CN204182612U - A kind of large-current high-voltage silicon stack cleaning device - Google Patents
A kind of large-current high-voltage silicon stack cleaning device Download PDFInfo
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- CN204182612U CN204182612U CN201420571582.4U CN201420571582U CN204182612U CN 204182612 U CN204182612 U CN 204182612U CN 201420571582 U CN201420571582 U CN 201420571582U CN 204182612 U CN204182612 U CN 204182612U
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- service sink
- spilling water
- guide rail
- moving guide
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Abstract
The utility model relates to a kind of large-current high-voltage silicon stack cleaning device, comprises frame, service sink, mechanical arm and moving guide rail, described service sink, mechanical arm and moving guide rail are installed in the inside of frame, and mechanical arm and moving guide rail are positioned at the upper end of service sink, described service sink comprises the HF liquid service sink distributed successively along moving guide rail long axis direction, one-level HF spilling water service sink, secondary HF spilling water service sink, one-level KOH service sink, secondary KOH service sink, one-level spray spilling water service sink, secondary spray spilling water service sink, EDTA-2 ultrasonic cleaning pond, one-level ultrasonic cleaning spilling water service sink, ultrasonic cleaning pond, secondary ultrasonic cleaning spilling water service sink, one grade acetone dehydration pond, two grade acetone dehydration ponds, spray between spilling water service sink at secondary KOH service sink and one-level and be provided with spray nozzle.The utility model has the advantage of: utilize this device to carry out ditch cleaning to the large-current high-voltage silicon stack after welding, the impurity being attached to high voltage silicon rectifier stack surface can well be removed.
Description
Technical field
The utility model relates to a kind of high voltage silicon rectifier stack processing unit (plant), particularly a kind of large-current high-voltage silicon stack cleaning device.
Background technology
High voltage silicon rectifier stack is composed in series by many kenotrons (silicon grain), is interchange to be become the requisite original paper of direct current in high-voltage rectifying.Because high-voltage rectifying presents requisite part in the screen (comprising old-fashioned television set, computer screen) of image in the mode of cathode-ray scan.There is a lot of manufacturer production high voltage silicon rectifier stack.Voltage is from 1KV ~ 1000KV; Electric current is not from 1mA ~ 100A etc.
At present, in industry production, at the high voltage silicon rectifier stack of below 350mA, lower electric current high voltage silicon rectifier stack is called for electric current.For small area analysis high voltage silicon rectifier stack in the process of producing, have one welding sequence, and after welding sequence, on small area analysis high voltage silicon rectifier stack surface, length can be attached with the impurity such as solder paste, dust, steam, if directly such high voltage silicon rectifier stack is used as finished product, can impact its performance such as durability, reliability, therefore work out a kind of large-current high-voltage silicon stack cleaning device imperative with the impurity removing its surface.
Summary of the invention
The technical problems to be solved in the utility model is to provide a kind of large-current high-voltage silicon stack cleaning device that can be good at being cleaned by the impurity on high voltage silicon rectifier stack surface.
For solving the problems of the technologies described above, the technical solution of the utility model is: a kind of large-current high-voltage silicon stack cleaning device, and its innovative point is: comprise frame, service sink, mechanical arm and moving guide rail;
Described service sink, mechanical arm and moving guide rail are installed in the inside of frame, and mechanical arm and moving guide rail are positioned at the upper end of service sink, described moving guide rail extends along the long axis direction of frame, and mechanical arm is arranged on moving guide rail, and extends along the bearing of trend of moving guide rail;
Described service sink comprise distribute successively along moving guide rail long axis direction HF liquid service sink, one-level HF spilling water service sink, secondary HF spilling water service sink, one-level KOH service sink, secondary KOH service sink, one-level spray spilling water service sink, secondary spray spilling water service sink, EDTA-2 ultrasonic cleaning pond, one-level ultrasonic cleaning spilling water service sink, ultrasonic cleaning pond, secondary ultrasonic cleaning spilling water service sink, a grade acetone dehydration pond, two grade acetones dehydration ponds, spray between spilling water service sink at secondary KOH service sink and one-level and be provided with spray nozzle.
Further, described frame is also provided with water nozzle, described water nozzle has several, is evenly arranged on the two ends of service sink.
The utility model has the advantage of: utilize this device to carry out ditch cleaning to the large-current high-voltage silicon stack after welding, the impurity such as solder paste, steam being attached to high voltage silicon rectifier stack surface can well be removed, corresponding its durability of increase and reliability; Arranging water nozzle at the side of service sink can, for personnel's cleaning, prevent it be infected with acid solution and can not get cleaning timely.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of large-current high-voltage silicon stack cleaning device of the present utility model.
Detailed description of the invention
Schematic diagram is as shown in Figure 1 known, and large-current high-voltage silicon stack cleaning device of the present utility model comprises frame 18, service sink, mechanical arm 1 and moving guide rail 2.
Service sink, mechanical arm 1 and moving guide rail 2 are installed in the inside of frame 18, and mechanical arm 1 and moving guide rail 2 are positioned at the upper end of service sink, moving guide rail 2 extends along the long axis direction of frame 18, mechanical arm 1 is arranged on moving guide rail 2, and extends along the bearing of trend of moving guide rail 2.
Frame 18 is also provided with water nozzle 4, and water nozzle 4 has several, is evenly arranged on the two ends of service sink.
Service sink comprise distribute successively along moving guide rail 2 long axis direction HF liquid service sink 5, one-level HF spilling water service sink 6, secondary HF spilling water service sink 7, one-level KOH service sink 8, secondary KOH service sink 9, one-level spray spilling water service sink 10, secondary spray spilling water service sink 11, EDTA-2 ultrasonic cleaning pond 12, one-level ultrasonic cleaning spilling water service sink 13, ultrasonic cleaning pond 14, grade acetone dehydration pond 17, secondary ultrasonic cleaning spilling water service sink 15, grade acetone dehydration pond 16, two, spray between spilling water service sink 10 at secondary KOH service sink 9 and one-level and be provided with spray nozzle 3.
The first step, first, utilizes mechanical arm high voltage silicon rectifier stack to be put into HF solution and soaks.
Second step, puts into spilling water by the high voltage silicon rectifier stack after HF solution soaks and cleans.
In this step, the total twice matting of spilling water cleaning one, is respectively the cleaning of one-level spilling water and the cleaning of secondary spilling water.
3rd step, then, utilizes mechanical arm that high voltage silicon rectifier stack is put into KOH solution and cleans.
In this step, the total two procedures of KOH solution cleaning one, is respectively the cleaning of first order KOH solution and the cleaning of second level KOH solution.
4th step, carries out spray process by the high voltage silicon rectifier stack after KOH solution is soaked.
5th step, puts into spilling water by the high voltage silicon rectifier stack after spray and cleans.
In this step, the total twice matting of spilling water cleaning one, is respectively the cleaning of one-level spilling water and the cleaning of secondary spilling water.
6th step, then high voltage silicon rectifier stack is utilized EDTA-2Na ultrasonic cleaning.
7th step, carries out spilling water cleaning by the high voltage silicon rectifier stack after EDTA-2Na ultrasonic cleaning.
In this step, the total twice matting of spilling water cleaning one, is respectively the cleaning of one-level spilling water and the cleaning of secondary spilling water.
Meanwhile, in this step one-level spilling water cleaning and secondary spilling water clean between also have additional ultrasonic cleaning operation.
8th step, carries out acetone processed by high voltage silicon rectifier stack.
In this step, acetone processed one has two procedures, is respectively a grade acetone processed and two grade acetone processed.
9th step, finally, utilizes hot N
2high voltage silicon rectifier stack is dried up.
More than show and describe general principle of the present utility model and principal character and advantage of the present utility model.The technical staff of the industry should understand; the utility model is not restricted to the described embodiments; what describe in above-described embodiment and description just illustrates principle of the present utility model; under the prerequisite not departing from the utility model spirit and scope; the utility model also has various changes and modifications, and these changes and improvements all fall within the scope of claimed the utility model.The claimed scope of the utility model is defined by appending claims and equivalent thereof.
Claims (2)
1.
a kind oflarge-current high-voltage silicon stack cleaning device, is characterized in that: comprise frame, service sink, mechanical arm and moving guide rail; Described service sink, mechanical arm and moving guide rail are installed in the inside of frame, and mechanical arm and moving guide rail are positioned at the upper end of service sink, described moving guide rail extends along the long axis direction of frame, and mechanical arm is arranged on moving guide rail, and extends along the bearing of trend of moving guide rail; Described service sink comprise distribute successively along moving guide rail long axis direction HF liquid service sink, one-level HF spilling water service sink, secondary HF spilling water service sink, one-level KOH service sink, secondary KOH service sink, one-level spray spilling water service sink, secondary spray spilling water service sink, EDTA-2 ultrasonic cleaning pond, one-level ultrasonic cleaning spilling water service sink, ultrasonic cleaning pond, secondary ultrasonic cleaning spilling water service sink, a grade acetone dehydration pond, two grade acetones dehydration ponds, spray between spilling water service sink at secondary KOH service sink and one-level and be provided with spray nozzle.
2. large-current high-voltage silicon stack cleaning device according to claim 1, it is characterized in that: described frame is also provided with water nozzle, described water nozzle has several, is evenly arranged on the two ends of service sink.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420571582.4U CN204182612U (en) | 2014-09-30 | 2014-09-30 | A kind of large-current high-voltage silicon stack cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420571582.4U CN204182612U (en) | 2014-09-30 | 2014-09-30 | A kind of large-current high-voltage silicon stack cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204182612U true CN204182612U (en) | 2015-03-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420571582.4U Active CN204182612U (en) | 2014-09-30 | 2014-09-30 | A kind of large-current high-voltage silicon stack cleaning device |
Country Status (1)
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| CN (1) | CN204182612U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108480322A (en) * | 2018-02-09 | 2018-09-04 | 浙江兰菱机械有限公司 | The spring cleaning of spring cleaning equipment and the application equipment |
| CN108971081A (en) * | 2018-06-28 | 2018-12-11 | 阳信金鑫电子有限公司 | The cleaning tooling and cleaning method of chip after a kind of assembling of semiconductor devices |
-
2014
- 2014-09-30 CN CN201420571582.4U patent/CN204182612U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108480322A (en) * | 2018-02-09 | 2018-09-04 | 浙江兰菱机械有限公司 | The spring cleaning of spring cleaning equipment and the application equipment |
| CN108971081A (en) * | 2018-06-28 | 2018-12-11 | 阳信金鑫电子有限公司 | The cleaning tooling and cleaning method of chip after a kind of assembling of semiconductor devices |
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