CN204039059U - A kind of mould for the preparation of Graphene - Google Patents
A kind of mould for the preparation of Graphene Download PDFInfo
- Publication number
- CN204039059U CN204039059U CN201420386081.9U CN201420386081U CN204039059U CN 204039059 U CN204039059 U CN 204039059U CN 201420386081 U CN201420386081 U CN 201420386081U CN 204039059 U CN204039059 U CN 204039059U
- Authority
- CN
- China
- Prior art keywords
- mould
- deposition frame
- preparation
- oblique slot
- boat holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 229910021389 graphene Inorganic materials 0.000 title claims abstract description 30
- 238000002360 preparation method Methods 0.000 title claims description 16
- 230000008021 deposition Effects 0.000 claims abstract description 52
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 description 37
- 238000000034 method Methods 0.000 description 15
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005070 sampling Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 210000005056 cell body Anatomy 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- -1 graphite alkene Chemical class 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Landscapes
- Carbon And Carbon Compounds (AREA)
Abstract
The utility model discloses a kind of mould preparing Graphene, comprise boat holder, deposition frame, plate and metal base; Described boat holder is placed in silica tube; It is inner that described deposition frame is positioned over boat holder, and be provided with at least one; Described deposition frame is arranged with the oblique slot of multilayer in parallel, in each oblique slot, is equipped with one block of plate; Described metal base is loaded in the upper surface of plate.Multiple deposition frame can be placed in boat holder inside of the present utility model, and deposition frame is arranged with the oblique slot of multilayer in parallel, and single can load metal base quantity comparatively greatly, solves the problem that existing mold one single deposition dress sample is less.
Description
Technical field
The utility model relates to a kind of mould for the preparation of Graphene.
Background technology
After Graphene is found, due to excellent conductive and heat-conductive ability, great structural strength, has a wide range of applications at new forms of energy, novel material and the numerous areas such as electronic devices and components, medication chemistry.Graphene is current preparation method mainly contain: microcomputer stripping method, epitaxial method, oxidation reduction process, solvent stripping method, chemical Vapor deposition process (CVD) etc.
CVD is the method for extensive making Graphene most prospect at present.Rare gas element, reducing gas and carbon source are passed into according to a certain percentage and sequentially, at high temperature (1000 ~ 1050 degree), carbon source is decomposed, and when annealing, Graphene will be separated out at substrate material surface.Base material prepared by Graphene is generally various metal, comprises Copper Foil, nickel foil, platinum foil etc., wherein due to metal base low price and the Graphene quality of growth better and the number of plies is more easy to control can be used for scale operation.After depositing operation completes, need by rotor technique Graphene to be transferred on required substrate to re-use.
Current deposited graphite alkene is usually adopted and metal base is undertaken by the mode being wound on silica tube surface, as " a kind of support of growing graphene, bracket component and graphene film growth module " that the application number Chinese patent literature that is CN201120551369.3 provides, this class methods shortcoming is: the number of single process growing graphene is less; Dress sample is got metal base in sheet process and is easy to die surface friction, causes the breakage of Graphene; Under high temperature, metal base deliquescing directly easily forms fold by metal base taking-up process; Friction when mould loads and between silica tube shakes, and causes metal base to misplace; Mould cost is high, changes difficulty after breakage.
Utility model content
The purpose of this utility model is the shortcoming for prior art, provides a kind of mould for the preparation of Graphene, solves the deficiencies in the prior art.
The technical scheme realizing the utility model object is: a kind of mould for the preparation of Graphene, comprises boat holder, deposition frame, plate and metal base; Described boat holder is placed in silica tube; It is inner that described deposition frame is positioned over boat holder, and be provided with at least one; Described deposition frame is arranged with the oblique slot of multilayer in parallel, in each oblique slot, is equipped with one block of plate; Described metal base is loaded in the upper surface of plate.
The quantity of the deposition frame in described boat holder is 1 ~ 10.
Described boat holder comprises at least two upper support sticks, at least two lower support rods, two pieces of vertical baffles and some stiffening webs; Described two upper support sticks and two lower support rods be arranged in parallel; The two ends of described upper support stick are separately fixed on two angles on the top of two pieces of vertical baffles; The two ends of described lower support rod are separately fixed on two angles of the bottom of two pieces of vertical baffles; The two ends of described all stiffening webs are fixed on two lower support rods respectively, and vertical with lower support rod.
The diameter of the upper support stick of described boat holder is 8 ~ 16mm, and the diameter of stiffening web is not more than lower support rod diameter, and scope is 10 ~ 15mm, and the thickness of vertical baffle is 5 ~ 10mm; The quantity of described stiffening web is 3 ~ 5.
Distance between two upper support sticks of described boat holder is greater than the distance between two lower support rods.
In described boat holder the upper support stick of the same side and lower support rod place plane and horizontal plane between angle be 91 DEG C ~ 120 DEG C.
Described deposition frame adopts rectangular frame structure; The oblique slot of described deposition frame is arranged on four root posts of deposition frame.
The top of the side that the oblique slot height of described deposition frame is higher does not arrange crossbeam.
The outside of the side that the oblique slot height of described deposition frame is lower is provided with blend stop.
The height of the oblique slot of described deposition frame is 2 ~ 4mm, the degree of depth is 3 ~ 4mm, quantity is 5 ~ 20, gradient is 1 ° ~ 8 °, equidistant or Unequal distance between adjacent oblique slot, and the spacing between oblique slot is 5 ~ 10mm; The thickness of described plate is 1 ~ 2mm.Have employed technique scheme, the utility model has following beneficial effect:
(1) multiple deposition frame can be placed in boat holder inside of the present utility model, and deposition frame is arranged with the oblique slot of multilayer in parallel, and single loads metal base quantity comparatively greatly, solves the problem that existing mold one single deposition dress sample is less.
(2) be equipped with one block of plate in each oblique slot of the present utility model, after deposition, sampling can be carried out from top to bottom successively, avoids the Graphene of metal substrate surface and the friction of mould in sampling process to cause breakage.
(3) metal base of the present utility model is loaded in the upper surface of plate, plate and metal base is unloaded in sampling process simultaneously, avoids the gauffer unloading separately and cause in metal base process.
(4) deposition frame of the present utility model is positioned in boat holder, can be placed on oar and directly silica tube appointed part be stretched in boat holder, to decrease between boat and silica tube friction vibrations and the metal base skew that causes.
(5) multiple deposition frame can be placed in boat holder inside of the present utility model, and single cell breakage is convenient afterwards to be changed in time, continues to use.
(6) deposition frame of the present utility model adopts rectangular frame structure; The oblique slot of described deposition frame is arranged on four root posts of deposition frame, and this structure fluting is convenient, effectively can alleviate the weight of deposition frame, and keep stronger structural strength when opening cell body dark equally.
(7) top of the side that the oblique slot height of deposition frame of the present utility model is higher does not arrange crossbeam, the convenient sampling of this structure, and can alleviate the weight of deposition frame further.
(8) outside of the side that the oblique slot height of deposition frame of the present utility model is lower is provided with blend stop, can prevent metal base in growth and transfer quartz boat process due to vibrations landing.
Accompanying drawing explanation
In order to make content of the present utility model more easily be clearly understood, below according to specific embodiment also by reference to the accompanying drawings, the utility model is described in further detail, wherein
Fig. 1 is the structural representation that the utility model is placed in silica tube.
Fig. 2 is the A place enlarged view of Fig. 1.
Fig. 3 is the structural representation of boat holder of the present utility model.
Fig. 4 is the structural representation of deposition frame of the present utility model.
Label in accompanying drawing is:
Boat holder 1, upper support stick 11, lower support rod 12, stiffening web 13, vertical baffle 14, deposition frame 2, oblique slot 21, blend stop 22, plate 3, silica tube 4.
Embodiment
(embodiment 1)
See Fig. 1 to Fig. 4, the mould preparing Graphene of the present embodiment, comprise boat holder 1, deposition frame 2, plate 3 and metal base.
Boat holder 1 is placed in silica tube 4.It is inner that deposition frame 2 is positioned over boat holder 1, and be provided with at least one.Deposition frame 2 is arranged with the oblique slot 21 of multilayer in parallel, in each oblique slot 21, is equipped with one block of plate 3.Metal base is loaded in the upper surface of plate 3.
The quantity of the deposition frame 2 in boat holder 1 is 1 ~ 10.Boat holder 1 comprises at least two upper support stick 11, at least two lower support rods 12, two pieces of vertical baffles 14 and some stiffening webs 13.Two upper support sticks 11 and two lower support rods 12 be arranged in parallel.The two ends of two upper support sticks 11 are separately fixed on two angles on the top of two pieces of vertical baffles 14.The two ends of two lower support rods 12 are separately fixed on two angles of the bottom of two pieces of vertical baffles 14.The two ends of all stiffening webs 13 are fixed on two lower support rods 12 respectively, and vertical with lower support rod 12.The diameter of the upper support stick 11 of boat holder 1 is 8 ~ 12mm, and the diameter of lower support rod 12 and stiffening web 13 is 10 ~ 15mm, and the thickness of vertical baffle 14 is 5 ~ 10mm.The quantity of stiffening web 13 is 3 ~ 5.Distance between two upper support sticks 11 of boat holder 1 is greater than the distance between two lower support rods 12.In boat holder 1 the upper support stick 11 of the same side and lower support rod 12 place planes and horizontal plane between angle be 91 DEG C ~ 120 DEG C.
Deposition frame 2 adopts rectangular frame structure.The oblique slot 21 of deposition frame 2 is arranged on four root posts of deposition frame 2.The top of the highly higher side of oblique slot 21 of deposition frame 2 does not arrange crossbeam.The outside of the highly lower side of oblique slot 21 of deposition frame 2 is provided with blend stop 22.The height of the oblique slot 21 of deposition frame 2 is 2 ~ 4mm, the degree of depth is 3 ~ 4mm, quantity is 5 ~ 20, gradient is 1 ° ~ 8 °, and the spacing between oblique slot 21 is 5 ~ 10mm.The thickness of plate 3 is 1 ~ 2mm.
The mould preparing Graphene for CVD of the present embodiment can be made up of materials such as quartz, corundum, silicon carbide.Large I increases the number of plies of plate 3 according to the change of silica tube 4 diameter, the length of boat holder 1 and the number of deposition frame 2 suitably can increase according to the length of boiler tube flat-temperature zone, according to boiler tube particular case, the distance between every layer of oblique slot 21 can be designed to equidistant or Unequal distance.
Above-described specific embodiment; the purpose of this utility model, technical scheme and beneficial effect are further described; be understood that; the foregoing is only specific embodiment of the utility model; be not limited to the utility model; all within spirit of the present utility model and principle, any amendment made, equivalent replacement, improvement etc., all should be included within protection domain of the present utility model.
Claims (10)
1. for the preparation of a mould for Graphene, it is characterized in that: comprise boat holder (1), deposition frame (2), plate (3) and metal base; Described boat holder (1) is placed in silica tube (4); It is inner that described deposition frame (2) is positioned over boat holder (1), and be provided with at least one; Described deposition frame (2) is arranged with the oblique slot of multilayer (21) in parallel, in each oblique slot (21), is equipped with one piece of plate (3); Described metal base is loaded in the upper surface of plate (3).
2. a kind of mould for the preparation of Graphene according to claim 1, is characterized in that: the quantity of the deposition frame (2) in described boat holder (1) is 1 ~ 10.
