CN204268073U - A kind of semiconductor machining gas transportation facilities - Google Patents
A kind of semiconductor machining gas transportation facilities Download PDFInfo
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- CN204268073U CN204268073U CN201420639361.6U CN201420639361U CN204268073U CN 204268073 U CN204268073 U CN 204268073U CN 201420639361 U CN201420639361 U CN 201420639361U CN 204268073 U CN204268073 U CN 204268073U
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 20
- 238000003754 machining Methods 0.000 title claims 5
- 230000001105 regulatory effect Effects 0.000 claims abstract description 62
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 49
- 239000010959 steel Substances 0.000 claims abstract description 49
- 239000007789 gas Substances 0.000 claims description 111
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 61
- 229910052757 nitrogen Inorganic materials 0.000 claims description 28
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- 229910001873 dinitrogen Inorganic materials 0.000 description 5
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- 238000000746 purification Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
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Abstract
本实用新型公开了一种半导体加工用气体输送设备，包括四个并联设置的钢瓶；每个所述钢瓶对应连接一根出气管，所述的四根出气管上均设有一个位于所述钢瓶出气口处的气体压力侦测器，以及一个调节阀，所述的四个调节阀以两个为一组，每组对应连接一个总调节阀，所述的两个总调节阀同时连接一根总出气管，所述总出气管上设有与所述的两个总调节阀连接的截止阀和一个位于所述总出气管出口处的总出气阀。其技术效果是：其可在不减少气体供应量的前提下，减少钢瓶更换次数，减少人为对配件的接触而减少配件成本费用，降低企业的生产成本。
The utility model discloses a gas conveying device for semiconductor processing, which comprises four steel cylinders arranged in parallel; each of the steel cylinders is correspondingly connected with a gas outlet pipe, and each of the four gas outlet pipes is provided with a A gas pressure detector at the gas outlet, and a regulating valve, the four regulating valves are in groups of two, and each group is correspondingly connected to a general regulating valve, and the two general regulating valves are connected to a The total air outlet pipe is provided with a shut-off valve connected with the two general regulating valves and a total air outlet valve located at the outlet of the total air outlet pipe. Its technical effect is: it can reduce the replacement times of steel cylinders without reducing the gas supply, reduce human contact with accessories, reduce the cost of accessories, and reduce the production cost of enterprises.
Description
技术领域technical field
本实用新型涉及一种半导体加工用气体输送设备。The utility model relates to a gas delivery device for semiconductor processing.
背景技术Background technique
在半导体工艺中化学气体是必不可少的，而安全、快捷地使用化学气体是非常重要的。而装载化学气体的钢瓶的规格是不一的，更换钢瓶是人工的，存在着一定的不确定性，目前工艺是四个钢瓶分为两组，这种分组方式，造成更换气体过程中，当测试泄漏率，发现气体输送系统有泄漏时，不能判断一组中哪一瓶钢瓶有问题，可能仅仅是安装时没有吻合好，或者本身钢瓶出气口有问题，这时需要一次次拆下重新安装以此排查问题点，长期如此操作，会加快气体输送设备中管线和接口的老化，造成配件费用增加。Chemical gases are indispensable in semiconductor processes, and it is very important to use chemical gases safely and quickly. The specifications of the steel cylinders loaded with chemical gases are different, and the replacement of the steel cylinders is manual, and there is a certain degree of uncertainty. The current process is to divide the four steel cylinders into two groups. Test the leak rate and find that there is a leak in the gas delivery system. It is impossible to judge which cylinder in a group has a problem. It may be that the installation did not match well, or there is a problem with the gas outlet of the cylinder itself. At this time, it needs to be removed and reinstalled again and again. Use this to check the problem points. If you do this for a long time, it will accelerate the aging of the pipelines and interfaces in the gas delivery equipment, resulting in an increase in the cost of accessories.
通过为每组钢瓶配备一套气体压力侦测器，将两个钢瓶算作一个整体，钢瓶内气体压力低于限值时报警，报警次数只有两次，只需人为查看一次。但这样分组必须等两个钢瓶都用完才能更换，但更换时对新钢瓶的好坏没有准确的判断。因此使用这种分组方式，同样造成人工的浪费，并且增加接口的损耗速率，致使相关配件使用周期减少，增加相关费用。By equipping each group of steel cylinders with a set of gas pressure detectors, the two cylinders are considered as a whole, and when the gas pressure in the cylinders is lower than the limit value, it will alarm. The number of alarms is only twice, and it only needs to be checked once manually. But this grouping must wait until both steel cylinders are used up before they can be replaced, but there is no accurate judgment on the quality of the new steel cylinders during the replacement. Therefore, the use of this grouping method also causes a waste of labor and increases the loss rate of the interface, resulting in a reduction in the service life of related accessories and an increase in related costs.
实用新型内容Utility model content
本实用新型的目的是为了克服现有技术的不足，提供一种半导体加工用气体输送设备，可在不减少气体供应量的前提下，减少钢瓶更换次数，减少人为对配件的接触而减少配件成本费用，降低企业的生产成本。The purpose of this utility model is to overcome the deficiencies of the prior art and provide a gas delivery device for semiconductor processing, which can reduce the number of steel cylinder replacements and reduce the cost of accessories without reducing the gas supply. expenses, reducing the production cost of the enterprise.
实现上述目的的一种技术方案是：一种半导体加工用气体输送设备，包括四个并联设置的钢瓶；A technical solution for achieving the above purpose is: a gas conveying device for semiconductor processing, including four steel cylinders arranged in parallel;
每个所述钢瓶对应连接一根出气管，所述的四根出气管上均设有一个位于所述钢瓶出气口处的气体压力侦测器，以及一个调节阀，所述的四个调节阀以两个为一组，每组对应连接一个总调节阀，所述的两个总调节阀同时连接一根总出气管，所述总出气管上设有与所述的两个总调节阀连接的截止阀和一个位于所述总出气管出口处的总出气阀。Each of the steel cylinders is correspondingly connected to a gas outlet pipe, and the four gas outlet pipes are provided with a gas pressure detector positioned at the gas outlet of the steel cylinder, and a regulating valve, and the four regulating valves Take two as a group, and each group is connected to a general regulating valve, and the two general regulating valves are connected to a general air outlet pipe at the same time, and the general air outlet pipe is provided with a valve connected to the two general regulating valves. The cut-off valve and a total gas outlet valve located at the outlet of the total gas outlet pipe.
进一步的，该气体输送设备还包括一套气体压力维持设备，包括氮气进气管、切换阀和气体输送管，所述氮气进气管上设有氮气进气阀，所述氮气进气管与所述切换阀连接，所述气体输送管的一端连接所述切换阀，另外一端在所述截止阀和所述总出气阀之间与所述总出气管连接，所述气体输送管上设有一个气体流量调节阀，所述的切换阀与所述的四个调节阀通过电路连接。Further, the gas delivery equipment also includes a set of gas pressure maintenance equipment, including a nitrogen gas inlet pipe, a switching valve and a gas delivery pipe, the nitrogen gas inlet pipe is provided with a nitrogen gas inlet valve, and the nitrogen gas inlet pipe is connected to the switching valve. One end of the gas delivery pipe is connected to the switching valve, the other end is connected to the main outlet pipe between the stop valve and the main outlet valve, and a gas flow rate is set on the gas delivery pipe. A regulating valve, the switching valve is connected with the four regulating valves through a circuit.
再进一步的，所述切换阀上还连接有一根空气进气管。Still further, an air intake pipe is also connected to the switching valve.
进一步的，该气体输送设备还包括一套气体净化系统，所述气体净化系统包括两个排气阀和一个总排气阀，两个所述排气阀与两个所述总调节阀之间对应通过一根排气管连接，所述总排气阀和两个所述排气阀之间通过一根总排气管连接。Further, the gas delivery equipment also includes a set of gas purification system, the gas purification system includes two exhaust valves and a main exhaust valve, between the two said exhaust valves and the two said main regulating valves Corresponding to the connection through an exhaust pipe, the general exhaust valve is connected to the two exhaust valves through a general exhaust pipe.
采用了本实用新型的一种半导体加工用气体输送设备的技术方案，即包括四个并联设置的钢瓶；每个所述钢瓶对应连接一根出气管，所述的四根出气管上均设有一个位于所述钢瓶出气口处的气体压力侦测器，以及一个调节阀，所述的四个调节阀以两个为一组，每组对应连接一个总调节阀，所述的两个总调节阀同时连接一根总出气管，所述总出气管上设有与所述的两个总调节阀连接的截止阀和一个位于所述总出气管出口处的总出气阀的技术方案。其技术效果是：其可在不减少气体供应量的前提下，减少钢瓶更换次数，减少人为对配件的接触而减少配件成本费用，降低企业的生产成本。Adopting the technical scheme of a kind of gas conveying equipment for semiconductor processing of the present invention, namely including four steel cylinders arranged in parallel; A gas pressure detector located at the gas outlet of the cylinder, and a regulating valve, the four regulating valves are in groups of two, and each group is correspondingly connected to a general regulating valve, and the two general regulating valves The valve is connected to a main air outlet pipe at the same time, and the main air outlet pipe is provided with a shut-off valve connected with the two main regulating valves and a technical solution of a main air outlet valve located at the outlet of the main air outlet pipe. Its technical effect is: it can reduce the replacement times of steel cylinders without reducing the gas supply, reduce human contact with accessories, reduce the cost of accessories, and reduce the production cost of enterprises.
附图说明Description of drawings
图1为本实用新型的一种半导体加工用气体输送设备的结构示意图。FIG. 1 is a schematic structural view of a gas delivery device for semiconductor processing of the present invention.
具体实施方式Detailed ways
请参阅图1，本实用新型的发明人为了能更好地对本实用新型的技术方案进行理解，下面通过具体地实施例，并结合附图进行详细地说明：Please refer to Fig. 1, in order to better understand the technical solution of the present utility model, the inventor of the utility model will describe in detail below through specific embodiments in conjunction with the accompanying drawings:
请参阅图1，本实用新型的一种半导体加工用气体输送设备，包括第一钢瓶11、第二钢瓶12、第三钢瓶13和第四钢瓶14。第一钢瓶11连接第一出气管，第二钢瓶12连接第二出气管，第三钢瓶13连接第三出气管，第四钢瓶14连接第四出气管。第一出气管上设有第一调节阀31以及位于第一钢瓶11出气口处的第一气体压力侦测器21，第二出气管上设有第二调节阀32以及位于第二钢瓶12出气口处的第二气体压力侦测器22，第三出气管上设有第三调节阀33以及位于第三钢瓶13出气口处的第三气体压力侦测器23，第四出气管上设有第四调节阀34以及位于第四钢瓶14出气口处的第四气体压力侦测器24。第一气体压力侦测器21，第二气体压力侦测器22，第三气体压力侦测器23，第四气体压力侦测器14，用以侦测第一钢瓶11、第二钢瓶12、第三钢瓶13和第四钢瓶14内的气体压力。Please refer to FIG. 1 , a semiconductor processing gas delivery device of the present invention includes a first steel cylinder 11 , a second steel cylinder 12 , a third steel cylinder 13 and a fourth steel cylinder 14 . The first steel cylinder 11 is connected with the first air outlet pipe, the second steel cylinder 12 is connected with the second air outlet pipe, the third steel cylinder 13 is connected with the third air outlet pipe, and the fourth steel cylinder 14 is connected with the fourth air outlet pipe. The first gas outlet pipe is provided with a first regulating valve 31 and a first gas pressure detector 21 located at the gas outlet of the first steel cylinder 11; The second gas pressure detector 22 at the gas port, the third gas outlet pipe is provided with a third regulating valve 33 and the third gas pressure detector 23 positioned at the gas outlet of the third steel cylinder 13, the fourth gas outlet pipe is provided with The fourth regulating valve 34 and the fourth gas pressure detector 24 located at the gas outlet of the fourth cylinder 14 . The first gas pressure detector 21, the second gas pressure detector 22, the third gas pressure detector 23, and the fourth gas pressure detector 14 are used to detect the first steel cylinder 11, the second steel cylinder 12, The gas pressure in the third steel cylinder 13 and the fourth steel cylinder 14.
第一调节阀31和第二调节阀32同时连接第一总调节阀41，第三调节阀33和第四调节阀34同时连接第二总调节阀42，第一总调节阀41和第二总调节阀42同时连接总出气管51，总出气管51上设有与第一总调节阀41和第二总调节阀42连接的一个截止阀52，以及位于总出气管51出口处的总出气阀53，从总出气管51流出的氮气流向用以对半导体进行加工的工位。The first regulating valve 31 and the second regulating valve 32 are connected to the first general regulating valve 41 at the same time, the third regulating valve 33 and the fourth regulating valve 34 are connected to the second general regulating valve 42 at the same time, the first general regulating valve 41 and the second general regulating valve The regulating valve 42 is connected to the total air outlet pipe 51 at the same time, and the total air outlet pipe 51 is provided with a shut-off valve 52 connected with the first general regulating valve 41 and the second general regulating valve 42, and the total air outlet valve at the outlet of the total air outlet pipe 51 53 , the nitrogen flowing out from the main gas outlet pipe 51 flows to the station for processing semiconductors.
该半导体加工用气体输送设备上还包括一套气体压力维持设备，以维持第一调节阀31、第二调节阀32、第三总调节阀33、第四调节阀34，以及第一总调节阀41、第二总调节阀43，以及截止阀52正常工作做所要的压力。该系统包括氮气进气管61，切换阀62和气体输送管63，氮气进气管61上设有氮气进气阀64，用以调节氮气的流量，气体输送管63一端连接切换阀62，另外一端在总出气阀53和截止阀52之间与总出气管51连接。气体输送管63设有一个气体流量调节阀65，切换阀62上还连接有一根空气进气管66。The gas delivery equipment for semiconductor processing also includes a set of gas pressure maintenance equipment to maintain the first regulating valve 31, the second regulating valve 32, the third general regulating valve 33, the fourth regulating valve 34, and the first general regulating valve. 41. The second general regulating valve 43 and the cut-off valve 52 work normally to achieve the desired pressure. The system comprises a nitrogen inlet pipe 61, a switching valve 62 and a gas delivery pipe 63. The nitrogen inlet pipe 61 is provided with a nitrogen inlet valve 64 to regulate the flow of nitrogen. One end of the gas delivery pipe 63 is connected to the switching valve 62, and the other end is in the The total gas outlet valve 53 and the cut-off valve 52 are connected with the total gas outlet pipe 51 . The gas delivery pipe 63 is provided with a gas flow regulating valve 65 , and an air intake pipe 66 is also connected to the switching valve 62 .
该半导体加工用气体输送设备还包括一套气体净化系统，包括第一排气阀71、第二排气阀72和一个总排气阀73，第一排气阀71和第二排气阀72对应通过第一排气管和第二排气管与第一总调节阀41和第二总调节阀42连接，总排气阀73和第一排气阀71，以及第二排气阀72之间通过一根总排气管连接。The gas delivery equipment for semiconductor processing also includes a set of gas purification system, including a first exhaust valve 71, a second exhaust valve 72 and a total exhaust valve 73, the first exhaust valve 71 and the second exhaust valve 72 Correspondingly connect the first general regulating valve 41 and the second general regulating valve 42 through the first exhaust pipe and the second exhaust pipe, the total exhaust valve 73 and the first exhaust valve 71, and the second exhaust valve 72 are connected by a common exhaust pipe.
在该半导体加工用气体输送设备向对半导体进行加工的工位正常供气时，切换阀62将空气进气管66关闭，氮气进气管61打开，第一调节阀31、第二调节阀32、第三调节阀33、第四调节阀34、第一总调节阀41、第二总调节阀42打开，截止阀52打开，第一排气阀71、第二排气阀72和总排气阀73关闭。When the gas conveying equipment for semiconductor processing is normally supplying gas to the semiconductor processing station, the switching valve 62 closes the air inlet pipe 66, opens the nitrogen gas inlet pipe 61, and the first regulating valve 31, the second regulating valve 32, the second The third regulating valve 33, the fourth regulating valve 34, the first general regulating valve 41, the second general regulating valve 42 are opened, the stop valve 52 is opened, the first exhaust valve 71, the second exhaust valve 72 and the total exhaust valve 73 closure.
第一气体压力侦测器21连接第一钢瓶11，侦测第一钢瓶11内的气体压力，第二气体压力侦测器22连接第二钢瓶12，侦测第二钢瓶12内的气压力，第三气体压力侦测器23连接第三钢瓶13，侦测第三钢瓶13内的气体压力，第四气体压力侦测器24连接第四钢瓶14，侦测第四钢瓶14内的气体压力，每次换钢瓶都只要读取一个气体压力侦测器上的数据，这样也可以在三个钢瓶都空了时对钢瓶进行更换，即换钢瓶时机更灵活，第一钢瓶11、第二钢瓶12、第三钢瓶13和第四钢瓶14内气体用完时，对应的调节阀或总调节阀关闭。同时这样的设计便于及时判断泄漏钢瓶的位置，因此其可在不减少气体供应量的前提下，减少钢瓶更换次数，减少人为对配件的接触而减少配件成本费用，降低企业的生产成本。The first gas pressure detector 21 is connected to the first steel cylinder 11 to detect the gas pressure in the first steel cylinder 11, and the second gas pressure detector 22 is connected to the second steel cylinder 12 to detect the gas pressure in the second steel cylinder 12, The third gas pressure detector 23 is connected to the third steel cylinder 13 to detect the gas pressure in the third steel cylinder 13, and the fourth gas pressure detector 24 is connected to the fourth steel cylinder 14 to detect the gas pressure in the fourth steel cylinder 14, Every time you change the steel cylinder, you only need to read the data on a gas pressure detector, so you can also change the steel cylinder when the three steel cylinders are all empty, that is, the timing of changing the steel cylinder is more flexible. 1. When the gas in the third steel cylinder 13 and the fourth steel cylinder 14 is used up, the corresponding regulating valve or the total regulating valve is closed. At the same time, this design is convenient for timely judging the location of the leaking steel cylinder, so it can reduce the number of cylinder replacements without reducing the gas supply, reduce human contact with accessories, reduce the cost of accessories, and reduce the production cost of the enterprise.
当侦测第一钢瓶11内气体压力时，第一气体压力侦测器21打开，第二气体压力侦测器22、第三气体压力侦测器23、第四气体压力侦测器24关闭，切换阀62与氮气进气管61连通，氮气进气阀64和截止阀52打开，氮气进气管61内的氮气冲入，给予第一气体压力侦测器21测量所需气压。When detecting the gas pressure in the first cylinder 11, the first gas pressure detector 21 is opened, the second gas pressure detector 22, the third gas pressure detector 23, and the fourth gas pressure detector 24 are closed, The switching valve 62 communicates with the nitrogen inlet pipe 61, the nitrogen inlet valve 64 and the shut-off valve 52 are opened, and the nitrogen in the nitrogen inlet pipe 61 rushes in to give the first gas pressure detector 21 to measure the required air pressure.
当侦测第二钢瓶12内气体压力时，第二气体压力侦测器22打开，第一气体压力侦测器21、第三气体压力侦测器23和第四气体压力侦测器24关闭，切换阀62与氮气进气管61连通，氮气进气阀64和截止阀52打开，氮气进气管61内的氮气冲入，给予第二气体压力侦测器22测量所需气压。When detecting the gas pressure in the second steel cylinder 12, the second gas pressure detector 22 is opened, and the first gas pressure detector 21, the third gas pressure detector 23 and the fourth gas pressure detector 24 are closed, The switching valve 62 communicates with the nitrogen inlet pipe 61, the nitrogen inlet valve 64 and the shut-off valve 52 are opened, and the nitrogen in the nitrogen inlet pipe 61 rushes in to give the second gas pressure detector 22 to measure the required air pressure.
当侦测第三钢瓶13内气体压力时，第三气体压力侦测器23打开，第二气体压力侦测器22、第一气体压力侦测器21和第四气体压力侦测器24关闭，切换阀62与氮气进气管61连通，氮气进气阀64和截止阀52打开，氮气进气管61内的氮气冲入，给予第三气体压力侦测器23测量所需气压。When detecting the gas pressure in the third cylinder 13, the third gas pressure detector 23 is opened, the second gas pressure detector 22, the first gas pressure detector 21 and the fourth gas pressure detector 24 are closed, The switching valve 62 communicates with the nitrogen inlet pipe 61, the nitrogen inlet valve 64 and the shut-off valve 52 are opened, and the nitrogen in the nitrogen inlet pipe 61 rushes in to give the third gas pressure detector 23 to measure the required air pressure.
当侦测第四钢瓶14内气体压力时，第四气体压力侦测器24打开，第二气体压力侦测器22、第三气体压力侦测器23和第一气体压力侦测器21关闭，切换阀62与氮气进气管61连通，氮气进气阀64和截止阀52打开，氮气进气管61内的氮气冲入，给予第四压力侦测器24测量所需气压。When detecting the gas pressure in the fourth steel cylinder 14, the fourth gas pressure detector 24 is opened, the second gas pressure detector 22, the third gas pressure detector 23 and the first gas pressure detector 21 are closed, The switching valve 62 communicates with the nitrogen inlet pipe 61, the nitrogen inlet valve 64 and the shut-off valve 52 are opened, and the nitrogen in the nitrogen inlet pipe 61 rushes in to give the fourth pressure detector 24 to measure the required air pressure.
当该半导体加工用气体输送设备维护时，切换阀62将空气进气管66打开，氮气进气管61关闭，第一调节阀31、第二调节阀32、第三调节阀33、第四调节阀34、第一总调节阀41、第二总调节阀42关闭，截止阀52关闭，通入空气，以防止切换阀62的损坏。When the semiconductor processing gas conveying equipment is maintained, the switching valve 62 opens the air inlet pipe 66, and the nitrogen inlet pipe 61 is closed. The first regulating valve 31, the second regulating valve 32, the third regulating valve 33, and the fourth regulating valve 34 , The first general regulating valve 41 and the second general regulating valve 42 are closed, the shut-off valve 52 is closed, and air is introduced to prevent the switching valve 62 from being damaged.
当要重启该半导体加工用气体输送设备时，切换阀62将空气进气管66关闭，氮气进气管61打开，第一调节阀31、第二调节阀32、第三调节阀33、第四调节阀34打开，第一总调节阀41、第二总调节阀42关闭，截止阀52打开，第一排气阀71和第二排气阀72和总排气阀73打开，以使整个管路内充满氮气。When the gas conveying equipment for semiconductor processing is to be restarted, the switching valve 62 closes the air inlet pipe 66, opens the nitrogen inlet pipe 61, and the first regulating valve 31, the second regulating valve 32, the third regulating valve 33, and the fourth regulating valve 34 is opened, the first general regulating valve 41 and the second general regulating valve 42 are closed, the shut-off valve 52 is opened, the first exhaust valve 71, the second exhaust valve 72 and the total exhaust valve 73 are opened, so that the whole pipeline Filled with nitrogen.
本技术领域中的普通技术人员应当认识到，以上的实施例仅是用来说明本实用新型，而并非用作为对本实用新型的限定，只要在本实用新型的实质精神范围内，对以上所述实施例的变化、变型都将落在本实用新型的权利要求书范围内。Those of ordinary skill in the art should recognize that the above embodiments are only used to illustrate the utility model, rather than as a limitation to the utility model, as long as within the spirit of the utility model, the above-mentioned The changes and modifications of the embodiments will all fall within the scope of the claims of the present utility model.
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| CN105439067A (en) * | 2015-11-24 | 2016-03-30 | 南京国盛电子有限公司 | Trichlorosilane supply device suitable for 8-inch silicon epitaxy process system |
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| CN105439067A (en) * | 2015-11-24 | 2016-03-30 | 南京国盛电子有限公司 | Trichlorosilane supply device suitable for 8-inch silicon epitaxy process system |
| CN105439067B (en) * | 2015-11-24 | 2018-06-29 | 南京国盛电子有限公司 | Suitable for the trichlorosilane feeding mechanism of 8 inches of silicon epitaxy process systems |
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