CN201760706U - Touch screen ito film laser etching device - Google Patents
Touch screen ito film laser etching device Download PDFInfo
- Publication number
- CN201760706U CN201760706U CN201020302494.6U CN201020302494U CN201760706U CN 201760706 U CN201760706 U CN 201760706U CN 201020302494 U CN201020302494 U CN 201020302494U CN 201760706 U CN201760706 U CN 201760706U
- Authority
- CN
- China
- Prior art keywords
- frame
- thin film
- kinematic pair
- laser
- touch screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010329 laser etching Methods 0.000 title abstract description 30
- 239000010409 thin film Substances 0.000 claims abstract description 34
- 230000007246 mechanism Effects 0.000 claims abstract description 29
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 17
- 230000003028 elevating effect Effects 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000000608 laser ablation Methods 0.000 claims 5
- 238000010521 absorption reaction Methods 0.000 claims 3
- 241000931526 Acer campestre Species 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 43
- 238000001179 sorption measurement Methods 0.000 abstract description 39
- 238000005530 etching Methods 0.000 abstract description 17
- 230000001965 increasing effect Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Laser Beam Processing (AREA)
Abstract
本实用新型提供一种触摸屏ITO薄膜激光刻蚀设备,包括机架、控制系统、显示系统、激光发生器、升降机构和吸附平台,控制系统、显示系统、升降机构和吸附平台都安装在机架上,激光发生器安装在升降机构上,其特征在于:还包括二维振镜头和F-θ透镜组,二维振镜头安装在升降机构的升降架上,F-θ透镜组安装在二维振镜头下部。升降机构包括电动机、蜗轮蜗杆减速机、丝杆运动副、直线导轨运动副和升降架。本实用新型的触摸屏ITO薄膜激光刻蚀设备,对触摸屏ITO薄膜刻蚀速度快,效率高,所刻线宽均匀。
The utility model provides a touch screen ITO film laser etching equipment, including a frame, a control system, a display system, a laser generator, a lifting mechanism and an adsorption platform, and the control system, the display system, the lifting mechanism and the adsorption platform are all installed on the frame Above, the laser generator is installed on the lifting mechanism, which is characterized in that it also includes a two-dimensional vibrating lens and an F-θ lens group. The two-dimensional vibrating lens is installed on the lifting frame of the lifting mechanism, and the F-θ lens group is installed on the The lower part of the oscillating head. The lifting mechanism includes a motor, a worm gear reducer, a screw motion pair, a linear guide rail motion pair and a lifting frame. The touch screen ITO thin film laser etching equipment of the utility model has fast etching speed, high efficiency and uniform engraved line width for the touch screen ITO thin film.
Description
技术领域technical field
本实用新型涉及激光加工领域,特别是涉及一种触摸屏ITO薄膜激光刻蚀设备。 The utility model relates to the field of laser processing, in particular to a touch screen ITO film laser etching equipment. the
背景技术Background technique
ITO薄膜即氧化铟锡(Indium-Tin Oxide)透明导电膜玻璃,广泛用于液晶触摸屏、显示器(LCD)、太阳能电池、微电子ITO导电膜玻璃、光电子和各种光学领域。 ITO film is Indium-Tin Oxide (Indium-Tin Oxide) transparent conductive film glass, which is widely used in liquid crystal touch screens, displays (LCD), solar cells, microelectronics ITO conductive film glass, optoelectronics and various optical fields. the
触摸屏在各行各业的应用越来越广泛,传统的触摸屏ITO薄膜主要采用化学蚀刻的方法生产。但随着苹果iphone中电容式多点触控技术的出现和Window7等操作系统对多点触控的支持,已经引发触摸屏的革命性变革,传统的化学蚀刻方法在加工精度(包括线性精度和线宽精度)和加工的效率以及良品率都无法满足要求。 Touch screens are more and more widely used in various industries. Traditional touch screen ITO films are mainly produced by chemical etching. However, with the emergence of capacitive multi-touch technology in Apple's iphone and the support of multi-touch operating systems such as Windows 7, it has triggered a revolutionary change in touch screens. Wide precision) and processing efficiency and yield cannot meet the requirements. the
激光具有高相干性、高方向性和高强度的特点,容易获得很高的光通量密度,将强的激光束聚焦到介质上,利用激光束与物质相互作用的过程来改变物质的性质,这就是激光加工。激光加工技术随着光学、机电、材料、计算机和控制技术的发展已经逐步发展成为一项新的加工技术。激光加工具有加工对象广、变形小、精度高、节省能源、公害小、远距离加工和自动化加工等显著优点,对提高产品质量和劳动生产率、实现加工过程自动化、减少或消除污染、减少材料消耗等的作用愈来愈重要。 The laser has the characteristics of high coherence, high directionality and high intensity, and it is easy to obtain a high luminous flux density, focus the strong laser beam on the medium, and use the process of interaction between the laser beam and the substance to change the nature of the substance, which is laser processing. With the development of optics, electromechanical, material, computer and control technology, laser processing technology has gradually developed into a new processing technology. Laser processing has significant advantages such as wide processing objects, small deformation, high precision, energy saving, small pollution, long-distance processing and automatic processing. etc. are becoming more and more important. the
