CN203553179U - Micro-nano texture of thin film solar cell - Google Patents
Micro-nano texture of thin film solar cell Download PDFInfo
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- CN203553179U CN203553179U CN201320752790.XU CN201320752790U CN203553179U CN 203553179 U CN203553179 U CN 203553179U CN 201320752790 U CN201320752790 U CN 201320752790U CN 203553179 U CN203553179 U CN 203553179U
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Abstract
The utility model discloses a micro-nano texture of a thin film solar cell. The micro-nano texture of the thin film solar cell is characterized in that a micro-nano texture layer is arranged on a solar panel; the micro-nano texture layer is a continuously-arranged concave-convex thin film layer; the transverse size of the micro nano texture is of micro nanoscale; and the longitudinal size of the micro-nano texture is in a range form of nanoscale to micro-nanoscale. When the micro-nano texture of the thin film solar cell is used; an embossed roller with a micro-nano optical texture structure is produced at first; in the production process of a substrate, the surface of the material of the substrate can be pressed with the optical texture on the embossed roller through using a traditional embossing technology, and therefore, the substrate can have a light trapping function; the substrate is preheated in the production process of the substrate, a SiO2 barrier layer of which the thickness is about 20nm and a 70nm transparent conductive film are sequentially deposited through using an MOCVD method, and therefore, a front electrode with the micro-nano texture can be produced, or AZO/Al is sputtered through using magnetic control, and therefore, a back-reflection electrode with the micro-nano texture can be manufactured. The micro-nano texture of the thin film solar cell has the advantages of simple structure, high efficiency, long service life and the like.
Description
Technical field
The present invention relates to technical field of solar batteries, particularly a kind of thin-film solar cells micro-nano texture of making of optics limit photo structure.
Background technology
To amorphous silicon thin-film solar cell, reduced thickness is one of main method improving its stability test, and still, reduced thickness and hull cell are runed counter to the absorption of light, and therefore, in thin-film solar cells, to have the texture of sunken light function be necessary in making.There is this texture can increase the light path of thin-film solar cells incident light in battery intrinsic layer, increase the absorption of intrinsic layer as cell to sunlight, can suitably reduce the thickness of hull cell intrinsic layer, and improve hull cell short-circuit current density, improve the stability of hull cell.
The design majority that falls into now light function concentrates on the electrode of thin-film solar cells, utilize the AZO/Al conductive film of magnetron sputtering method growth to can be used as back reflector, itself does not have light trapping effect this electrode, need to utilize hydrochloric acid solution etching electrode, the suede structure that formation has certain roughness reaches the function of limitting light.Also or preparation has the transparent conductive film (TCO film) of certain matte, form the front electrode of the thin-film solar cells with limit light function.Also have report to point out by the white glass of etching, make its surface form the structure with sunken light function, then by this structure replication to TCO transparent conductive film, thereby produce, fall into light function.This method complex manufacturing technology, consumptive material is serious, is unfavorable for the simplification of cost savings and production procedure, and therefore, photovoltaic area research person can find sunken light technology simply a kind of and that effectively carry out large-scale production with regard to wishing.
Summary of the invention
The object of the invention is to overcome above-mentioned the deficiencies in the prior art, the micro-nano texture that provide that a kind of energy is even, that large area is made continuously is efficient, there is the thin-film solar cells of limit light function.
The utility model can reach by following measure:
A kind of micro-nano texture of thin-film solar cells, it is characterized in that being provided with micro-nano texture layer on solar panel, micro-nano texture layer be continuously arranged recessed/convex thin layer, the lateral dimension of micro-nano texture has micro-nano magnitude, the longitudinal size of micro-nano texture is controlled in wider scope, from nanometer scale to sub-micrometer scale.
The shape of micro-nano texture described in the utility model can be Large-Area-Uniform, prepare the various photo structures such as pyramid, inverted pyramid, steamed bun or honeycomb on solar panel continuously.
Micro-nano texture described in the utility model can be arranged on the front battery lead plate of thin-film solar cells, also can be used for the back of the body counterelectrode plate of thin-film solar cells.
