CN204361070U

CN204361070U - Roller bush and the substrate support for the treatment of chamber

Info

Publication number: CN204361070U
Application number: CN201420528314.4U
Authority: CN
Inventors: A·波利亚克
Original assignee: Applied Materials Inc
Current assignee: Applied Materials Inc
Priority date: 2014-09-15
Filing date: 2014-09-15
Publication date: 2015-05-27
Anticipated expiration: 2024-09-15

Abstract

Disclose roller bush and the substrate support for the treatment of chamber herein.Roller bush comprises shell and at least partially at least four raceways formed in described shell, and shell has endoporus that axle along the longitudinal formed by described shell and in order to hold lift pins.Described at least four raceways comprise and are arranged in raceway and moveable several bearing element.Each raceway comprises first passage and and the second channel of radial separations parallel with first passage.Second channel comprises longitudinal cut, thus allow several bearing element extend into endoporus at least partially.The first lid that roller bush more comprises the first end place being arranged at shell covers with second of the second end place being arranged at shell, each lid comprises the backflow groove be formed in lid, and backflow groove connection first passage and second channel are to promote that several bearing element moves between first passage and second channel.

Description

Roller bush and the substrate support for the treatment of chamber

Technical field

The utility model relates to substrate support in the processing chamber, and more particularly, substrate support has roller bush for guiding lift pins with positioning baseplate.

Background technology

For many years, electronic installation such as thin-film transistor (TFT), photovoltaic (PV) device or solar cell and other electronic installations is manufactured on thin-medium.Thin-medium is generally discrete brick (tile), wafer, thin slice or other substrates, and substrate has master and surface area is less than 1 square metre.But, continue at present to be devoted to manufacture electronic installation on the substrate of surface area much larger than 1 square metre, such as on 2 square metres or larger substrate, manufacture electronic installation, with produce the end product with large-size and (or) reduce the manufacturing cost of every device (such as, pixel, thin-film transistor, photovoltaic devices or solar cell etc.).

The scales increase of these substrates but brings the challenge in numerous process.Thin-medium is at room temperature highly flexible, and thin-medium becomes more flexible under the treatment temperature improved.The pliability of thin-medium can cause larger flexure along with the surface area increased, and (or) need the additional areas that must support in order to avoid excessive deflection.The possibility of particle contamination can be increased owing to increasing the extra strong point, only increase the extra strong point and nonideal selection.

In addition, sometimes need in processes to use lift pins to carry out dynamically positioning baseplate, lift pins is moveable relative to substrate.During this Kinematic Positioning, substrate unexpectedly may bend, arches or bend.This at random flexure may produce in lift pins twisting resistance and (or) side force.These power acted in lift pins may cause one or more lift pins bonding substrate, make substrate breakage, inefficacy, scratch or damage substrate, and these effects may produce particulate.Lift pins and (or) substrate infringement can cause system down time and (or) expend the cost of product, and reduce output and profit.Although known lining has removable lift pins carry out supporting substrate, lining is normally by with made by the unmatched material of the environment of deposition chamber.For example, the material making known lining possibly cannot resist temperature more than 1000 DEG C, and (or) material of making known lining may react with process chemicals.

Utility model content

The utility model has about can resist high temperature, do not react with process chemicals and can resist the substrate support of twisting resistance that substrate bends and act in lift pins and side force.

The utility model provides a kind of roller bush.Roller bush comprises shell, at least four raceways and the first lid and the second lid.Shell has the endoporus that axle is along the longitudinal formed by shell, in order to hold lift pins.These at least four raceways formed at least partly in the enclosure, and these at least four raceways comprise the several bearing elements be arranged at movably in these at least four raceways.The each of these at least four raceways all comprises first passage and second channel, second channel and radial separations parallel with first passage, and second channel comprises longitudinal cut, thus allow several bearing element extend into endoporus at least partially.First lid is arranged at the first end place of shell and the second lid is arranged at the second end place of shell, each lid all comprises the backflow groove be formed in lid, backflow groove connects first passage and second channel, to promote that several bearing element moves between first passage and second channel.

In one embodiment, first passage is arranged in the sagittal plane relative to longitudinal axis, and second channel is arranged in this sagittal plane at the inner side place of first passage.

Roller bush comprises several fixed component further, and these several fixed component each all have first end and the second end, and first end resides in the first lid via the first retainer ring, and the second end resides in the second lid via the second retainer ring.In one embodiment, the first lid is covered by encasement couples to the second via several fixed component.In one embodiment, shell comprises the several longitudinal flutings be formed in the outer surface of shell, and each of these several longitudinal flutings is all suitable for the one of the correspondence holding several fixed component.In one embodiment, each of at least four raceways all separated by the one of several longitudinal fluting.

In one embodiment, shell all has annular ridge in end opposite, and this annular ridge separates first passage and second channel.In one embodiment, each lid comprises circular passage, and this circular passage holds this annular ridge.

In one embodiment, select in the group that each of several bearing element is all made up of roller element, Needle bearing, spheroid or their combination.

In one embodiment, shell and several bearing element are made by ceramic material.

The utility model also provides a kind of substrate support for the treatment of chamber.Substrate support comprises main body and roller bush.Main body has the several openings between two major side edges being formed at this main body, and roller bush is arranged at least one of these several openings.Roller bush comprises cylindrical body, at least four raceways and the first lid and the second lid.Cylindrical body have shell and along the longitudinal axle by shell form to hold the endoporus of lift pins.These at least four raceways formed at least partly in the enclosure, and these at least four raceways comprise the several bearing elements be arranged at movably in these at least four raceways.The each of these at least four raceways all comprises first passage and second channel, second channel and radial separations parallel with first passage, and second channel comprises longitudinal cut, thus allow several bearing element extend into endoporus at least partially.First lid is arranged at the first end place of shell and the second lid is arranged at the second end place of shell, each lid all comprises the backflow groove be formed in lid, backflow groove connects first passage and second channel, to promote that several bearing element moves between first passage and second channel.

In one embodiment, substrate support comprises bottom further, and this bottom is coupled to main body and cylindrical body is fixed in this at least one of several opening.

Accompanying drawing explanation

Of the present utility model particularly description as above short summary can obtain with reference to embodiment herein, and make these features can understanding embodiment herein in this way in detail, some embodiment is illustrated in accompanying drawing herein.But, it should be noted that accompanying drawing only illustrates exemplary embodiments herein and therefore should not be considered as limiting category herein, because other equal effectively embodiments can be admitted herein.

Figure 1A is the cross sectional representation of an embodiment of the treatment system with substrate support.

Figure 1B is the cross sectional representation that in the treatment system of Figure 1A, substrate support is in delivering position.

Fig. 1 C is the zoomed-in view of the roller bush of Figure 1A and a part for substrate support.

Fig. 2 A is the end face schematic diagram of the roller bush of an embodiment according to this case.

Fig. 2 B is the lateral cross section schematic diagram that the roller bush of Fig. 2 A captures along line segment AA.

Fig. 2 C is the lateral cross section schematic diagram that the roller bush of Fig. 2 A captures along line segment BB.

Fig. 3 is the isogonism schematic diagram of the roller bush of Fig. 2 A to Fig. 2 C.

In order to promote understand, use as far as possible identical component symbol to censure graphic in share similar elements.Consider element disclosed in one embodiment herein do not having can be used in valuably in other embodiments under specific description.

Symbol description:

100 treatment systems

101 substrates

102 chamber body

104 substrate supports

105 radio-frequency power supplies

106 temperature control equipments

107 stayed surfaces

108 lids

The electrical return mechanism of 109A, 109B

110A, 110B, 110C, 110D lift pins

111 process spaces

112 processing regions

114 nozzle components

117 sidewalls

118 gas extraction system

Bottom 119

122 process sources of the gas

123 transmit mouth

125 roller bushes

128 openings

134 conduits

135 insulators

138 actuators

The blade of 150 robots

160 cylindrical body

165 endoporus

The outer surface of 168 lift pins

170 bearing elements

175A, 175B, 175C, 175D circuit orbit or raceway

178 longitudinal cuts

180

182 bars

184 bottoms

200 longitudinal axiss

205 shells

210A, 210B end cap

212A, 212B, 212B ', 212B ", 212B " ', 212B " " backflow groove

214 thrusts or ridge

215A, 215B, 215C, 215D fixed component

220

222 bars

225 U-shaped passages

230 retainer rings

235A first passage

235B second channel

240 sagittal planes

260 diameter interface

305 annular grooves

310 U-shaped groove or passages

320 circumferential grooves

400 annular projection thing or ridges

Embodiment

Embodiment is herein haply about the substrate support of guiding lift pins via rolling friction.In one embodiment, describe be used for supporting, transmit and (or) process the system of flexible medium.System comprises substrate support, and substrate support is specially adapted to Rectangular Enclosure with Participating Media, and Rectangular Enclosure with Participating Media has master and surface area can be greater than about 1 square metre, such as, be greater than about 2 square metres, or larger.In one embodiment, substrate support is in order to guide lift pins, and substrate support is in order to support flexible, Rectangular Enclosure with Participating Media or to impel transmission that is flexible, Rectangular Enclosure with Participating Media.Substrate support can be used in treatment chamber, and treatment chamber to be applicable on medium deposition materials to form electronic installation, such as thin-film transistor, Organic Light Emitting Diode, photovoltaic devices or solar cell.Flexible medium as herein described can be sheet metal, plastic slice, organic material thin slice, silicon sheet, glass flake, quartzy thin slice or polymer flake, and the thin slice of other materials be applicable to.