专利号为CN200720171149.1的一种ITO薄膜激光蚀刻机,包括机架、工控机、显示系统、激光发生器、切割头、吸附盘、X轴运动系统、Y轴运动系统和Z轴运动系统,所述工控机、激光发生器、显示系统和Z轴运动系统都安装在机架上,所述切割头安装在Z轴运动系统上,所述吸附盘固定在X轴运动系统上,位于Y轴运动系统的上方,所述X轴运动系统安装在Y轴运动系统上,并交叉呈十字状,Y轴运动系统固定安装在机架上,本实用新型对ITO薄膜的刻线效率高、线性好,能够对大尺寸的ITO薄膜进行激光蚀刻。 Patent No. CN200720171149.1 is an ITO thin film laser etching machine, including a frame, an industrial computer, a display system, a laser generator, a cutting head, a suction plate, an X-axis motion system, a Y-axis motion system, and a Z-axis motion system. The industrial computer, laser generator, display system and Z-axis motion system are all installed on the frame, the cutting head is installed on the Z-axis motion system, and the adsorption disc is fixed on the X-axis motion system, located on the Y-axis Above the kinematic system, the X-axis kinematic system is installed on the Y-axis kinematic system, and crosses in a cross shape, and the Y-axis kinematic system is fixedly installed on the frame. The utility model has high efficiency and good linearity for the marking of the ITO film. , capable of laser etching large-size ITO films. the
但由于专利号为CN200720171149.1的ITO薄膜激光蚀刻机,其吸附盘固定在X轴运动系统上,X轴运动系统安装在Y轴运动系统上,而X轴运动系统和Y轴运动系统由直线电机驱动,吸附盘、X轴运动系统和Y轴运动系统的质量较大,惯性也大,直线电机带动吸附盘上的ITO薄膜运动刻线,其刻线速度因为吸附盘、X轴运动系统和Y轴运动系统的质量较大、惯性大而受影响,所以刻线速度慢,效率低;另外,因为吸附盘、X轴运动系统和Y轴运动系统的质量较大、惯性大,在刻线过程中振动也大,刻线的稳定线也受到影响,所刻的线宽不均匀。 However, due to the ITO thin film laser etching machine whose patent number is CN200720171149.1, its adsorption plate is fixed on the X-axis motion system, and the X-axis motion system is installed on the Y-axis motion system, and the X-axis motion system and the Y-axis motion system are composed of a straight line Driven by a motor, the quality of the suction disc, the X-axis motion system and the Y-axis motion system are relatively large, and the inertia is also large. The linear motor drives the ITO film on the adsorption disc to move the engraving line. The mass of the Y-axis motion system is large and the inertia is large, so the marking speed is slow and the efficiency is low; The vibration is also large during the process, and the stable line of the engraved line is also affected, and the engraved line width is uneven. the
发明内容Contents of the invention
本实用新型的目的是提供一种触摸屏ITO薄膜激光刻蚀设备,此触摸屏ITO薄膜激光刻蚀设备,刻蚀速度快,效率高,所刻线宽均匀。 The purpose of the utility model is to provide a touch screen ITO thin film laser etching equipment, the touch screen ITO thin film laser etching equipment, the etching speed is high, the efficiency is high, and the engraved line width is uniform. the
为了达到上述目的,本实用新型的触摸屏ITO薄膜激光刻蚀设备,包括机架、控制系统、显示系统、激光发生器、升降机构和吸附平台,控制系统、显示系统、升降机构和吸附平台都安装在机架上,激光发生器安装在升降机构上,其特征在于:还包括二维振镜头和F-θ透镜组,二维振镜头安装在升降机构的升降架上,F-θ透镜组安装在二维振镜头下部。 In order to achieve the above object, the touch screen ITO thin film laser etching equipment of the present invention includes a frame, a control system, a display system, a laser generator, a lifting mechanism and an adsorption platform, and the control system, the display system, the lifting mechanism and the adsorption platform are all installed On the frame, the laser generator is installed on the lifting mechanism, which is characterized in that it also includes a two-dimensional vibrating lens and an F-θ lens group. The two-dimensional vibrating lens is installed on the lifting frame of the lifting mechanism, and the F-θ lens group is installed In the lower part of the two-dimensional vibrating head. the
如上所述的触摸屏ITO薄膜激光刻蚀设备,其特征在于:升降机构包括电动机、蜗轮蜗杆减速机、丝杆运动副、直线导轨运动副和升降架,电动机的输出轴与蜗轮蜗杆减速机的输入轴联接,蜗轮蜗杆减速机的输出轴与丝杆运动副的丝杆联接,丝杆运动副的螺帽与升降架联接,直线导轨运动副的导轨安装在与机架相联的联接板上,直线导轨运动副的滑块与升降架相联接。升降机构的作用是用来调节F-θ透镜组与吸附平台上ITO薄膜的距离,使经过F-θ透镜组的激光光束聚焦后其焦点落在ITO薄膜上。 The above-mentioned touch screen ITO film laser etching equipment is characterized in that: the lifting mechanism includes a motor, a worm gear reducer, a screw motion pair, a linear guide rail motion pair and a lifting frame, and the output shaft of the motor and the input of the worm gear reducer Shaft connection, the output shaft of the worm gear reducer is connected with the screw of the screw motion pair, the nut of the screw motion pair is connected with the lifting frame, the guide rail of the linear guide rail motion pair is installed on the connecting plate connected with the frame, The slider of the linear guide rail kinematic pair is connected with the lifting frame. The function of the lifting mechanism is to adjust the distance between the F-θ lens group and the ITO film on the adsorption platform, so that the focus of the laser beam passing through the F-θ lens group falls on the ITO film. the
如上所述的触摸屏ITO薄膜激光刻蚀设备,其特征在于:升降机构包括手轮、蜗轮蜗杆减速机、丝杆运动副、直线导轨运动副和升降架,手轮与蜗轮蜗杆减速机的输入轴联接,蜗轮蜗杆减速机的输出轴与丝杆运动副的丝杆联接,丝杆运动副的螺帽与升降架联接,直线导轨运动副的导轨安装在与机架相联的联接板上,直线导轨运动副的滑块与升降架相联接。升降机构的作用是用来调节F-θ透镜组与吸附平台上ITO薄膜的距离,使经过F-θ透镜组的激光光束聚焦后其焦点落在ITO薄膜上。 The above touch screen ITO thin film laser etching equipment is characterized in that: the lifting mechanism includes a hand wheel, a worm gear reducer, a screw motion pair, a linear guide rail motion pair and a lifting frame, and the input shaft of the hand wheel and the worm gear reducer Connection, the output shaft of the worm gear reducer is connected with the screw of the screw kinematic pair, the nut of the screw kinematic pair is connected with the lifting frame, the guide rail of the linear guide rail kinematic pair is installed on the connecting plate connected with the frame, and the straight line The slider of the guide rail kinematic pair is connected with the lifting frame. The function of the lifting mechanism is to adjust the distance between the F-θ lens group and the ITO film on the adsorption platform, so that the focus of the laser beam passing through the F-θ lens group falls on the ITO film. the
如上所述的触摸屏ITO薄膜激光刻蚀设备,其特征在于:还包括二维运动系统,二维运动系统由X轴运动系统和Y轴运动系统组成,X轴运动系统安装在Y轴运动系统上,X轴运动系统和Y轴运动系统呈交叉十字状,二维运动系统安装在机架上,吸附平台安装在二维运动系统上。 The above touch screen ITO thin film laser etching equipment is characterized in that: it also includes a two-dimensional motion system, the two-dimensional motion system is composed of an X-axis motion system and a Y-axis motion system, and the X-axis motion system is installed on the Y-axis motion system , the X-axis motion system and the Y-axis motion system are in the shape of a cross, the two-dimensional motion system is installed on the frame, and the adsorption platform is installed on the two-dimensional motion system. the
如上所述的触摸屏ITO薄膜激光刻蚀设备,其特征在于:激光发生器发出的激光波长为266nm;激光发生器发出的激光波长也可以是1064nm、532nm或355nm。 The touch screen ITO thin film laser etching equipment as above is characterized in that: the wavelength of the laser emitted by the laser generator is 266nm; the wavelength of the laser emitted by the laser generator can also be 1064nm, 532nm or 355nm. the
所述的二维振镜头内有两个高速伺服振动电机,每个高速伺服振动电机的轴上安装有激光反射镜片,两个高速伺服振动电机交叉安装。本触摸屏ITO薄膜激光刻蚀设备采用二维振镜头来控制激光的偏转,通过两个高速伺服振动电机的振动,使安装在其轴上的激光反射镜片发生偏转。通过控制高速伺服振动电机轴偏转角的大小来控制激光光束的偏转角度,也就决定了激光光束的偏转距离。由于二维振镜头的高速伺服振动电机的偏转速度很快,使激光光束运动速度高,也就是对ITO薄膜进行刻蚀速度快,效率高。 There are two high-speed servo vibration motors in the two-dimensional oscillating head, a laser reflection lens is installed on the shaft of each high-speed servo vibration motor, and the two high-speed servo vibration motors are installed crosswise. This touch screen ITO thin film laser etching equipment uses a two-dimensional oscillating lens to control the deflection of the laser. Through the vibration of two high-speed servo vibration motors, the laser reflective mirror installed on its axis is deflected. The deflection angle of the laser beam is controlled by controlling the deflection angle of the high-speed servo vibration motor shaft, which also determines the deflection distance of the laser beam. Due to the high deflection speed of the high-speed servo vibration motor of the two-dimensional vibrating lens, the laser beam moves at a high speed, that is, the etching speed of the ITO film is fast and the efficiency is high. the
所述的F-θ透镜组为一组镜片组,其作用是将经过二维振镜头的不同角度激光光束聚焦 到一个平面上,所以能对置于吸附平台上的ITO薄膜进行刻蚀加工。 The F-θ lens group is a group of lens groups, and its function is to focus the laser beams at different angles through the two-dimensional vibrating lens onto a plane, so the ITO film placed on the adsorption platform can be etched. the
