CN203774348U - 一种铜铟镓硒薄膜太阳能电池的陷光结构 - Google Patents
一种铜铟镓硒薄膜太阳能电池的陷光结构 Download PDFInfo
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- CN203774348U CN203774348U CN201420148549.0U CN201420148549U CN203774348U CN 203774348 U CN203774348 U CN 203774348U CN 201420148549 U CN201420148549 U CN 201420148549U CN 203774348 U CN203774348 U CN 203774348U
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- layer
- copper
- solar cell
- indium
- film
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- 239000010409 thin film Substances 0.000 title claims abstract description 47
- 239000010408 film Substances 0.000 claims description 67
- 239000000758 substrate Substances 0.000 claims description 33
- 229910052711 selenium Inorganic materials 0.000 claims description 24
- 239000011669 selenium Substances 0.000 claims description 24
- 239000011807 nanoball Substances 0.000 claims description 13
- 230000007704 transition Effects 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 10
- 239000004642 Polyimide Substances 0.000 claims description 9
- 239000002052 molecular layer Substances 0.000 claims description 9
- 229920001721 polyimide Polymers 0.000 claims description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims description 8
- 239000011733 molybdenum Substances 0.000 claims description 8
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical group OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 claims description 7
- 229910052980 cadmium sulfide Inorganic materials 0.000 claims description 7
- ZWNQSJPQMSUVSE-UHFFFAOYSA-N [Cu].[Sn].[In] Chemical compound [Cu].[Sn].[In] ZWNQSJPQMSUVSE-UHFFFAOYSA-N 0.000 claims description 6
- 239000005361 soda-lime glass Substances 0.000 claims description 5
- 239000010935 stainless steel Substances 0.000 claims description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- WILFBXOGIULNAF-UHFFFAOYSA-N copper sulfanylidenetin zinc Chemical compound [Sn]=S.[Zn].[Cu] WILFBXOGIULNAF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 230000007480 spreading Effects 0.000 claims description 3
- 238000003892 spreading Methods 0.000 claims description 3
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 206010000210 abortion Diseases 0.000 abstract 3
- 231100000176 abortion Toxicity 0.000 abstract 3
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 50
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 49
- 239000011787 zinc oxide Substances 0.000 description 25
- 239000011805 ball Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000011160 research Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000004793 Polystyrene Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 5
- 229920002223 polystyrene Polymers 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 239000004005 microsphere Substances 0.000 description 4
- 239000002077 nanosphere Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229960001296 zinc oxide Drugs 0.000 description 2
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910003310 Ni-Al Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000013084 building-integrated photovoltaic technology Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- QNWMNMIVDYETIG-UHFFFAOYSA-N gallium(ii) selenide Chemical compound [Se]=[Ga] QNWMNMIVDYETIG-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000013082 photovoltaic technology Methods 0.000 description 1
- 238000011020 pilot scale process Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
Description
Claims (7)
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CN201420148549.0U CN203774348U (zh) | 2014-03-31 | 2014-03-31 | 一种铜铟镓硒薄膜太阳能电池的陷光结构 |
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CN201420148549.0U CN203774348U (zh) | 2014-03-31 | 2014-03-31 | 一种铜铟镓硒薄膜太阳能电池的陷光结构 |
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CN203774348U true CN203774348U (zh) | 2014-08-13 |
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CN201420148549.0U Expired - Lifetime CN203774348U (zh) | 2014-03-31 | 2014-03-31 | 一种铜铟镓硒薄膜太阳能电池的陷光结构 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103872166A (zh) * | 2014-03-31 | 2014-06-18 | 惠州市易晖太阳能科技有限公司 | 一种铜铟镓硒薄膜太阳能电池的陷光结构及其制备方法 |
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2014
- 2014-03-31 CN CN201420148549.0U patent/CN203774348U/zh not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103872166A (zh) * | 2014-03-31 | 2014-06-18 | 惠州市易晖太阳能科技有限公司 | 一种铜铟镓硒薄膜太阳能电池的陷光结构及其制备方法 |
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Legal Events
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: HUIZHOU E-FLY ENERGY TECHNOLOGY CO., LTD. Free format text: FORMER NAME: HUIZHOU YIHUI SOLAR ENERGY TECHNOLOGY CO.,LTD. |
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CP03 | Change of name, title or address |
Address after: 516025 Guangdong city of Huizhou province huiao Avenue South High-tech Industrial Park Huatai Road No. 1 Patentee after: HUIZHOU YIHUI ENERGY SCIENCE & TECHNOLOGY CO.,LTD. Address before: 516025 Guangdong city of Huizhou province huiao Avenue South High-tech Industrial Park Huatai Road No. 1 Building No. 2 building 1-2 Patentee before: HUIZHOU E-FLY SOLAR Co.,Ltd. |
|
C56 | Change in the name or address of the patentee | ||
CP03 | Change of name, title or address |
Address after: 516025 Guangdong city of Huizhou province huiao Avenue South High-tech Industrial Park Huatai Road No. 1 Patentee after: HUIZHOU E-FLY OPTOELECTRONIC MATERIALS Co.,Ltd. Address before: 516025 Guangdong city of Huizhou province huiao Avenue South High-tech Industrial Park Huatai Road No. 1 Patentee before: HUIZHOU YIHUI ENERGY SCIENCE & TECHNOLOGY CO.,LTD. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230828 Address after: Building 1-4, Phase II Factory Building, Chancheng New Area, Anyuan County, Ganzhou City, Jiangxi Province, 342100 Patentee after: Jiangxi Yihui Optoelectronic Technology Co.,Ltd. Address before: No.1 Huatai South Road, Huinan hi tech Industrial Park, huiao Avenue, Huizhou City, Guangdong Province 516025 Patentee before: HUIZHOU E-FLY OPTOELECTRONIC MATERIALS Co.,Ltd. |
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CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20140813 |