CN204129433U - For the reproducing unit of nano-imprinting composite template - Google Patents
For the reproducing unit of nano-imprinting composite template Download PDFInfo
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- CN204129433U CN204129433U CN201420560206.5U CN201420560206U CN204129433U CN 204129433 U CN204129433 U CN 204129433U CN 201420560206 U CN201420560206 U CN 201420560206U CN 204129433 U CN204129433 U CN 204129433U
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Abstract
The utility model discloses a kind of reproducing unit for nano-imprinting composite template, it comprises the first docking unit and the second docking unit, formed involutory between it by guiding mechanism, and at involutory rear formation cavity between this first docking unit and the second docking unit.The utility model is compared to prior art, and first it simplified the setting of structure, and manufacturing cost is minimized; Its reproduction process is simultaneously simple, and only need to injecting layer in cavity, reproduction speed is also improved; Finally, by arranging guiding mechanism, improve the flatness copied, make the utility model no matter compared to other reproducing units or the effect of guiding mechanism itself, all achieve beyond thought technique effect, thus composite shuttering can be realized to the high precision of micro-nano structure pattern and Hi-Fily to copy.
Description
Technical field
The utility model relates to the template duplicating device in a kind of micro-nano technology field, is specifically related to a kind of reproducing unit for nano-imprinting composite template.
Background technology
In large scale integrated circuit manufactures, most widely used is photoetching process, which includes gold-tinted photoetching, extreme ultraviolet photolithographic, electron-beam direct writing, immersion lithography etc.Under Moore's Law is guided, large scale integrated circuit enters nanometer era steadily, and photoetching forms bottleneck at 45nm node.Due to the restriction that optical lithography techniques is intrinsic, be difficult to meet semiconductor industry and continued along Moore's Law fast-developing.In Graphic transitions technology of future generation, electron-beam direct writing, X-ray exposure and nanometer embossing occupy critical role.Wherein nanometer embossing takes the lead in being proposed by Stephen professor Y.Chou, and technology has that output is high, cost is low and the simple advantage of technique.This is the brand-new Graphic transitions technology of a kind of difference and conventional lithographic techniques.Nanometer embossing had both had the advantage of the necessary high yield of large-scale industrial production, low cost, had possessed the high resolving power that the technology such as electron-beam direct writing just can reach simultaneously.Its appearance and fast development cause rapidly the extensive attention of whole world research and production department.
In recent years, nanometer embossing obtains swift and violent development, and in wherein impressing, template is prepared in order to gordian technique.Template uses direct electronic beam writing technology to prepare usually, but electron-beam direct writing speed is slow, and cost is high.The preparation of template becomes the key link in nanometer embossing always.Therefore, find a kind of low cost of manufacture, to copy fast and the method preparing template copying flatness high is particularly important.
Utility model content
In order to solve the problems of the technologies described above, the utility model provides a kind of low cost of manufacture, copies fast and copy the high reproducing unit for nano-imprinting composite template of flatness.
In order to achieve the above object, the technical solution of the utility model is as follows:
For the reproducing unit of nano-imprinting composite template, it comprises the first docking unit and the second docking unit, is formed involutory between it by guiding mechanism, and at involutory rear formation cavity between this first docking unit and the second docking unit.
Reproducing unit of the present utility model mainly includes the first docking unit, second docking unit and guiding mechanism, first docking unit and the second docking unit are at involutory rear formation cavity, when copying, supporting layer and template are individually fixed on the first docking unit and the second docking unit, namely be fixed in cavity, then pass through to (the material namely for copying of injecting layer in cavity, as glue etc.), utilize the flowing property of cushion, it is made to spread out lentamente in this airtight cavity and fill up, after layer to be buffered is formed, namely the process copied completes.This therebetween, important is some the depth of parallelism that will ensure two bottom surfaces that involutory rear chamber is upper and lower, and namely ensure the depth of parallelism of the first docking unit and the second docking unit, in order to reach this depth of parallelism, the utility model is just provided with guiding mechanism.Guiding mechanism is in the use of routine, it is all to form guide effect, thus ensure the steady movement of moving component, the utility model utilizes this guiding mechanism, make the first docking unit relative to the second docking unit, or when the second docking unit carries out involutory relative to the first docking unit, guide effect can be formed, this guide effect effectively can overcome staff or other equipment may on the impact of the depth of parallelism between it when being undertaken involutory by docking unit, namely the docking of docking unit is made to have object of reference, thus make involutory after two docking unit ensured the depth of parallelism, thus make the duplicate completed in cavity also can ensure the flatness on its surface.
Therefore, the utility model is compared to prior art, and first it simplified the setting of structure, and manufacturing cost is minimized; Its reproduction process is simultaneously simple, and only need to injecting layer in cavity, reproduction speed is also improved; Finally, by arranging guiding mechanism, improve the flatness copied, make the utility model no matter compared to other reproducing units or the effect of guiding mechanism itself, all achieve beyond thought technique effect, thus composite shuttering can be realized to the high precision of micro-nano structure pattern and Hi-Fily to copy.
On the basis of technique scheme, the utility model can also do following improvement:
As preferred scheme, above-mentioned guiding mechanism is spaced multiple.
Adopt above-mentioned preferred scheme, by arranging multiple guiding mechanism, make each guiding mechanism when carrying out docking unit involutory, reference can be formed each other and pin down, make each point docking unit, particularly marginal portion is able to maintenance depth of parallelism, thus improves the depth of parallelism between docking unit further, ensures the flatness copied.
As preferred scheme, above-mentioned guiding mechanism comprises guide pillars and bushes, this guide pin bushing is located on the first docking unit, this guide pillar to being located on the second docking unit by guide pin bushing, or this guide pillar is located on the first docking unit, this guide pin bushing is to being located on the second docking unit by guide pillar.
Adopt above-mentioned preferred scheme, by the cooperation of guide pillars and bushes, can more be convenient to formation first dock unit and second docking unit orientation involutory, ensure docking unit between the depth of parallelism.
As preferred scheme, above-mentioned first docking unit is provided with boss, the second docking unit is provided with to should the groove of boss, the height of this boss be lower than the degree of depth of this groove, and this boss and groove are combined to form above-mentioned cavity.
Adopt above-mentioned preferred scheme, adopt the cooperation of boss and groove, the edge of cavity can be made can not to form piece because of involutory, thus make formed cavity have better leakproofness, thus prevent from having an impact to the flatness copied because of gas leakage.
As preferred scheme, above-mentioned groove is also provided with sealing gasket outward.
Adopt above-mentioned preferred scheme, the leakproofness of cavity can be improved further.
Alternatively, above-mentioned first docking unit is provided with groove, the second docking unit is provided with to should the boss of groove, the height of this boss be lower than the degree of depth of this groove, and this groove and boss are combined to form above-mentioned cavity.
Adopt above-mentioned preferred scheme, adopt the cooperation of boss and groove, the edge of cavity can be made can not to form piece because of involutory, thus make formed cavity have better leakproofness, thus prevent from having an impact to the flatness copied because of gas leakage.
Alternatively, above-mentioned boss is also provided with sealing gasket outward.
Adopt above-mentioned preferred scheme, the leakproofness of cavity can be improved further.
As preferred scheme, the second above-mentioned docking unit is double-decker, and its top section is formed and docks the involutory of unit with first.
Adopt above-mentioned preferred scheme, can so that form two function divisions of the second docking unit, top section can form the involutory effect of docking unit with first, and underclad portion then may be used for arranging the ingredients such as gas port.
Accompanying drawing explanation
Fig. 1 is of the present utility model for the front view under the reproducing unit disassembled form of nano-imprinting composite template.
Fig. 2 is the left view of Fig. 1.
Fig. 3 is the vertical view of Fig. 1.
Fig. 4 is the stereographic map of Fig. 1.
Fig. 5 is of the present utility model for the front view under the reproducing unit apposition of nano-imprinting composite template.
Fig. 6 A is the cut-open view of the first docking unit of the reproducing unit for nano-imprinting composite template of the present utility model.
Fig. 6 B is the cut-open view of the second docking unit of the reproducing unit for nano-imprinting composite template of the present utility model.
Fig. 7 A is the vertical view of the first docking unit convex platform of the reproducing unit for nano-imprinting composite template of the present utility model.
Fig. 7 B is the stereographic map of Fig. 6 A.
Fig. 8 be the reproducing unit for nano-imprinting composite template of the present utility model second docking unit at the middle and upper levels part vertical view.
Fig. 9 A is the vertical view of underclad portion in the second docking unit of the reproducing unit for nano-imprinting composite template of the present utility model.
Fig. 9 B is the stereographic map of Fig. 9 A.
Wherein, 1. the first docking unit 11. boss 111. air flue 112. exhausr port 113. inlet 12. handle 2. second docks unit 21. groove 22. sealing gasket 23. top section 231. first pore 232. second pore 24. underclad portion 241. first vacuum port 242. second vacuum port 243. first air cavity 244. second air cavity 3. guiding mechanism 31. guide pillar 32. guide pin bushing 4. cavity.
Embodiment
Preferred implementation of the present utility model is described in detail below in conjunction with accompanying drawing.
In order to reach the purpose of this utility model, as shown in figures 1-8, in some embodiments of the reproducing unit for nano-imprinting composite template of the present utility model, it comprises the first docking unit 1 and the second docking unit 2, formed involutory by guiding mechanism 3 between it, and at involutory rear formation cavity 4 between this first docking unit 1 and second docking unit 2.
Wherein, the first docking unit 1 and the second docking unit 2 can be plate body as shown in the figure, can be also the various shape such as the body of rod, hemisphere, will not enumerate at this.
Further, for the ease of being exhausted and injecting the object such as duplicating material and fixed support layer, first docking unit 1 can also offer air flue 111, exhausr port 112 and inlet 113, air flue 111 is for fixed support layer, exhausr port 112 is for exhaust, and inlet 113 is for injecting duplicating material.And for the ease of fixed form on the second docking unit 2, the first pore 231 also can be set and realize.Certainly, in order to reach these objects, according to the common practise of this area, we can also reach by other means, and these can know from prior art, will not enumerate at this.And for the ease of people's manual manipulation, we can also install handle 12 additional above.
Shown in composition graphs 1-8, this reproducing unit mainly includes the first docking unit 1, second docking unit 2 and guiding mechanism 3, first docking unit 1 and the second docking unit 2 are at involutory rear formation cavity 4, when copying, supporting layer and template are individually fixed on the first docking unit 1 and the second docking unit 2, namely be fixed in cavity 4, then pass through to the injecting layer (material namely for copying in cavity 4, as glue etc.), utilize the flowing property of cushion, it is made to spread out lentamente and fill up in this airtight cavity 4, after layer to be buffered is formed, namely the process copied completes.This therebetween, important is some the depth of parallelism of two bottom surfaces that will ensure involutory rear chamber about 4, and namely ensure the depth of parallelism of the first docking unit 1 and the second docking unit 2, in order to reach this depth of parallelism, this reproducing unit is just provided with guiding mechanism 3.Guiding mechanism 3 is in the use of routine, it is all to form guide effect, thus ensure the steady movement of moving component, this device utilizes this guiding mechanism 3, make the first docking unit 1 relative to the second docking unit 2, or when the second docking unit 2 carries out involutory relative to the first docking unit 1, guide effect can be formed, this guide effect effectively can overcome staff or other equipment may on the impact of the depth of parallelism between it when being undertaken involutory by docking unit, namely the docking of docking unit is made to have object of reference, thus make involutory after two docking unit ensured the depth of parallelism, thus make the duplicate completed in cavity also can ensure the flatness on its surface.
Therefore, this reproducing unit is compared to prior art, and first it simplified the setting of structure, and manufacturing cost is minimized; Its reproduction process is simultaneously simple, and only need to injecting layer in cavity, reproduction speed is also improved; Finally, by arranging guiding mechanism, improve the flatness copied, make this device no matter compared to other reproducing units or the effect of guiding mechanism itself, all achieve beyond thought technique effect, thus composite shuttering can be realized to the high precision of micro-nano structure pattern and Hi-Fily to copy.
In order to optimize implementation result of the present utility model further, as shown in Fig. 1-6B, in other embodiments of the reproducing unit for nano-imprinting composite template of the present invention, on the basis of foregoing teachings, above-mentioned guiding mechanism 3 is spaced multiple.This guiding mechanism 3 can for as shown in the figure be arranged at the multiple of edge with encirclement form, and if docking unit is strip or arc line shaped, so guiding mechanism 3 also can be set to the multiple of line spread or camber line arrangement.Adopt the scheme of this embodiment, by arranging multiple guiding mechanism, make each guiding mechanism when carrying out docking unit involutory, reference can be formed each other and pin down, make each point docking unit, particularly marginal portion is able to maintenance depth of parallelism, thus improves the depth of parallelism between docking unit further, ensures the flatness copied.
In order to optimize implementation result of the present utility model further, as shown in Fig. 1-6B, in other embodiments of the reproducing unit for nano-imprinting composite template of the present invention, on the basis of foregoing teachings, above-mentioned guiding mechanism 3 comprises guide pillar 31 and guide pin bushing 32, and this guide pin bushing 32 is located on the first docking unit 1, this guide pillar 31 is to being located on the second docking unit 2 by guide pin bushing 32.Adopt the scheme of this embodiment, by the cooperation of guide pillars and bushes, can more be convenient to formation first dock unit and second docking unit orientation involutory, ensure docking unit between the depth of parallelism.
As the replacement scheme of this embodiment, guide pillar can also to be located on the first docking unit, by guide pin bushing being located on the second docking unit by guide pillar by we, also can reach the same object.
In order to optimize implementation result of the present utility model further, as shown in figures 1-8, in other embodiments of the reproducing unit for nano-imprinting composite template of the present utility model, on the basis of foregoing teachings, the first above-mentioned docking unit 1 is provided with boss 11, second docking unit 2 is provided with to should the groove 21 of boss 11, the height of this boss 11 be lower than the degree of depth of this groove 21, and this boss 11 is combined to form cavity 4 with groove 21.Adopt the scheme of this embodiment, adopt the cooperation of boss and groove, the edge of cavity can be made because of involutory can not to form piece (boss is deep in groove to coordinate to form cavity), thus make formed cavity have better leakproofness, thus prevent from having an impact to the flatness copied because of gas leakage.And for the ease of objects such as observations, we can also use visual material to make boss, become visual window.
As the replacement scheme of this embodiment, we can also be provided with groove on the first docking unit, the second docking unit are provided with to should the boss of groove, and the height of this boss is lower than the degree of depth of this groove, this groove and boss are combined to form cavity, also can reach the same object.
In order to optimize implementation result of the present utility model further, as shown in figures 1-8, in other embodiments of the reproducing unit for nano-imprinting composite template of the present utility model, on the basis of foregoing teachings, above-mentioned groove 21 is outer is also provided with sealing gasket 22.Wherein, conveniently fixing seal pad 22, we can arrange the second pore 232 and realize, and certainly, also can adopt the forms such as bonding.Adopt the scheme of this embodiment, the leakproofness of cavity can be improved further.
As the replacement scheme of this embodiment, we still can be provided with sealing gasket outward at boss, also can reach the same object.
In order to optimize implementation result of the present utility model further, as shown in Fig. 1-9B, in other embodiments of the reproducing unit for nano-imprinting composite template of the present invention, on the basis of foregoing teachings, the second above-mentioned docking unit 2 is double-decker, and its top section 23 is formed and docks the involutory of unit 1 with first.Adopt the scheme of this embodiment, can so that form two function divisions of the second docking unit 2, top section 23 can form the involutory effect of docking unit 1 with first, underclad portion 24 may be used for arranging the ingredients such as gas port, such as shown in the figure, offer the first vacuum port 241, second vacuum port 242, first air cavity 243 and the second air cavity 244, first vacuum port 241 is O-ring seal vacuum port, second vacuum port 242 fixes vacuum port for template, first air cavity 243 fixes air cavity for O-ring seal, and the second air cavity 244 fixes air cavity for template.
Introduce the course of work of the present utility model below: shown in composition graphs 1-9B, when copying, supporting layer and template are individually fixed on the first docking unit 1 and the second docking unit 2, namely be fixed in cavity 4, then by injecting layer in cavity 4, utilize the flowing property of cushion, make it spread out lentamente and fill up in this airtight cavity 4, after layer to be buffered is formed, namely the process copied completes.
Above-described is only preferred implementation of the present utility model; it should be pointed out that for the person of ordinary skill of the art, under the prerequisite not departing from the utility model creation design; can also make some distortion and improvement, these all belong to protection domain of the present utility model.
Claims (8)
1. for the reproducing unit of nano-imprinting composite template, it is characterized in that, comprise the first docking unit and the second docking unit, formed by guiding mechanism involutory between it, and at involutory rear formation cavity between described first docking unit and described second docking unit.
2. the reproducing unit for nano-imprinting composite template according to claim 1, is characterized in that, described guiding mechanism is spaced multiple.
3. the reproducing unit for nano-imprinting composite template according to claim 1 and 2, it is characterized in that, described guiding mechanism comprises guide pillars and bushes, described guide pin bushing is located on described first docking unit, the corresponding described guide pin bushing of described guide pillar is located on described second docking unit, or described guide pillar is located on described first docking unit, the corresponding described guide pillar of described guide pin bushing is located on described second docking unit.
4. the reproducing unit for nano-imprinting composite template according to claim 1, it is characterized in that, described first docking unit is provided with boss, described second docking unit is provided with the groove of corresponding described boss, the height of described boss is lower than the degree of depth of described groove, and described boss and described groove are combined to form described cavity.
5. the reproducing unit for nano-imprinting composite template according to claim 4, is characterized in that, described groove is also provided with sealing gasket outward.
6. the reproducing unit for nano-imprinting composite template according to claim 1, it is characterized in that, described first docking unit is provided with groove, described second docking unit is provided with the boss of corresponding described groove, the height of described boss is lower than the degree of depth of described groove, and described groove and described boss are combined to form described cavity.
7. the reproducing unit for nano-imprinting composite template according to claim 6, is characterized in that, described boss is also provided with sealing gasket outward.
8. the reproducing unit for nano-imprinting composite template according to claim 1, is characterized in that, described second docking unit is double-decker, and its top section is formed and docks the involutory of unit with described first.
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| CN201420560206.5U CN204129433U (en) | 2014-09-26 | 2014-09-26 | For the reproducing unit of nano-imprinting composite template |
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| CN201420560206.5U CN204129433U (en) | 2014-09-26 | 2014-09-26 | For the reproducing unit of nano-imprinting composite template |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105511224A (en) * | 2014-09-26 | 2016-04-20 | 苏州光舵微纳科技有限公司 | Reproducing unit for nanoimprinting composite templates |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105511224A (en) * | 2014-09-26 | 2016-04-20 | 苏州光舵微纳科技有限公司 | Reproducing unit for nanoimprinting composite templates |
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Address after: 215513 Jiangsu city of Suzhou province Changshou City Changshu economic and Technological Development Zone (four Road No. 11) Branch Chong Park Building No. 2 102 Patentee after: Suzhou Guangduo Micro, Nano-Device Co., Ltd. Address before: 215513 Jiangsu city of Suzhou province Changshou City Changshu economic and Technological Development Zone (four Road No. 11) Branch Chong Park Building No. 2 102 Patentee before: SuZhou GuangDuo Micro,Nano-Device Co., Ltd. |