CN204189770U - A kind of small area analysis high voltage silicon stack cleaning device - Google Patents
A kind of small area analysis high voltage silicon stack cleaning device Download PDFInfo
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- CN204189770U CN204189770U CN201420571347.7U CN201420571347U CN204189770U CN 204189770 U CN204189770 U CN 204189770U CN 201420571347 U CN201420571347 U CN 201420571347U CN 204189770 U CN204189770 U CN 204189770U
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- service sink
- guide rail
- moving guide
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- spilling water
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Abstract
The utility model relates to a kind of small area analysis high voltage silicon stack cleaning device, comprises frame, service sink, mechanical arm and moving guide rail.Described service sink, mechanical arm and moving guide rail are installed in the inside of frame, and mechanical arm and moving guide rail are positioned at the upper end of service sink, described moving guide rail extends along the long axis direction of frame, and mechanical arm is arranged on moving guide rail, and moves along the bearing of trend of moving guide rail; Described service sink comprises the nitration mixture service sink, one-level nitration mixture spilling water service sink, secondary nitration mixture spilling water service sink, rare HNO service sink, rare HNO spilling water service sink, rare HF service sink, one-level rare HF spilling water service sink and the secondary rare HF spilling water service sink that set gradually.The utility model has the advantage of: utilize this device to carry out ditch cleaning to the large-current high-voltage silicon stack after welding, the impurity such as solder paste, steam being attached to high voltage silicon stack surface can well be removed, corresponding its durability of increase and reliability.
Description
Technical field
The utility model relates to a kind of high voltage silicon stack processing unit (plant), particularly a kind of small area analysis high voltage silicon stack cleaning device.
Background technology
High voltage silicon stack is composed in series by many kenotrons (silicon grain), is interchange to be become the requisite original paper of direct current in high-voltage rectifying.Because high-voltage rectifying presents requisite part in the screen (comprising old-fashioned television set, computer screen) of image in the mode of cathode-ray scan.There is a lot of manufacturer production high voltage silicon stack.Voltage is from 1KV ~ 1000KV; Electric current is not from 1mA ~ 100A etc.
At present, in industry production, at the high voltage silicon stack of more than 350mA, large-current high-voltage silicon stack is called for electric current.For large-current high-voltage silicon stack in the process of producing, have one welding sequence, and after welding sequence, on large-current high-voltage silicon stack surface, length can be attached with the impurity such as solder paste, dust, steam, if directly such high voltage silicon stack is used as finished product, can impact its performance such as durability, reliability, therefore work out a kind of small area analysis high voltage silicon stack cleaning device imperative with the impurity removing its surface.
Summary of the invention
The technical problems to be solved in the utility model is to provide a kind of small area analysis high voltage silicon stack cleaning device that can be good at being cleaned by the impurity on high voltage silicon stack surface.
For solving the problems of the technologies described above, the technical solution of the utility model is: a kind of small area analysis high voltage silicon stack cleaning device, and its innovative point is: comprise frame, service sink, mechanical arm and moving guide rail;
Described service sink, mechanical arm and moving guide rail are installed in the inside of frame, and mechanical arm and moving guide rail are positioned at the upper end of service sink, described moving guide rail extends along the long axis direction of frame, and mechanical arm is arranged on moving guide rail, and moves along the bearing of trend of moving guide rail;
Described service sink comprises the nitration mixture service sink, one-level nitration mixture spilling water service sink, secondary nitration mixture spilling water service sink, rare HNO service sink, rare HNO spilling water service sink, rare HF service sink, one-level rare HF spilling water service sink and the secondary rare HF spilling water service sink that set gradually.
Further, described frame is also provided with water nozzle, described water nozzle has several, is evenly arranged on the two ends of service sink.
The utility model has the advantage of: utilize this device to carry out ditch cleaning to the large-current high-voltage silicon stack after welding, the impurity such as solder paste, steam being attached to high voltage silicon stack surface can well be removed, corresponding its durability of increase and reliability; Arranging water nozzle at the side of service sink can, for personnel's cleaning, prevent it be infected with acid solution and can not get cleaning timely.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of small area analysis high voltage silicon stack cleaning device of the present utility model.
Embodiment
Schematic diagram is as shown in Figure 1 known, and small area analysis high voltage silicon stack cleaning device of the present utility model comprises frame 3, service sink, mechanical arm 1 and moving guide rail 2.
Service sink, mechanical arm 1 and moving guide rail 2 are installed in the inside of frame 3, and mechanical arm 1 and moving guide rail 2 are positioned at the upper end of service sink, moving guide rail 2 extends along the long axis direction of frame 3, and mechanical arm 1 is arranged on moving guide rail 2, and moves along the bearing of trend of moving guide rail 2.
Frame 3 is also provided with water nozzle 12, and water nozzle 12 has several, is evenly arranged on the two ends of service sink.
Service sink comprises nitration mixture service sink 4, one-level nitration mixture spilling water service sink 5, secondary nitration mixture spilling water service sink 6, rare HNO service sink 7, rare HNO spilling water service sink 8, rare HF service sink 9, one-level rare HF spilling water service sink 10 and secondary rare HF spilling water service sink 11, and nitration mixture service sink 4, one-level nitration mixture spilling water service sink 5, secondary nitration mixture spilling water service sink 6, rare HNO service sink 7, rare HNO spilling water service sink 8, rare HF service sink 9, one-level rare HF spilling water service sink 10 and secondary rare HF spilling water service sink 11 are that yi word pattern is arranged successively along the bearing of trend of moving guide rail 2.
When utilizing this cleaning device to clean, mainly comprise following mechanism step:
The first step, first, utilizes mechanical arm that high voltage silicon stack is put into mixed acid solution and cleans, and meanwhile, in the process of cleaning, mechanical arm automatic swing, can fully contact with mixed acid solution to facilitate high voltage silicon stack.
Second step, puts into spilling water by the high voltage silicon stack after nitration mixture cleaning and cleans, and meanwhile, in the process of cleaning, mechanical arm automatic swing, to remove the mixed acid solution on high voltage silicon stack surface.
In this step, the total twice matting of spilling water cleaning one, is respectively the cleaning of one-level spilling water and the cleaning of secondary spilling water.
3rd step, then, high voltage silicon stack is put into rare HNO solution and is cleaned by recycling mechanical arm, and meanwhile, in the process of cleaning, mechanical arm automatic swing, can fully contact with rare HNO solution to facilitate high voltage silicon stack.
4th step, the high voltage silicon stack after rare HNO cleaning is put into spilling water and cleans, meanwhile, in the process of cleaning, mechanical arm automatic swing, to remove rare HNO solution on high voltage silicon stack surface.
In this step, spilling water cleaning is one matting.
5th step, finally, utilizes mechanical arm high voltage silicon stack to be put into rare HF and cleans, and meanwhile, in the process of cleaning, mechanical arm automatic swing, can fully contact with rare HF solution to facilitate high voltage silicon stack.
6th step, the high voltage silicon stack after rare HF cleaning is put into spilling water and cleans, meanwhile, in the process of cleaning, mechanical arm automatic swing, to remove rare HF solution on high voltage silicon stack surface.
The total twice matting of spilling water cleaning one in this step, is respectively the cleaning of one-level spilling water and the cleaning of secondary spilling water.
7th step, finally, puts into drier and carries out processed, complete cleaning by high voltage silicon stack.
More than show and describe general principle of the present utility model and principal character and advantage of the present utility model.The technical staff of the industry should understand; the utility model is not restricted to the described embodiments; what describe in above-described embodiment and specification just illustrates principle of the present utility model; under the prerequisite not departing from the utility model spirit and scope; the utility model also has various changes and modifications, and these changes and improvements all fall within the scope of claimed the utility model.The claimed scope of the utility model is defined by appending claims and equivalent thereof.
Claims (2)
1.
a kind ofsmall area analysis high voltage silicon stack cleaning device, is characterized in that: comprise frame, service sink, mechanical arm and moving guide rail; Described service sink, mechanical arm and moving guide rail are installed in the inside of frame, and mechanical arm and moving guide rail are positioned at the upper end of service sink, described moving guide rail extends along the long axis direction of frame, and mechanical arm is arranged on moving guide rail, and moves along the bearing of trend of moving guide rail; Described service sink comprises the nitration mixture service sink, one-level nitration mixture spilling water service sink, secondary nitration mixture spilling water service sink, rare HNO service sink, rare HNO spilling water service sink, rare HF service sink, one-level rare HF spilling water service sink and the secondary rare HF spilling water service sink that set gradually.
2. small area analysis high voltage silicon stack cleaning device according to claim 1, it is characterized in that: described frame is also provided with water nozzle, described water nozzle has several, is evenly arranged on the two ends of service sink.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420571347.7U CN204189770U (en) | 2014-09-30 | 2014-09-30 | A kind of small area analysis high voltage silicon stack cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420571347.7U CN204189770U (en) | 2014-09-30 | 2014-09-30 | A kind of small area analysis high voltage silicon stack cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204189770U true CN204189770U (en) | 2015-03-04 |
Family
ID=52621746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420571347.7U Active CN204189770U (en) | 2014-09-30 | 2014-09-30 | A kind of small area analysis high voltage silicon stack cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204189770U (en) |
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2014
- 2014-09-30 CN CN201420571347.7U patent/CN204189770U/en active Active
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