Figure 1A is the cross sectional representation of an embodiment for the treatment of system 100.In one embodiment, treatment system 100 is for the treatment of flexible medium, and such as large-area substrates 101, uses plasma to form structure and device on large-area substrates 101.The structure formed by treatment system 100 is applicable in the middle of the manufacture of the photovoltaic cell of liquid crystal display (LCD), flat-panel screens, Organic Light Emitting Diode (OLED) or solar battery array etc.Substrate 101 can be sheet metal, plastic slice, organic material thin slice, silicon sheet, glass flake, quartzy thin slice or polymer flake, and the thin slice of other materials be applicable to.The surface area of substrate 101 can be greater than about 1 square metre, such as, be greater than about 2 square metres.Structure on substrate 101 can comprise the one or more junctions of the part forming thin-film photovoltaic device or solar cell.In another embodiment, the structure on substrate 101 can be a part for the thin-film transistor forming liquid crystal display or thin-film transistor (TFT) types of devices.In addition, treatment system 100 is applicable to the substrate of other sizes of process and type, and can in order to manufacture other structures.

As shown in Figure 1A, treatment system 100 comprise haply chamber body 102 and lid 108 and define process space 111, chamber body 102 comprises sidewall 117 and bottom 119.Base for supporting or substrate support 104 to be arranged in process space 111 and to be positioned at the opposite side of nozzle component 114.Substrate support 104 for being supported on upper surface or the stayed surface 107 of substrate support 104 during processing by substrate 101.Substrate support 104 is also coupled to actuator 138, and actuator 138 is moving substrate strutting piece 104 at least in vertical direction, impel substrate 101 transmission and (or) adjustment substrate 101 and nozzle component 114 between distance.Several opening 128 is formed in substrate support 104.One or more lift pins 110A to 110D is arranged in Special supporting device separately movably, and Special supporting device is such as arranged at the roller bush 125 in opening 128.Lift pins 110A to 110D extends through substrate support 104 separately via other roller bush 125 individual.

In the embodiment shown in Figure 1A, the substrate support 104 illustrated is in the process position near nozzle component 114.Manage herein in position, lift pins 110A to 110D flushes with the stayed surface 107 of substrate support 104 or locates below a little at stayed surface 107, lies low on substrate support 104 to allow substrate 101.Via conduit 134 coupling processing source of the gas 122, with transmit process gas by nozzle component 114 and enter process space 111 in.Treatment system 100 also comprises gas extraction system 118, with apply negative pressure to process space 111 and (or) maintain process space 111 in negative pressure.Radio frequency (RF) power supply 105 is coupled to nozzle component 114, to promote the formation of plasma in processing region 112.Processing region 112 is defined between the stayed surface 107 of nozzle component 114 and substrate support 104 haply.Nozzle component 114 haply with substrate support 104 in parallel, to promote the generation of plasma between nozzle component 114 and substrate support 104.

Nozzle component 114, lid 108 and conduit 134 are formed by electric conducting material haply and are telecommunications each other.Chamber body 102 also formed by electric conducting material.Chamber body 102 electrically insulate with nozzle component 114 haply.In one embodiment, nozzle component 114 is installed in chamber body 102 via insulator 135.In one embodiment, substrate support 104 is also what conduct electricity, and substrate support 104 is applicable to as diverter pole, to facilitate the ground connection return path of radio-frequency (RF) energy.

Substrate support 104 and chamber body 102 sidewall 117 and (or) can be coupled between bottom 119 several electrical return mechanism 109A, 109B.Electrical return mechanism 109A, 109B each be flexible and (or) be spring-like device, and bending, flexure or be optionally biased, with contact substrate strutting piece 104, sidewall 117 and (or) bottom 119.In one embodiment, this several electrical return mechanism 109A, 109B's is thin flexible band at least partially, these flexible bands be coupling in substrate support 104 and sidewall 117 and (or) between bottom 119.In an example, by this several electrical return mechanism 109A, 109B at least partially, substrate support 104 can be coupled to ground connection.Or, or additionally, return path may return radio-frequency power supply 105 via the guiding at least partially of this several electrical return mechanism 109A, 109B.In this embodiment, return radio-frequency current by along sidewall 117 and (or) bottom 119 interior surface transmission and return radio-frequency power supply 105.