所述的吸附平台的内部为空腔,上面表设置多个与空腔连通的小孔,吸附平台的侧面或下部开有与空腔相连通的多个通孔;其中,至少有一个通孔与真空装置或抽风装置连接;至少有一个通孔与吹气装置连接。刻蚀ITO薄膜要使ITO薄膜吸附于吸附平台,刻蚀完成后,要使ITO薄膜吹高吸附平台,以便方便地从吸附平台上取下。 The interior of the adsorption platform is a cavity, the upper surface is provided with a plurality of small holes communicating with the cavity, and the side or lower part of the adsorption platform is provided with a plurality of through holes communicating with the cavity; wherein, at least one through hole Connect with vacuum device or suction device; at least one through hole is connected with blowing device. To etch the ITO film, the ITO film should be adsorbed on the adsorption platform. After the etching is completed, the ITO film should be blown up to the adsorption platform so that it can be easily removed from the adsorption platform. the
所述的机架为金属结构件,是整个触摸屏ITO薄膜激光刻蚀设备的支撑与连接部件,控制系统、显示系统、升降机构、吸附平台、二维运动系统都安装在机架上。 The frame is a metal structure, which is the supporting and connecting part of the entire touch screen ITO thin film laser etching equipment. The control system, display system, lifting mechanism, adsorption platform, and two-dimensional motion system are all installed on the frame. the
所述的控制系统包括工控机及其操作控制软件,其作用是控制触摸屏ITO薄膜激光刻蚀设备的运行。 The control system includes an industrial computer and its operation control software, and its function is to control the operation of the touch screen ITO thin film laser etching equipment. the
所述的显示系统为一显示屏,其作用是用于显示操作控制软件的界面。 The display system is a display screen, which is used to display the interface of the operation control software. the
工作时,ITO薄膜平放于吸附平台上,在真空装置或抽风装置的作用下,ITO薄膜被平坦的吸附于吸附平台的上表面,激光发生器发出的激光在控制系统的控制下,通过二维振镜头和F-θ透镜组作用于ITO薄膜上,对ITO薄膜进行刻蚀加工。 When working, the ITO film is placed flat on the adsorption platform. Under the action of the vacuum device or the exhaust device, the ITO film is flatly adsorbed on the upper surface of the adsorption platform. The laser emitted by the laser generator is controlled by the control system. The vibrating lens and F-θ lens group act on the ITO film to etch the ITO film. the
由于本触摸屏ITO薄膜激光刻蚀设备采用二维振镜头来控制激光的偏转,而二维振镜头的高速伺服振动电机的偏转速度很快,使激光光束运动速度高,也就是对ITO薄膜进行刻蚀速度快,效率高;同时,二维振镜头的高速伺服振动电机的振动虽然很快,但其质量很小,所以二维振镜头的高速伺服振动电机偏转时振动小,对整个设备的影响小,ITO薄膜刻蚀线宽均匀。 Since this touch screen ITO film laser etching equipment uses a two-dimensional vibrating lens to control the deflection of the laser, and the deflection speed of the high-speed servo vibration motor of the two-dimensional vibrating lens is very fast, so that the laser beam moves at a high speed, that is, the ITO film is engraved The erosion speed is fast and the efficiency is high; at the same time, although the vibration of the high-speed servo vibration motor of the two-dimensional vibrating lens is very fast, its mass is very small, so the vibration of the high-speed servo vibrating motor of the two-dimensional vibrating lens is small when it deflects, which has an impact on the entire equipment Small, uniform ITO film etching line width. the
采用二维振镜头来控制激光的偏转,刻蚀速度快,但二维振镜头的刻蚀幅面受到限制,如果要加大幅面,就必须加大F-θ透镜组的焦距,但是,加大了F-θ透镜组的焦距会使激光聚焦点变大,刻蚀的线宽宽,难以满足要求。为了加大刻蚀范围,本触摸屏ITO薄膜激光刻蚀设备设有二维运动系统,二维运动系统由X轴运动系统和Y轴运动系统组成,X轴运动系统安装在Y轴运动系统上,X轴运动系统和Y轴运动系统呈交叉十字状,二维运动系统安装在机架上,吸附平台安装在二维运动系统上。通过软件控制,使X轴运动系统和Y轴运动系统运动,使放置在吸附平台上摸屏ITO薄膜分区域刻蚀,刻蚀完一个区域后再刻蚀另一个区域,这样就可以刻蚀大幅面的摸屏ITO薄膜。 Two-dimensional vibrating lens is used to control the deflection of the laser, and the etching speed is fast, but the etching format of the two-dimensional vibrating lens is limited. If the format is to be increased, the focal length of the F-θ lens group must be increased. However, increasing the If the focal length of the F-θ lens group is exceeded, the laser focus point will become larger, and the etched line width will be wide, which is difficult to meet the requirements. In order to increase the etching range, the touch screen ITO thin film laser etching equipment is equipped with a two-dimensional motion system. The two-dimensional motion system is composed of an X-axis motion system and a Y-axis motion system. The X-axis motion system is installed on the Y-axis motion system. The X-axis motion system and the Y-axis motion system are in the shape of a cross, the two-dimensional motion system is installed on the frame, and the adsorption platform is installed on the two-dimensional motion system. Through software control, the X-axis motion system and the Y-axis motion system are moved to etch the ITO film on the touch screen on the adsorption platform. After one area is etched, another area can be etched, so that a large area can be etched. Large format touch screen ITO film. the
本实用新型的触摸屏ITO薄膜激光刻蚀设备,对触摸屏ITO薄膜刻蚀速度快,效率高,所刻线宽均匀。 The touch screen ITO thin film laser etching equipment of the utility model has fast etching speed and high efficiency for the touch screen ITO thin film, and the engraved line width is uniform. the
附图说明Description of drawings
图1是本实用新型实施例的正面示意图。 Fig. 1 is a schematic front view of an embodiment of the utility model. the
图2是侧面示意图。 Figure 2 is a schematic side view. the
图3是升降机构结构图。 Figure 3 is a structural diagram of the lifting mechanism. the
具体实施方式Detailed ways
图1标记的说明:机架1,控制系统2,显示系统3,升降机构4,二维振镜头5,F-θ透镜组6,吸附平台7,防护门8,透视窗9,健盘抽屉10,支撑脚11。 Description of the marks in Figure 1: Frame 1, Control System 2, Display System 3, Lifting Mechanism 4, 2D Vibrating Head 5, F-θ Lens Group 6, Adsorption Platform 7, Protective Door 8, Perspective Window 9, Disk Drawer 10, support feet 11. the
图2标记的说明:激光发生器12。 Description of FIG. 2 labeled:
图3标记的说明:蜗轮蜗杆减速机13,电动机14,联接板15,滑块16,导轨17,升降架18,丝杆19,螺帽20。 The explanation of Fig. 3 mark:
参见图1,本实用新型触摸屏ITO薄膜激光刻蚀设备的实施例包括机架1、控制系统2、显示系统3、激光发生器12(参见图2)、升降机构4、二维振镜头5、F-θ透镜组6和吸附平台7。控制系统2、显示系统3、升降机构4和吸附平台7都安装在机架1上,激光发生器12安装在升降机构4上,二维振镜头5安装在升降机构4的升降架18上,F-θ透镜组6安装在二维振镜头5下部。 Referring to Fig. 1, the embodiment of the touch screen ITO thin film laser etching equipment of the present invention includes a frame 1, a control system 2, a display system 3, a laser generator 12 (see Fig. 2), a lifting mechanism 4, a two-dimensional vibrating lens 5, F-θ lens group 6 and adsorption platform 7. The control system 2, the display system 3, the lifting mechanism 4 and the adsorption platform 7 are all installed on the frame 1, the
参见图3,本实用新型触摸屏ITO薄膜激光刻蚀设备实施例的升降机构4包括电动机14、蜗轮蜗杆减速机13、丝杆运动副、直线导轨运动副和升降架18,电动机14的输出轴与蜗轮蜗杆减速机13的输入轴联接,蜗轮蜗杆减速机13的输出轴与丝杆运动副的丝杆19联接,丝杆运动副的螺帽20与升降架18联接,直线导轨运动副的导轨17安装在与机架1相联的联接板15上,直线导轨运动副的滑块16与升降架18相联接。升降机构4的作用是用来调节F-θ透镜组6与吸附平台7上ITO薄膜的距离,使经过F-θ透镜组6的激光光束聚焦后其焦点落在ITO薄膜上。 Referring to Fig. 3, the lifting mechanism 4 of the embodiment of the touch screen ITO thin film laser etching equipment of the present invention includes a
参见图1,本实用新型触摸屏ITO薄膜激光刻蚀设备实施例的机架1的前部开有防护门8,以方便工作时放置或取出ITO薄膜;防护门8上开有透视窗9,透视窗9为工作时观察窗口。机架1上安装有健盘抽屉10,输入健盘放置在其中。机架1下部设置有支撑脚11。 Referring to Fig. 1, the front portion of the frame 1 of the embodiment of the touch screen ITO thin film laser etching equipment of the present invention is provided with a protective door 8 to facilitate the placement or removal of the ITO film during work; the protective door 8 is provided with a perspective window 9 for perspective Window 9 is an observation window during work. A keyboard drawer 10 is installed on the frame 1, and the input keyboard is placed therein. The lower part of the frame 1 is provided with supporting feet 11 . the
本实用新型触摸屏ITO薄膜激光刻蚀设备还包括二维运动系统,二维运动系统由X轴运动系统和Y轴运动系统组成,X轴运动系统安装在Y轴运动系统上,X轴运动系统和Y轴运动系统呈交叉十字状,二维运动系统安装在机架1上,吸附平台7安装在二维运动系统上。 The utility model touch screen ITO thin film laser etching equipment also includes a two-dimensional motion system, the two-dimensional motion system is composed of an X-axis motion system and a Y-axis motion system, the X-axis motion system is installed on the Y-axis motion system, and the X-axis motion system and The Y-axis motion system is in the shape of a cross, the two-dimensional motion system is installed on the frame 1, and the adsorption platform 7 is installed on the two-dimensional motion system. the
二维振镜头5内有两个高速伺服振动电机,每个高速伺服振动电机的轴上安装有激光反射镜片,两个高速伺服振动电机交叉安装。本触摸屏ITO薄膜激光刻蚀设备采用二维振镜头5来控制激光的偏转,通过两个高速伺服振动电机的振动,使安装在其轴上的激光反射镜片发生偏转。通过控制高速伺服振动电机轴偏转角的大小来控制激光光束的偏转角度,也就决定了激光光束的偏转距离。由于二维振镜头5的高速伺服振动电机的偏转速度很快,使激光光束运动速度高,也就是对ITO薄膜进行刻蚀速度快,效率高。 There are two high-speed servo vibration motors in the two-dimensional vibrating head 5, and a laser reflector is installed on the shaft of each high-speed servo vibration motor, and the two high-speed servo vibration motors are installed crosswise. This touch screen ITO thin film laser etching equipment uses a two-dimensional vibrating lens 5 to control the deflection of the laser, and deflects the laser reflective mirror installed on its axis through the vibration of two high-speed servo vibration motors. The deflection angle of the laser beam is controlled by controlling the deflection angle of the high-speed servo vibration motor shaft, which also determines the deflection distance of the laser beam. Because the deflection speed of the high-speed servo vibration motor of the two-dimensional vibrating lens 5 is very fast, the moving speed of the laser beam is high, that is, the etching speed of the ITO thin film is fast and the efficiency is high. the
