, for isolating graphene film supporting layer; Described cover plate is placed in the top of fixed leg, and avoid fixture when catalytic substrate etches for preventing, fixture is cursory on etching liquid liquid level; Described dress liquid bucket comprises the retaining plate on casing and static housing top, and described casing is provided with small opening, and described retaining plate is provided with mechanical manipulator hook hole and lattice gear cylinder open holes; Described base plate, the fixed leg be fixedly connected with base plate, pad and cover plate are positioned over the box house filling liquid bucket after having assembled.
Further, described mechanical manipulator hook hole and lattice gear cylinder open holes quantity are 2.
Further, the described fixed leg quantity be fixedly connected with base plate is 8.
Further, the described fixed leg be fixedly connected with base plate is for circular or square.
Further, the described fixed leg be fixedly connected with base plate is for time circular, and its diameter is 0.1 cm-3 cm.
Further, base plate, the fixed leg be fixedly connected with base plate, pad and cover plate all adopt PVC(polyvinyl chloride), PTFE(tetrafluoroethylene), PVDF(polyvinylidene difluoride (PVDF)) etc. the engineering plastics of acid-alkali-corrosive-resisting make.
Further, described spacer thickness is 1 cm-10cm.
The using method of the fixture system that the utility model provides is as follows:
1) getting length is 200-400 cm; width is that the Thermal release adhesive tape of 200-400 cm or silicone band are as supporting layer; the area of supporting layer and the base plate sizableness of grip device; and according to the position of fixed leg on base plate, supporting layer is punched; afterwards; tear the protective membrane on release glue-line; then " volume to volume " mode is adopted; getting in catalytic substrate has the one side of Graphene to fit with release glue-line or layer of silica gel; catalytic substrate is at supporting layer region intermediate, and its area is less than the inside region of fixed leg.
2) on each fixed leg of base plate, overlap the identical pad of quantity, then put into according to the mode of catalytic substrate side towards base plate by supporting layer, now, supporting layer is just fixed by the fixed leg on base plate.Put one deck pad according on each fixed leg afterwards, the form of putting a slice supporting layer print is placed.
3) after having overlapped last pad, cover cover plate, on fixed leg, then overlap corrosion resistant rubber ring.Then whole grip device is placed on dress liquid bucket, after all grip devices all load liquid bucket, lattice gear cylinder is plugged successively on dress liquid bucket, slowly etching liquid is put into dress liquid bucket, wait for that catalytic substrate is etched complete, mention dress liquid bucket, after device no longer drips etching liquid, dress liquid bucket is delivered to rinse bath with grip device, rinses well with clear water.After drying up, take off lattice gear cylinder, get the rubber ring on fixed leg, take off cover plate, then take out pad successively, take out the supporting layer exposing Graphene.
4) fitted in the Graphene face of supporting layer and target substrate (PET, glass, silicon-dioxide etc.).By to heat or supporting layer is separated by stripping mode, obtain the target substrate that there is Graphene on surface.
5) pad, cover plate, dress liquid bucket and etching liquid groove, rinse bath all adopt the engineering plastics of acid-alkali-corrosive-resisting to make.
Compared with prior art, the beneficial effect of the fixture system for chemical gaseous phase depositing process transfer graphene film of the present utility model is: can etch multi-disc catalytic substrate simultaneously, enhance productivity, fixture can be avoided completely to be floated in etching liquid on liquid level by the cooperation of dress liquid bucket and cover plate, the situation causing partially catalyzed substrate not to be etched occurs simultaneously.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the utility model is further described:
Fig. 1 is the perspective view of the agent structure of the fixture system for chemical gaseous phase depositing process transfer graphene film of the present utility model;
Fig. 2 is the schematic top plan view of the agent structure of the fixture system for chemical gaseous phase depositing process transfer graphene film of the present utility model;
Fig. 3 is the perspective view preparing the cover plate of the fixture system of graphene film for chemical gaseous phase depositing process of the present utility model;
Fig. 4 is the perspective view of the dress liquid bucket of the fixture system for chemical gaseous phase depositing process transfer graphene film of the present utility model;
In figure, each title corresponding to mark is respectively: base plate 1, the fixed leg 2 be fixedly connected with base plate, pad 3, cover plate 4, fill liquid bucket 5, casing 5-1, small opening 5-1-1, retaining plate 5-2, mechanical manipulator hook hole 5-2-1, lattice keep off cylinder open holes 5-2-2.
Embodiment
Fig. 1 is the perspective view of the agent structure of the fixture system for chemical gaseous phase depositing process transfer graphene film of the present utility model, Fig. 2 is the schematic top plan view of the agent structure of the fixture system for chemical gaseous phase depositing process transfer graphene film of the present utility model, Fig. 3 is the perspective view preparing the cover plate of the fixture system of graphene film for chemical gaseous phase depositing process of the present utility model, Fig. 4 is the perspective view of the dress liquid bucket of the fixture system for chemical gaseous phase depositing process transfer graphene film of the present utility model, as shown in the figure: the fixture system for chemical gaseous phase depositing process transfer graphene film of the present embodiment comprises base plate 1, the fixed leg 2 be fixedly connected with base plate and pad 3, described pad 3 can pass fixed leg 2, for isolating graphene film supporting layer.
Principle of the present utility model is: first bore a hole at the specific position of graphene film supporting layer, and by the hole on supporting layer through on the fixed leg 2 be fixedly connected with base plate, for being fixed on fixture system of the present utility model, different graphene film supporting layers is isolated by pad 3, thus enable etching liquid flow between adjacent two panels graphene film supporting layer, and catalytic substrate is etched, this arrangement can etch the catalytic substrate on multi-disc Graphene supporting layer simultaneously, take full advantage of the space of etching liquid groove, improve production efficiency, cover plate 4 can be blocked after lattice gear cylinder being installed with fashionable dress liquid bucket 5 by lattice gear cylinder open holes 5-2-2, it is stoped to float during etching, be convenient to abundant etching.
In the present embodiment, described mechanical manipulator hook hole 5-2-1 and lattice gear cylinder open holes 5-2-2 quantity are 2, described mechanical manipulator hook hole 5-2-1 is convenient to the transport filling liquid bucket, cover plate 4 can be blocked after described lattice gear cylinder open holes 5-2-2 installs lattice gear cylinder, stop it to float during etching, be convenient to abundant etching.
In the present embodiment, described fixed leg 2 quantity be fixedly connected with base plate is 8, fixed catalytic substrate that can be reliable and stable.
In the present embodiment, the described fixed leg 2 be fixedly connected with base plate, for circular or square, has the advantage that structure is simple, be easy to manufacture.
In the present embodiment, the described fixed leg 2 be fixedly connected with base plate is for time circular, and its diameter is 0.1 cm-3 cm.
In the present embodiment, described base plate 1, the fixed leg 2 be fixedly connected with base plate, pad 3 and cover plate 4 all adopt PVC(polyvinyl chloride), PTFE(tetrafluoroethylene), PVDF(polyvinylidene difluoride (PVDF)) etc. the engineering plastics of acid-alkali-corrosive-resisting make, during etching, fixture system can not be corroded, and can repeatedly use.
In the present embodiment, described pad 3 thickness is 1 cm-10cm.
The using method of the fixture system that the utility model provides is as follows:
1) getting length is 200-400 cm; width is that the Thermal release adhesive tape of 200-400 cm or silicone band are as supporting layer; the area of supporting layer and base plate 1 sizableness of grip device; and according to the position of fixed leg 2 on base plate 1, supporting layer is punched; afterwards; tear the protective membrane on release glue-line; then " volume to volume " mode is adopted; getting in catalytic substrate has the one side of Graphene to fit with release glue-line or layer of silica gel; catalytic substrate is at supporting layer region intermediate, and its area is less than the inside region of fixed leg 2.
2) overlap on each fixed leg 2 of base plate 1 and put the identical pad of quantity 3, then put into according to the mode of catalytic substrate side towards base plate by supporting layer, now, supporting layer is just fixed by the fixed leg 2 on base plate.Put one deck pad 3 according to according on each fixed leg afterwards, the form of putting a slice supporting layer print is placed.
3) after having overlapped last pad 3, cover cover plate 4, then on fixed leg 2, overlap corrosion resistant rubber ring.Then whole grip device is placed on dress liquid bucket 5, after all fixtures all load liquid bucket, lattice gear cylinder is plugged successively on dress liquid bucket, then grip device slowly puts into etching liquid with dress liquid bucket 5, wait for that catalytic substrate is etched complete, mention dress liquid bucket 5, after device no longer drips etching liquid, dress liquid bucket 5 is delivered to rinse bath with grip device, rinses well with clear water.After drying up, take off lattice gear cylinder, get the rubber ring on fixed leg, take off cover plate 4, then take out pad 3 successively, take out the supporting layer exposing Graphene.