Via the process gas from process source of the gas 122, treatment system 100 can be used to various deposition of material on large-area substrates 101, these materials including but not limited to dielectric material (such as, SiO2, SiOxNy, their derivative or combination), semi-conducting material (such as, Si and alloy), barrier material (such as, SiNx, SiOxNy or their derivative).The particular instance forming or deposit dielectric material on large area substrates and semi-conducting material via treatment system 100 can comprise epitaxial silicon, polysilicon, amorphous silicon, microcrystal silicon, SiGe, germanium, silicon dioxide, silicon nitrogen oxide, silicon nitride, their alloy (such as, B, P or As), their derivative or their combination.Treatment system 100 also receives the gas of such as argon gas, hydrogen, nitrogen, helium or their combination, is used as Purge gas or carrier gas (such as, Ar, H2, N2, He, their derivative or their combination).Reach the example of silicon deposited film on large-area substrates 101 as precursor gases via silane in use hydrogen carrier gas via system 100.

Also be provided with temperature control equipment 106 in substrate support 104, in order to before treatment, during process or control the temperature of substrate 101 after process.In a kind of aspect, temperature control equipment 106 comprises heating element, in order to heated substrates 101 in advance before treatment.In this embodiment, substrate support 104 can be heated to the temperature between about 200 DEG C and 250 DEG C by temperature control equipment 106.During processing, during when the temperature arrival in processing region 112 or more than 400 DEG C, temperature control equipment 106 can comprise one or more cooling duct in order to cooling base 101.In another kind of aspect, temperature control equipment 106 can in order to cooling base 101 after the treatment.Therefore, temperature control equipment 106 can be cooling duct, resistive heating elements or their combination.

Figure 1B is the cross sectional representation that in the treatment system 100 of Figure 1A, substrate support 104 is in delivering position.In delivering position place, substrate 101 is positioned over stayed surface 107 separated place with substrate support 104.In the position that this separates, via robot device's movable substrate 101.In one embodiment, preferential with substrate edges and mode that substrate center is last by substrate 101 from stayed surface 107 elevate a turnable ladder.And that substrate center last method preferential with substrate edges makes the directed elevate a turnable ladder substrate 101 that arches and substrate 101 supported by lift pins 110A to 110D.During processing, electrostatic charge is accumulated between substrate 101 and stayed surface 107.After the treatment, this little electrostatic charge a part maintain and in order to substrate 101 is attached to stayed surface 107.Via make to interrupt residual static electricity attract and (or) power needed for redistribution residual static electricity power minimizes, preferential with substrate edges and substrate center is last method makes substrate 101 easily elevate a turnable ladder, result is to use less elevate a turnable ladder power.Similarly, the load mode for pending substrate is then preferential with substrate center and substrate edges is last method.Preferential with substrate center and substrate edges is last method allows substrate 101 to have better contact with between stayed surface 107.For example, when substrate 101 declines towards substrate support 104, any air existed between substrate 101 and stayed surface 107 can be fled from.

In order to impel substrate 101 to transmit with the orientation of arching, lift pins 110A to 110D is divided into several group, the lift pins in such as outside is used for peripheral support and the lift pins of inner side is used for central supported.Via actuator 138, each group of lift pins activated under the different time, and (or) above stayed surface 107, extend different length (or height), with the direction and location substrate 101 arched.In one embodiment, lift pins 110A, the 110D in outside are longer than lift pins 110B, the 110C of inner side.In this embodiment, when making substrate support 104 decline via actuator 138, lift pins 110A to 110D is in order to contact the bottom 119 of chamber body 102 and supporting substrate 101.The different length of lift pins 110A, 110D and lift pins 110B, 110C allows to lift (or falling) substrate 101 with the orientation of arching.The sidewall 117 of chamber body 102 is also formed and transmits mouth 123.At delivering position place, the stayed surface 107 of substrate support 104 aligns with transmission mouth 123 in fact, and allow the blade 150 of robot in X-direction and between lift pins 110A to 110D or around mobile, and to move between substrate 101 and stayed surface 107.In order to from then on substrate removes by position, blade 150 vertically upward (Z-direction) mobile with by substrate 101 from lift pins 110A to 110D elevate a turnable ladder.Then via blade 150 of retracting in contrary X-direction, the substrate supported by blade 150 can remove from chamber body 102.Similarly, in order to be positioned on lift pins 110A to 110D by pending substrate 101, blade 150 vertically downward (-Z-direction) is mobile to be positioned on the lift pins 110A to 110D of extension by substrate.

As on Figure 1A indicate, Fig. 1 C is the zoomed-in view of the roller bush 125 of Figure 1A and a part for substrate support 104.Roller bush 125 comprises cylindrical body 160, and cylindrical body 160 has the endoporus 165 formed by cylindrical body 160, in order to hold lift pins 110A.Cylindrical body 160 can from the lower surface pressing of substrate support 104 to enter opening 128 and (or) be coupled to substrate support 104 via bottom 184.Via screw thread or securing member, such as screw (not shown) or via pressing, bottom 184 can be coupled to substrate support 104.The size of endoporus 165 is larger a little than lift pins 110A, moves in endoporus 165 to allow lift pins 110A along the longitudinal axis of endoporus 165.Lift pins 110A comprises 180 and a bar 182.180 avoid lift pins 110A to move fully through endoporus 165, and allow when substrate support 104 is positioned at cocked position as shown in Figure 1A by this, lift pins 110A is unsettled.180 parts that can be the amplification of the bar 182 of lift pins 110A, or 180 can be element separately and are anchored on the bar 182 of lift pins 110A.In one embodiment, 180 of lift pins 110A has the first diameter and bar 182 has Second bobbin diameter, and Second bobbin diameter is less than the first diameter.In another embodiment, 180 can be bell or conical butt, and make 180 to comprise the first diameter, the first diameter equals in fact the diameter of the bar 182 of lift pins 110A, and converts the Second bobbin diameter being greater than the first diameter to.

Unsettled permission lift pins 110A during substrate support 104 is vertically mobile of lift pins 110A moves together with substrate support 104.The unsettled lower end end opposite of 180 (namely) freedom of lift pins 110A that also allows of lift pins 110A is unsettled, makes any side direction misalignment between the bottom 119 (see Figure 1A and Figure 1B) and the lower end of lift pins 110A of chamber body 102 that lift pins 110A can not be caused to bind or break.

Be formed with circuit orbit or raceway 175A, 175B in cylindrical body 160, one or more bearing element 170 to be arranged in raceway 175A, 175B and to contact the outer surface 168 of lift pins 110A.Each in raceway 175A, 175B comprises longitudinal cut 178, and longitudinal cut 178 allows a part for bearing element 170 to extend partially into endoporus 165 and contacts the outer surface 168 of lift pins 110A.In this embodiment, roller bush 125 comprises four raceways (only can see raceway 175A, 175B in fig. 1 c) be separated.In other embodiments, also more raceway can be utilized.Each bearing element 170 can be roller element, such as ball bearing or spherical surface body.Each bearing element 170 be by not with process gas or plasma reaction inert material made by, such as pottery or crystalline material, such as sapphire, ruby, quartz and their combination.

In operation, as shown in Figure 1A, when substrate support 104 is positioned at process position, 180 are set to locate below a little with the planes align of stayed surface 107 or in the plane of stayed surface 107.In this way, 180 are filled in any hole in stayed surface 107, and hole caused owing to cylindrical body 160 being positioned in the middle of substrate support 104.Cylindrical body 160 and lift pins 110A are heat conducting at least partly, in order to by heat energy transfer to substrate 101 and substrate support 104, and shift heat energy from substrate 101 and substrate support 104.Cylindrical body 160 and support 180 combination strengthen heating or cooling base 101, so make " cold spot " on substrate 101 to minimize or eliminate.The uniform temperature distribution of being reached by roller bush 125 impels on substrate 101 and can have uniform deposition.

When substrate support 104 moves to delivering position (declining with-Z-direction), cylindrical body 160 maintains lift pins 110A with the orientation of substantial orthogonality (Z-direction), until the bottom 119 (see Figure 1B) of the lower end in contact chamber body 102 of lift pins 110A.After the bottom of the lower end in contact chamber body 102 of lift pins 110A, lift pins 110A is static relative to substrate support 104, and substrate support 104 continues to move with-Z-direction.Because substrate support 104 moves relative to lift pins 110A, bearing element 170 moves in raceway 175A, 175B of cylindrical body 160 with recirculation mode.The movement of substrate support 104 causes 180 to extend the stayed surface 107 away from substrate support 104 with+Z-direction, thus lifts substrate 101 and separate with stayed surface 107.

In substrate support 104 with this-Z-direction move period, bearing element 170 relative to each other moves and allows cylindrical body 160 to move relative to lift pins 110A.In one embodiment, the bearing element 170 contacting lift pins 110A moves with the direction contrary with the moving direction of lift pins 110A.In another embodiment, when there is enough contacts between lift pins 110A and bearing element 170, moving with contrary direction in raceway 175A, 175B at least partially of bearing element 170.For example, when substrate support 104 moves with+Z direction, the bearing element 170 in raceway 175A is to move clockwise, and the bearing element 170 in raceway 175B moves with counterclockwise.Similarly, when substrate support 104 moves with-Z-direction (such as during transmitting pending substrate), contrary at the move mode of raceway 175A, 175B middle (center) bearing element 170.

