CN204028559U

CN204028559U - A kind of inserted type mask plate

Info

Publication number: CN204028559U
Application number: CN201420358143.5U
Authority: CN
Inventors: 夏玺华; 李随萌; 方庭
Original assignee: Xiangneng Hualei Optoelectrical Co Ltd
Current assignee: Xiangneng Hualei Optoelectrical Co Ltd
Priority date: 2014-06-30
Filing date: 2014-06-30
Publication date: 2014-12-17
Anticipated expiration: 2024-06-30

Abstract

The utility model provides a kind of inserted type mask plate, comprises recess and the protruding place of space on the side of described mask plate, and inward flange lines shape, the size of the outer edge line strip at described protruding place, size and described recess are coincide mutually; In described protruding place, be provided with the complete plating network figure of at least one unit.The utility model is by redesigning the connecting method of mask plate, the serrate that is mutual interlock by the edge designs of mask plate Mosaic face, and the complete plating network figure of at least one unit is placed on to the recess at edge, alleviate splicing difficulty and workload, and improved the integrity degree that plates network figure, effectively stopping to expose, it is abnormal to splice the chip surface extremely causing.

Description

A kind of inserted type mask plate

Technical field

The utility model relates to LED industry photoetching utility appliance field, especially, relates to a kind of inserted type mask plate.

Background technology

At present, LED industry development is more and more ripe, graphical sapphire substrate (PatternedSapphireSubstrate, PSS) can effectively reduce dislocation and the defect of epitaxial material, in nitride device preparation, being widely used, is the main flow substrate adopting in current LED industry.Graphical sapphire substrate is at Grown on Sapphire Substrates dry etching mask, by the photoetching process of standard, mask is carved to predetermined pattern, utilize ICP lithographic technique etching sapphire, and remove mask, growth GaN material thereon, makes longitudinal extension of GaN material become horizontal extension again.Can effectively reduce the dislocation desity of GaN epitaxial material like this, thereby reduce the non-radiative compound of active area, reduce reverse leakage current, improve the life-span of LED; The light that send active area on the other hand, through GaN and Sapphire Substrate interface Multiple Scattering, has changed the emergence angle of total reflection light, has increased the light of flip LED from the probability of Sapphire Substrate outgoing, thereby has improved the extraction efficiency of light.The reason of comprehensive this two aspect, improves the traditional LED of emergent light brightness ratio of the LED of the upper growth of PSS greatly, and reverse leakage current reduces simultaneously, and the life-span of LED has also obtained prolongation.

The graphical sapphire substrate of the overwhelming majority, adopts step photo-etching machine to expose at present.Existing litho machine light shield generally adopts the mode of semicircle splicing to carry out general optical splice.As described in Figure 1, the semi-circular pattern at two mask plate edges is docked, making two semicircle amalgamations on mask plate is a full circle.The mode of this semicircle splicing easily causes two semicircle docking not quite identical, makes the spliced figure of mask plate abnormal, makes substrate surface figure extremely and then causes MOCVD growth rear surface abnormal.

Utility model content

The utility model object is to provide a kind of inserted type mask plate, to solve the abnormal technical matters of substrate surface graphic joining.

For achieving the above object, the utility model provides a kind of inserted type mask plate, the recess and the protruding place that on the side of described mask plate, comprise space, inward flange lines shape, the size of the outer edge line strip at described protruding place, size and described recess are coincide mutually;

In described protruding place, be provided with the complete plating network figure of at least one unit.

Preferably, described protruding place is shaped as rectangle, triangle, circle or trapezoidal.

Preferably, in described protruding place, be provided with a complete plating network figure.

The complete plating network figure of at least one unit preferably, arranging in described protruding place is horizontal or longitudinal arrangement.

Preferably, described complete plating network figure is circular.

The utlity model has following beneficial effect:

The utility model is by redesigning the connecting method of mask plate, the serrate that is mutual interlock by the edge designs of mask plate Mosaic face, and the complete plating network figure of at least one unit is placed on to the recess at edge, make mask plate in splicing, not need will to plate network figure perfect alignment to form a new complete plating network figure simultaneously, alleviate splicing difficulty and workload, and improved the integrity degree that plates network figure, effectively stopping to expose, it is abnormal to splice the chip surface extremely causing.

Except object described above, feature and advantage, the utility model also has other object, feature and advantage.Below with reference to figure, the utility model is described in further detail.

Accompanying drawing explanation

The accompanying drawing that forms the application's a part is used to provide further understanding of the present utility model, and schematic description and description of the present utility model is used for explaining the utility model, does not form improper restriction of the present utility model.In the accompanying drawings:

Fig. 1 is the mask structure being schematic diagram of prior art;

Fig. 2 is one of mask structure being schematic diagram of the utility model preferred embodiment;

Fig. 3 be the utility model preferred embodiment mask structure being schematic diagram two;

Fig. 4 be the utility model preferred embodiment mask structure being schematic diagram three;

Wherein, 1, mask plate, 2, complete plating network figure, 3, protruding place, 4, recess.

Embodiment

Below in conjunction with accompanying drawing, embodiment of the present utility model is elaborated, but the multitude of different ways that the utility model can limit and cover according to claim is implemented.

Referring to Fig. 2 and Fig. 3, the utility model provides a kind of inserted type mask plate, the recess 4 and the protruding place 3 that on the side of described mask plate 1, comprise space, inward flange lines shape, the size of the outer edge line strip at described protruding place 3, size and described recess are coincide mutually; The example outer edge line strip at protruding place 3 and the inward flange lines shape of described recess is as shown in Figure 2 straight line, the inward flange lines shape of the outer edge line strip at the protruding place 3 shown in Fig. 3 and described recess is the wedge angle that two oblique lines form, so can mutually coincide, realize two slitless connections between mask plate.

In described protruding place, be provided with the complete plating network figure 2 of at least one unit, make in splicing, without the incomplete plating network figure of aiming at both sides, to simplify splicing, and effectively keep the integrality of all units figure.

The shape at described protruding place can, for rectangle, triangle, circle or trapezoidal, not affect the realization of the utility model embodiment.As the rectangle that is shaped as at the protruding place of Fig. 2.

The complete plating network figure 2 arranging in described protruding place is at least Yi Ge unit, as Fig. 2 and Fig. 3, is the figure of Yi Ge unit.Referring to Fig. 4, the figure of Wei Liangge unit.Figure 4 shows that transversely arrangedly, can select flexibly longitudinally or laterally arrange according to actual conditions.Longitudinally arrange and be at least two the complete plating network figures 2 of arranging on the bearing of trend at least one protruding place 3.

The foregoing is only preferred embodiment of the present utility model, be not limited to the utility model, for a person skilled in the art, the utility model can have various modifications and variations.All within spirit of the present utility model and principle, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection domain of the present utility model.

Claims

1. an inserted type mask plate, is characterized in that, comprises recess and the protruding place of space on the side of described mask plate, and inward flange lines shape, the size of the outer edge line strip at described protruding place, size and described recess are coincide mutually;

2. a kind of inserted type mask plate according to claim 1, is characterized in that, described protruding place is shaped as rectangle, triangle, circle or trapezoidal.

3. a kind of inserted type mask plate according to claim 1, is characterized in that, is provided with a complete plating network figure in described protruding place.

4. a kind of inserted type mask plate according to claim 1, is characterized in that, the complete plating network figure of at least one unit arranging in described protruding place is horizontal or longitudinal arrangement.

5. a kind of inserted type mask plate according to claim 1, is characterized in that, described complete plating network figure is circular.