CN204265826U - Metal mask version - Google Patents
Metal mask version Download PDFInfo
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- CN204265826U CN204265826U CN201420748162.9U CN201420748162U CN204265826U CN 204265826 U CN204265826 U CN 204265826U CN 201420748162 U CN201420748162 U CN 201420748162U CN 204265826 U CN204265826 U CN 204265826U
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Abstract
The utility model discloses a kind of metal mask version, described metal mask version comprises first substrate and second substrate, described first substrate has at least one first opening, described second substrate has at least one second opening, described second substrate is laminated on described first substrate, and the first opening on described first substrate second opening portion corresponding with on described second substrate is overlapping.The utility model makes actual breach when carrying out evaporation diminish, thus improves making precision, is conducive to the raising of PPI.
Description
Technical field
The utility model relates to organic light emitting display field, particularly relates to metal mask version during a kind of AMOLED evaporation.
Background technology
AMOLED (Active Matrix Organic Light Emitting Display, active array organic light emitting display device) has the features such as automatic luminous is low in energy consumption, speed of response fast, contrast gradient is higher, visual angle is wider.
In the process manufacturing AMOLED, need to carry out evaporation respectively to pixel RGB.As described in Figure 1, apply to mask when evaporation, this mask comprises substrate 10, and described substrate 10 is provided with opening 11, thus the region that opening 11 exposes is by evaporation, and other regions are blocked.And the size-dependence of opening 11 PPI (Pixels Per Inch, picture element density).High PPI is the development trend of AMOLED, and current main flow AMOLED shields the PPI of body between 300-400.How to improve PPI further, have in the industry following several method:
1, improve PPI by pixel arrangement cleverly, the resolving power promoted like this is not resolving power truly, and just improve the numerical value of resolving power, human eye still can tell granular sensation.
2, the precision by improving substrate improves PPI, but will realize this high precision, needs the ability promoting mask making, but more difficult realization at present.
Therefore, how improving PPI, has been problem demanding prompt solution.
Utility model content
The purpose of this utility model is, provides a kind of metal mask version, PPI is improved.
For solving the problems of the technologies described above, the utility model provides a kind of metal mask version, for evaporation process, described metal mask version comprises first substrate and second substrate, described first substrate has at least one first opening, described second substrate has at least one second opening, and described second substrate is laminated on described first substrate, and the first opening on described first substrate second opening portion corresponding with on described second substrate is overlapping.
Optionally, for described metal mask version, described first substrate is fixedly connected with second substrate.
Optionally, for described metal mask version, described first substrate and second substrate are by being welded and fixed.
Optionally, for described metal mask version, described first substrate and second substrate are flexibly connected.
Optionally, for described metal mask version, described first substrate and second substrate are fixed by a stationary installation.
Optionally, for described metal mask version, described first substrate or second substrate are provided with vernier adjustment knob.
Optionally, for described metal mask version, described first substrate or second substrate are provided with an elastic device in side, and opposite side is provided with two control pieces spaced apart and connector, interval between described two control pieces is wide at the top and narrow at the bottom, and described connector is placed in described interval.
Optionally, for described metal mask version, described first opening is identical with the shape of the second opening.
Optionally, for described metal mask version, described first opening is different with the shape of the second opening.
Optionally, for described metal mask version, the shape of described first opening is square, and the shape of described second opening is rectangle.
In the metal mask version that the utility model provides, comprise first substrate and second substrate, described first substrate has at least one first opening, described second substrate has at least one second opening, described second substrate is laminated on described first substrate, and the first opening on described first substrate second opening portion corresponding with on described second substrate is overlapping.Compared to existing technology, by partly overlapping of the first opening and the second opening, make opening have stop each other, like this with regard to make actual carry out evaporation time breach diminish, thus improve making precision, be conducive to the raising of PPI.
Accompanying drawing explanation
Fig. 1 is the structural representation of substrate in prior art mask;
Fig. 2 is the structural representation of substrate in the utility model mask;
Fig. 3 is the schematic diagram of a kind of micromatic setting in the utility model mask;
Fig. 4 is the schematic diagram of another kind of micromatic setting in the utility model mask.
Embodiment
Below in conjunction with schematic diagram, metal mask version of the present utility model is described in more detail, which show preferred embodiment of the present utility model, should be appreciated that those skilled in the art can revise the utility model described here, and still realize advantageous effects of the present utility model.Therefore, following description is appreciated that extensively knowing for those skilled in the art, and not as to restriction of the present utility model.
In the following passage, more specifically the utility model is described by way of example with reference to accompanying drawing.According to the following describes and claims, advantage of the present utility model and feature will be clearer.It should be noted that, accompanying drawing all adopts the form that simplifies very much and all uses non-ratio accurately, only in order to object that is convenient, aid illustration the utility model embodiment lucidly.
Main thought of the present utility model is, a kind of metal mask version is provided, for evaporation process, described metal mask version comprises first substrate and second substrate, described first substrate has at least one first opening, described second substrate has at least one second opening, and described second substrate is laminated on described first substrate, and the first opening on described first substrate second opening portion corresponding with on described second substrate is overlapping.So breach during evaporation just can be made to diminish, thus improve making precision, be conducive to the raising of PPI.
Below enumerate the preferred embodiment of described metal mask version, so that content of the present utility model to be clearly described, will be clear that, content of the present utility model is not restricted to following examples, and other improvement by the routine techniques means of those of ordinary skill in the art are also within thought range of the present utility model.
Please refer to the structural representation shown in Fig. 2, described metal mask version comprises first substrate 21 and second substrate 22, described first substrate 21 has at least one first opening 211, described second substrate 22 has at least one opening 221, wherein second substrate 22 is laminated on first substrate 21, and the first opening 211 on described first substrate 21 second opening 221 corresponding with on described second substrate 22 partly overlaps.As shown in Figure 2, after the first opening 211 and the second opening 221 generating portion overlap, the actual aperture formed, the breach 223 when being also evaporation is less than the first opening 211 or the second opening 221.Thus be conducive to the formation of high PPI.
Preferably, described first substrate 21 identical with second substrate 22 (namely the first opening 211 is also identical with the second opening 221), is convenient to batch production.Be first substrate 21 and the identical situation of second substrate 22 shown in Fig. 2, the first opening 211 and the second opening 221 are all rectangle.Certainly, consider and also can utilize existing substrate, therefore, first substrate 21 and second substrate 22 also can be different, and such as the first opening 211 and the second opening 221 vary in size, and one can be square, and another can be rectangle etc.But, when first substrate 21 and second substrate 22 are different, demand fulfillment first opening 211 and the second opening 221 can arrive by one_to_one corresponding, avoid appearing at after the first opening 211 and the second opening 221 partly overlap, the situation that the breach 223 when forming evaporation is not of uniform size.It should be noted that, above-mentioned rectangle and square are only illustrated, and the first opening 211 of other shapes and the second opening 221 are also can be applied in the utility model.
In a preferred embodiment of the present utility model, described first substrate 21 is fixedly connected with second substrate 22.Such as first substrate 21 and second substrate 22 are welded together.By presetting the size of the lap of multiple first opening 211 and the second opening 221, then can weld, obtaining multiple mask, to adapt to the demand of different process.
In another preferred embodiment of the present utility model, described first substrate 21 and second substrate 22 are flexibly connected, to realize the multiple application of a mask.Such as that described first substrate 21 and second substrate 22 are fixed by a stationary installation (not shown), this stationary installation such as adopts retaining clip, bolt etc., make described first substrate 21 and second substrate 22 can either relative motion, to regulate the size of the lap of the first opening 211 and the second opening 221, after the size of described lap has adjusted, can be fixed again.Preferably, described first substrate 21 can be made to fix, and adjustment second substrate 22 relatively first substrate 21 is movable.
Described mask also comprises micromatic setting, in order to realize the adjustment of the first opening 211 and the second opening 221 lap.Please refer to Fig. 3 with Fig. 4 to be below described the assignment procedure of the size of the lap of the first opening 211 and the second opening 221 when being fixedly connected with or being flexibly connected.
As shown in Figure 3, described micromatic setting is the vernier adjustment knob 30 arranged on described second substrate 22.Described vernier adjustment knob 30 can be such as precision gear structure, reaches the regulation and control of micron level.This vernier adjustment knob 30 can be integrated on second substrate, also can adopt the external structure of helical screw or other types.Obvious, this vernier adjustment knob 30 can also be arranged on first substrate 21, or first substrate 21 and second substrate 22 are all arranged.Preferably, this when being designed for flexible connection, can be very convenient when repeatedly regulating.Certainly for the form be fixedly connected with, such as, first adopt this design to reach overlapping size needed for the first opening 211 and the second opening 221, then be welded and fixed, be also fine.
Please refer to Fig. 4, the elastic device 40 that the side that described micromatic setting is included in second substrate 22 is arranged, the control piece 41,42 of the opposite side setting of second substrate 22 and connector 43, interval between control piece 41,42 is wide at the top and narrow at the bottom, thus when connector 43 presses downward to, in conjunction with the control of elastic device 40, realize staggering of second substrate 22 and first substrate 21.By arranging the factor such as the obliquity of control piece 41, the miles of relative movement of connector, also can realize such as in the regulation and control of micron level.Obvious, elastic device 40, control piece 41,42 and connector 43 also can be the both sides being arranged on first substrate 21.Preferably, this when being designed for flexible connection, can be very convenient when repeatedly regulating.Certainly for the form be fixedly connected with, such as, first adopt this design to reach overlapping size needed for the first opening 211 and the second opening 221, then be welded and fixed, be also fine.In addition, described elastic device 40, control piece 41,42 and connector 43 also can be in a device integrated.Same, when integrated in a device time, no matter for the form be fixedly connected with, or the form be flexibly connected, also all can use.
In sum, in the utility model, employ the first substrate 21 with the first opening 211 and the second substrate 22 with the second opening 221, by controlling the first opening 211 and the second corresponding opening 221 generating portion overlap, reduce the breach 223 during evaporation, be conducive to the raising of PPI.
Obviously, those skilled in the art can carry out various change and modification to the utility model and not depart from spirit and scope of the present utility model.Like this, if these amendments of the present utility model and modification belong within the scope of the utility model claim and equivalent technologies thereof, then the utility model is also intended to comprise these change and modification.
Claims (10)
1. a metal mask version, for evaporation process, it is characterized in that, described metal mask version comprises first substrate and second substrate, described first substrate has at least one first opening, described second substrate has at least one second opening, and described second substrate is laminated on described first substrate, and the first opening on described first substrate second opening portion corresponding with on described second substrate is overlapping.
2. metal mask version as claimed in claim 1, it is characterized in that, described first substrate is fixedly connected with second substrate.
3. metal mask version as claimed in claim 2, it is characterized in that, described first substrate and second substrate are by being welded and fixed.
4. metal mask version as claimed in claim 1, is characterized in that, described first substrate and second substrate are flexibly connected.
5. metal mask version as claimed in claim 4, it is characterized in that, described first substrate and second substrate are fixed by a stationary installation.
6. the metal mask version as described in claim 3 or 5, is characterized in that, described first substrate or second substrate are provided with vernier adjustment knob.
7. the metal mask version as described in claim 3 or 5, it is characterized in that, described first substrate or second substrate are provided with an elastic device in side, opposite side is provided with two control pieces spaced apart and connector, interval between described two control pieces is wide at the top and narrow at the bottom, and described connector is placed in described interval.
8. metal mask version as claimed in claim 1, it is characterized in that, described first opening is identical with the shape of the second opening.
9. metal mask version as claimed in claim 1, it is characterized in that, described first opening is different with the shape of the second opening.
10. metal mask version as claimed in claim 9, is characterized in that, the shape of described first opening is square, and the shape of described second opening is rectangle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420748162.9U CN204265826U (en) | 2014-12-02 | 2014-12-02 | Metal mask version |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420748162.9U CN204265826U (en) | 2014-12-02 | 2014-12-02 | Metal mask version |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204265826U true CN204265826U (en) | 2015-04-15 |
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ID=52800704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420748162.9U Active CN204265826U (en) | 2014-12-02 | 2014-12-02 | Metal mask version |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204265826U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107740042A (en) * | 2017-11-30 | 2018-02-27 | 信利（惠州）智能显示有限公司 | Mask plate |
| US10233529B2 (en) | 2017-04-11 | 2019-03-19 | Boe Technology Group Co., Ltd. | Mask assembly, and apparatus and method for detecting film thickness of evaporation material on the mask |
-
2014
- 2014-12-02 CN CN201420748162.9U patent/CN204265826U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10233529B2 (en) | 2017-04-11 | 2019-03-19 | Boe Technology Group Co., Ltd. | Mask assembly, and apparatus and method for detecting film thickness of evaporation material on the mask |
| CN107740042A (en) * | 2017-11-30 | 2018-02-27 | 信利（惠州）智能显示有限公司 | Mask plate |
| CN107740042B (en) * | 2017-11-30 | 2021-04-06 | 信利（惠州）智能显示有限公司 | Mask plate |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |