CN203774322U - 多晶片发光二极管封装结构 - Google Patents
多晶片发光二极管封装结构 Download PDFInfo
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- CN203774322U CN203774322U CN201320876776.0U CN201320876776U CN203774322U CN 203774322 U CN203774322 U CN 203774322U CN 201320876776 U CN201320876776 U CN 201320876776U CN 203774322 U CN203774322 U CN 203774322U
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/49105—Connecting at different heights
- H01L2224/49109—Connecting at different heights outside the semiconductor or solid-state body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85909—Post-treatment of the connector or wire bonding area
- H01L2224/8592—Applying permanent coating, e.g. protective coating
Abstract
本实用新型公开了一种多晶片发光二极管封装结构,包括:金属基板、多个LED芯片及金属导线,金属基板上开设用于放置LED芯片的凹腔,凹腔的底部设置有铜基底层,金属基板的上表面依次成型有第一导热绝缘层、导线层及第二导热绝缘层,LED芯片设置在铜基底层上,相邻的两个LED芯片的间距为0.5~1mm,且相邻的两个LED芯片之间填充有金属铜,LED芯片上还覆盖有荧光粉层,金属导线一端与LED芯片电性连接,另一端穿过第二导热绝缘层与导线层电性连接,铜基底层的厚度为0.25~0.3mm。本实用新型是一种使用寿命长、减少成本、提高封装效率的多晶片发光二极管封装结构。
Description
技术领域
本实用新型涉发光二极管封装技术领域,尤其涉及一种使用寿命长、减少成本、提高封装效率的多晶片发光二极管封装结构。
背景技术
随着LED(发光二极管)照明技术的不断发展,LED的生产规模在不断扩大,LED的封装技术是其在生产制造过程中的关键的一环。LED封装是指发光芯片的封装,相比集成电路封装有较大不同。LED的封装不仅要求能够保护灯芯,而且还要能够透光。所以LED的封装对封装材料有特殊的要求。
因此,亟需一种使用寿命长、减少成本、提高封装效率的多晶片发光二极管封装结构。
实用新型内容
本实用新型的目的是提供一种使用寿命长、减少成本、提高封装效率的多晶片发光二极管封装结构。
为了实现上述目的,本实用新型提供一种多晶片发光二极管封装结构,包括:金属基板、LED芯片及金属导线,所述金属基板上开设用于放置LED芯片的凹腔,所述凹腔的底部设置有铜基底层,所述金属基板的上表面依次成型有第一导热绝缘层、导线层及第二导热绝缘层,所述LED芯片设置在所述铜基底层上,相邻的两个所述LED芯片的间距为0.5~1mm,且相邻的两个所述LED芯片之间填充有金属铜,所述LED芯片上还覆盖有荧光粉层,所述金属导线一端与所述LED芯片电性连接,另一端穿过所述第二导热绝缘层与所述导线层电性连接,所述铜基底层的厚度为0.25~0.3mm。
所述第一导热绝缘层的厚度为45~48nm。
所述导线层为金铝合金导线层,厚度为45~48nm。
所述第二导热绝缘层的厚度为48~55nm。
所述凹腔的腔壁上还设置有镍银合金反射膜层。
所述凹腔上还覆盖封装有光学透镜层。
所述凹腔的底部与腔壁的角度为120度。
所述金属导线为金线或金铝合金线。
与现有技术相比,本实用新型多晶片发光二极管封装结构中,由于设置有所述第二导热绝缘层,因此能够覆盖住所述导线层,能够防止所述导线层在长期的高温使用过程中,被氧化,而且直接将所述第二导热绝缘层覆盖于所述导线层上,因此能够提高寿命、减少成本、提高封装效率的多晶片发光二极管封装结构。
通过以下的描述并结合附图,本实用新型将变得更加清晰,这些附图用于解释本实用新型的实施例。
附图说明
图1为本实用新型多晶片发光二极管封装结构的剖面结构示意图。
具体实施方式
现在参考附图描述本实用新型的实施例,附图中类似的元件标号代表类似的元件。如上所述,如图1所示,本实用新型提供的多晶片发光二极管封装结构100,包括:金属基板1、LED芯片2及金属导线3,所述金属基板1上开设用于放置LED芯片2的凹腔4,所述凹腔4的底部设置有铜基底层5,所述金属基板1的上表面依次成型有第一导热绝缘层6、导线层7及第二导热绝缘层8,所述LED芯片2设置在所述铜基底层5上,相邻的两个所述LED芯片2的间距为0.5~1mm,且相邻的两个所述LED芯片2之间填充有金属铜11,所述LED芯片2上还覆盖有荧光粉层12,所述金属导线3一端与所述LED芯片2电性连接,另一端穿过所述第二导热绝缘层8与所述导线层7电性连接,所述铜基底层5的厚度为0.25~0.3mm。
所述第一导热绝缘层6的厚度为45~48nm。
所述导线层7为金铝合金导线层,厚度为45~48nm。
所述第二导热绝缘层8的厚度为48~55nm。
所述凹腔4的腔壁上还设置有镍银合金反射膜层9。
所述凹腔4上还覆盖封装有光学透镜层10。
所述凹腔4的底部与腔壁的角度为120度。
所述金属导线为金线或金铝合金线。
结合图1,本实用新型多晶片发光二极管封装结构100,由于设置有所述第二导热绝缘层8,因此能够覆盖住所述导线层7,能够防止所述导线层7在长期的高温使用过程中,被氧化,而且直接将所述第二导热绝缘层8覆盖于所述导线层7上,因此能够提高寿命、减少成本、提高封装效率的多晶片发光二极管封装结构。
以上所揭露的仅为本实用新型的优选实施例而已,当然不能以此来限定本实用新型之权利范围,因此依本实用新型申请专利范围所作的等同变化,仍属本实用新型所涵盖的范围。
Claims (8)
1.一种多晶片发光二极管封装结构,其特征在于,包括:金属基板、LED芯片及金属导线,所述金属基板上开设用于放置LED芯片的凹腔,所述凹腔的底部设置有铜基底层,所述金属基板的上表面依次成型有第一导热绝缘层、导线层及第二导热绝缘层,所述LED芯片设置在所述铜基底层上,相邻的两个所述LED芯片的间距为0.5~1mm,且相邻的两个所述LED芯片之间填充有金属铜,所述LED芯片上还覆盖有荧光粉层,所述金属导线一端与所述LED芯片电性连接,另一端穿过所述第二导热绝缘层与所述导线层电性连接,所述铜基底层的厚度为0.25~0.3mm。
2.如权利要求1所述的多晶片发光二极管封装结构,其特征在于,所述第一导热绝缘层的厚度为45~48nm。
3.如权利要求1所述的多晶片发光二极管封装结构,其特征在于,所述导线层为金铝合金导线层,厚度为45~48nm。
4.如权利要求1所述的多晶片发光二极管封装结构,其特征在于,所述第二导热绝缘层的厚度为48~55nm。
5.如权利要求1所述的多晶片发光二极管封装结构,其特征在于,所述凹腔的腔壁上还设置有镍银合金反射膜层。
6.如权利要求1所述的多晶片发光二极管封装结构,其特征在于,所述凹腔上还覆盖封装有光学透镜层。
7.如权利要求1所述的多晶片发光二极管封装结构,其特征在于,所述凹腔的底部与腔壁的角度为120度。
8.如权利要求1所述的多晶片发光二极管封装结构,其特征在于,所述金属导线为金线或金铝合金线。
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Granted publication date: 20140813 Termination date: 20161227 |