CN204086922U - A kind of ion sputtering instrument control system - Google Patents
A kind of ion sputtering instrument control system Download PDFInfo
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- CN204086922U CN204086922U CN201420576372.4U CN201420576372U CN204086922U CN 204086922 U CN204086922 U CN 204086922U CN 201420576372 U CN201420576372 U CN 201420576372U CN 204086922 U CN204086922 U CN 204086922U
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- ion sputtering
- sputtering instrument
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Abstract
The utility model discloses a kind of ion sputtering instrument control system, belong to semiconductor manufacturing facility field.A kind of ion sputtering instrument control system, comprises RF power supply, direct supply, PLC, vacuum instrumentation, sensor, touch-screen and perform outputs, wherein, described sensor is connected with PLC, and the Signal transmissions of sensor collection is to PLC; PLC exports with execution and is connected, and the Signal transmissions after PLC process is to performing output; Described PLC is also connected with vacuum instrumentation, RF power supply, touch-screen, direct supply respectively, respectively and vacuum instrumentation, RF power supply, touch-screen, carry out two-way signaling transmission between direct supply, described sensor setting is in ion sputtering instrument board for described PLC.It can realize a key operation of board, the whole robotization of process, as long as operating personnel's load and get sheet, simple to operate, accuracy is good, production constant product quality.
Description
Technical field
The utility model relates to semiconductor manufacturing facility field, more particularly, relates to a kind of ion sputtering instrument control system.
Background technology
Ion beam sputtering is the sputtering technology grown up after magnetron sputtering technique, and its advantage is that sputter procedure can control, and ion energy and incident angle can regulation and controls, and substrate is by the radiation damage that ion causes from target surface reflection.The coating materials ion energy utilizing energetic ion stream to sputter is high, is conducive to the generation of membrane structure; Ion gun controllability is strong, therefore prepares film with ion beam sputtering and has good adhesion, low scattering good stability and repeatability.Ensure the densification of film, evenly, be easy to control.In recent years, ion beam sputter depositing technology focuses on studying the multi-element compounds film with exact chemical proportioning more, the compound film of deposition multicomponent atom flux and deposition standard analysis content.In addition, the Modulatory character of source parameters can controlling diaphragm ply stress problem, for CuInSe
2(CIS) battery of this sandwich construction of solar cell can more easily process stress in thin film problem; Along with heavy caliber ion gun is studied deeply and ion beam sputter depositing technology perfect, ion beam sputter depositing CIS thin film technique is adopted to have equipment simple, non-toxic and can the feature of large area production; Therefore, ion beam sputter depositing technology has the condition preparing high-quality CIS film.
4400 type sputters are unit sputtering machine tables that the U.S. produces in early days, and this type of board still has many producers in use at home.Partially manual operating function logical circuit is only realized interlocking and controls by the control section of former board, and complex operation, easily produces maloperation and equipment failure, affects the stable of product, poor stability.
Utility model content
1. the technical matters that will solve
Loaded down with trivial details for the manual operation existed in prior art, easily make a fault, and easily cause the problem of quality instability, the utility model provides a kind of ion sputtering instrument control system.It can realize a key operation of board, the whole robotization of process, as long as operating personnel's load and get sheet, simple to operate, accuracy is good, production constant product quality.
2. technical scheme
The purpose of this utility model is achieved through the following technical solutions:
A kind of ion sputtering instrument control system, comprises RF power supply, direct supply, PLC, vacuum instrumentation, sensor, touch-screen and perform outputs, wherein, described sensor is connected with PLC, and the Signal transmissions of sensor collection is to PLC; PLC exports with execution and is connected, and the Signal transmissions after PLC process is to performing output; Described PLC is also connected with vacuum instrumentation, RF power supply, touch-screen, direct supply respectively, respectively and vacuum instrumentation, RF power supply, touch-screen, carry out two-way signaling transmission between direct supply, described sensor setting is in ion sputtering instrument board for described PLC.
Further, described PLC includes 88 digital quantity input points, 64 digital quantity output points, 4 input analog amount interfaces and 1 output analog quantity interface.
Further, described PLC is configured with I/O expansion module.
Further, described execution exports the mechanical pump, load chamber, sputtering chamber and the travelling bogie that comprise ion sputtering instrument.
