CN204287726U - Photoresist nano-imprinting composite template - Google Patents
Photoresist nano-imprinting composite template Download PDFInfo
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- CN204287726U CN204287726U CN201420812246.4U CN201420812246U CN204287726U CN 204287726 U CN204287726 U CN 204287726U CN 201420812246 U CN201420812246 U CN 201420812246U CN 204287726 U CN204287726 U CN 204287726U
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- photoresist
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- composite template
- imprinting composite
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Abstract
The utility model discloses a kind of photoresist nano-imprinting composite template, it comprises: substrate; Photoresist layer, it is arranged on substrate, and the surface of this photoresist layer has stamping structure.The utility model compared with prior art, can reduce manufacturing cost, and improves the production efficiency of nano-imprinting composite template.
Description
Technical field
The utility model relates to a kind of nano impression device, is specifically related to a kind of photoresist nano-imprinting composite template.
Background technology
Photoresist also known as photoresist, the photosensitive mixing material be made up of photosensitive resin, sensitizer and solvent three kinds of principal ingredients.After illumination, can there is photocuring reaction in exposure region in photosensitive resin, make the physical property of this material soon, and particularly significant change occurs for dissolubility, affinity etc.Through suitable solvent process, dissolve soluble part, obtain required image, therefore photoresist is widely used among the making of circuit board.
For current nano-imprinting composite template, its stamping structure be all print with PDMS layer on.Chinese patent CN203630508U and CN203025473U just discloses two kinds of nano-imprinting composite templates adopting PDMS layer to print stamping structure.But the cost of manufacture of PDMS layer is generally higher, and its time required for solidification is longer, general needs 3 hours, like this for the making of nano-imprinting composite template, to a certain degree have impact on its production efficiency.
Utility model content
In order to solve the problems of the technologies described above, the utility model provides a kind of photoresist nano-imprinting composite template that can reduce costs, enhance productivity.
In order to achieve the above object, the technical solution of the utility model is as follows:
Photoresist nano-imprinting composite template, it comprises:
Substrate;
Photoresist layer, it is arranged on substrate, and the surface of this photoresist layer has stamping structure.
The utility model is by arranging photoresist layer, and print stamping structure thereon, in order to substitute the PDMS layer with stamping structure of the prior art, utilize the characteristic of photoresist, manufacturing cost can be reduced compared to PDMS layer, simultaneously photoresist is due to photaesthesia, and its solidification required time can reduce (set time of photoresist probably needs about 10 minutes) greatly compared to PDMS layer, thus the production efficiency of nano-imprinting composite template can be made to be improved.Meanwhile, use photoresist layer can also save the use of adhesive layer, reduce manufacturing cost further.
On the basis of technique scheme, the utility model can also do following improvement:
As preferred scheme, above-mentioned photoresist layer is UV glue-line.
Adopt above-mentioned preferred scheme, utilize the characteristic of UV glue, the production efficiency of nano-imprinting composite template can be improved further.
As preferred scheme, above-mentioned substrate is plastic plate or glass plate.
Adopt above-mentioned preferred scheme, steadiness and the serviceable life of whole nano-imprinting composite template can be improved.
As preferred scheme, above-mentioned plastic plate is PET or PC.
Adopt above-mentioned preferred scheme, steadiness and the serviceable life of whole nano-imprinting composite template can be improved further.
Accompanying drawing explanation
Fig. 1 is the structural representation of photoresist nano-imprinting composite template of the present utility model.
Wherein, 1. substrate 2. photoresist layer 21 stamping structure.
Embodiment
Preferred implementation of the present utility model is described in detail below in conjunction with accompanying drawing.
In order to reach the purpose of this utility model, as shown in Figure 1, in the some of them embodiment of photoresist nano-imprinting composite template of the present utility model, it comprises: substrate 1; Photoresist layer 2, it is arranged on substrate 1, and the surface of this photoresist layer 2 has stamping structure 21.This composite shuttering is by arranging photoresist layer, and print stamping structure thereon, in order to substitute the PDMS layer with stamping structure of the prior art, utilize the characteristic of photoresist, manufacturing cost can be reduced compared to PDMS layer, simultaneously photoresist is due to photaesthesia, and its solidification required time can reduce (set time of photoresist probably needs about 10 minutes) greatly compared to PDMS layer, thus the production efficiency of nano-imprinting composite template can be made to be improved.Meanwhile, use photoresist layer can also save the use of adhesive layer, reduce manufacturing cost further.
In order to optimize implementation result of the present utility model further, in other embodiments of photoresist nano-imprinting composite template of the present utility model, on the basis of the above, above-mentioned photoresist layer 2 is UV glue-line.Adopt the scheme of this embodiment, utilize the characteristic of UV glue, the production efficiency of nano-imprinting composite template can be improved further.Certainly, except UV glue-line, we also can adopt other known photoresist types, will not enumerate at this.
In order to optimize implementation result of the present utility model further, in other embodiments of photoresist nano-imprinting composite template of the present utility model, on the basis of the above, above-mentioned substrate is plastic plate or glass plate, and this plastic plate is specifically as follows PET or PC.Adopt the scheme of this embodiment, steadiness and the serviceable life of whole nano-imprinting composite template can be improved.
The manufacturing process of photoresist nano-imprinting composite template of the present utility model is: on substrate, apply the photoresists such as UV glue, then adopt the mode of flexible imprints to impress above and produce micro-nano structure, after the demoulding, namely obtain photoresist nano-imprinting composite template of the present utility model.
Above-described is only preferred implementation of the present utility model; it should be pointed out that for the person of ordinary skill of the art, under the prerequisite not departing from the utility model creation design; can also make some distortion and improvement, these all belong to protection domain of the present utility model.
Claims (4)
1. photoresist nano-imprinting composite template, is characterized in that, comprising:
Substrate;
Photoresist layer, it is arranged on described substrate, and the surface of described photoresist layer has stamping structure.
2. photoresist nano-imprinting composite template according to claim 1, is characterized in that, described photoresist layer is UV glue-line.
3. photoresist nano-imprinting composite template according to claim 1 and 2, is characterized in that, described substrate is plastic plate or glass plate.
4. photoresist nano-imprinting composite template according to claim 3, is characterized in that, described plastic plate is PET or PC.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420812246.4U CN204287726U (en) | 2014-12-18 | 2014-12-18 | Photoresist nano-imprinting composite template |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420812246.4U CN204287726U (en) | 2014-12-18 | 2014-12-18 | Photoresist nano-imprinting composite template |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204287726U true CN204287726U (en) | 2015-04-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420812246.4U Active CN204287726U (en) | 2014-12-18 | 2014-12-18 | Photoresist nano-imprinting composite template |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204287726U (en) |
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2014
- 2014-12-18 CN CN201420812246.4U patent/CN204287726U/en active Active
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Legal Events
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| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP03 | Change of name, title or address |
Address after: 215513 Jiangsu city of Suzhou province Changshou City economic and Technological Development Zone (four Road No. 11) Branch Chong Park Building No. 2 102 Patentee after: Suzhou Guangduo Micro, Nano-Device Co., Ltd. Address before: 215513 Jiangsu city of Suzhou province Changshou City Changshu economic and Technological Development Zone (four Road No. 11) Branch Chong Park Building No. 2 102 Patentee before: SuZhou GuangDuo Micro,Nano-Device Co., Ltd. |