Fig. 2 A is the end face schematic diagram of the roller bush 125 of an embodiment according to this case, Fig. 2 B is the lateral cross section schematic diagram that the roller bush 125 of Fig. 2 A captures along line segment AA, and Fig. 2 C is the lateral cross section schematic diagram that the roller bush 125 of Fig. 2 A captures along line segment BB.In this embodiment, as shown in Figure 2 A, roller bush 125 comprises four raceways 175A, 175B, 175C, 175D, raceway 175A, 175B, 175C, 175D from the longitudinal axis 200 of roller bush 125 with one heart and (or) radially arrange.As shown in Figure 2 B, raceway 175A to 175D each is all included in the longitudinal cut 178 in the inwall of cylindrical body 160, thus allows a part for bearing element 170 to extend into endoporus 165

As shown in Figure 2 A, raceway 175A to 175D each all comprises first passage 235A and second channel 235B.In raceway 175A to 175D each, first passage 235A and the separate configuration of second channel 235B, and can with the orientation stacked, concentric circles or footpath relation setting altogether in the shell 205 of cylindrical body 160 (see Fig. 1 C).For example, first passage 235A and second channel 235B relative to longitudinal axis 200 for be arranged on identical sagittal plane 240 but first passage 235A and second channel 235B has different radial distances from longitudinal axis 200.In one embodiment, the center of first passage 235A is arranged at the radial outside place of corresponding second channel 235B.

In one embodiment, raceway 175A to 175D each is all arranged on in the radial axle that equal intervals is located in fact.For example, with the interval of 90 degree, raceway 175A to 175D each is all arranged so that raceway is equal in fact separation.In another embodiment, U-shaped passage 225 (with reference to describing about Fig. 2 C) is formed between raceway 175A to 175D each.In one embodiment, each of U-shaped passage 225 is all biased about 45 degree from the sagittal plane of raceway 175A to 175D each.In an example, U-shaped passage 225 is with the positioned at intervals of 90 degree.In another example, U-shaped passage 225 from the radial axle of raceway 175A to 175D each with the positioned at intervals of 45 degree.Depend on the number of raceway, also contain other positions of raceway herein, such as unequal separation or interval, and the interval of 180 degree, the interval of 120 degree, the interval of 45 degree etc.

As visible in Fig. 2 A, the surface of bearing element protrudes into endoporus 165 and forms diameter interface 260, and diameter interface 260 is less times greater than the diameter of lift pins 110A (Fig. 2 A does not illustrate).This larger diameter interface 260 allow lift pins 110A to rotate relative to endoporus 165 with the relation be biased a little with longitudinal axis 200 and (or) mobile.In one embodiment, the diameter of lift pins 110A such as, between about 0.18 inch extremely about 0.30 inch, about 0.25 inch, and the diameter of diameter interface 260 such as, between about 0.20 inch extremely about 0.32 inch, about 0.255 inch.

As shown in Figure 2 B, cylindrical body 160 comprises central shell 205 and end cap 210A, 210B in the end opposite of shell 205.In one embodiment, end cap 210A, 210B each is all a part of raceway 175A.For example, end cap 210A, 210B comprise backflow groove 212A, 212B respectively, to provide the recirculation path of several bearing element 170.In one embodiment, raceway 175A to 175D each is all comprised and is longitudinally formed or formed two passages that separate parallel with endoporus 165 by cylindrical body 160, and raceway 175A to 175D each all comprises backflow groove 212A, 212B (with reference to raceway 175A), backflow groove 212A, 212B connect these two passages.Backflow groove 212A, 212B is U-shaped in fact groove and is formed in the surface of end cap 210A, 210B, enters and respective another passage of the raceway 175A to 175D that leads from the passage that raceway 175A to 175D is respective to allow bearing element 170.In one embodiment, the upper end of shell 205 and lower end comprise the thrust or ridge 214 that extend away from the two ends of shell 205, to form the inner surface of raceway 175A.

As shown in Figure 2 C, (in Fig. 2 C, 215A and 215C is illustrated via at least one fixed component 215A, 215B, 215C, 215D, 215B and 215D is then illustrated in Fig. 2 A), end cap 210A, 210B each secured to one another and (or) be fastened to shell 205.This at least one fixed component 215A can be securing member, such as, sell, bolt or screw, this securing member by secured to one another to end cap 210A, 210B and (or) be fastened to shell 205.In one embodiment, this at least one fixed component 215A can be pin and has 220 of amplification in each end of bar 222.In this embodiment, 220 grooves being arranged at the correspondence formed in end cap 210A, 210B each, make fixed component 215A that each end cap 210A, 210B are fixed to shell 205.