4) fitted in the Graphene face of supporting layer and target substrate (PET, glass, silicon-dioxide etc.).By to heat or supporting layer is separated by stripping mode, obtain the target substrate that there is Graphene on surface.
5) pad 3, cover plate 4, dress liquid bucket 5 and etching liquid groove, rinse bath all adopt the engineering plastics of acid-alkali-corrosive-resisting to make.
What finally illustrate is, above embodiment is only in order to illustrate the technical solution of the utility model and unrestricted, although be described in detail the utility model with reference to preferred embodiment, those of ordinary skill in the art is to be understood that, can modify to the technical solution of the utility model or equivalent replacement, and not departing from aim and the scope of technical solutions of the utility model, it all should be encompassed in the middle of right of the present utility model.
Claims (7)
1. for a fixture system for chemical gaseous phase depositing process transfer graphene film, it is characterized in that: comprise the fixture that is made up of base plate (1), the fixed leg (2) be fixedly connected with base plate, pad (3), cover plate (4) and fill liquid bucket (5); Described pad (3) can pass fixed leg (2), for isolating graphene film supporting layer; Described cover plate (4) is placed in the top of fixed leg (2), and for preventing fixture when catalytic substrate etches, fixture is cursory on etching liquid liquid level; Described dress liquid bucket (5) comprises the retaining plate (5-2) on casing (5-1) and static housing (5-1) top, described casing (5-1) is provided with small opening (5-1-1), and described retaining plate (5-2) is provided with mechanical manipulator hook hole (5-2-1) and lattice gear cylinder open holes (5-2-2); Described base plate (1), the fixed leg (2) be fixedly connected with base plate, pad (3) and cover plate (4) are positioned over the casing (5-1) filling liquid bucket (5) after having assembled grip device inner.
2. the fixture system for chemical gaseous phase depositing process transfer graphene film according to claim 1, is characterized in that: described mechanical manipulator hook hole (5-2-1) and lattice gear cylinder open holes (5-2-2) quantity are 2.
3. the fixture system for chemical gaseous phase depositing process transfer graphene film according to claim 1, is characterized in that: described fixed leg (2) quantity be fixedly connected with base plate is 8.
4. the fixture system for chemical gaseous phase depositing process transfer graphene film according to claim 1, is characterized in that: the described fixed leg (2) be fixedly connected with base plate is for circular or square.
5. the fixture system for chemical gaseous phase depositing process transfer graphene film according to claim 1, is characterized in that: the described fixed leg (2) be fixedly connected with base plate is for time circular, and its diameter is 0.1cm-3 cm.
6. the fixture system for chemical gaseous phase depositing process transfer graphene film according to claim 1, is characterized in that: described base plate (1), the fixed leg (2) be fixedly connected with base plate, pad (3), cover plate (4), fill liquid bucket (5) and all adopt acid-alkali-corrosive-resisting engineering plastics to make.
7. the fixture system for chemical gaseous phase depositing process transfer graphene film according to claim 1, is characterized in that: described pad (3) thickness is 1 cm-10cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420776166.8U CN204356398U (en) | 2014-12-11 | 2014-12-11 | A kind of fixture system for chemical gaseous phase depositing process transfer graphene film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420776166.8U CN204356398U (en) | 2014-12-11 | 2014-12-11 | A kind of fixture system for chemical gaseous phase depositing process transfer graphene film |
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| Publication Number | Publication Date |
|---|---|
| CN204356398U true CN204356398U (en) | 2015-05-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420776166.8U Withdrawn - After Issue CN204356398U (en) | 2014-12-11 | 2014-12-11 | A kind of fixture system for chemical gaseous phase depositing process transfer graphene film |
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| CN (1) | CN204356398U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104451595A (en) * | 2014-12-11 | 2015-03-25 | 重庆墨希科技有限公司 | Tooling system for transferring graphene membrane by chemical vapor deposition method |
-
2014
- 2014-12-11 CN CN201420776166.8U patent/CN204356398U/en not_active Withdrawn - After Issue
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104451595A (en) * | 2014-12-11 | 2015-03-25 | 重庆墨希科技有限公司 | Tooling system for transferring graphene membrane by chemical vapor deposition method |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20150527 Effective date of abandoning: 20170725 |
|
| AV01 | Patent right actively abandoned |
Granted publication date: 20150527 Effective date of abandoning: 20170725 |
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| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |