CN204302626U - A kind of array base palte and display device - Google Patents
A kind of array base palte and display device Download PDFInfo
- Publication number
- CN204302626U CN204302626U CN201520005469.4U CN201520005469U CN204302626U CN 204302626 U CN204302626 U CN 204302626U CN 201520005469 U CN201520005469 U CN 201520005469U CN 204302626 U CN204302626 U CN 204302626U
- Authority
- CN
- China
- Prior art keywords
- electrode
- base palte
- array base
- black matrix
- underlay substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Liquid Crystal (AREA)
Abstract
The utility model discloses a kind of array base palte and display device, wherein array base palte comprises the black matrix be arranged on underlay substrate, array base palte has the multiple pixel cells be arranged in array, the orthogonal projection of pattern on underlay substrate of black matrix covers the gap location between adjacent pixel cell at least in part, the surface at least partially of black matrix has can carry out irreflexive first concaveconvex structure by the light being irradiated to black matrix surface, because first concaveconvex structure on black matrix surface has diffuse reflection effect, when extraneous light is irradiated to black matrix surperficial, extraneous light is diffusely reflected, thus reduce the light intensity of reflected light, improve the observability of each pixel cell region of array base palte, the display effect of improving picture.
Description
Technical field
The utility model relates to display technique field, espespecially a kind of array base palte and display device.
Background technology
Array base palte is the critical component of display panel, at present, integrated color membrane technology (the Color-filter OnArray of array, be called for short COA) be technology chromatic filter layer is directly formed on array base palte, this technology can not produce bit errors, the difficulty to box technique in display panel preparation process can be reduced, receive widespread use.
But the structure with light-reflecting property on COA display base plate reduces the readability of viewing area picture, and how improving the anti-light line jamming performance of display base plate, is the technical matters that those skilled in the art need solution badly.
Utility model content
In view of this, the utility model embodiment provides a kind of array base palte and display device, when extraneous light can be made to be irradiated to black matrix surperficial, carries out scattering to it, to reduce the light intensity of reflected light, thus improve the observability of each pixel cell region of array base palte.
Therefore, the utility model embodiment provides a kind of array base palte, comprise: underlay substrate, be arranged on the black matrix on described underlay substrate, described array base palte has the multiple pixel cells be arranged in array, and the orthogonal projection of pattern on underlay substrate of described black matrix covers the gap location between adjacent described pixel cell at least in part:
The surface at least partially of described black matrix has can carry out irreflexive first concaveconvex structure by the light being irradiated to described black matrix surface.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, also comprise: be arranged on the below of described black matrix and the insulation course directly contacted with described black matrix, the surface of described insulation course has the second concaveconvex structure matched with first concaveconvex structure on described black matrix surface.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, the material of described black matrix is metal material.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, also comprise: the first electrode being arranged on the slit-shaped in each described pixel cell region on underlay substrate, described first electrode is identical with the material of described black matrix and arrange with layer.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, also comprise: be arranged on the second electrode in each described pixel cell region on underlay substrate;
Described second electrode is by described insulation course and described first electrode mutually insulated.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, described second electrode is plane-shape electrode or gap electrode.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, described first electrode and the orthogonal projection of described second electrode on underlay substrate overlap at least partly.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, described first electrode is public electrode, and described second electrode is pixel electrode; Or,
Described first electrode is pixel electrode, and described second electrode is public electrode.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, described insulation course is the chromatic filter layer comprising the different optical filter of at least three kinds of colors.
In a kind of possible implementation, in the above-mentioned array base palte that the utility model embodiment provides, the width of described first concaveconvex structure is 3 to 6 microns; And/or,
The degree of depth of described first concaveconvex structure is 0.5 to 1.5 micron; And/or,
Described first concaveconvex structure be spaced apart 3 to 6 microns.
The utility model embodiment still provides a kind of display device, comprises the above-mentioned array base palte that the utility model embodiment provides.
The beneficial effect of the utility model embodiment comprises:
A kind of array base palte that the utility model embodiment provides and display device, wherein array base palte comprises: be arranged on the black matrix on underlay substrate, array base palte has the multiple pixel cells be arranged in array, the orthogonal projection of pattern on underlay substrate of black matrix covers the gap location between adjacent pixel cell, the surface of black matrix has can carry out irreflexive first concaveconvex structure by the light being irradiated to black matrix surface, because first concaveconvex structure on black matrix surface has diffuse reflection effect, when extraneous light is irradiated to black matrix surperficial, extraneous light is diffusely reflected, thus reduce the light intensity of reflected light, improve the observability of each pixel cell region of array base palte, the display effect of improving picture.
