CN203569237U - Double-station CVD (chemical vapor deposition) furnace - Google Patents
Double-station CVD (chemical vapor deposition) furnace Download PDFInfo
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- CN203569237U CN203569237U CN201320605860.9U CN201320605860U CN203569237U CN 203569237 U CN203569237 U CN 203569237U CN 201320605860 U CN201320605860 U CN 201320605860U CN 203569237 U CN203569237 U CN 203569237U
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Abstract
The utility model provides a double-station CVD (chemical vapor deposition) furnace which comprises a process chamber and two auxiliary work chambers, wherein the process chamber is located between the two auxiliary work chambers in a length direction, and the process chamber and the two auxiliary work chambers are in seal connection via vacuum valves; a vacuum suction port and a charging port are formed in the process chamber; translation mechanisms are installed in the auxiliary work chambers, one end of each translation mechanism near the process chamber is fixedly connected with a quartz boat, a seal door is fixed at the other end, the seal door is matched with the inner surface of one end of each auxiliary work chamber near the process chamber, and loading doors are arranged on the auxiliary work chambers. The double-station CVD furnace has the advantages that the two auxiliary work chambers are arranged, when one auxiliary work chamber and the process chamber perform a process course together, the other auxiliary work chamber can load materials, in this way, the conversion of two stations enables the process chamber to work continuously, auxiliary time, such as loading materials and the like, is arranged in the other auxiliary work chamber in order, the production efficiency of single equipment is greatly increased, and therefore, production cost is reduced.
Description
Technical field
The utility model relates to a kind of equipment of substrate surface epitaxial film growth, relates in particular to the equipment of semiconductor type wafer and the epitaxial film growth of metal substrate surface.
Background technology
For semiconductor type wafer metal substrate, its surperficial epitaxial film growth needs carries out under the process gas environment of certain vacuum degree and temperature.Therefore need repeatedly wafer to be sent into this environment from ambient atmosphere state, after technique completes, then send the external world from this environment.Therefore, the space of wafer epitaxial film growth just inevitably need to constantly be switched between state of the art and atmospheric condition.The manufacturing process of product is for to send substrate into chamber, and---chamber vacuumizes, and---growing epitaxial film---is filled with gas to atmospheric condition---and changes substrate, time cannot carry out epitaxial film growth technique picking and placeing material like this, thereby cause that production efficiency is low, product cost is high.
Summary of the invention
In order to solve above technical problem, the utility model provides a kind of efficient, double CVD stove that can reduce production costs, can be used for semiconductor type wafer and the growth of metallic substance substrate epitaxial film.
Double CVD stove described in the utility model, comprises a processing chamber and two back work chambers; Wherein processing chamber is between two back work chambers in the longitudinal direction, and three is tightly connected by vacuum valve; Vacuum pumping port and inflation inlet are set on processing chamber; In back work chamber, translation mechanism is installed; Translation mechanism is fixedly connected with quartz boat in one end of nearly processing chamber, and the other end is fixed with hermatic door; Sealing door matches with the inner face that back work chamber is positioned at nearly processing chamber one end; Dress feeding door is set on back work chamber.
During work, double CVD stove described in the utility model is according to following steps cycle operation, first, close the vacuum valve between processing chamber and a back work chamber, vacuum valve between processing chamber and another back work chamber is open mode, translation mechanism action, quartz boat fixed thereon and hermatic door are thereupon together to the displacement of processing chamber direction, until hermatic door overlaps with back work chamber end, quartz boat has also been delivered in the work area of processing chamber, now hermatic door and back work chamber end are joined merge into sealed state completely, translation mechanism stops, by vacuum pumping port, processing chamber is vacuumized to processing requirement processed, by inflation inlet, processing chamber is filled with to process gas again, through technological process after a while, complete exemplar growing epitaxial membrane process, then translation mechanism reverse motion, quartz boat is retracted in back work chamber thereupon, again close the vacuum valve between this back work chamber and processing chamber, now use another back work chamber to repeat said process, when said process carries out, the completed exemplar of last consignment of is picked and placeed to material work, open dress feeding door, exemplar on quartz boat is taken out, be reentered into pending new exemplar, close dress feeding door, etc. pending next round work.
Double CVD stove described in the utility model, its beneficial effect is to exist two back work chambers, when one of them carries out technological process together with processing chamber, another can fill feeding, the conversion of such two working positions can make processing chamber non-stop run, orderly being arranged in another back work chamber non-cutting time such as dress feeding are walked abreast, greatly improved the production efficiency of single device, thereby reduced production cost.
In order to reach better technique effect, double CVD stove described in the utility model can also adopt following measures:
1, on described back work chamber, be provided with vacuum pumping port.When a back work chamber and work chamber carry out technological process jointly, another back work chamber carries out exemplar replacing, when changing complete and closing dress feeding behind the door, the back work that can vacuumize this back work chamber, thereby reduce the time in next technological process, work chamber being vacuumized, can further improve production efficiency.
2, described translation mechanism comprises drive-motor, leading screw, screw, slide block, guide rail, support, and wherein motor is connected with leading screw, and leading screw coordinates with screw, screw and slide block are all fixed on support, guide rail is fixed in auxiliary process chamber, and direction is parallel with leading screw, and slide block and guide rail are slidably matched.The displacement of graphite boat and hermatic door is driven by drive-motor, leading screw is by screw, rotatablely move motor to be converted into straight-line displacement through guide rail guiding, forward drive motor graphite boat enters work chamber, hermatic door and back work chamber end reach sealed state, reverse drive motor is realized the graphite boat chamber of deactivating, and hermatic door and back work chamber end are separate stage.
3, the mode of being tightly connected between described processing chamber and vacuum valve is seal assembly, described seal assembly is the hollow structure of stainless steel, middle vacancy arranges water coolant water channel, and seal assembly two ends are provided with sealing-ring, is tightly connected respectively with processing chamber and vacuum valve.Arranging of water coolant water channel can be played the not effect of heat damage of protection sealing-ring.
4, double CVD stove described in the utility model also comprises well heater, is enclosed within processing chamber outside, can single-ended or multistage temperature control, and can complete tubular body of heater or the half-open body of heater of open-close type.When exemplar carries out epitaxial film growth, need well heater to heat processing chamber, in thermal-radiating mode, the exemplar in quartz boat in work area is heated.
5, double CVD stove described in the utility model also comprises magnetic fluid, is arranged on the end face of back work chamber away from work chamber, and its two ends are coaxially connected with drive-motor and leading screw respectively.The drive-motor of translation mechanism is positioned at back work chamber outside, when back work chamber interior is vacuum state, by magnetic fluid, carries out the sealing of atmosphere and the transmission of rotation outside vacuum and chamber in chamber.
6, double CVD stove described in the utility model also comprises vacuum pump, vacuum valve, vacuum-lines, vacuumometer, wherein vacuumometer is separately fixed on processing chamber and back work chamber and passes in chamber, vacuum-lines two ends are connected with vacuum orifice and vacuum pump respectively, and vacuum valve is arranged on vacuum-lines.Vacuumometer is to measure and control processing chamber or the interior vacuum tightness of back work chamber, and when reaching processing requirement in chamber, vacuumometer control vacuum valve cuts out, and vacuum pump just quits work.
7, double CVD stove described in the utility model also comprises position transducer, is arranged on guide rail one end.Utilize position transducer can control the displacement of quartz boat.
8, described processing chamber material is quartz or stainless steel.
9, on described dress feeding door, viewing window is set, viewing window and and dress feeding door between be tightly connected.
Accompanying drawing explanation
Fig. 1 is the structural representation of double CVD stove embodiment mono-described in the utility model.
Fig. 2 is the enlarged view at Fig. 1 Position Sensor position.
Number description:
1-processing chamber; 2-seal assembly; 3-vacuum gate valve A; 4-right redundant chamber; 5-dress feeding door; 6-hermatic door; 7-quartz boat; 8-support; 9-magnetic fluid; 10-drive-motor; 11-guide rail; 12-leading screw; 13-vacuum-lines; 14-vacuum pump; 15-vacuum valve; 16-well heater; 17-position transducer; 18-vacuumometer; 19-vacuum gate valve B; 20-left redundant chamber; 21-technique gas holder; 22-process gas pipeline.
Embodiment
Embodiment mono-.
In conjunction with Fig. 1, double CVD stove described in the utility model is elaborated.
Described in the present embodiment, double CVD stove comprises:
Processing chamber assembly, comprises processing chamber 1, seal assembly 2, industrial gasses pipeline 24, technique gas holder 25, vacuum-lines 13, vacuum valve 15, vacuum pump 14, vacuumometer 18, well heater 16.
There is seal assembly 2 at processing chamber 1 two ends, and these seal assembly 2 materials are stainless steel, are hollow structure, and hollow space arranges water coolant water channel, for the protection of not heat damage of sealing-ring; Seal assembly 2 diametric(al)s are provided with inflation inlet and vacuum pumping port, are connecting respectively inside and outside industrial gasses pipeline 22 and the vacuum-lines 13 connecting, and are connected with outside technique gas holder 21 and vacuum pump 14.
Back work chamber assembly, is divided into left redundant work chamber assembly and right redundant work chamber assembly, and left redundant work chamber assembly and right redundant work chamber assembly are take processing chamber center cross-sectional place plane as the complete mirror image of benchmark.Take right redundant work chamber assembly as example, it comprises right redundant chamber 4, dress feeding door 5, hermatic door 6, quartz boat 7, support 8, magnetic fluid 9, drive-motor 10, guide rail 11, leading screw 12, position transducer 17, vacuumometer 18, vacuum-lines 13, vacuum valve 15, vacuum pump 14.
In right redundant chamber 4, be provided with the support 8 that drives quartz boat 7 and hermatic door 6 to move, support 8 is fixed on and drives in leading screw 12 and guide rail 11 mechanisms, by drive-motor 10, is driven.On the left end flange inner plane of right redundant cavity 4, be provided with sealing-ring, hermatic door 6 mates with sealing circle, when the two in conjunction with time be sealed state.One end of guide rail 11 nearly processing chambers 1 is also provided with displacement sensor 17, to control the displacement of quartz boat 7 and hermatic door 6.
Right redundant chamber 4 inside are vacuum state sometimes, therefore the transition mechanism between drive-motor 10 and leading screw 12 adopts general magnetic fluid 9 modes, magnetic fluid 9 is arranged on when on the end face of right redundant chamber 4, one end is coaxially connected with leading screw, the other end is coaxially connected with drive-motor 10, by magnetic fluid 9, carries out vacuum and the outer sealing of atmosphere of cavity and the transmission of rotation in cavity.
Dress feeding door 5 is set on right redundant chamber 4.
Processing chamber 1 and the 4(of right redundant work chamber left redundant chamber 20) on be all fixed with the vacuumometer 18 passing in chamber, vacuum-lines 13 two ends are connected with vacuum orifice and vacuum pump 14 respectively, vacuum valve 15 is arranged on vacuum-lines 13.
Between processing chamber 1 and right redundant chamber 4, by vacuum gate valve A3, be tightly connected; Between processing chamber 1 and left redundant chamber 20, by vacuum gate valve B19, be tightly connected.
All there is sealing-ring at seal assembly 2 two ends of processing chamber 1 end, are connected and sealed respectively with processing chamber 1 and vacuum gate valve A3 (vacuum gate valve B19); Vacuum gate valve A3 is connected with 4 mechanical seals of right redundant chamber, and vacuum gate valve B19 is connected with 20 mechanical seals of left redundant chamber, has formed the rational deployment of processing chamber assembly and back work chamber assembly and has been tightly connected.
While carrying out work, by following steps, realize:
1, open vacuum gate valve A3, (now the vacuum gate valve B19 of opposite side closes);
2, drive-motor 10, by leading screw 12 and guide rail 11, drive support 8 to move, hermatic door 6 and quartz boat 7 are rigidly connected with support 8 simultaneously, with support 8, move left, until the left end flange inner plane of hermatic door 6 and right redundant cavity 4 closely compresses, realize sealing; Quartz boat has been delivered in the work area in processing chamber 1 simultaneously; By position transducer 27, control drive-motor 10 stops simultaneously;
3, in processing chamber 1 by being arranged on the vacuum pumping port in seal assembly 2, by vacuum pump 14, open vacuum valve 15, by vacuum-lines 13, processing chamber 1 inside vacuumized, till vacuum tightness reaches processing requirement, by vacuumometer 18, measure and control;
4, by well heater 16, processing chamber 1 is heated, thermal radiation mode heats the exemplar on the quartz boat 7 in work area;
5, in processing chamber 1 by being arranged on the inflation inlet in seal assembly 2, by technique gas holder 21, process gas pipeline 22, process gas is filled in processing chamber 1 inside;
6, through technological process after a while, complete the technique of exemplar growing epitaxial film, drive-motor 10 opposite spins, are withdrawn into quartz boat 7 in right redundant chamber 4, control drive-motor 10 stop by position transducer 17;
7, close vacuum gate valve A3;
8, time, by above-mentioned flow process, carry out the same workflow of left redundant chamber 20;
9,, in the time period of left redundant chamber 20 implementing process processes, the right redundant chamber 4 of finishing the work is is before taken, put to the work of material;
10, open dress feeding door 5, the exemplar that completes growing epitaxial film on quartz boat 7 is taken out, and then be reentered into pending new exemplar, close dress feeding door 5;
11, by vacuum pump 14, open vacuum valve 15, right redundant chamber 4 is carried out to forvacuum, by vacuumometer 18, measure and control;
12, wait for next step technological process.
Claims (10)
1. a double CVD stove, is characterized in that it comprises a processing chamber and two back work chambers; Wherein processing chamber is between two back work chambers in the longitudinal direction, and three is tightly connected by vacuum valve; Vacuum pumping port and inflation inlet are set on processing chamber; In back work chamber, translation mechanism is installed; Translation mechanism is fixedly connected with quartz boat in one end of nearly processing chamber, and the other end is fixed with hermatic door; Sealing door matches with the inner face that back work chamber is positioned at nearly processing chamber one end; Dress feeding door is set on back work chamber.
2. double CVD stove according to claim 1, is characterized in that being provided with vacuum pumping port on described back work chamber.
3. according to double CVD stove described in claim 1 or 2, it is characterized in that described translation mechanism comprises drive-motor, leading screw, screw, slide block, guide rail, support, wherein motor is connected with leading screw, leading screw coordinates with screw, screw and slide block are all fixed on support, guide rail is fixed in auxiliary process chamber, and direction is parallel with leading screw, and slide block and guide rail are slidably matched.
4. according to double CVD stove described in claim 1 or 2, it is characterized in that the mode of being tightly connected between described processing chamber and vacuum valve is seal assembly, described seal assembly is the hollow structure of stainless steel, middle vacancy arranges water coolant water channel, seal assembly two ends are provided with sealing-ring, are tightly connected respectively with processing chamber and vacuum valve.
5. according to double CVD stove described in claim 1 or 2, it is characterized in that described double CVD stove also comprises well heater, be enclosed within processing chamber outside, can single-ended or multistage temperature control, can complete tubular body of heater or the half-open body of heater of open-close type.
6. double CVD stove according to claim 3, is characterized in that described double CVD stove also comprises magnetic fluid, is arranged on the end face of back work chamber away from work chamber, and its two ends are coaxially connected with drive-motor and leading screw respectively.
7. double CVD stove according to claim 2, it is characterized in that described double CVD stove also comprises vacuum pump, vacuum valve, vacuum-lines, vacuumometer, wherein vacuumometer is separately fixed on processing chamber and back work chamber and passes in chamber, vacuum-lines two ends are connected with vacuum orifice and vacuum pump respectively, and vacuum valve is arranged on vacuum-lines.
8. double CVD stove according to claim 3, is characterized in that it also comprises position transducer, is arranged on guide rail one end.
9. according to double CVD stove described in claim 1 or 2, it is characterized in that described processing chamber material is quartz or stainless steel.
10. according to double CVD stove described in claim 1 or 2, it is characterized in that, on described dress feeding door, viewing window is set, viewing window and and dress feeding door between be tightly connected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320605860.9U CN203569237U (en) | 2013-09-29 | 2013-09-29 | Double-station CVD (chemical vapor deposition) furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320605860.9U CN203569237U (en) | 2013-09-29 | 2013-09-29 | Double-station CVD (chemical vapor deposition) furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203569237U true CN203569237U (en) | 2014-04-30 |
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ID=50536979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320605860.9U Withdrawn - After Issue CN203569237U (en) | 2013-09-29 | 2013-09-29 | Double-station CVD (chemical vapor deposition) furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203569237U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103498192A (en) * | 2013-09-29 | 2014-01-08 | 青岛赛瑞达电子科技有限公司 | Double-station CVD (Chemical Vapor Deposition) furnace |
| CN106904408A (en) * | 2017-02-23 | 2017-06-30 | 北京创世威纳科技有限公司 | A kind of vacuum chamber conveyer |
-
2013
- 2013-09-29 CN CN201320605860.9U patent/CN203569237U/en not_active Withdrawn - After Issue
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103498192A (en) * | 2013-09-29 | 2014-01-08 | 青岛赛瑞达电子科技有限公司 | Double-station CVD (Chemical Vapor Deposition) furnace |
| CN103498192B (en) * | 2013-09-29 | 2016-07-06 | 青岛赛瑞达电子科技有限公司 | Double CVD stove |
| CN106904408A (en) * | 2017-02-23 | 2017-06-30 | 北京创世威纳科技有限公司 | A kind of vacuum chamber conveyer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20140430 Effective date of abandoning: 20160706 |
|
| C25 | Abandonment of patent right or utility model to avoid double patenting |