CN204321414U - Two galvanometer multiple plate switched laser etching machine - Google Patents
Two galvanometer multiple plate switched laser etching machine Download PDFInfo
- Publication number
- CN204321414U CN204321414U CN201420817079.2U CN201420817079U CN204321414U CN 204321414 U CN204321414 U CN 204321414U CN 201420817079 U CN201420817079 U CN 201420817079U CN 204321414 U CN204321414 U CN 204321414U
- Authority
- CN
- China
- Prior art keywords
- laser
- lenses
- vibration lens
- dimensional vibration
- laser generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The utility model provides a kind of two galvanometer multiple plate switched laser etching machine, comprises frame, control system, computer system, laser generator, absorption platform, two-dimensional vibration lens, two linear motion platforms intersected, lifting platform and F-θ set of lenses; Control system, department of computer science laser generator of unifying is arranged in frame, the laser head of lifting platform, laser generator, two-dimensional vibration lens and F-θ set of lenses are arranged on above absorption platform, F-θ set of lenses is arranged on two-dimensional vibration lens bottom, laser generator, two-dimensional vibration lens and F-θ set of lenses respectively have two pieces, install side by side after the combination of the laser head of two pieces laser generator, two-dimensional vibration lens and F-θ set of lenses, it is characterized in that: below the laser head of a laser generator, two-dimensional vibration lens and F-θ set of lenses, line slideway is installed.This utility model patent can realize the production requirement of a laser ablation equipment to the product of different live width and breadth, and apparatus adaptability is good, and utilization rate is high, and production cost is low.
Description
Technical field
The utility model relates to laser etching techniques field, particularly relates to two galvanometer multiple plate switched laser etching machine.
Background technology
For etching motion driving mechanism many employings two-dimensional vibration lens and the combination of F-θ set of lenses of the silver slurry laser ablation equipment of display touch-screen ito thin film, substrate of glass or PET base, this laser ablation equipment etching speed is fast, efficiency is high, but, because etching product has certain requirement to live width, the etching breadth of two-dimensional vibration lens and the combination of F-θ set of lenses is restricted.Generally, the breadth that F-θ set of lenses etches is large, and the live width of its etching is just wide, and meanwhile, the focal length of F-θ set of lenses is just large.If strengthen etching breadth, the live width of its etching also can broaden, and often can not meet the requirement of client to live width.So the etching breadth of the laser ablation equipment of existing employing two-dimensional vibration lens and the combination of F-θ set of lenses is all smaller.Process one block of large material will carry out and repeatedly splice etching, production efficiency is low; Meanwhile, the splicing of multiple etching often makes the yields of product reduce.
The patent No. is many galvanometers head etching laser machining of CN201220003814, comprise frame, control system, computer system, laser generator, absorption platform, two-dimensional vibration lens, two linear motion platforms and F-θ set of lenses intersected, control system, department of computer science's laser generator of unifying all is arranged in frame, the laser head of laser generator, two-dimensional vibration lens and F-θ set of lenses are arranged on above absorption platform, the Laser output hole of the laser head of laser generator is concentric with the laser light well of two-dimensional vibration lens, F-θ set of lenses is arranged on two-dimensional vibration lens bottom, two linear motion platform directions of motion of intersecting are mutually vertical, laser generator, two-dimensional vibration lens and F-θ set of lenses respectively have more than one piece, the laser head of more than one piece laser generator, install side by side after two-dimensional vibration lens and the combination of F-θ set of lenses.This many galvanometers head etching laser machining, process velocity is fast, and production efficiency is high.
Although the patent No. is that many galvanometers head etching laser machining process velocity of CN201220003814 is fast, production efficiency is high, but, in actual production process, the product etching live width of manufacturer often has multiple requirement, in the product requiring live width narrow, use the two-dimensional vibration lens compared with small breadth and the combination of F-θ set of lenses; Require in the product that live width is wider, use the two-dimensional vibration lens compared with large format and the combination of F-θ set of lenses, meet the requirement of different live width with peak efficiency.The patent No. is the laser head of the more than one piece laser generator of many galvanometers head etching laser machining of CN201220003814, install side by side after two-dimensional vibration lens and the combination of F-θ set of lenses, and distance therebetween can not regulate after installing, the two-dimensional vibration lens of different breadth and the combination of F-θ set of lenses cannot be changed, the production requirement of an equipment to the product of different live width and breadth can not be realized.
Summary of the invention
The purpose of this utility model is to provide a kind of two galvanometer multiple plate switched laser etching machine, this pair of galvanometer multiple plate switched laser etching machine, can realize the production requirement of an equipment to the product of different live width and breadth, apparatus adaptability is good, utilization rate is high, and production cost is low.
In order to achieve the above object, of the present utility model pair of galvanometer multiple plate switched laser etching machine, comprises frame, control system, computer system, laser generator, absorption platform, two-dimensional vibration lens, two linear motion platforms intersected, lifting platform and F-θ set of lenses, control system, department of computer science's laser generator of unifying all is arranged in frame, lifting platform, the laser head of laser generator, two-dimensional vibration lens and F-θ set of lenses are arranged on above absorption platform, and the Laser output hole of the laser head of laser generator is concentric with the laser light well of two-dimensional vibration lens, and F-θ set of lenses is arranged on two-dimensional vibration lens bottom, the laser head of laser generator, two-dimensional vibration lens and F-θ set of lenses are arranged on lifting platform, and two linear motion platform directions of motion of intersecting are mutually vertical, laser generator, two-dimensional vibration lens and F-θ set of lenses respectively have two pieces, the laser head of two pieces laser generator, install side by side after two-dimensional vibration lens and the combination of F-θ set of lenses, it is characterized in that: at the laser head of a laser generator, below two-dimensional vibration lens and F-θ set of lenses, line slideway is installed.
Because the two galvanometer multiple plate switched laser etching machine of the utility model, at the laser head of a laser generator, below two-dimensional vibration lens and F-θ set of lenses, line slideway is installed, the laser head of this part laser generator, two-dimensional vibration lens and F-θ set of lenses just can linearly move by guide rail, make the laser head of two pieces laser generator, distance between two-dimensional vibration lens and F-θ set of lenses changes and adapts to different breadth F-θ set of lenses, the distance between F-θ set of lenses and absorption platform is regulated again by lifting platform, make the laser after focusing can carry out lithography to the workpiece on absorption platform.So just can realize the production requirement of an equipment to different live width and web product, apparatus adaptability is good, and utilization rate is high, and production cost is low.
Described two galvanometer multiple plate switched laser etching machines, is characterized in that: linearly guide rail direction mounting limit device.When the effect of stopping means is used to change F-θ set of lenses at every turn, when regulating the laser head of two pieces laser generator, distance between two-dimensional vibration lens and F-θ set of lenses, location is convenient.
In production process, if the product of different live width or breadth will be etched, only need to change F-θ set of lenses, then regulate the height of lifting platform, make the laser after focusing can carry out lithography to the workpiece on absorption platform; Regulate simultaneously and be arranged on the laser head of the laser generator of line slideway, the distance between two-dimensional vibration lens and F-θ set of lenses, the border that two groups of F-θ set of lenses are etched can be docked.
Described frame is hardware or marble component, is support and the attaching parts of whole pair of galvanometer multiple plate switched laser etching machine, and control system, department of computer science laser generator of unifying all is arranged in frame.
Described control system comprises electrical system and operation control software thereof.
Described computer system comprises main frame, display, keyboard and mouse, and the mainboard of wherein main frame is provided with motion control card.Computer system controls two galvanometer multiple plate switched laser etching machine work together with control system, and the effect of display is the interface for showing operation control software.
Described linear motion platform is the moving component that servomotor or linear electric motors drive.
The optical maser wavelength that described laser generator sends is 266nm, 1064nm, 532nm or 355nm.
Have two high-speed servo vibrating motors in described two-dimensional vibration lens, the axle of each high-speed servo vibrating motor is provided with laser reflection eyeglass, two high-speed servo vibrating motors intersect to be installed.
Described F-θ set of lenses is one group of lens set, and its effect is by the different angles laser beam focusing through two-dimensional vibration lens in a plane, so the workpiece that can be opposite on absorption platform carries out lithography.
The inside of described absorption platform is cavity, and table arranges aperture that is multiple and cavity connects above, and the side of absorption platform or bottom have the through hole be connected with cavity, wherein, have at least a through hole to be connected with vacuum plant or extractor fan; Vacuum plant or extractor fan work make absorption of workpieces in absorption platform, make workpiece lie on absorption platform, ensure etching quality.
Described lifting platform is erect the motion platform installed, the laser head of a laser generator, two-dimensional vibration lens and F-θ set of lenses are arranged on lifting platform, laser head, the two-dimensional vibration lens of another part laser generator and be provided with line slideway between F-θ set of lenses and lifting platform.
Of the present utility model pair of galvanometer multiple plate switched laser etching machine, can realize the production requirement of an equipment to the product of different live width and breadth, apparatus adaptability is good, and utilization rate of equipment and installations is high, and production cost is low.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model embodiment.
Detailed description of the invention
The explanation of Fig. 1 mark: frame 1, support column 2, X-axis linear motion platform 3, stopping means 4, the laser head 5 of laser generator, lifting platform 6, two-dimensional vibration lens 7, line slideway 8, F-θ set of lenses 9, absorption platform 10, Y-axis linear motion platform 11, computer system 12.