Accompanying drawing explanation
Fig. 1 a to Fig. 1 d is respectively the structural representation of the array base palte that the utility model embodiment provides;
The method for making process flow diagram of the black matrix in the array base palte that Fig. 2 provides for the utility model embodiment;
The method for making process flow diagram of the array base palte that Fig. 3 provides for the utility model embodiment;
Fig. 4 a to Fig. 4 f is respectively the structural representation of method for making after each step performs of the array base palte that the utility model embodiment provides.
Embodiment
Below in conjunction with accompanying drawing, the array base palte provide the utility model embodiment and the embodiment of display device are described in detail.
Wherein, in accompanying drawing, the thickness of each rete and shape do not reflect the actual proportions of array base palte, and object just signal illustrates the utility model content.
The utility model embodiment provides a kind of array base palte, as shown in Fig. 1 a to Fig. 1 d, comprise: underlay substrate 100, be arranged on the black matrix 200 on underlay substrate 100, array base palte has the multiple pixel cells be arranged in array, and the orthogonal projection of pattern on underlay substrate 100 of black matrix 200 covers the gap location between adjacent pixel cell at least in part; Such as, the orthogonal projection of black matrix 200 covers grid line and the data line of array base palte, can also to cover in TFT at least raceway groove region to be formed.
The surface at least partially of this black matrix 200 has can carry out irreflexive first concaveconvex structure A by the light being irradiated to black matrix 200 surface.
Because the first concaveconvex structure A on black matrix 200 surface has diffuse reflection effect, when extraneous light is irradiated to black matrix 200 surperficial, extraneous light is diffusely reflected, thus reduce the light intensity of reflected light, improve the observability of each pixel cell region of array base palte, the display effect of improving picture.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, irreflexive first concaveconvex structure can be there is in order to black matrix surface further can be made to be formed, as shown in Fig. 1 a to Fig. 1 d, this array base palte can also comprise: be arranged on the below of black matrix 200 and the insulation course 300 directly contacted with black matrix 200, the surface of insulation course 300 has the second concaveconvex structure B matched with the first concaveconvex structure A on black matrix 200 surface, now, the second concaveconvex structure B on insulation course 300 surface and the first concaveconvex structure A on black matrix 200 surface is affixed each other.In the manufacture craft of array base palte, underlay substrate is first formed the figure with the insulation course 300 of the second concaveconvex structure B, next step patterning processes can be conducive to like this and form the figure that surface has the black matrix 200 of the first concaveconvex structure A, ensure that the extraneous light being irradiated to black matrix 200 surface diffuse reflection can occur simultaneously.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, the width of the first concaveconvex structure can be set to 3 to 6 microns, and concrete width is decided as circumstances require, in this no limit.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, the degree of depth of the first concaveconvex structure can be set to 0.5 to 1.5 micron, and the concrete degree of depth is decided as circumstances require, in this no limit.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, the interval of the first concaveconvex structure can be set to 3 to 6 microns, and decide as circumstances require in concrete interval, in this no limit.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, the material of black matrix 200 is traditionally arranged to be metal material, can stop the light sent by the backlight module in display panel so on the one hand, to prevent colour mixture and light leak, on the one hand can reflect external light.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, as shown in Fig. 1 a to Fig. 1 d, this array base palte can also comprise: the first electrode 400 being arranged on the slit-shaped in each pixel cell region on underlay substrate 100, in order to reduce the Making programme of array base palte, particularly, this first electrode 400 is set to identical metal material with the material of black matrix 200, and be that same layer is arranged, like this on the Making programme of array base palte, by carrying out a patterning processes to a metal level, just can form the figure of black matrix 200 and the figure of the first electrode 400 simultaneously, namely a patterning processes is adopted just to form two figures, visible, decrease Making programme, reduce cost of manufacture.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, as shown in Fig. 1 a to Fig. 1 d, this array base palte can also comprise: be arranged on the second electrode 500 in each pixel cell region on underlay substrate 100; This second electrode 500 is by insulation course 300 and the first electrode 400 mutually insulated, namely the rete of three closes is that what underlay substrate 100 in array base palte set gradually is the second electrode 500, insulation course 300 and the first electrode 400, effectively can carry out display and control like this, now insulation course 300 plays the effect of separation second electrode 500 and the first electrode 400.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, as illustrated in figs. ia and ib, the second electrode 500 is plane-shape electrode, or as shown in Fig. 1 c and Fig. 1 d, the second electrode 500 is gap electrode.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, as shown in Fig. 1 a to Fig. 1 d, the first electrode 400 and the second orthogonal projection of electrode 500 on underlay substrate overlap at least partly.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, according to the different display mode of display panel, as illustrated in figs. ia and ib, when the first electrode 400 is set to public electrode, the second electrode 500 is traditionally arranged to be pixel electrode; Or another kind of mode, as shown in Fig. 1 c and Fig. 1 d, when the first electrode 400 is set to pixel electrode, the second electrode 500 is traditionally arranged to be public electrode.In the specific implementation, can according to actual needs, be decided by the concrete display mode of display panel.
In the specific implementation, in the above-mentioned array base palte that the utility model embodiment provides, the chromatic filter layer comprising the different optical filter of at least three kinds of colors is generally arranged between underlay substrate and the second electrode, the optical filter of different colours is used for filtering respectively, as shown in Fig. 1 a and Fig. 1 c, be provided with chromatic filter layer 600 between underlay substrate 100 and the second electrode 500, namely chromatic filter layer 600 arranges separately.In order to reduce the thickness of array base palte and simplify the manufacture craft of array base palte, particularly, in the above-mentioned array base palte that the utility model embodiment provides, insulation course can be set to comprise the chromatic filter layer of the different optical filter of at least three kinds of colors, as shown in Fig. 1 b and Fig. 1 d, the chromatic filter layer comprising the different optical filter of at least three kinds of colors is arranged between the first electrode 400 and the second electrode 500, namely chromatic filter layer is directly as insulation course 300, which reduce the thickness of array base palte, simplify the manufacture craft of array base palte simultaneously.
In the specific implementation, generally other film layer structures such as such as luminescent layer, negative electrode and anode also can be had in the array base palte that the utility model embodiment provides, and also the structures such as thin film transistor (TFT), grid line, data line, public electrode wire are generally formed with on underlay substrate, these concrete structures can have multiple implementation, do not limit at this.
Conceive based on same utility model, the utility model embodiment still provides the method for making of the above-mentioned array base palte that a kind of the utility model embodiment provides, the principle of dealing with problems due to the method is similar to aforementioned a kind of array base palte, therefore the enforcement of the method see the enforcement of array base palte, can repeat part and repeats no more.
In the specific implementation, the method for making of the array base palte that the utility model embodiment provides, specifically comprises the following steps:
Underlay substrate is formed the figure of the multiple pixel cell be arranged in array and the black matrix covering gap location between adjacent pixel cell at least in part;
Wherein, the surface at least partially of this black Matrix Pattern has can carry out irreflexive first concaveconvex structure by the light being irradiated to black matrix surface, because the first concaveconvex structure A on black matrix 200 surface has diffuse reflection effect, when extraneous light is irradiated to black matrix 200 surperficial, extraneous light is diffusely reflected, thus reduce the light intensity of reflected light, improve the observability of each pixel cell region of array base palte, the display effect of improving picture.
In the specific implementation, in the method for making of the above-mentioned array base palte provided in the utility model embodiment, underlay substrate is formed the figure of black matrix, as shown in Figure 2, specifically can realize in the following way:
S201, underlay substrate is formed there is the figure of the insulation course of the second concaveconvex structure; In the specific implementation, the second concaveconvex structure of surface of insulating layer and first concaveconvex structure on black matrix surface will match, and form the figure with the insulation course of the second concaveconvex structure, method for making has a lot, does not limit at this;
S202, form a metal level on the insulating layer;
S203, carry out a patterning processes to metal level, between adjacent pixel cell, the gap location surface formed at least partially has the black Matrix Pattern of the first concaveconvex structure, and in each pixel cell region, form the figure of the first electrode.Particularly, form black Matrix Pattern and the first electrode pattern only make use of a patterning processes, decrease the Making programme of array base palte, the black Matrix Pattern of the first concaveconvex structure of surface formation simultaneously ensures the light intensity reducing the reflected light that extraneous light produces on the surface of black matrix, thus improves the observability of each pixel cell region of array base palte.