F-θ透镜组6为一组镜片组,其作用是将经过二维振镜头5的不同角度激光光束聚焦到一个平面上,所以能对置于吸附平台7上的ITO薄膜进行刻蚀加工。激光发生器12为波长是266nm的固体激光发生器。吸附平台7的内部为空腔,上面表设置多个与空腔连通的小孔,吸附平台7的侧面或下部开有与空腔相连通的多个阵列的通孔;其中,有一个通孔与真空装置或抽风装置连接,有一个通孔与吹气装置连接。通过控制气阀的开闭,就能使ITO薄膜吸附于吸附平台7或吹离吸附平台7。刻蚀ITO薄膜要使ITO薄膜吸附于吸附平台7,刻蚀完成后,要使ITO薄膜吹高吸附平台7,以便方便地从吸附平台7上取下。 The F-θ lens group 6 is a group of lens groups, and its function is to focus the laser beams of different angles passing through the two-dimensional vibrating lens 5 onto a plane, so that the ITO film placed on the adsorption platform 7 can be etched. The
机架1为金属结构件,是整个触摸屏ITO薄膜激光刻蚀设备的支撑与连接部件,控制系统2、显示系统3、升降机构4、吸附平台7、二维运动系统都安装在机架1上。 Frame 1 is a metal structural part, which is the supporting and connecting part of the entire touch screen ITO thin film laser etching equipment. Control system 2, display system 3, lifting mechanism 4, adsorption platform 7, and two-dimensional motion system are all installed on frame 1. . the
控制系统2包括工控机及其操作控制软件,其作用是控制触摸屏ITO薄膜激光刻蚀设备的运行;显示系统3为一显示屏,其作用是用于显示操作控制软件的界面。 The control system 2 includes an industrial computer and its operation control software, its function is to control the operation of the touch screen ITO thin film laser etching equipment; the display system 3 is a display screen, its function is to display the interface of the operation control software. the
工作时,ITO薄膜平放于吸附平台7上,在真空装置或抽风装置的作用下,ITO薄膜被平坦的吸附于吸附平台7的上表面,激光发生器12发出的激光在控制系统2的控制下,通过二维振镜头5和F-θ透镜组6作用于ITO薄膜上,对ITO薄膜进行刻蚀加工。 When working, the ITO film is placed flat on the adsorption platform 7. Under the action of the vacuum device or the ventilation device, the ITO film is flatly adsorbed on the upper surface of the adsorption platform 7. The laser emitted by the
由于本触摸屏ITO薄膜激光刻蚀设备采用二维振镜头5来控制激光的偏转,而二维振镜头5的高速伺服振动电机的偏转速度很快,使激光光束运动速度高,也就是对ITO薄膜进行刻蚀速度快,效率高;同时,二维振镜头5的高速伺服振动电机的振动虽然很快,但其质量很小,所以二维振镜头5的高速伺服振动电机偏转时振动小,对整个设备的影响小,ITO薄膜刻蚀线宽均匀。 Because the touch screen ITO thin film laser etching equipment uses the two-dimensional vibrating lens 5 to control the deflection of the laser, and the deflection speed of the high-speed servo vibration motor of the two-dimensional vibrating lens 5 is very fast, so that the laser beam moves at a high speed, that is, the ITO thin film The etching speed is fast and the efficiency is high; at the same time, although the vibration of the high-speed servo vibrating motor of the two-dimensional vibrating lens 5 is very fast, its mass is very small, so the vibration of the high-speed servo vibrating motor of the two-dimensional vibrating lens 5 is small when it deflects. The influence of the whole device is small, and the etching line width of the ITO film is uniform. the
采用二维振镜头5来控制激光的偏转,刻蚀速度快,但二维振镜头5的刻蚀幅面受到限制,如果要加大幅面,就必须加大F-θ透镜组6的焦距,但是,加大了F-θ透镜组6的焦距会使激光聚焦点变大,刻蚀的线宽宽,难以满足要求。为了加大刻蚀范围,本触摸屏ITO薄膜激光刻蚀设备可设置二维运动系统,二维运动系统由X轴运动系统和Y轴运动系统组成,X轴运动系统安装在Y轴运动系统上,X轴运动系统和Y轴运动系统呈交叉十字状,二维运动系统安装在机架1上,吸附平台7安装在二维运动系统上。通过软件控制,使X轴运动系统和Y轴运动系统运动,使放置在吸附平台7上摸屏ITO薄膜分区域刻蚀,刻蚀完一个区域后再刻蚀另一个区域,这样就可以刻蚀大幅面的摸屏ITO薄膜。 The two-dimensional vibrating lens 5 is used to control the deflection of the laser, and the etching speed is fast, but the etching format of the two-dimensional vibrating lens 5 is limited. If the format is to be increased, the focal length of the F-θ lens group 6 must be increased, but , increasing the focal length of the F-θ lens group 6 will increase the focal point of the laser, and the etched line width will be wide, which is difficult to meet the requirements. In order to increase the etching range, the touch screen ITO thin film laser etching equipment can be equipped with a two-dimensional motion system. The two-dimensional motion system is composed of an X-axis motion system and a Y-axis motion system. The X-axis motion system is installed on the Y-axis motion system. The X-axis motion system and the Y-axis motion system are in the shape of a cross, the two-dimensional motion system is installed on the frame 1, and the adsorption platform 7 is installed on the two-dimensional motion system. Through software control, the X-axis motion system and the Y-axis motion system are moved to etch the touch-screen ITO film placed on the adsorption platform 7 in different areas. After one area is etched, another area is etched, so that it can be etched. Large format touch screen ITO film. the
本实用新型的触摸屏ITO薄膜激光刻蚀设备,对触摸屏ITO薄膜刻蚀速度快,效率高,所刻线宽均匀,它的推广运用,对提高触摸屏ITO薄膜的加工生产率、保证其加工质量有着重要的意义。 The touch screen ITO thin film laser etching equipment of the present utility model has fast etching speed, high efficiency, and even engraved line width for the touch screen ITO thin film. meaning. the
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201020302494.6U CN201760706U (en) | 2010-10-15 | 2010-10-15 | Touch screen ito film laser etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201020302494.6U CN201760706U (en) | 2010-10-15 | 2010-10-15 | Touch screen ito film laser etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN201760706U true CN201760706U (en) | 2011-03-16 |
Family
ID=43713308
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201020302494.6U Expired - Lifetime CN201760706U (en) | 2010-10-15 | 2010-10-15 | Touch screen ito film laser etching device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN201760706U (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102205468A (en) * | 2011-05-18 | 2011-10-05 | 苏州德龙激光有限公司 | Device and method for etching silver syrup on electronic product |
CN102218608A (en) * | 2011-05-18 | 2011-10-19 | 苏州德龙激光有限公司 | Device and method for etching conductive film of unviewable zone on touch screen |
CN102284794A (en) * | 2011-07-27 | 2011-12-21 | 苏州德龙激光有限公司 | Device and method for performing laser etching on organic light emitting diode (OLED) display anode film material |
CN102500929A (en) * | 2011-10-31 | 2012-06-20 | 武汉先河激光技术有限公司 | Ultraviolet laser etching machine |
CN102581492A (en) * | 2012-01-31 | 2012-07-18 | 武汉吉事达激光技术有限公司 | Laser etcher capable of automatically feeding roll materials |
CN102759863A (en) * | 2011-04-27 | 2012-10-31 | 瑞世达科技(厦门)有限公司 | Film etching method and laser photoetching machine |
CN103658974A (en) * | 2012-09-21 | 2014-03-26 | 昆山思拓机器有限公司 | Manual lifting mechanism for two-sided indium tin oxide (ITO) laser ablation equipment |
CN103878488A (en) * | 2014-03-28 | 2014-06-25 | 广州创乐激光设备有限公司 | Structure of laser marking machine of light guide plate |
CN106782134A (en) * | 2017-03-05 | 2017-05-31 | 陆才娣 | Large-scale transparent display screen photoelectric glass manufacture method can be assembled into |
CN106946477A (en) * | 2017-03-05 | 2017-07-14 | 陆才娣 | LED glass closes chip architecture and its glass processing lamination process |
CN107117834A (en) * | 2017-05-25 | 2017-09-01 | 陆才娣 | LED glass closes chip architecture and its glass processing lamination process |
CN107138859A (en) * | 2017-05-24 | 2017-09-08 | 江苏华工激光科技有限公司 | A kind of laser on-line marking method and apparatus of packaging material for surface coating |
CN107717692A (en) * | 2017-11-27 | 2018-02-23 | 深圳赛贝尔自动化设备有限公司 | A kind of elevating mechanism of upper millstone |
WO2019137496A1 (en) * | 2018-01-12 | 2019-07-18 | 上海微电子装备(集团)股份有限公司 | Lifting mechanism, lifting platform device, lithography machine and lithography method |
-
2010
- 2010-10-15 CN CN201020302494.6U patent/CN201760706U/en not_active Expired - Lifetime
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI473168B (en) * | 2011-04-27 | 2015-02-11 | Ray Star Technology Xiamen Inc | Film layer etching method |
CN102759863A (en) * | 2011-04-27 | 2012-10-31 | 瑞世达科技(厦门)有限公司 | Film etching method and laser photoetching machine |
CN102759863B (en) * | 2011-04-27 | 2015-12-02 | 瑞世达科技(厦门)有限公司 | Laser stepper |
CN102218608A (en) * | 2011-05-18 | 2011-10-19 | 苏州德龙激光有限公司 | Device and method for etching conductive film of unviewable zone on touch screen |
CN102205468A (en) * | 2011-05-18 | 2011-10-05 | 苏州德龙激光有限公司 | Device and method for etching silver syrup on electronic product |
CN102284794A (en) * | 2011-07-27 | 2011-12-21 | 苏州德龙激光有限公司 | Device and method for performing laser etching on organic light emitting diode (OLED) display anode film material |
CN102500929A (en) * | 2011-10-31 | 2012-06-20 | 武汉先河激光技术有限公司 | Ultraviolet laser etching machine |
CN102581492A (en) * | 2012-01-31 | 2012-07-18 | 武汉吉事达激光技术有限公司 | Laser etcher capable of automatically feeding roll materials |
CN103658974A (en) * | 2012-09-21 | 2014-03-26 | 昆山思拓机器有限公司 | Manual lifting mechanism for two-sided indium tin oxide (ITO) laser ablation equipment |
CN103878488A (en) * | 2014-03-28 | 2014-06-25 | 广州创乐激光设备有限公司 | Structure of laser marking machine of light guide plate |
CN103878488B (en) * | 2014-03-28 | 2015-11-25 | 广州创乐激光设备有限公司 | A kind of structure of light guide plate laser marking machine |
CN106782134A (en) * | 2017-03-05 | 2017-05-31 | 陆才娣 | Large-scale transparent display screen photoelectric glass manufacture method can be assembled into |
CN106946477A (en) * | 2017-03-05 | 2017-07-14 | 陆才娣 | LED glass closes chip architecture and its glass processing lamination process |
CN106782134B (en) * | 2017-03-05 | 2020-01-03 | 陆才娣 | Manufacturing method of photoelectric glass capable of being assembled into large transparent display screen |
CN107138859A (en) * | 2017-05-24 | 2017-09-08 | 江苏华工激光科技有限公司 | A kind of laser on-line marking method and apparatus of packaging material for surface coating |
CN107138859B (en) * | 2017-05-24 | 2023-12-15 | 江苏华工激光科技有限公司 | Laser online marking method and device for packaging material with surface film |
CN107117834A (en) * | 2017-05-25 | 2017-09-01 | 陆才娣 | LED glass closes chip architecture and its glass processing lamination process |
CN107717692A (en) * | 2017-11-27 | 2018-02-23 | 深圳赛贝尔自动化设备有限公司 | A kind of elevating mechanism of upper millstone |
WO2019137496A1 (en) * | 2018-01-12 | 2019-07-18 | 上海微电子装备(集团)股份有限公司 | Lifting mechanism, lifting platform device, lithography machine and lithography method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN201760706U (en) | Touch screen ito film laser etching device | |
CN201931205U (en) | Double-station laser etching machine for touch screen ITO (indium tin oxide) thin films | |
CN201087172Y (en) | Ultra-thin glass substrate laser cutting machine | |
US20240001489A1 (en) | High-efficiency and high-precision combined machining equipment and method for diamond wafer sheet | |
CN203437812U (en) | Three-dimensional galvanometer laser etching machine | |
CN106799545A (en) | A kind of five-axle linkage laser cutter | |
CN100505335C (en) | Solar battery laser marking device | |
CN205702840U (en) | Laser machine for double-sided processing | |
JPWO2007119740A1 (en) | Scribing method, scribing apparatus, and cleaved substrate cleaved using this method or apparatus | |
CN207982569U (en) | A laser marking and cutting machine | |
CN104766904B (en) | CIGS thin film solar cell scribing equipment | |
CN204586136U (en) | Three-axis linkage marking machine | |
JPWO2007094348A1 (en) | Laser scribing method, laser scribing apparatus, and cleaved substrate cleaved using this method or apparatus | |
CN203140978U (en) | Double-head laser etching machine | |
CN102528296B (en) | ITO silver paste laser etching methods | |
CN102717190A (en) | Device and method for pulse laser etching of conducting film on organic glass | |
CN108247208A (en) | Laser index carving device and its marking method | |
CN201783760U (en) | Laser scribing device | |
JP2010162586A (en) | Laser beam machining method and laser beam machining apparatus | |
CN201143596Y (en) | ITO thin film laser etching machine | |
CN111138091A (en) | A vertical glass laser film removal machine | |
KR100647456B1 (en) | Scribing method of brittle material and scribing head and scribing apparatus provided with scribe head | |
KR20130126287A (en) | Substrate cutting and method | |
CN109623159A (en) | A kind of laser scanning device and its method | |
CN202527852U (en) | Hanging type laser machining device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: Touch screen ITO film laser etching device Effective date of registration: 20120719 Granted publication date: 20110316 Pledgee: Bank of Hankou Limited by Share Ltd Optics Valley branch Pledgor: Wuhan GStar Laser Technology Co., Ltd. Registration number: 2012990000389 |
|
C56 | Change in the name or address of the patentee |
Owner name: WUHAN GSTAR TECHNOLOGY CO., LTD. Free format text: FORMER NAME: WUHAN GSTAR LASER TECHNOLOGY CO., LTD. |
|
CP03 | Change of name, title or address |
Address after: 430071, No. seven block, Kanto science and Technology Industrial Zone, East Lake Development Zone, Wuhan, Hubei Patentee after: WUHAN GSTAR TECHNOLOGY CO., LTD. Address before: 430071, 7-5, Wuhan science and Technology Park, East Lake Development Zone, Hubei, China Patentee before: Wuhan GStar Laser Technology Co., Ltd. |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20131029 Granted publication date: 20110316 Pledgee: Bank of Hankou Limited by Share Ltd Optics Valley branch Pledgor: Wuhan GStar Laser Technology Co., Ltd. Registration number: 2012990000389 |
|
PLDC | Enforcement, change and cancellation of contracts on pledge of patent right or utility model | ||
CX01 | Expiry of patent term |
Granted publication date: 20110316 |
|
CX01 | Expiry of patent term |