CN203707146U - Micro-nano texture used on thin film solar cell substrate - Google Patents
Micro-nano texture used on thin film solar cell substrate Download PDFInfo
- Publication number
- CN203707146U CN203707146U CN201320757553.2U CN201320757553U CN203707146U CN 203707146 U CN203707146 U CN 203707146U CN 201320757553 U CN201320757553 U CN 201320757553U CN 203707146 U CN203707146 U CN 203707146U
- Authority
- CN
- China
- Prior art keywords
- texture
- substrate
- micro
- layer
- nano
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
Abstract
The utility model relates to the technology of thin film solar cells, and especially relates to a micro-nano texture used on a thin film solar cell substrate. The micro-nano texture is characterized in that the texture with the micro-nano scale is made on the cell substrate by utilization of the traditional impressing technology to form a texture layer; the texture layer is a uniform and large-area continuous cover layer; the cell substrate comprises a piece of glass or a polyester film or a metal foil; the texture layer has the micro-nano scale, the lateral dimension of the texture layer is 100nm-1000nm, and the longitudinal dimension is from the nanometer scale to the micrometer scale; and a barrier layer and a conductive film are deposited between the substrate and the texture layer. The substrate has the advantages that an accurate, large-area and low-cost optical texture can be provided on the cheap substrate, the shape, interval and size of the texture layer on an impression can be adjusted according to the need so as to prepare the required substrate texture layer, and therefore light utilization rate is improved and production cost is reduced.
Description
Technical field
The utility model relates to technical field of thin-film solar, particularly a kind of for the micro-nano texture on thin-film solar cells substrate.
Background technology
As everyone knows, solar energy power generating is to obtain to be conducive to one of important means of environment, green regenerative energy sources, and thin-film solar cells is important one of solar cell industry kind.The shortcomings such as existing industrial thin-film solar cells exists that conversion efficiency is low, poor stability and production cost height, want to change existing above-mentioned shortcoming, mainly contain both direction: the depositing operation and the technical parameter that 1) improve film; 2) effective rate of utilization of raising light.But required R&D cycle of first direction is long, cost is high, and the short time cannot produce a desired effect.The effective rate of utilization that improves light just seems very important in hull cell industry.
The so-called effective rate of utilization that improves thin-film solar cells light, refers to the absorbability in absorbing layer of thin film solar cell with certain method increase light.Conventionally can adopt increase absorber thickness, deposition or preparation to there is the conductive film of certain matte.But the thickness that increases absorbed layer can reduce thin-film solar cells stability, also there is certain influence in the techniques such as the collection to charge carrier, also increased production cost simultaneously.Deposition or preparation have the conductive film of certain matte, can improve the effective light path of light in absorbed layer, although existing making herbs into wool technology is relatively ripe, but complex manufacturing, wayward, be difficult to accomplish Large-Area-Uniform and produce continuously, some even also will use acid or aqueous slkali to carry out etching making herbs into wool, causes the further increase of production cost.
Summary of the invention
The purpose of this utility model is to overcome above-mentioned the deficiencies in the prior art, a kind of photoelectric conversion efficiency that improves thin-film solar cells is provided, reduce production costs, be easy to realize large-scale industrial production, there is certain texture for the micro-nano texture on thin-film solar cells substrate.
The utility model can reach by following measure.
A kind of for the micro-nano texture on thin-film solar cells substrate, it is levied is in cell substrate, to utilize traditional stamping technique to make the texture with micro-nano magnitude, form texture layer, texture layer is even, the continuous cover layer of large area, cell substrate comprises glass or polyester film or tinsel, and texture layer has micro/nano level, and its lateral dimension is at 100nm-1000nm, longitudinal size from nanometer scale to micron dimension, described substrate and texture interlayer deposited barrier layer and conductive film.
Substrate described in the utility model and texture interlayer deposited barrier layer and conductive film.
Barrier layer on substrate described in the utility model adopts SiO2 or Mo to make.
Conductive film described in the utility model selects TCO transparent conductive film as front electrode by substrate, and the metal material that AZO/Al or Ag high reflectance, high electricity are led is as back of the body counterelectrode.
Conductive film described in the utility model is copying the texture layer on substrate in shape.
That the thin-film solar cells substrate advantage that the utility model provides is in inexpensive substrate, to provide is accurate, large-area, optical texture cheaply, can adjust on request shape, spacing and the size of texture layer on die simultaneously, prepare required substrate texture layer, the thin-film solar cells substrate forming on this basis can increase the light path inciding in battery, increase light absorption with this, improve the utilance of light and reduce production costs.
Accompanying drawing explanation
Fig. 1 is a kind of schematic cross-section of the present utility model.
Embodiment
Below in conjunction with accompanying drawing, the utility model is further described.
A kind of for the micro-nano texture on thin-film solar cells substrate, it is levied is in cell substrate, to utilize traditional stamping technique to make the texture with micro-nano magnitude, form texture layer, cell substrate described in the utility model comprises glass or polyester film or tinsel; Described texture has micro/nano level, and its lateral dimension is at 100nm-1000nm, and longitudinal size is from nanometer scale to micron dimension; Described texture layer is even, the continuous cover layer of large area; Described substrate and texture interlayer deposited barrier layer and conductive film; Barrier layer on described substrate adopts SiO2 or Mo to make; Described conductive film selects TCO transparent conductive film as front electrode by substrate, and the metal material that AZO/Al or Ag high reflectance, high electricity are led is as back of the body counterelectrode; Described conductive film is copying the texture layer on substrate in shape; Described for the micro-nano texture mold making technology on thin-film solar cells substrate, its preferably embodiment be to comprise step:
First, preparation has the knurling rolls of micro-nano magnitude texture, and the texture of these knurling rolls can be orderly and unordered pyramid structure, handstand pyramid structure, alveolate texture, goose ocular structure and hexagonal pyramid structure etc.
Secondly,, in substrate production process, make substrate 1 copy the texture of knurling rolls by micro-nano imprint technology.
Finally, in substrate production process, selected substrate 1, deposits corresponding barrier layer and conductive film according to substrate type, finally on conductive film, forms the texture of the micro-nano magnitude of respective graphical.
As shown in the figure, the front electrode that is used for thin-film solar cells by micro-nano imprint technology formation textured substrates of the present invention.In figure, 1 for having the substrate of zigzag texture, and 2 for having the barrier layer of sawtooth texture, and 3 for having the conductive film of sawtooth texture, and 4 is thin-film solar cells layer.
2 is SiO2 or the Mo barrier layer that about 20nm is thick, and 3 is the conductive film that about 70nm is thick, and 4 is thin-film solar cells layer, comprises electrode.The thin-film solar cells of this kind of structure can connect by inline mode, can form large-area photovoltaic module, that the thin-film solar cells substrate advantage that the utility model provides is in inexpensive substrate, to provide is accurate, large-area, optical texture cheaply, can adjust on request shape, spacing and the size of texture layer on die simultaneously, prepare required substrate texture layer, the thin-film solar cells substrate forming on this basis can increase the light path inciding in battery, increase light absorption with this, improve the utilance of light and reduce production costs.
Claims (4)
1. one kind for the micro-nano texture on thin-film solar cells substrate, it is levied is in cell substrate, to utilize traditional stamping technique to make the texture with micro-nano magnitude, form texture layer, texture layer is even, the continuous cover layer of large area, cell substrate comprises glass or polyester film or tinsel, and texture layer has micro/nano level, and its lateral dimension is at 100nm-1000nm, longitudinal size from nanometer scale to micron dimension, described substrate and texture interlayer deposited barrier layer and conductive film.
2. according to claim 1 a kind of for the micro-nano texture on thin-film solar cells substrate, it is characterized in that the barrier layer on substrate adopts SiO2 or Mo to make.
3. according to claim 1 a kind of for the micro-nano texture on thin-film solar cells substrate, it is characterized in that conductive film selects TCO transparent conductive film as front electrode by substrate, the metal material that AZO/Al or Ag high reflectance, high electricity are led is as back of the body counterelectrode.
4. according to claim 1 a kind of for the micro-nano texture on thin-film solar cells substrate, it is characterized in that conductive film is copying the texture layer on substrate in shape.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320757553.2U CN203707146U (en) | 2013-11-27 | 2013-11-27 | Micro-nano texture used on thin film solar cell substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320757553.2U CN203707146U (en) | 2013-11-27 | 2013-11-27 | Micro-nano texture used on thin film solar cell substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
CN203707146U true CN203707146U (en) | 2014-07-09 |
Family
ID=51057544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201320757553.2U Expired - Fee Related CN203707146U (en) | 2013-11-27 | 2013-11-27 | Micro-nano texture used on thin film solar cell substrate |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN203707146U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108962497A (en) * | 2018-07-19 | 2018-12-07 | 东莞市中图半导体科技有限公司 | A method of preparing silver nanowires base transparent conducting film in patterned substrate |
-
2013
- 2013-11-27 CN CN201320757553.2U patent/CN203707146U/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108962497A (en) * | 2018-07-19 | 2018-12-07 | 东莞市中图半导体科技有限公司 | A method of preparing silver nanowires base transparent conducting film in patterned substrate |
CN108962497B (en) * | 2018-07-19 | 2020-04-28 | 东莞市中图半导体科技有限公司 | Method for preparing silver nanowire-based transparent conductive film on patterned substrate |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102254963A (en) | Graphene/silicon pillar array Schottky junction photovoltaic cell and manufacturing method thereof | |
CN104538552A (en) | Perovskite solar cell and manufacturing method thereof | |
CN102184975A (en) | Thin film solar cell with improved photoelectric conversion efficiency and manufacturing method thereof | |
CN103022267A (en) | Production method of ZnO spherical-empty-shell nanoparticle array | |
CN102709347A (en) | Heterojunction solar cell with buried grid structure | |
CN203932078U (en) | A kind of back of the body passivation solar cell | |
CN103633193A (en) | Microstructure light trapping method for silicon-based thin film solar cell | |
CN204315587U (en) | Based on the solar cell of GaN nano wire array | |
CN203707146U (en) | Micro-nano texture used on thin film solar cell substrate | |
CN205564764U (en) | Back passivation contact battery structure | |
CN103050287B (en) | A kind ofly to shift and titanium dioxide nano-pipe array thin film to the conductive glass surface that bonds prepares the method for light anode | |
CN103227226B (en) | A kind of photonic crystal amorphous silicon film solar battery | |
CN203553179U (en) | Micro-nano texture of thin film solar cell | |
CN203307232U (en) | Low-reflection ultra-white knurled film-plated glass | |
CN203406305U (en) | Novel back-contact battery assembly | |
CN203883017U (en) | Perovskite solar cell with hole transport layer made of zinc telluride | |
CN204315594U (en) | Based on the solar cell of silicon nanowire array | |
CN104576787A (en) | Electric field controlled graphene/gallium arsenide solar cell and preparation method thereof | |
CN204289473U (en) | A kind of solar battery sheet grid line structure of positive electrode | |
CN202977485U (en) | Photovoltaic glass with radiation heat dissipation membrane structure | |
CN103972321B (en) | Fibrous silicon-based thin-film solar cell and preparation method thereof | |
CN204289471U (en) | A kind of crystal silicon solar energy battery structure | |
CN203883020U (en) | Polysilicon thin-film solar cell | |
CN204315609U (en) | Based on the heterojunction solar battery of silicon nanowire suede | |
CN201233896Y (en) | Solar cell applying selective one-time diffusion process |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140709 Termination date: 20141127 |
|
EXPY | Termination of patent right or utility model |