In the specific implementation, in the method for making of the above-mentioned array base palte provided in the utility model embodiment, before execution step S201 forms the figure of the insulation course with the second concaveconvex structure on underlay substrate, comprise the following steps:
Underlay substrate is formed the figure of the second electrode;
Step S201 forms the figure of the insulation course with the second concaveconvex structure on underlay substrate, specifically can comprise:
The figure of the second electrode is formed the chromatic filter layer comprising the different optical filter of at least three kinds of colors, and this filter layer has the second concaveconvex structure.
The method for making of the array base palte shown in Fig. 1 a provided with concrete example detailed description the utility model embodiment below, as shown in Figure 3, specifically comprises the following steps:
S301, underlay substrate is formed comprise the figure of grid, grid line, public electrode wire, active layer, source-drain electrode, chromatic filter layer, protective seam, the second electrode and insulation course;
In the specific implementation, make in the process of array base palte, as shown in fig. 4 a, first formed successively on underlay substrate 100 and comprise grid 701, grid line, public electrode wire 800, active layer 702, source electrode 703, drain electrode 704, the figure of chromatic filter layer 600 and protective seam 900, then on the underlay substrate forming protective seam 900, form the figure of the second electrode 500, and the second electrode 500 is electrical connected with drain electrode 704 by the via hole of protective seam, afterwards on the underlay substrate 100 of formation second electrode 500, deposition one deck insulating layer material, form insulation course 300 figure,
S302, at the surface of insulation course coating photoresist, use half-tone mask plate or gray mask plate to photoresist exposure imaging, obtain photoresist part reserve area, region removed completely by photoresist and the complete reserve area of photoresist;
In the specific implementation, as shown in Figure 4 b, apply one deck photoresist on the surface of insulation course, use half-tone mask plate or gray mask plate to carry out exposure imaging to photoresist, obtain photoresist part reserve area a, region b removed completely by photoresist and the complete reserve area c of photoresist;
S303, underlay substrate after photoresist exposure imaging carry out first time etching technics, etches away the insulating layer material that region removed completely by photoresist, form the figure of the via hole of insulation course;
In the specific implementation, as illustrated in fig. 4 c, the underlay substrate 100 after photoresist exposure imaging carries out first time etching technics, etch away the insulating layer material that region b removed completely by photoresist, form the figure of the via hole C of insulation course 300;
S304, carry out first time etching technics after underlay substrate on, ashing is carried out to the photoresist after exposure imaging, gets rid of the photoresist of photoresist part reserve area;
In the specific implementation, as shown in figure 4d, on the underlay substrate 100 after carrying out first time etching technics, need the photoresist after to exposure imaging to carry out ashing, get rid of the photoresist of photoresist part reserve area a, the gross thickness of photoresist can reduce;
S305, underlay substrate after photoresist ashing carry out second time etching technics, forms the figure with the insulation course of the second concaveconvex structure;
In the specific implementation, as shown in fig 4e, underlay substrate 100 after photoresist ashing carries out second time etching technics, etch away the partial insulative layer 300 with photoresist part reserve area a, and the thickness etched away is less than the thickness of insulation course 300, form the figure with the insulation course 300 of the second concaveconvex structure B;
The photoresist of the complete reserve area of S306, stripping photoresist, form a metal level on the insulating layer, a patterning processes is carried out to metal level, between adjacent pixel cell, gap location forms the black Matrix Pattern that surface has the first concaveconvex structure, and in each pixel cell region, form the figure of the first electrode;
In the specific implementation, as shown in fig. 4f, the photoresist of the complete reserve area c of first stripping photoresist, deposit layer of metal material being formed on the underlay substrate with the insulation course of the second concaveconvex structure, form a metal level, a patterning processes is carried out to metal level, between adjacent pixel cell, gap location forms black matrix 200 figure that surface has the first concaveconvex structure A, and in each pixel cell region, forming the figure of the first electrode 400, the first electrode 400 is electrical connected by the via hole C of insulation course 300 and public electrode wire 800.
So far, the above-mentioned steps S301 to S306 provided through concrete example has produced the above-mentioned array base palte that the utility model embodiment provides.
