CN204020101U - A kind of coated glass - Google Patents
A kind of coated glass Download PDFInfo
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- CN204020101U CN204020101U CN201420011565.5U CN201420011565U CN204020101U CN 204020101 U CN204020101 U CN 204020101U CN 201420011565 U CN201420011565 U CN 201420011565U CN 204020101 U CN204020101 U CN 204020101U
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- coated glass
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- 239000011521 glass Substances 0.000 title claims abstract description 93
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000012528 membrane Substances 0.000 claims abstract description 19
- 239000010410 layer Substances 0.000 claims description 143
- 229910004205 SiNX Inorganic materials 0.000 claims description 22
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 229910020286 SiOxNy Inorganic materials 0.000 claims description 18
- 229910003134 ZrOx Inorganic materials 0.000 claims description 17
- 229910003087 TiOx Inorganic materials 0.000 claims description 11
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 9
- 229910006245 ZrSiNx Inorganic materials 0.000 claims description 4
- 229910003465 moissanite Inorganic materials 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims description 2
- 238000003672 processing method Methods 0.000 abstract description 23
- 238000005496 tempering Methods 0.000 abstract description 4
- 230000001458 anti-acid effect Effects 0.000 abstract description 3
- 239000003963 antioxidant agent Substances 0.000 abstract description 3
- 230000003078 antioxidant effect Effects 0.000 abstract description 3
- 235000006708 antioxidants Nutrition 0.000 abstract description 3
- 239000003518 caustics Substances 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 238000005260 corrosion Methods 0.000 abstract description 3
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 58
- 238000004544 sputter deposition Methods 0.000 description 25
- 238000004062 sedimentation Methods 0.000 description 23
- 238000012546 transfer Methods 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- 238000009413 insulation Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
Abstract
The utility model provides a kind of coated glass, comprise: glass substrate and plated film, taking described glass substrate as substrate, described plated film film layer structure is from inside to outside: the first dielectric combination layer film, the second dielectric combination layer film, trilamellar membrane, the 4th layer of dielectric combination film, layer 5 film, layer 6 film.The processing method of this coated glass is: glass substrate is provided; On this glass substrate, deposit ground floor dielectric combination layer film; On ground floor, deposit second layer dielectric combination layer film; On the second layer, deposit the 3rd layer of transparent oxide conduction tunic; On the 3rd layer, deposit the 4th layer of dielectric combination layer film; On the 4th layer, deposit layer 5 film; On layer 5, deposit layer 6 film.A kind of film on coated glass of the utility model, this rete has outside good infrared external reflection function, also have anti-oxidant, antiacid caustic corrosion, can tempering and can be exposed under atmospheric environment.
Description
Technical field
The utility model relates to a kind of coated glass, relates to more specifically the coated glass with infrared external reflection function.
Background technology
Glass is the main material of be mainly used in that door and window, curtain wall and automobile keep out the wind a kind of transparent, heat-insulation and heat-preservation, it is part the thinnest in building or automobile, that readily conduct heat most, so double glazing is widely adopted at present, it is between glass and glass, to leave certain cavity; Therefore, there is the performances such as good insulation, heat insulation, sound insulation.But this double glazing thermal property is not strong, be subject to sharp pounding or impact easily fragmentation, do not there is the function of purifying the air of a room yet.The at present best low-e double glazing product of thermal property, its heat transfer coefficient U value is about 1.6W/m2.K, shading coefficient Sc is 0.3 upper and lower; In conventional hollow glass structure situation, its coefficient of heat conduction U value and shading coefficient Sc are all difficult to further reduce again.In order further to reduce the U value of product; common way is to reduce its coefficient of heat conduction by changing hollow thickness and being filled with inert gas or increasing the modes such as substrate thickness in hollow structure; but this can increase the cost of product undoubtedly; improve finished product price; and improve limited to properties of product; do not meet mainstream market demand, be difficult to accomplish scale production.Another way that improves product thermal property is at No. two face plating low-e retes of double glazing, be coated with thermal reflecting coating at 3# face, but this kind of method only contributed to some extent to shading coefficient Sc, heat transfer coefficient U value, without any reduction, and is only suitable for using in the area grown day-light saving time, south.And be all coated with low-e film at No. two faces of double glazing and No. three faces, with respect to a product at No. two face plated films, only shading coefficient Sc and heat transfer coefficient U are slightly contributed to (all only improving 0.01～0.03), product overall performance is not almost affected, do not possess real production meaning.Under normal circumstances, double glazing comprises four faces, comprises successively a face, No. two faces, No. three faces and No. four faces by outdoor to indoor surface.