Under micro-nano texture layer described in the utility model, transparent conductive film SnO2 layer and deposited barrier layer can be set, to form the front electrode of the thin-film solar cells with micro-nano texture.
Under micro-nano texture layer described in the utility model, deposit successively AZO layer and Al layer, to form the back reflector of the thin-film solar cells with micro-nano texture.
Solar panel described in the utility model can be glass plate, also can adopt polyimide plate or stainless steel etc.
When the utility model is used, first preparation has the knurling rolls of micro-nano optical texture structure, the optical texture of these knurling rolls is various, can be the shapes such as pyramid, inverted pyramid, sawtooth, honeycomb or steamed bun, again in substrate manufacturing process, utilize traditional stamping technique to make substrate material surface copy the optical texture on knurling rolls, thereby possessed sunken light function, in substrate manufacturing process to substrate preheating, by the method for MOCVD, deposit successively the SiO2 barrier layer of about 20nm and the transparent conductive film of 70nm, thereby made the front electrode with micro-nano texture; Or utilize magnetron sputtering AZO/Al, making has the back reflector of micro-nano texture, the micro-nano texture that the utility model can be evenly, large area is made continuously is efficient, have the thin-film solar cells of limit light function, has the advantages such as simple in structure, operating efficiency is high, long service life.
Accompanying drawing explanation
Fig. 1 is the schematic diagram that the utility model is applied to the front electrode of thin-film solar cells.
Fig. 2 is the schematic diagram that the utility model is applied to thin-film solar cells back reflector.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
A kind of micro-nano texture of thin-film solar cells, it is characterized in that being provided with micro-nano texture layer on solar panel, micro-nano texture layer be continuously arranged recessed/convex thin layer, the lateral dimension of micro-nano texture has micro-nano magnitude, the longitudinal size of micro-nano texture is controlled in wider scope, from nanometer scale to sub-micrometer scale, the shape of described micro-nano texture can be Large-Area-Uniform, prepare continuously the pyramid on solar panel, inverted pyramid, the various photo structures such as steamed bun or honeycomb, described micro-nano texture can be arranged on the front battery lead plate of thin-film solar cells, also the back of the body counterelectrode plate that can be used for thin-film solar cells, under micro-nano texture layer, set gradually transparent conductive film SnO2 layer and deposited barrier layer, can form the front electrode of the thin-film solar cells of micro-nano texture, under micro-nano texture layer, deposit successively AZO layer and Al layer, can form the back reflector of the thin-film solar cells with micro-nano texture, in addition, solar panel described in the utility model can be glass plate, also can adopt polyimide plate or stainless steel etc.
Micro-nano texture for thin film solar of the present invention, its embodiment comprises:
First, preparation has the knurling rolls of micro-nano optical texture structure, and the optical texture of these knurling rolls is various, can be the shapes such as pyramid, inverted pyramid, sawtooth, honeycomb or steamed bun;
Secondly, in substrate manufacturing process, utilize traditional stamping technique to make substrate material surface copy the optical texture on knurling rolls, thereby possessed sunken light function.
Again, in substrate manufacturing process, to substrate preheating, by the method for MOCVD, deposit successively the SiO2 barrier layer of about 20nm and the transparent conductive film of 70nm, thereby made the front electrode with micro-nano texture; Or utilize magnetron sputtering AZO/Al, make the back reflector with micro-nano texture.
Further, in some embodiments of the present invention, described micro-nano texture, both can be used for the front electrode of thin-film solar cells, can be used for again the back reflector of thin-film solar cells.
embodiment 1
As shown in Figure 1, micro-nano texture of the present invention is for the front electrode of thin-film solar cells.In figure, 1 is jagged micro-nano textured substrates, and 2 is electrode before the TCO electrically conducting transparent of jagged micro-nano texture, 3 photoelectric conversion layers that are thin-film solar cells, 4 back reflectors that are thin-film solar cells.Wherein, between front electrode and photoelectric conversion layer, be the micro-nano texture with limit light function.
2 is SiO2 barrier layer and the thick front electrode of TCO electrically conducting transparent of 70nm that about 20nm is thick, 3 is about 400nm thickness amorphous silicon photoelectric conversion layer, 4 is the back reflector of the AZO/Al that about 100nm is thick, the thin-film solar cells of this structure can connect by inline mode, forms large-area battery component.
embodiment 2
As shown in Figure 2, micro-nano texture of the present invention is for the back reflector of thin-film solar cells.In figure, 5 is jagged micro-nano textured substrates, and 6 is the conduction back reflector of jagged micro-nano texture, 7 photoelectric conversion layers that are thin-film solar cells, and 8 is electrode before electrically conducting transparent.Wherein, between substrate and back reflector and photoelectric conversion layer, be the micro-nano texture with sunken light function.
2 is the back reflector of the AZO/Al that about 100nm is thick, 3 is about 400nm thickness amorphous silicon photoelectric conversion layer, 4 is electrode before the TCO electrically conducting transparent that about 70nm is thick, and the thin-film solar cells of this kind of structure can connect by outreaching mode, forms large-area battery component.
The micro-nano texture that the utility model can be evenly, large area is made continuously is efficient, have the thin-film solar cells of limit light function, has the advantages such as simple in structure, operating efficiency is high, long service life.
Claims (7)
1. the micro-nano texture of a thin-film solar cells, it is characterized in that being provided with micro-nano texture layer on solar panel, micro-nano texture layer be continuously arranged recessed/convex thin layer, the lateral dimension of micro-nano texture has micro-nano magnitude, the longitudinal size of micro-nano texture is controlled in wider scope, from nanometer scale to sub-micrometer scale.
2. the micro-nano texture of a kind of thin-film solar cells according to claim 1, the shape that it is characterized in that micro-nano texture is Large-Area-Uniform, prepares pyramid photo structure or inverted pyramid photo structure or steamed bun photo structure or the honeycomb photo structure on solar panel continuously.
3. the micro-nano texture of a kind of thin-film solar cells according to claim 1, is characterized in that micro-nano texture is arranged on the front battery lead plate of thin-film solar cells.
4. the micro-nano texture of a kind of thin-film solar cells according to claim 1, is characterized in that micro-nano texture is arranged on the back of the body counterelectrode plate of thin-film solar cells.
5. the micro-nano texture of a kind of thin-film solar cells according to claim 3, is characterized in that setting gradually transparent conductive film SnO2 layer and deposited barrier layer under micro-nano texture layer.
6. the micro-nano texture of a kind of thin-film solar cells according to claim 4, is characterized in that depositing successively under micro-nano texture layer AZO layer and Al layer.
7. the micro-nano texture of a kind of thin-film solar cells according to claim 4, is characterized in that solar panel is glass plate or polyimide plate or stainless steel.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107039538A (en) * | 2017-01-17 | 2017-08-11 | 苏州瑞而美光电科技有限公司 | A kind of high-photoelectric transformation efficiency solar cell and preparation method thereof |
CN108962497A (en) * | 2018-07-19 | 2018-12-07 | 东莞市中图半导体科技有限公司 | A method of preparing silver nanowires base transparent conducting film in patterned substrate |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107039538A (en) * | 2017-01-17 | 2017-08-11 | 苏州瑞而美光电科技有限公司 | A kind of high-photoelectric transformation efficiency solar cell and preparation method thereof |
CN107039538B (en) * | 2017-01-17 | 2019-07-16 | 苏州瑞而美光电科技有限公司 | A kind of high-photoelectric transformation efficiency solar battery and preparation method thereof |
CN108962497A (en) * | 2018-07-19 | 2018-12-07 | 东莞市中图半导体科技有限公司 | A method of preparing silver nanowires base transparent conducting film in patterned substrate |
CN108962497B (en) * | 2018-07-19 | 2020-04-28 | 东莞市中图半导体科技有限公司 | Method for preparing silver nanowire-based transparent conductive film on patterned substrate |
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Granted publication date: 20140416 Termination date: 20151126 |