See Fig. 1, the embodiment of the two galvanometer multiple plate switched laser etching machine of the utility model comprises frame 1, control system, computer system 12, laser generator, absorption platform 10, two-dimensional vibration lens 7, two linear motion platforms intersected, lifting platform 6 and F-θ set of lenses 9, control system, computer system 12 and laser generator are all arranged in frame 1, lifting platform 6, the laser head 5 of laser generator, two-dimensional vibration lens 7 and F-θ set of lenses 9 are arranged on above absorption platform 10, and the Laser output hole of the laser head 5 of laser generator is concentric with the laser light well of two-dimensional vibration lens 7, and F-θ set of lenses 9 is arranged on two-dimensional vibration lens 7 bottom, the laser head 5 of laser generator, two-dimensional vibration lens 7 and F-θ set of lenses 9 are arranged on lifting platform 6, two linear motion platform directions of motion of intersecting are mutually vertical, two linear motion platforms intersected are made up of X-axis linear motion platform 3 and Y-axis linear motion platform 11, and centre is supported by support column 2, laser generator, two-dimensional vibration lens 7 and F-θ set of lenses 9 respectively have two pieces, the laser head 5 of two pieces laser generator, install side by side, at the laser head 5 of a laser generator after two-dimensional vibration lens 7 and the combination of F-θ set of lenses 9, line slideway 8 is arranged on below two-dimensional vibration lens 7 and F-θ set of lenses 9.
Because the two galvanometer multiple plate switched laser etching machine of the utility model, at the laser head 5 of a laser generator, line slideway 8 is arranged on below two-dimensional vibration lens 7 and F-θ set of lenses 9, the laser head 5 of this part laser generator, two-dimensional vibration lens 7 and F-θ set of lenses 9 just can move at linearly guide rail 8, make the laser head 5 of two pieces laser generator, distance between two-dimensional vibration lens 7 and F-θ set of lenses 9 changes and adapts to different breadth F-θ set of lenses 9, the distance between F-θ set of lenses 9 and absorption platform 10 is regulated again by lifting platform 6, make the laser after focusing can carry out lithography to the workpiece on absorption platform 10.So just can realize the production requirement of an equipment to the product of different live width and breadth, apparatus adaptability is good, and utilization rate of equipment and installations is high, and production cost is low.
Linearly guide rail 8 direction is provided with stopping means 4.When the effect of stopping means 4 is used to change F-θ set of lenses 9 at every turn, when regulating the laser head 5 of two pieces laser generator, distance between two-dimensional vibration lens 7 and F-θ set of lenses 9, location is convenient.
In production process, if the product of different live width or breadth will be etched, only need to change F-θ set of lenses 9, then regulate the height of lifting platform 6, make the laser after focusing can carry out lithography to the workpiece on absorption platform 10; Regulate simultaneously and be arranged on the laser head 5 of the laser generator of line slideway 8, the distance between two-dimensional vibration lens 7 and F-θ set of lenses 9, the border that two groups of F-θ set of lenses 9 are etched can be docked.
In embodiment, frame 1 is hardware, and be support and the attaching parts of whole pair of galvanometer multiple plate switched laser etching machine, control system, computer system 12 and laser generator are all arranged in frame 1.
Control system comprises electrical system and operation control software thereof.Computer system 12 comprises main frame, display, keyboard and mouse, and the mainboard of wherein main frame is provided with motion control card.Computer system 12 controls two galvanometer multiple plate switched laser etching machine work together with control system, and the effect of display is the interface for showing operation control software.
Linear motion platform is the moving component that linear electric motors drive.Linear motion platform comprises X-axis linear motion platform 3 and Y-axis linear motion platform 11, and centre is supported by support column 2.
Optical fiber laser adopted by laser generator, and the optical maser wavelength sent is 1064nm.
Have two high-speed servo vibrating motors in two-dimensional vibration lens 7, the axle of each high-speed servo vibrating motor is provided with laser reflection eyeglass, two high-speed servo vibrating motors intersect to be installed.F-θ set of lenses 9 is one group of lens set, and its effect is by the different angles laser beam focusing through two-dimensional vibration lens 7 in a plane, so the workpiece that can be opposite on absorption platform 10 carries out lithography.
The inside of absorption platform 10 is cavity, and table arranges aperture that is multiple and cavity connects above, and the side of absorption platform 10 or bottom have the through hole be connected with cavity, wherein, have at least a through hole to be connected with vacuum plant or extractor fan; Vacuum plant or extractor fan work make absorption of workpieces in absorption platform 10, make workpiece lie on absorption platform 10, ensure etching quality.
Lifting platform 6 is erect the motion platform installed, the laser head 5 of a laser generator, two-dimensional vibration lens 7 and F-θ set of lenses 9 are arranged on lifting platform 6, laser head 5, the two-dimensional vibration lens 7 of another part laser generator and be provided with line slideway 8 between F-θ set of lenses 9 and lifting platform 6.