In this embodiment, the bar 222 of fixed component 215A has compared with 220 and less external dimensions, and bar 222 is arranged in the outer surface of shell 205 in the U-shaped passage 225 formed.Fixed component 215A is fixed in each end cap 210A, 210B by retainer ring 230 such as snap ring or split ring.The U-shaped passage 225 formed in the outer surface of shell 205 allows fixed component 215A easily to insert, and maybe when removing retainer ring 230, fixed component 215A removes from shell 205.Retainer ring 230 by resisting process chemicals with made by hot material, can be able to keep as spring-like character simultaneously.The material of retainer ring can be thermal endurance plastic cement or metal material, such as aluminium, stainless steel, and other metals or its alloy.In an example, retainer ring 230 is made by aluminium, pottery or ceramic fibre.

The material being used for making roller bush 125 can resist process chemicals and high temperature haply.Example comprises metal material, such as aluminium, anodised or non-anodised, stainless steel, or their alloy.In one embodiment, roller bush 125 comprises dielectric or inert material, such as pottery.In one embodiment, shell 205, end cap 210A, 210B, bearing element 170 and fixed component 215A to 215D be by can resist process chemicals with exceed about 400 DEG C to about 1000 DEG C temperature ceramic material made by.

The structure of roller bush 125 has equal in fact surrounding or external dimensions, thus impels the opening 128 (see Fig. 1 C) with press-fit or the insertion substrate support 104 that closely cooperates.Shell 205, end cap 210A, 210B and being designed and sized to of retainer ring 230 form smooth circumferential outer surface, to make easily to install or remove, and (or) particle generation during installing or removing is minimized.In one embodiment, the outer dia of shell 205, end cap 210A, 210B and retainer ring 230 is equal in fact.

Fig. 3 is the isogonism schematic diagram of the roller bush 125 of Fig. 2 A to Fig. 2 C.End cap 210A and end cap 210B has structure similar in fact, explains in Fig. 3 with end cap 210B.As shown in Figure 3, end cap 210B comprises several backflow groove 212B ', 212B ", 212B " ' and 212B " ", backflow groove 212B ', 212B ", 212B " ' and 212B " " be configured to aim at the raceway 175A to 175D (see Fig. 2 A and Fig. 2 B) in shell 205 respectively.Fig. 3 also illustrates annular groove 305, and annular groove 305 is arranged in the radial position identical with ridge 214 (see Fig. 2 B).Fig. 3 also illustrates several U-shaped groove or passage 310, and U-shaped groove or passage 310 hold 220 of fixed component 215A and a part for bar 222 and other fixed components.Each passage 310 comprises keyway (not shown), and being designed and sized to of keyway holds 220 of fixed component 215A.In addition, circumferential groove 320 is formed at around end cap 210A and end cap 210B respectively, in order to hold retainer ring 230.

Also illustrate annular projection thing or ridge 400 in Fig. 3, annular projection thing or ridge 400 are arranged between first passage 235A each and second channel 235B each (see Fig. 2 A).In one embodiment, annular ridge 400 is the extension of ridge 214 as shown in Figure 2 B, and annular ridge 400 is also present in the lower surface of shell 205 but cannot sees in Yu Bentu.As ridge 214, annular ridge 400 provides interior surface to comprise the bearing element 170 in recirculation path.In this embodiment, the passage 305 formed in end cap 210A, 210B holds annular ridge 400 (only can see the passage 305 of end cap 210B in detail in this figure).When assembling roller bush 125, annular ridge is also as index feature.

The assemble method of roller bush 125 is below described.By the lower end in contact of end cap 210B and shell 205, and backflow groove 212B ', the 212B in end cap 210B ", 212B " ' and 212B " " aim at raceway 175A to 175D respectively.Now, end cap 210B and shell 205 not fastening, but to keep together via the hand of gravity, operator, folder or other fixtures.In this embodiment, bearing element 170 is ball bearing, and sends into the one or both in first and second passage 235A, 235B.In one embodiment, the number sending into the bearing element 170 of passage 235A, 235B should fill each raceway 175A to 175D, makes capacity between half-full to full up or close between full up.In an example, each raceway 175A to 175D is filled to the capacity of about 3/4ths.In a kind of aspect, the number of bearing element 170 should be equal all in fact in each raceway 175A to 175D.

Moreover by the upper-end contact of end cap 210A and shell 205, and the backflow groove in end cap 210A is aimed at raceway 175A to 175D respectively.When fixed component 215A to 215D inserts U-shaped passage 225,310 from the side of shell 205, end cap 210A, 210B and shell 205 can keep together.After fixed component 215A to 215D inserts U-shaped passage 225,310, retainer ring 230 can insert circumferential groove 320, is fastened and fixed component 215A to 215D thus, end cap 210A, 210B and shell 205 is fixed together.The roller bush 125 assembled can insert the opening 128 (see Fig. 1 C) formed in substrate support 104, and lift pins 110A can insert endoporus 165.If necessary, during by roller bush 125 insertion opening 128, retainer ring 230 can be removed from circumferential groove 320

For embodiment of the present utility model although aforementioned, when not departing from basic categories of the present utility model, can design other and further embodiment of the present utility model.

Claims

1. a roller bush, is characterized in that, comprising:

One shell, described shell has the endoporus formed by described shell along a longitudinal axis, in order to hold a lift pins;

At least four raceways, described at least four raceways formed at least partially in described shell, described at least four raceways comprise be arranged at movably described in several bearing elements at least four raceways, each of described at least four raceways all comprises:

One first passage; And

One second channel, described second channel and radial separations parallel with described first passage, described second channel comprises a longitudinal cut, thus allow described several bearing element extend into described endoporus at least partially; And

One first lid and one second lid, described first lid is arranged at a first end place of described shell and described second lid is arranged at one second end place of described shell, each lid all comprises the backflow groove be formed in described lid, described backflow groove connects described first passage and described second channel, to promote that described several bearing element moves between described first passage and described second channel.

2. roller bush as claimed in claim 1, it is characterized in that, described first passage is arranged in the sagittal plane relative to described longitudinal axis, and described second channel is arranged in described sagittal plane at the inner side place of described first passage.

3. roller bush as claimed in claim 1, is characterized in that, comprise further:

Several fixed component, described several fixed component each all has a first end and one second end, and described first end resides in via one first retainer ring in described first lid, and described second end resides in via one second retainer ring in described second lid.

4. roller bush as claimed in claim 3, is characterized in that, described first lid is covered to described second by described encasement couples via described several fixed component.

5. roller bush as claimed in claim 3, it is characterized in that, described shell comprises the several longitudinal flutings be formed in an outer surface of described shell, and each of described several longitudinal fluting is all suitable for the one of the correspondence holding described several fixed component.

6. roller bush as claimed in claim 5, it is characterized in that, each of described at least four raceways all separated by the one of described several longitudinal fluting.

7. roller bush as claimed in claim 1, it is characterized in that, described shell all has an annular ridge in the end opposite of described shell, and described annular ridge separates described first passage and described second channel.

8. roller bush as claimed in claim 7, is characterized in that, each lid comprises a circular passage, and described circular passage holds described annular ridge.

9. roller bush as claimed in claim 1, is characterized in that, selects in the group that each of described several bearing element is all made up of roller element, Needle bearing, spheroid or above-mentioned combination.

10. roller bush as claimed in claim 1, it is characterized in that, described shell and described several bearing element are made by a ceramic material.

11. 1 kinds, for the substrate support of a treatment chamber, is characterized in that, described substrate support comprises:

One main body, described main body has the several openings between two major side edges being formed at described main body; And

One roller bush, described roller bush is arranged at least one of described several opening, and described roller bush comprises:

One cylindrical body, described cylindrical body have a shell and along a longitudinal axis by described shell form to hold an endoporus of a lift pins;

One first passage; And

12. substrate supports as claimed in claim 11, is characterized in that, comprise further:

One bottom, described bottom is coupled to described main body and described cylindrical body is fixed in the described at least one of described several opening.

13. substrate supports as claimed in claim 11, it is characterized in that, described first passage is arranged in the sagittal plane relative to described longitudinal axis, and described second channel is arranged in described sagittal plane at the inner side place of described first passage.

14. substrate supports as claimed in claim 11, it is characterized in that, described roller bush comprises several fixed component, described several fixed component each all has a first end and one second end, described first end resides in via one first retainer ring in described first lid, and described second end resides in via one second retainer ring in described second lid.

15. substrate supports as claimed in claim 14, is characterized in that, described first lid is covered to described second by described encasement couples via described several fixed component.

16. substrate supports as claimed in claim 14, it is characterized in that, described shell comprises the several longitudinal flutings be formed in an outer surface of described shell, and each of described several longitudinal fluting is all suitable for the one of the correspondence holding described several fixed component.

17. substrate supports as claimed in claim 16, is characterized in that, each of described at least four raceways all separated by the one of described several longitudinal fluting.

18. substrate supports as claimed in claim 11, it is characterized in that, described shell all has an annular ridge in the end opposite of described shell, and described annular ridge separates described first passage and described second channel.

19. substrate supports as claimed in claim 18, is characterized in that, each lid comprises a circular passage, and described circular passage holds described annular ridge.

20. substrate supports as claimed in claim 11, is characterized in that, select in the group that each of described several bearing element is all made up of roller element, Needle bearing, spheroid or above-mentioned combination.

21. substrate supports as claimed in claim 11, is characterized in that, described shell and described several bearing element are made by a ceramic material.