Further, described touch-screen includes viewing area, and viewing area is divided into technological parameter viewing area, running state parameter viewing area and fault alarm information viewing area.
3. beneficial effect
Compared to prior art, the utility model has the advantage of:
(1) the utility model structure is simple, and each component modelsization distribution, avoids the equipment failure that people causes for maloperation, under fully automatic working state, simple to operate, by start button, enhances productivity;
(2) full-automatic operation, relative to manual operation, automation mechanized operation avoids different people and operates different situation, and automation mechanized operation avoids different people to operate different situation, improves the reliability of production and the stability of product;
(3) the utility model adopts PLC number of structures many, 88 digital quantity input points, 64 digital quantity output points, 4 input analog amount interfaces and 1 output analog quantity interface, and can process for the production in multiple colleague's situation, treatment effeciency is high;
(4) PLC is configured with I/O expansion module, can with the addition of interface for follow-up operation, can carry out at any time adding new function and method, compatible strong;
(5) various piece is unified to be connected to use PLC execution to be exported, and can control board, operation controls whole robotization and carries out, and reduces equipment failure rate comprehensively;
(6) use touch-screen, can touch and product is operated, convenient and swift;
(7) touch-screen viewing area content is comprehensive, viewing area has been divided into technological parameter viewing area, running state parameter viewing area, fault alarm information viewing area, better product operation is monitored, and emergency case can be moved back in time process, improve the stability of product.
Accompanying drawing explanation
Fig. 1 is each model calling schematic diagram of the present utility model;
Number in the figure illustrates: 1, PLC; 2, vacuum instrumentation; 3, sensor; 4, RF power supply; 5, touch-screen; 6, direct supply; 7, output is performed.
Embodiment
Below in conjunction with Figure of description and specific embodiment, the utility model is described in detail.
Embodiment 1
A kind of ion sputtering instrument control system, comprise RF power supply 4, direct supply 6, PLC 1, vacuum instrumentation 2, sensor 3, touch-screen 5 and perform output 7, wherein, described sensor 3 is connected with PLC 1, and the Signal transmissions that sensor 3 gathers is to PLC 1; PLC 1 includes 88 digital quantity input points, 64 digital quantity output points, 4 input analog amount interfaces, and 1 exports analog quantity interface, and PLC 1 is configured with I/O expansion module.PLC 1 is Siemens 200 type PLC.
PLC 1 is connected with execution output 7, and the Signal transmissions after PLC 1 processes is to execution output 7; Perform output 7 and comprise the mechanical pump of ion sputtering instrument, load chamber, sputtering chamber and travelling bogie, described PLC 1 is also connected with vacuum instrumentation 2, RF power supply 4, touch-screen 5, direct supply 6 respectively, respectively and vacuum instrumentation 2, RF power supply 4, touch-screen 5, carry out two-way signaling transmission between direct supply 6, described sensor 3 is arranged in ion sputtering instrument board described PLC 1.
The 5KW power supply of AE PLC of the U.S. selected by direct supply 6, is connected by the USER interface of direct supply 6 with the analog quantity interface of PLC with digital quantity interface.
RF power supply 4 selects the OEM-12A radio-frequency power supply of OEM company of the U.S., is connected by the USER interface of RF power supply 4 with the analog quantity interface of PLC with digital quantity interface, and analog quantity interface shielding line connects, and prevents Radio frequency interference (RFI).
Vacuum instrumentation 2 selects the GP307 vacuum meter of PHILLIP company, is connected by vacuum instrumentation 2 switching value interface with control interface with PLC.
Touch-screen 5 selects ten cun of screens that Taiwan prestige synthetic fibre is logical.
Touch-screen 5 includes viewing area, and viewing area has been divided into technological parameter viewing area, running state parameter viewing area and fault alarm information viewing area.Technological parameter viewing area can carry out showing and arranging.The cool time after the radio-frequency power of etching technics, etching time, etching can be set; Cool time after the sputtering order of target, sputtering power, sputtering time, sputtering can be set.Running state parameter viewing area can show the time of etching forward power, backward power, sputtering power and each technique, the step that display routine runs.
Specific operation process is as follows:
Be directed to ion sputtering instrument board, board comprises mechanical pump, load chamber, sputtering chamber and travelling bogie.