3. a kind of mould for the preparation of Graphene according to claim 1, is characterized in that: described boat holder (1) comprises at least two upper support sticks (11), at least two lower support rods (12), at least two pieces of vertical baffles (14) and some stiffening webs (13); Described upper support stick (11) and lower support rod (12) be arranged in parallel; The two ends of described upper support stick (11) are separately fixed on two angles on the top of two pieces of vertical baffles (13); The two ends of described lower support rod (12) are separately fixed on two angles of the bottom of two pieces of vertical baffles (14); The two ends of described all stiffening webs (13) are fixed on two lower support rods (12) respectively, and vertical with lower support rod (12).
4. a kind of mould for the preparation of Graphene according to claim 3, it is characterized in that: the diameter of the upper support stick (11) of described boat holder (1) is 8 ~ 16mm, the diameter of stiffening web (13) is not more than lower support rod (12) diameter, and scope is 10 ~ 15mm, the thickness of vertical baffle (14) is 5 ~ 10mm; The quantity of described stiffening web (13) is 3 ~ 5.
5. a kind of mould for the preparation of Graphene according to claim 3, is characterized in that: the distance between two upper support sticks (11) of described boat holder (1) is greater than the distance between two lower support rods (12).
6. a kind of mould for the preparation of Graphene according to claim 5, is characterized in that: in described boat holder (1), the angle be positioned between the upper support stick (11) of the same side and lower support rod (12) place plane and horizontal plane is 91 DEG C ~ 120 DEG C.
7. a kind of mould for the preparation of Graphene according to claim 1, is characterized in that: described deposition frame (2) adopts quadra structure; The oblique slot (21) of described deposition frame (2) is arranged on four root posts of deposition frame (2).
8. a kind of mould for the preparation of Graphene according to claim 1, is characterized in that: the top of the side that the oblique slot (21) of described deposition frame (2) is highly higher does not arrange crossbeam.
9. a kind of mould for the preparation of Graphene according to claim 1, is characterized in that: the outside of the side that the oblique slot (21) of described deposition frame (2) is highly lower is provided with blend stop (22).
10. a kind of mould for the preparation of Graphene according to claim 1, it is characterized in that: the height of the oblique slot (21) of described deposition frame (2) is 2 ~ 4mm, the degree of depth is 3 ~ 4mm, quantity is 5 ~ 20, gradient is 1 ° ~ 8 °, spacing between oblique slot (21) is 5 ~ 10mm, equidistant or Unequal distance between adjacent oblique slot (21); The thickness of described plate (3) is 1 ~ 2mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420386081.9U CN204039059U (en) | 2014-07-11 | 2014-07-11 | A kind of mould for the preparation of Graphene |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420386081.9U CN204039059U (en) | 2014-07-11 | 2014-07-11 | A kind of mould for the preparation of Graphene |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204039059U true CN204039059U (en) | 2014-12-24 |
Family
ID=52239750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420386081.9U Expired - Lifetime CN204039059U (en) | 2014-07-11 | 2014-07-11 | A kind of mould for the preparation of Graphene |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204039059U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104609416A (en) * | 2015-02-15 | 2015-05-13 | 重庆墨希科技有限公司 | Carrier used for graphene growth and method for preparing graphene |
-
2014
- 2014-07-11 CN CN201420386081.9U patent/CN204039059U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104609416A (en) * | 2015-02-15 | 2015-05-13 | 重庆墨希科技有限公司 | Carrier used for graphene growth and method for preparing graphene |
| CN104609416B (en) * | 2015-02-15 | 2017-01-18 | 重庆墨希科技有限公司 | Carrier used for graphene growth and method for preparing graphene |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: CHANGZHOU 2D CARBON TECHNOLOGY CO., LTD. Free format text: FORMER NAME: 2D CARBON (CHANGZHOU) TECHNOLOGY CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: 213000 No. 6 Xiangyun Road, Wujin Economic Development Zone, Jiangsu, Changzhou Patentee after: 2D CARBON (CHANGZHOU) TECH Inc.,Ltd. Address before: 213000 No. 6 Xiangyun Road, Wujin Economic Development Zone, Jiangsu, Changzhou Patentee before: 2D CARBON (CHANGZHOU) TECH Co.,Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20141224 |