Conceive based on same utility model, the utility model embodiment still provides a kind of display device, comprise the above-mentioned array base palte that the utility model embodiment provides, this display device can be: any product or parts with Presentation Function such as mobile phone, panel computer, televisor, display, notebook computer, digital album (digital photo frame), navigating instrument.Other requisite ingredient for this display device is and will be understood by those skilled in the art that to have, and does not repeat at this, also should as to restriction of the present utility model.The enforcement of this display device see the embodiment of above-mentioned array base palte, can repeat part and repeats no more.
A kind of array base palte that the utility model embodiment provides and display device, wherein array base palte comprises: be arranged on the black matrix on underlay substrate, array base palte has the multiple pixel cells be arranged in array, the orthogonal projection of pattern on underlay substrate of black matrix covers the gap location between adjacent pixel cell, the surface of black matrix has can carry out irreflexive first concaveconvex structure by the light being irradiated to black matrix surface, because first concaveconvex structure on black matrix surface has diffuse reflection effect, when extraneous light is irradiated to black matrix surperficial, extraneous light is diffusely reflected, thus reduce the light intensity of reflected light, improve the observability of each pixel cell region of array base palte, the display effect of improving picture.
Obviously, those skilled in the art can carry out various change and modification to the utility model and not depart from spirit and scope of the present utility model.Like this, if these amendments of the present utility model and modification belong within the scope of the utility model claim and equivalent technologies thereof, then the utility model is also intended to comprise these change and modification.
Claims (11)
1. an array base palte, comprise: underlay substrate, be arranged on the black matrix on described underlay substrate, described array base palte has the multiple pixel cells be arranged in array, the orthogonal projection of pattern on underlay substrate of described black matrix covers the gap location between adjacent described pixel cell at least in part, it is characterized in that:
The surface at least partially of described black matrix has can carry out irreflexive first concaveconvex structure by the light being irradiated to described black matrix surface.
2. array base palte as claimed in claim 1, it is characterized in that, also comprise: be arranged on the below of described black matrix and the insulation course directly contacted with described black matrix, the surface of described insulation course has the second concaveconvex structure matched with first concaveconvex structure on described black matrix surface.
3. array base palte as claimed in claim 2, it is characterized in that, the material of described black matrix is metal material.
4. array base palte as claimed in claim 3, is characterized in that, also comprise: the first electrode being arranged on the slit-shaped in each described pixel cell region on underlay substrate, and described first electrode is identical with the material of described black matrix and arrange with layer.
5. array base palte as claimed in claim 4, is characterized in that, also comprise: be arranged on the second electrode in each described pixel cell region on underlay substrate;
Described second electrode is by described insulation course and described first electrode mutually insulated.
6. array base palte as claimed in claim 5, it is characterized in that, described second electrode is plane-shape electrode or gap electrode.
7. array base palte as claimed in claim 5, it is characterized in that, described first electrode and the orthogonal projection of described second electrode on underlay substrate overlap at least partly.
8. array base palte as claimed in claim 5, it is characterized in that, described first electrode is public electrode, and described second electrode is pixel electrode; Or,
Described first electrode is pixel electrode, and described second electrode is public electrode.
9. the array base palte as described in any one of claim 2-8, is characterized in that, described insulation course is the chromatic filter layer comprising the different optical filter of at least three kinds of colors.
10. the array base palte as described in any one of claim 2-8, is characterized in that, the width of described first concaveconvex structure is 3 to 6 microns; And/or,
The degree of depth of described first concaveconvex structure is 0.5 to 1.5 micron; And/or,
Described first concaveconvex structure be spaced apart 3 to 6 microns.
11. 1 kinds of display device, is characterized in that, comprise the array base palte as described in any one of claim 1-10.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520005469.4U CN204302626U (en) | 2015-01-04 | 2015-01-04 | A kind of array base palte and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520005469.4U CN204302626U (en) | 2015-01-04 | 2015-01-04 | A kind of array base palte and display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204302626U true CN204302626U (en) | 2015-04-29 |
Family
ID=53108157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520005469.4U Active CN204302626U (en) | 2015-01-04 | 2015-01-04 | A kind of array base palte and display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204302626U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104536194A (en) * | 2015-01-04 | 2015-04-22 | 京东方科技集团股份有限公司 | Array substrate, method for manufacturing array substrate and display device |
| CN104733456A (en) * | 2015-03-23 | 2015-06-24 | 京东方科技集团股份有限公司 | Array substrate, preparation method thereof and display device |
| CN106654046A (en) * | 2016-12-20 | 2017-05-10 | 武汉华星光电技术有限公司 | Oled display panel and manufacturing method thereof |
| CN107093562A (en) * | 2017-05-18 | 2017-08-25 | 京东方科技集团股份有限公司 | A kind of organic film base plate preparation method, organic ilm substrate and display panel |
| WO2021169944A1 (en) * | 2020-02-27 | 2021-09-02 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof, display panel and display device |
-
2015
- 2015-01-04 CN CN201520005469.4U patent/CN204302626U/en active Active
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104536194A (en) * | 2015-01-04 | 2015-04-22 | 京东方科技集团股份有限公司 | Array substrate, method for manufacturing array substrate and display device |
| WO2016107039A1 (en) * | 2015-01-04 | 2016-07-07 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method therefor, and display device |
| US9709864B2 (en) | 2015-01-04 | 2017-07-18 | Boe Technology Group Co., Ltd. | Array substrate and its manufacturing method and display device |
| CN104733456A (en) * | 2015-03-23 | 2015-06-24 | 京东方科技集团股份有限公司 | Array substrate, preparation method thereof and display device |
| CN104733456B (en) * | 2015-03-23 | 2018-04-27 | 京东方科技集团股份有限公司 | A kind of array base palte and preparation method thereof, display device |
| US10054814B2 (en) | 2015-03-23 | 2018-08-21 | Boe Technology Group Co., Ltd. | Array substrate, manufacturing method thereof, and display apparatus |
| CN106654046A (en) * | 2016-12-20 | 2017-05-10 | 武汉华星光电技术有限公司 | Oled display panel and manufacturing method thereof |
| CN107093562A (en) * | 2017-05-18 | 2017-08-25 | 京东方科技集团股份有限公司 | A kind of organic film base plate preparation method, organic ilm substrate and display panel |
| CN107093562B (en) * | 2017-05-18 | 2019-03-26 | 京东方科技集团股份有限公司 | A kind of organic film base plate preparation method, organic ilm substrate and display panel |
| WO2021169944A1 (en) * | 2020-02-27 | 2021-09-02 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof, display panel and display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104536194A (en) | Array substrate, method for manufacturing array substrate and display device | |
| CN204302626U (en) | A kind of array base palte and display device | |
| CN103185981B (en) | Colorful filter array substrate and preparation method thereof and display device | |
| CN105304649B (en) | Array substrate and preparation method thereof, display panel, display device | |
| CN101825815B (en) | TFT (Thin Film Transistor)-LCD (Liquid Crystal Display) array baseplate and manufacturing method thereof | |
| CN102566148B (en) | Liquid crystal display panel and method for fabricating the same | |
| CN103353699A (en) | Array substrate, preparation method thereof and display device | |
| CN104020902B (en) | A kind of touch-screen and display device | |
| CN103208491A (en) | Array substrate, manufacture method of array substrate and display device | |
| CN104037126A (en) | Array substrate preparation method, array substrate and display device | |
| CN103515375B (en) | Array base palte and manufacture method thereof and display unit | |
| CN102800630A (en) | Array substrate and preparation method and display device thereof | |
| CN203299499U (en) | Array substrate and display device | |
| JP6188793B2 (en) | TFT array substrate, manufacturing method thereof, and display device | |
| CN103424925B (en) | A kind of array base palte and manufacture method, display device | |
| CN106353944A (en) | Array base plate, manufacturing method of array base plate, display panel and display device | |
| CN100447628C (en) | Manufacturing method for chromatic filter layer | |
| CN111897168A (en) | Array substrate, preparation method thereof and display device | |
| US20180308875A1 (en) | Array Substrate, Manufacturing Method Thereof, Display Panel and Display Device | |
| CN104597647A (en) | Liquid crystal display panel and manufacturing method thereof | |
| CN103913944A (en) | Half-toning mask plate, array substrate, its manufacturing method and display apparatus | |
| CN102637698B (en) | Array substrate and preparation method thereof | |
| CN203085536U (en) | Array substrate and display device | |
| CN102315167B (en) | Wide visual angle LCD array substrate manufacturing method | |
| CN104851891A (en) | Array substrate and preparation method thereof and display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |