CN203724482U - Implant tooth abutment and implant tooth - Google Patents
Implant tooth abutment and implant tooth Download PDFInfo
- Publication number
- CN203724482U CN203724482U CN201320870360.8U CN201320870360U CN203724482U CN 203724482 U CN203724482 U CN 203724482U CN 201320870360 U CN201320870360 U CN 201320870360U CN 203724482 U CN203724482 U CN 203724482U
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- CN
- China
- Prior art keywords
- base station
- implant
- solution
- abutment
- implant tooth
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Abstract
The utility model provides an implant tooth abutment and an implant tooth. The implant tooth abutment comprises an abutment body, wherein a sliver ion layer is coated on the abutment body. The implant tooth abutment with the nano sliver particle coating can form good gingival closure, can reduce infection of the implant periphery, can create and keep the implant periphery in a relatively sterile environment for a long time, and can improve survival rate of the implant tooth.
Description
Technical field
This utility model relates to field of nanometer material technology, relates in particular to a kind of Dental Implant base station and preparation method thereof, and has used the Dental Implant of this Dental Implant base station.
Background technology
Tooth implant and host's osseous tissue, gingival epithelium tissue contacts with upper subcutaneous connective tissue, and part is exposed to oral cavity simultaneously has in collarium border.Implantation body implants behind oral cavity, easily suffers the invasion and attack of microorganism and toxic product thereof and epithelium occurs separates and produce dark peri-implant bag.Therefore, implant denture surrounding tissue is easier to antibacterial and infects, and the bacterial plaque microbial accumulation in implantation body's artificial tooth week may develop into peri-implantitis, is inflammation or the infection of peri-implant, and follows the forfeiture of supporting bone.Therefore, pay attention to the effect of microorganism in peri-implantitis morbidity, suppress oral cavity bacterium and be exposed to the adhesion on Abutment surface in oral cavity, it is very important keeping the non-cohesive bacterial plaque of Abutment.Have at least two kinds of methods can suppress the formation of bacterial plaque, the firstth, the initial adherence of inhibition oral cavity bacterium; The secondth, suppress the field planting of oral cavity bacterium, comprise antibacterial surface activity.If create and maintain the long-term gnotobasis relatively in tooth implant week, will be the key that reduces the incidence rate of Colonization in Partial Edentulous Patients with Peri-implantitis.
Oral cavity bacterium starts from base station to the invasion of implantation body, after antibacterial infects, produces peri-implant inflammation, seriously can cause Dental Implant failure.So, prevent oral cavity bacterium in the adhesion of base station and field planting for guaranteeing that long-term clinical success is most important.
Utility model content
This utility model provides a kind of Dental Implant base station and preparation method thereof, and has used the Dental Implant of this Dental Implant base station.Use this Dental Implant can form good gingiva sealing, and built long-term antibacterial system of Dental Implant week, thereby the antibacterial of prevention peri-implant infects, and is applied to the clinical promising result of receiving.
This utility model provides a kind of Dental Implant base station, comprises base station body, on described base station body, is coated with silver ion layer.
Described Dental Implant base station, its preparation method comprises the following steps:
A, preparation AgNO
3weak solution, Na
3c
6h
5o
6weak solution and NaBH
4weak solution is for subsequent use;
B, by AgNO
3solution, Na
3c
6h
5o
6solution and water mix in ice-water bath, control AgNO
3and Na
3c
6h
5o
6mole identical, add appropriate amount of deionized water, under agitation add NaBH
4solution, described NaBH
4mole be AgNO
31.2 times, continue to be stirred to and obtain uniform colloidal sol, control the AgNO in colloidal sol
3and Na
3c
6h
5o
6solution concentration is 5 ~ 20mmol/L, NaBH
4the concentration of solution is 10 ~ 100mmol/L;
C, the base station body after silanization is immersed in the colloidal sol making 0.8 ~ 1.2 hour, then take out, clean up, to obtain final product.
In described Dental Implant base station preparation method steps A, the consumption of water is AgNO
3solution and Na
3c
6h
5o
615 ~ 25 times of overall solution volume.
Described AgNO
3the concentration of weak solution is 5 ~ 20mmol/L;
Described Na
3c
6h
5o
6the concentration of weak solution is 5 ~ 20mmol/L.
Preferably, AgNO
3and Na
3c
6h
5o
6solution concentration is 10mmol/L, NaBH
4the concentration of solution is 50 mmol/L;
In described step B, base station bulk silicon alkanisation refers to: base station body piranha solution is soaked 20 ~ 40 minutes under 70 DEG C of-80 DEG C of immersions, dry in nitrogen after cleaning up, in the alcoholic solution of then base station body to be immersed to percent by volume be 1 ~ 4% 3-(aminopropyl) triethoxysilane 1 ~ 3 hour, use subsequently ethanol ultrasonic cleaning 20 ~ 40 seconds, deionized water rinsing, dry in nitrogen;
Base station surface performance after silanization reduces, and it is not disturbed by other materials when silver coating on sol solutions crosses.
Described piranha solution is like this configuration: in psychrolusia, in the ratio of 7:3,98% concentrated sulphuric acid is poured into lentamente in 20 ~ 40% hydrogen peroxide, in process, constantly stirred.
This utility model also provides a kind of Dental Implant, comprises implantation body and base station body, and described implantation body is installed on base station body, is coated with silver ion layer on base station body.
Described Dental Implant is for adopting artificial material, as metal, pottery etc., the implantation body of making, general similar root form, in underwent operative method implanting tissue, normally goes up on lower jaw, and obtain firmly maintenance support of osseous tissue, connect the implantation body that supports top by base station, general mounting means is to have the screw thread cooperatively interacting in implantation body He on base station, realizes the installation of implantation body by screw thread.
Dental Implant base station of the present utility model utilizes the nano-silver ionic layer adhering on it, can form good gingiva sealing, reduce the infection of peri-implant, create and maintain the long-term gnotobasis relatively of peri-implant, both there is antibacterial action, there is again good biocompatibility, use it can avoid oral cavity bacterium field planting and infection subsequently, improve the success rate of Dental Implant, reduce patient treatment expense, improve patient's quality of life, alleviate society and patient's financial burden.
Brief description of the drawings
Fig. 1 is the structural representation of the Dental Implant that provides of this utility model embodiment;
In figure, each several part serial number name is as follows:
1-implantation body, 2-base station body, 3-silver ion layer.
Specific embodiment
Illustrate embodiment of the present utility model below in conjunction with this accompanying drawing, as shown in Figure 1, described Dental Implant base station comprises base station body 2, on described base station body 2, is coated with silver ion layer 3, also comprise implantation body 1, described implantation body 1 is nested to be installed on base station body 2.
Embodiment mono-
By the AgNO of the 20mmol/L concentration of 0.25ml
3the Na of the 20mmol/L concentration of solution and 0.25ml
3c
6h
5o
6solution mixes in ice-water bath, then adds water to 15ml, adds the NaBH of the 60mmol/L concentration of 0.1ml under stirring
4solution, reacts after 25 seconds and stops stirring, and obtains golden yellow nano silver colloidal sol.
Configuration piranha solution: in the ratio of 7:3,98% concentrated sulphuric acid is poured into lentamente in ice-water bath in 20% hydrogen peroxide, ceaselessly stirred heat radiation.With the piranha solution configuring pretreatment base station 20 minutes in 70 DEG C of water baths, then water thoroughly cleans, dry in nitrogen.
Base station after pretreatment is immersed containing in the alcoholic solution of 2% 3-(aminopropyl) triethoxysilane (APS) 1 hour, use subsequently ethanol ultrasonic cleaning 20 seconds, water rinses, dry in nitrogen.Finally the base station after silanization is at room temperature immersed in the nano-class silver colloidal solution making to the silver-colored granule that falls not adhere to mobile deionized water rinsing after taking out 0.8 hour.
Embodiment bis-
A kind of nanometer silver granuel coating base station, comprises the following steps:
By the AgNO of the 10mmol/L concentration of 0.5ml
3the Na of the 10mmol/L concentration of solution and 0.5ml
3c
6h
5o
6solution mixes in ice-water bath, then adds deionized water to 20ml, adds the NaBH of the 50mmol/L concentration of 0.12ml under stirring
4solution, reacts after 30 seconds and stops stirring, and obtains golden yellow nano silver colloidal sol.
Configuration piranha solution: in the ratio of 7:3,98% concentrated sulphuric acid is poured into lentamente in ice-water bath in 30% hydrogen peroxide, ceaselessly stirred heat radiation with Glass rod.With the piranha solution configuring pretreatment base station 30 minutes in 75 DEG C of water baths, more thoroughly clean with deionized water, dry in nitrogen.
Base station after pretreatment is immersed containing in the alcoholic solution of 2% 3-(aminopropyl) triethoxysilane (APS) 2 hours, use subsequently ethanol ultrasonic cleaning 30 seconds, deionized water rinsing, dry in nitrogen.Finally the base station after silanization is at room temperature immersed in the nano-class silver colloidal solution making to the silver-colored granule that falls not adhere to mobile deionized water rinsing after taking out 1 hour.
Embodiment tri-
A kind of nanometer silver granuel coating base station, comprises the following steps:
By the AgNO of the 5mmol/L concentration of 1ml
3the Na of the 5mmol/L concentration of solution and 1ml
3c
6h
5o
6solution mixes in ice-water bath, then adds deionized water to 25ml, adds the NaBH of the 25mmol/L concentration of 0.24ml under stirring
4solution, reacts after 35 seconds and stops stirring, and obtains golden yellow nano silver colloidal sol.
Configuration piranha solution: in the ratio of 7:3,98% concentrated sulphuric acid is poured into lentamente in ice-water bath in 40% hydrogen peroxide, ceaselessly stirred heat radiation with Glass rod.With the piranha solution configuring pretreatment base station 40 minutes at 80 DEG C, more thoroughly clean with deionized water, dry in nitrogen.
Base station after pretreatment is immersed containing in the alcoholic solution of 2% 3-(aminopropyl) triethoxysilane (APS) 3 hours, use subsequently ethanol ultrasonic cleaning 40 seconds, deionized water rinsing, dry in nitrogen.Finally the base station after silanization is at room temperature immersed in the nano-class silver colloidal solution making to the silver-colored granule that falls not adhere to mobile deionized water rinsing after taking out 1.2 hours.
Claims (2)
1. a Dental Implant base station, comprises base station body (2), it is characterized in that: on described base station body (2), be coated with silver ion layer (3).
2. a Dental Implant, comprises implantation body (1) and base station body (2), and it is upper that described implantation body (1) is installed on base station body (2), it is characterized in that: on described base station body (2), be coated with silver ion layer (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320870360.8U CN203724482U (en) | 2013-12-27 | 2013-12-27 | Implant tooth abutment and implant tooth |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320870360.8U CN203724482U (en) | 2013-12-27 | 2013-12-27 | Implant tooth abutment and implant tooth |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203724482U true CN203724482U (en) | 2014-07-23 |
Family
ID=51194590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320870360.8U Expired - Fee Related CN203724482U (en) | 2013-12-27 | 2013-12-27 | Implant tooth abutment and implant tooth |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203724482U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106109043A (en) * | 2016-07-25 | 2016-11-16 | 成都嘉宝祥生物科技有限公司 | A kind of dens supporter manufacture method |
-
2013
- 2013-12-27 CN CN201320870360.8U patent/CN203724482U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106109043A (en) * | 2016-07-25 | 2016-11-16 | 成都嘉宝祥生物科技有限公司 | A kind of dens supporter manufacture method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140723 Termination date: 20151227 |
|
| EXPY | Termination of patent right or utility model |