A, year chamber vacuum, namely vacuumize to load chamber.First open load chamber pre-valve mechanical pump and vacuum is evacuated to below 100 millitorrs, when reaching the value of vacuum setting etc. vacuum values, close the pre-valve of load chamber, then open molecular pump high threshold, take out 2 vacuum minute.
B, travelling bogie are loaded into, and the deep bid being about to be equipped with chip sends into sputtering chamber from load chamber.
C, etching, sputtering chamber sends into argon gas after reaching technique vacuum, starts RF power supply 4.Utilize alternating current generator to regulate variable capacitance, adopt the method for successive approximation to make backward power be adjusted to zero.
D, sputtering, sputtering chamber sends into argon gas after reaching technique vacuum, by process sequence, the power of setting, starts DC power supply.
E, travelling bogie set out, and after completing sputtering technology, the deep bid that chip is housed is sent into load chamber from sputtering chamber, and load chamber is inflated to atmospheric pressure, so that get sheet.
Whole course of work control mode has manual, semi-automatic, full-automatic, touch-screen manual operation 4 kinds of modes of operation.Manual operation, namely realized the operation of each step by the button on panel, each action has interlocking, prevents faulty operation.
Semi-automatic operation, namely performs above-mentioned a ~ e operation at every turn.
Full automatic working, namely automatically performs the operation from a to e.
Touch-screen manual operation, when switching to this mode of operation, panel button operation can be lost efficacy, and this is the mode of operation of equipment personnel ability when carrying out maintenance of equipment, and each action does not have condition to interlock.
Below be schematically described the invention and embodiment thereof, this description does not have restricted, and one of embodiment of the also just the invention shown in accompanying drawing, actual structure is not limited thereto.So, if those of ordinary skill in the art enlightens by it, when not departing from this creation aim, designing the frame mode similar to this technical scheme and embodiment without creationary, the protection domain of this patent all should be belonged to.
Claims (5)
1. an ion sputtering instrument control system, comprise RF power supply (4) and direct supply (6), it is characterized in that: also comprise PLC (1), vacuum instrumentation (2), sensor (3), touch-screen (5) and perform output (7), wherein, described sensor (3) is connected with PLC (1), and the Signal transmissions that sensor (3) gathers is to PLC (1); PLC (1) with perform output (7) and be connected, the Signal transmissions after PLC (1) process is to performing output (7); Described PLC (1) is also connected with vacuum instrumentation (2), RF power supply (4), touch-screen (5), direct supply (6) respectively; Described PLC (1) respectively and vacuum instrumentation (2), RF power supply (4), carry out two-way signaling transmission between touch-screen (5) and direct supply (6); Described sensor (3) is arranged in ion sputtering instrument board.
2. a kind of ion sputtering instrument control system according to claim 1, it is characterized in that: described PLC (1) includes 88 digital quantity input points, 64 digital quantity output points, 4 input analog amount interfaces and 1 output analog quantity interface.
3. a kind of ion sputtering instrument control system according to claim 1, is characterized in that: described PLC (1) is configured with I/O expansion module.
4. a kind of ion sputtering instrument control system according to claim 1 and 2, is characterized in that: described perform output (7) and comprise the mechanical pump of ion sputtering instrument, load chamber, sputtering chamber and travelling bogie.
5. a kind of ion sputtering instrument control system according to claim 1, it is characterized in that: described touch-screen (5) includes viewing area, and viewing area is divided into technological parameter viewing area, running state parameter viewing area and fault alarm information viewing area.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420576372.4U CN204086922U (en) | 2014-09-30 | 2014-09-30 | A kind of ion sputtering instrument control system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420576372.4U CN204086922U (en) | 2014-09-30 | 2014-09-30 | A kind of ion sputtering instrument control system |
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| Publication Number | Publication Date |
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| CN204086922U true CN204086922U (en) | 2015-01-07 |
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| CN201420576372.4U Active CN204086922U (en) | 2014-09-30 | 2014-09-30 | A kind of ion sputtering instrument control system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105328536A (en) * | 2015-11-04 | 2016-02-17 | 中国兵器科学研究院宁波分院 | Control systems for vacuum ion beam polishing machine and communication method of control systems |
-
2014
- 2014-09-30 CN CN201420576372.4U patent/CN204086922U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105328536A (en) * | 2015-11-04 | 2016-02-17 | 中国兵器科学研究院宁波分院 | Control systems for vacuum ion beam polishing machine and communication method of control systems |
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