Of the present utility model pair of galvanometer multiple plate switched laser etching machine, can realize the production requirement of an equipment to the product of different live width and breadth, apparatus adaptability is good, and utilization rate of equipment and installations is high, and production cost is low.Promoting the use of it, to the utilization rate improving etching laser machining, reducing production cost has positive meaning.
Claims (2)
1. pair galvanometer multiple plate switched laser etching machine, comprises frame, control system, computer system, laser generator, absorption platform, two-dimensional vibration lens, two linear motion platforms intersected, lifting platform and F-θ set of lenses, control system, department of computer science's laser generator of unifying is arranged in frame, lifting platform, the laser head of laser generator, two-dimensional vibration lens and F-θ set of lenses are arranged on above absorption platform, the Laser output hole of the laser head of laser generator is concentric with the laser light well of two-dimensional vibration lens, F-θ set of lenses is arranged on two-dimensional vibration lens bottom, the laser head of laser generator, two-dimensional vibration lens and F-θ set of lenses are arranged on lifting platform, two linear motion platform directions of motion of intersecting are mutually vertical, laser generator, two-dimensional vibration lens and F-θ set of lenses respectively have two pieces, the laser head of two pieces laser generator, install side by side after two-dimensional vibration lens and the combination of F-θ set of lenses, it is characterized in that: at the laser head of a laser generator, below two-dimensional vibration lens and F-θ set of lenses, line slideway is installed.
2. according to claim 1 pair of galvanometer multiple plate switched laser etching machine, is characterized in that: linearly guide rail direction is provided with stopping means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420817079.2U CN204321414U (en) | 2014-12-22 | 2014-12-22 | Two galvanometer multiple plate switched laser etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420817079.2U CN204321414U (en) | 2014-12-22 | 2014-12-22 | Two galvanometer multiple plate switched laser etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204321414U true CN204321414U (en) | 2015-05-13 |
Family
ID=53157817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420817079.2U Expired - Fee Related CN204321414U (en) | 2014-12-22 | 2014-12-22 | Two galvanometer multiple plate switched laser etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204321414U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110508938A (en) * | 2019-08-13 | 2019-11-29 | 江苏屹诚激光装备制造有限公司 | A kind of high-precision laser cutter device |
-
2014
- 2014-12-22 CN CN201420817079.2U patent/CN204321414U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110508938A (en) * | 2019-08-13 | 2019-11-29 | 江苏屹诚激光装备制造有限公司 | A kind of high-precision laser cutter device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN201760706U (en) | Touch screen ito film laser etching device | |
| CN201931205U (en) | Double-station laser etching machine for touch screen ITO (indium tin oxide) thin films | |
| CN203171139U (en) | Laser equipment for stereoscopic direct forming | |
| CN104071974B (en) | A kind of laser equipment for glass cutting and cutting method | |
| CN201737838U (en) | Ultraviolet laser cutting device | |
| CN106735878A (en) | The laser process equipment and its method of cell phone rear cover and frame | |
| CN102581492A (en) | Laser etcher capable of automatically feeding roll materials | |
| CN205342235U (en) | Laser cutting machine with interactive workstation | |
| CN202896121U (en) | Large-format laser engraving machine | |
| CN102626834B (en) | Dual-pickup-head laser fast cutting device used for different formats and application method | |
| CN204135558U (en) | Double-workbench vision location radium carving machine | |
| CN103331522B (en) | A kind of light guide plate pattern process equipment | |
| CN105195901A (en) | Method and device for engraving three-dimensional image on glass with regular cambered surface | |
| CN104924825A (en) | Method and device for engraving three-dimensional patterns in glass | |
| CN206425685U (en) | The laser process equipment of cell phone rear cover and frame | |
| CN203960048U (en) | A kind of laser equipment for glass cutting | |
| CN204321414U (en) | Two galvanometer multiple plate switched laser etching machine | |
| CN102632336B (en) | Switching macro micro laser high-speed cutting machine tool | |
| CN103394808A (en) | Multi-station laser engraving machine | |
| CN203752530U (en) | Striking lifting mechanism for spacecraft lunar-module adapter (SLA) principle-based third-dimensional (3D) printer | |
| CN206047359U (en) | Dynamic focusing vibration mirror splices etching laser machining | |
| CN201257662Y (en) | Touch screen mobile phone film laser linotype machine | |
| CN204353073U (en) | Camera module fixed mount intelligence point gum machine | |
| KR20140121927A (en) | Appraratus for manufacturing pattern on a light guide plate | |
| CN203282275U (en) | Laser locating device for machining |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150513 Termination date: 20191222 |