Utility model content
The purpose of this utility model is the technological deficiency for prior art, and the utility model aims to provide a kind of coated glass with infrared external reflection function, for realizing above technical goal, the utility model by the following technical solutions:
A kind of coated glass, comprising: glass substrate and plated film, and taking described glass substrate as substrate, described plated film film layer structure is from inside to outside:
The first dielectric combination layer film, described the first dielectric combination layer film is the dielectric substance of refractive index n between 2.0～2.7;
The second dielectric combination layer film, described the second dielectric combination layer film is the dielectric substance of refractive index n between 1.4～1.8;
Trilamellar membrane, described trilamellar membrane is that refractive index n is at 2.0～2.5 transparent oxide conductive film layers;
The 4th dielectric combination layer film, the dielectric substance of described the 4th dielectric combination layer film refractive index n between 1.4～1.8;
Layer 5 film;
Layer 6 film, described the 6th rete is block protective layer.
Further, the first described dielectric combination layer film is the one or more combination in SiNx, TiOx or ZrOx.
Further, the second described dielectric combination layer film is the one or more combination in SiOx, SiOxNy or ZrSiOx.
Further, described tertiary membrane layer is the one or more combination in ITO, TNO or AZO.
Further, the 4th described dielectric combination layer film is the one or more combination in SiOx, SiOxNy, ZrSiOx or ZrSiNx.
Further, the 5th described rete is SiNx or TiOx.
Further, the 6th described rete is SiC, ZrOx or SiNx.
Further, this first dielectric combination layer film thickness is 15-35nm, and the second dielectric combination layer film thickness is 10-40nm, and trilamellar membrane thickness is 80-500nm, and the 4th dielectric combination layer film thickness is 15-45nm, and layer 5 film thickness is 10-35nm; Layer 6 film thickness is 5-30nm.
The invention also discloses the preparation method of coated glass, it is characterized in that comprising the steps:
Step 1: glass substrate is provided;
Step 2: deposit ground floor dielectric combination layer film on this glass substrate---mono-kind of SiNx, TiOx or ZrOx or combination;
Step 3: deposit second layer dielectric combination layer film on ground floor---one or more in SiOx, SiOxNy or ZrSiOx;
Step 4: deposit the 3rd layer of transparent oxide conduction tunic on the second layer---as a kind of or combination in ITO, TNO or AZO;
Step 5: deposit the 4th layer of dielectric combination layer film---SiOx, SiOxNy, ZrSiOx or ZrSiNx on the 3rd layer;
Step 6: deposit layer 5 film on the 4th layer---SiNx or TiOx;
Step 7: deposit layer 6 film on layer 5---SiC, ZrOx or SiNx.
Further, wherein, the processing method of the SiNx in ground floor dielectric combination layer film is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, reacting gas is N2, TiOx uses intermediate frequency power supply rotating cathode sputtering sedimentation equally, and working gas is Ar gas, direct current or intermediate frequency power supply reactive sputter-deposition for ZrOx, working gas Ar, reacting gas O2, the post-depositional scope of this layer is 15-35nm, preferably 20～30nm;
Wherein, SiOx, the SiOxNy in second layer dielectric combination layer film, the processing method of ZrSiOx are that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein SiOx, ZrSiOx working gas are Ar, and reacting gas is O2, with SiAl target and the sputter of ZrSiAl target; SiOxNy working gas is Ar, and reacting gas is O2 and N2, and target uses SiAl target; The deposit thickness scope of this combination layer is 10-40nm, preferably 15-25nm.
Wherein, processing method a kind of or combination in ITO, TNO, AZO in tertiary membrane layer transparent oxide conducting film is that ITO, TNO are that intermediate frequency power supply adds rotating cathode sputtering sedimentation, wherein working gas is Ar sputter, ITO, TNO are dc source sputter, working gas is pure Ar sputter, deposit thickness scope is 80-500nm, preferably 100-350nm;
Wherein, SiOx, SiOxNy in the 4th dielectric combination layer film, the processing method of ZrSiOx are that intermediate frequency power supply adds rotating cathode sputtering sedimentation, wherein SiOx, ZrSiOx working gas are Ar, reacting gas is O2, and with SiAl target and the sputter of ZrSiAl target, SiOxNy working gas is Ar, reacting gas is O2 and N2, target uses SiAl target, and the deposit thickness scope of this combination layer is 15-45nm, preferably 20-30nm;
Wherein, the 5th SiNx of rete or the processing method of TiOx are that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is N2 or O2, and the post-depositional scope of SiNx is 10-35nm, preferably 20-30nm.
Wherein, the processing method of the ZrOx of the 6th rete is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, reacting gas is O2, and SiC Film preparation method is flat target d.c. sputtering, and sputter gas is pure Ar, the scope of the deposit thickness of this layer is 5-30nm, preferably 7-20nm.
Trilamellar membrane is the including transparent conducting oxide layer that has infrared external reflection and have low radiance, and can be combination or sandwich structure combination, as ITO+AZO+ITO etc.In order further to reduce radiance, improve infrared external reflection, according to the difference of selected transparent conductive oxide rete, this combination layer can improve electric conductivity through Overheating Treatment, reduces radiance.
Layer 5 film is mainly to select high index material, and coordinates rete above, improves the transmitance of overall rete, reduces reflection, plays the effect of connection the 4th and layer 6 simultaneously, increases film adhesion and density.
Layer 6 film is mainly the rete that has high rigidity, scratch resistance, acid-alkali-corrosive-resisting and overall rete is had to protectiveness.
This coated glass can be used for building by individual layer, also can be used as double glazing, faced chamber's inner face of chamber inner layer glass, namely No. four faces.Conventionally double glazing comprises four faces, be respectively face No. one, No. two faces, No. three faces, No. four faces, the one side by air of a Mian Shi chamber glass outer, the one side by hollow cavity of No. two Mian Shi chamber glass outers, No. three Mian Shi chamber inner layer glasses are close to the one side of hollow cavity, and No. four Mian Shi chamber inner layer glasses are by indoor one side.Glass hollow cavity can vacuumize or fill 10%～95% the inert gas such as Ar gas, He gas.Cavity thickness range is 6～24mm.No. two face is coated with low-e rete, these No. two face low-e rete radiances 0.03～0.15, and visible light transmissivity 40%～87%, No. four masks have the plated film of the coated glass of infrared external reflection function.
As the plated film of No. four faces of double glazing, coordinate No. two faces to be coated with low-e rete, will effectively reduce Sc and U value, optimizing product thermal property, can meet and promote the demand of existing market to building coated glass.
SC value is energy-saving index, is also shading coefficient.
Shading coefficient Sc: under the same conditions, the ratio (solar radiant energy that sees through 3 ㎜ conventional clear glass is 630W/m2) through the solar radiant energy of glass with the solar radiant energy through 3 ㎜ conventional clear glass.What shading coefficient Sc reflected is the heat transfer that direct solar radiation sees through glass.The glass of different shading coefficients is suitable for the area of Different climate.
Shading coefficient Sc=direct solar radiation energy ÷ 630W/m2
Direct solar radiation energy=630W/m2 × shading coefficient Sc
Shading coefficient Sc directly reflects the screening effect of glass to sunlight, and what it embodied is the heat-proof quality of glass.Sc is high to be meaned and sees through glass to enter indoor solar radiant heat many, and the heat-proof quality of glass is poor.
Heat transfer coefficient: referred to as K value or U value (for glass, both are called for short difference).Be the important limit value of design standard for energy efficiency of buildings to glass, refer under steady heat transfer condition, glass both sides Air Temperature Difference is 1 while spending, in the unit interval, by the heat output of 1 square metre of glass, represents with W/m2K or W/m2 DEG C.External U value is shown Btu/hr/ft2/F with bit table made in Great Britain, and English unit's U value is multiplied by 5.678 conversion coefficient and obtains metric unit U value.Heat transfer coefficient is lower, illustrates that the thermal and insulating performance of glass is better.The heat transfer coefficient of monolithic simple glass is about 5.8W/m2K.
A kind of film on coated glass of the utility model, this rete has outside good infrared external reflection function, also have anti-oxidant, antiacid caustic corrosion, can tempering and can be exposed under atmospheric environment, realization can monolithic be used and has the functional glass product of infrared external reflection characteristic, can be made into hollow glass structure simultaneously, to effectively reduce Sc and U value, optimizing product thermal property, can meet and promote the demand of existing market to building coated glass.
The utility model has the advantages that: the utility model ground floor set of dielectrics be there is high index of refraction, extremely strong and in tempering heating process, can stop the dielectric substance of Na+ diffusion with glass substrate adhesion, can stop the dielectric substance of Na+ diffusion; The second dielectric combination layer film is for having compared with low index dielectric material, and as one or more in SiOx, SiOxNy, ZrSiOx, ranges of indices of refraction is 1.4～1.8; Tertiary membrane layer is the transparent oxide conductive film layer with high index, and as one or more the combination in ITO, TNO, AZO, its refractive index is 2.0～2.5.; The 4th layer of dielectric combination layer film, for thering is the dielectric substance of relatively low refractive index, as one or more the combination in SiOx, SiOxNy, ZrSiOx or ZrSiNx, the 6th rete is to have material or the combination layer that extremely strong acid-alkali-corrosive-resisting, high temperature resistant and extreme hardness, anti-machinery scratch, as the one in SiC, ZrOx, SiNx.Owing to having adopted the design of high-low-high refractivity film layer structure matching, effectively improve the transmitance of overall rete.This rete has outside good infrared external reflection function, also have anti-oxidant, antiacid caustic corrosion, can tempering and can be exposed under atmospheric environment.
Brief description of the drawings:
Fig. 1 is structural representation of the present utility model
Fig. 2 is the schematic diagram of the utility model application
1, glass 2, face 3, No. two faces
4, hollow cavity 5, No. three faces 6, No. four faces
Detailed description of the invention
In order to illustrate the technical solution of the utility model and technical purpose, below in conjunction with the drawings and the specific embodiments, the utility model is described further.
As shown in the figure, the structure of coated glass of the present utility model is: glass substrate and plated film, taking described glass substrate as substrate, described plated film film layer structure is from inside to outside: the first dielectric combination layer film, the second dielectric combination layer film, trilamellar membrane, the 4th layer of dielectric combination film, layer 5 film, layer 6 film.
Embodiment 1
The structure of the present embodiment coated glass is for comprising: glass substrate and plated film, and taking described glass substrate as substrate, described plated film film layer structure is from inside to outside: the first dielectric combination layer film is SiNx; The second dielectric combination layer film is SiOx; Trilamellar membrane is ITO; The 4th layer of dielectric combination film is SiOxNy; Layer 5 film is SiNx; Layer 6 film is ZrOx.
The first described dielectric combination layer film is 15nm;
The second described dielectric combination layer film thickness is 25nm;
Described trilamellar membrane thickness is 80nm;
The 4th layer of described dielectric combination film thickness is 45nm;
Described layer 5 film thickness is 10nm;
Described layer 6 film thickness is 30nm;
Wherein, the processing method of the SiNx of ground floor is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is N
2, the post-depositional thickness of SiNx is 15nm;
Wherein, the processing method of the SiOx of the second layer is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is O
2, with the sputter of SiAl target, the post-depositional thickness of SiOx is 25nm;
Wherein, the processing method of the ITO of the 3rd layer is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is N2 and O
2, the post-depositional thickness of ITO is 80nm;
Wherein, the processing method of the SiOxNy of the 4th layer is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is N2 and O
2, the post-depositional thickness of SiOxNy is 40nm;
Wherein, the processing method of the SiNx of layer 5 is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is N
2, the post-depositional thickness of SiNx is 10nm;
Wherein, the processing method of the ZrOx of layer 6 is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is O
2, the post-depositional thickness of ZrOx is 30nm.
Embodiment 2
The structure of the present embodiment coated glass is for comprising: glass substrate and plated film, and taking described glass substrate as substrate, described plated film film layer structure is from inside to outside: the first dielectric combination layer film is TiOx; The second dielectric combination layer film is SiOxNy; Trilamellar membrane is TNO; The 4th layer of dielectric combination film is ZrSiOx; Layer 5 film is TiO
x; Layer 6 film is ZrOx.
The first described dielectric combination layer film is 35nm;
The second described dielectric combination layer film thickness is 40nm;
Described trilamellar membrane thickness is 500nm;
The 4th layer of described dielectric combination film thickness is 15nm;
Described layer 5 film thickness is 20nm;
Described layer 6 film thickness is 5nm;
Wherein, the processing method of the TiOx of ground floor is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is N
2, the post-depositional thickness of TiOx is 35nm;
Wherein, the processing method of the SiOxNy of the second layer is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, wherein, is Ar as gas, and reacting gas is O
2and N
2, target uses SiAl target, and the post-depositional thickness of SiOxNy is 40nm;
Wherein, the processing method of the TNO of the 3rd layer is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is N2 and O
2, the post-depositional thickness of TNO is 500nm;
Wherein, the processing method of the ZrSiOx in the 4th dielectric combination layer film is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is O
2, with SiAl target and the sputter of ZrSiAl target, post-depositional thickness is 15nm;
Wherein, the TiO of layer 5
xprocessing method be that intermediate frequency power supply adds rotating cathode sputtering sedimentation, wherein working gas is Ar, reacting gas is N
2, TiO
xpost-depositional thickness be 20nm;
Wherein, the processing method of the ZrOx of layer 6 is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is O
2, the post-depositional thickness of ZrOx is 5nm.
Embodiment 3
The structure of the present embodiment coated glass is for comprising: glass substrate and plated film, and taking described glass substrate as substrate, described plated film film layer structure is from inside to outside: the first dielectric combination layer film is ZrOx; The second dielectric combination layer film is SiOx; Trilamellar membrane is ITO; The 4th layer of dielectric combination film is SiOx; Layer 5 film is SiNx; Layer 6 film is SiC.
The first described dielectric combination layer film is 35nm;
The second described dielectric combination layer film thickness is 15nm;
Described trilamellar membrane thickness is 100nm;
The 4th layer of described dielectric combination film thickness is 20nm;
Described layer 5 film thickness is 35nm;
Described layer 6 film thickness is 30nm;
Wherein, direct current or intermediate frequency power supply reactive sputter-deposition for the ZrOx of ground floor, working gas Ar, reacting gas O
2, the post-depositional scope of this layer is 35nm;
Wherein, the processing method of the SiOx of the second layer is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein SiOx working gas is Ar, and reacting gas is O
2, with SiAl target and ZrSiAl target sputter 15nm;
Wherein, the processing method of the ITO of the 3rd layer is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar sputter, and ITO is dc source sputter, and working gas is pure Ar sputter, and deposit thickness scope is 100-nm;
Wherein, the processing method of the SiOx in the 4th dielectric combination layer film is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein SiOx working gas is Ar, and reacting gas is O
2, with SiAl target and ZrSiAl target sputter 20nm;
Wherein, the processing method of the SiNx of layer 5 is that intermediate frequency power supply adds rotating cathode sputtering sedimentation, and wherein working gas is Ar, and reacting gas is N
2, the post-depositional thickness of SiNx is 35nm;
Wherein, the SiC Film preparation method of layer 6 is flat target d.c. sputtering, and sputter gas is pure Ar, and the scope of the deposit thickness of this layer is 30nm.
Embodiment 4-6 individual layer coated glass detects index
Embodiment 7
The structure of double glazing as described in Figure 2, No. two face plating one deck low-e retes with the outdoor outdoor glassy layer contacting, with the coated glass of the indoor indoor glass use embodiment 1 contacting, coated surface contact room air, the thickness of the hollow cavity between layer glass is 12nm.
Embodiment 8
The structure of double glazing as described in Figure 2, No. two face plating one deck low-e retes with the outdoor outdoor glassy layer contacting, with the coated glass of the indoor indoor glass use embodiment 2 contacting, coated surface contact room air, the thickness of the hollow cavity between layer glass is 12nm.
Embodiment 9
The structure of double glazing as described in Figure 2, No. two face plating one deck low-e retes with the outdoor outdoor glassy layer contacting, with the coated glass of the indoor indoor glass use embodiment 3 contacting, coated surface contact room air, the thickness of the hollow cavity between layer glass is 12nm.
Embodiment 10
The structure of double glazing as described in Figure 2, No. two face plating one deck low-e retes with the outdoor outdoor glassy layer contacting, with the coated glass of the indoor indoor glass use embodiment 1 contacting, coated surface contact room air, the thickness of the hollow cavity between layer glass is 9nm.
Embodiment 11
The structure of double glazing as described in Figure 2, No. two face plating one deck low-e retes with the outdoor outdoor glassy layer contacting, with the coated glass of the indoor indoor glass use embodiment 2 contacting, coated surface contact room air, the thickness of the hollow cavity between layer glass is 9nm.
Embodiment 12
The structure of double glazing as described in Figure 2, No. two face plating one deck low-e retes with the outdoor outdoor glassy layer contacting, with the coated glass of the indoor indoor glass use embodiment 3 contacting, coated surface contact room air, the thickness of the hollow cavity between layer glass is 9nm.
Above embodiment of the present utility model is had been described in detail, but described content is only preferred embodiment of the present utility model, not in order to limit the utility model.All any amendments of making in application range of the present utility model, be equal to and replace and improvement etc., within all should being included in protection domain of the present utility model.
Claims (8)
1. a coated glass, comprising: glass substrate and plated film, is characterized in that: taking described glass substrate as substrate, described plated film film layer structure is from inside to outside:
The first dielectric combination layer film, described the first dielectric combination layer film is the dielectric substance of refractive index n between 2.0～2.7;
The second dielectric combination layer film, described the second dielectric combination layer film is the dielectric substance of refractive index n between 1.4～1.8;
Trilamellar membrane, described trilamellar membrane is that refractive index n is at 2.0～2.5 transparent oxide conductive film layers;
The 4th dielectric combination layer film, described the 4th dielectric combination layer film is the dielectric substance of refractive index n between 1.4～1.8;
Layer 5 film;
Layer 6 film, described the 6th rete is outermost layer hard protective layer.
2. a kind of coated glass according to claim 1, is characterized in that: the first described dielectric combination layer film is the one in SiNx, TiOx or ZrOx.
3. a kind of coated glass according to claim 1, is characterized in that: the second described dielectric combination layer film is the one in SiOx, SiOxNy or ZrSiOx.
4. a kind of coated glass according to claim 1, is characterized in that: described tertiary membrane layer is the one in ITO, TNO or AZO.
5. a kind of coated glass according to claim 1, is characterized in that: the 4th described dielectric combination layer film is the one in SiOx, SiOxNy, ZrSiOx or ZrSiNx.
6. a kind of coated glass according to claim 1, is characterized in that: the 5th described rete is SiNx or TiOx.
7. a kind of coated glass according to claim 1, is characterized in that: the 6th described rete is SiC, ZrOx or SiNx.
8. according to a kind of coated glass described in the arbitrary claim of claim 1-7, it is characterized in that: this first dielectric combination layer film thickness is 15-35nm, the second dielectric combination layer film thickness is 10-40nm, trilamellar membrane thickness is 80-500nm, the 4th dielectric combination layer film thickness is 15-45nm, and layer 5 film thickness is 10-35nm; Layer 6 film thickness is 5-30nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420011565.5U CN204020101U (en) | 2014-01-06 | 2014-01-06 | A kind of coated glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420011565.5U CN204020101U (en) | 2014-01-06 | 2014-01-06 | A kind of coated glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204020101U true CN204020101U (en) | 2014-12-17 |
Family
ID=52060008
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|---|---|---|---|
| CN201420011565.5U Expired - Lifetime CN204020101U (en) | 2014-01-06 | 2014-01-06 | A kind of coated glass |
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| CN (1) | CN204020101U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103737999A (en) * | 2014-01-06 | 2014-04-23 | 天津南玻节能玻璃有限公司 | Coated glass with infrared reflection function and preparation method thereof |
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2014
- 2014-01-06 CN CN201420011565.5U patent/CN204020101U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103737999A (en) * | 2014-01-06 | 2014-04-23 | 天津南玻节能玻璃有限公司 | Coated glass with infrared reflection function and preparation method thereof |
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Effective date of registration: 20160203 Address after: 301700 Wuqing District, Wuqing New Technology Industrial Park Development Zone, Feng Feng Road, No. 12, No. Patentee after: TIANJIN CSG ENERGY-SAVING GLASS Co.,Ltd. Patentee after: CSG HOLDING Co.,Ltd. Address before: 301700 Wuqing District, Wuqing New Technology Industrial Park Development Zone, Feng Feng Road, No. 12, No. Patentee before: TIANJIN CSG ENERGY-SAVING GLASS Co.,Ltd. Patentee before: Tianjin CSG Architectural Glass Co.,Ltd. Patentee before: CSG HOLDING Co.,Ltd. |
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| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20141217 |