CN203549395U - Chemical liquid supply device - Google Patents
Chemical liquid supply device Download PDFInfo
- Publication number
- CN203549395U CN203549395U CN201320717101.1U CN201320717101U CN203549395U CN 203549395 U CN203549395 U CN 203549395U CN 201320717101 U CN201320717101 U CN 201320717101U CN 203549395 U CN203549395 U CN 203549395U
- Authority
- CN
- China
- Prior art keywords
- pipeline
- valve
- chemical liquids
- supplier
- liquid container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 118
- 239000000126 substance Substances 0.000 title claims abstract description 56
- 239000012530 fluid Substances 0.000 claims description 32
- 230000001939 inductive effect Effects 0.000 claims description 7
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 abstract description 19
- 239000007789 gas Substances 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001802 infusion Methods 0.000 description 2
- 238000011112 process operation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model provides a chemical liquid supply device which comprises a liquid storage tank, a liquid inlet pipeline, a liquid outlet pipeline, a connecting pipeline, an air inlet pipeline and an exhaust pipeline. The liquid outlet pipeline is connected with the bottom wall of the liquid storage tank, the liquid inlet pipeline and the connecting pipeline extend into the liquid storage tank, and the air inlet pipeline and the exhaust pipeline are communicated with the connecting pipeline. The liquid outlet pipeline extends to the liquid storage tank from the bottom, bubbles generated at the factory service end and bubbles generated by chemical liquid can be prevented from entering the liquid outlet pipeline, and normal operation of the process of a machine table connected with the liquid outlet pipeline is guaranteed.
Description
Technical field
The utility model relates to ic manufacturing technology field, particularly a kind of chemical liquids supplier.
Background technique
Along with the development of semiconductor device technology and in proportion size dwindle, in the manufacturing process of semiconductor devices, less defect (defect) will be brought larger impact to yield.
Take contact hole wet clean step as example, it is strict to technological requirement, in manufacturing process, can not interrupt.Otherwise will introduce new defect for wafer.And the different chemical liquids rate of etch difference to different films in the process of this step, so bring very large puzzlement to doing over again of this step.In above-mentioned contact hole wet clean step, need the NH using
4oH has very strong volatility, easily produces bubble.
As shown in Figure 1, for to such as NH of wet-cleaning board supplying chemical liquid
4the chemical liquids supplier of OH, comprising: liquid container 110, feed liquor pipeline 120, fluid pipeline 130, connecting pipeline 140, air inlet pipeline 150, air draft pipeline 160, described fluid pipeline 130 is connected with the sidewall of described liquid container 110.
When factory's business end supplements chemical liquids to liquid container 110, being arranged at the 4th valve 121 on described feed liquor pipeline 120 opens, be arranged at the second valve 141 on described connecting pipeline 140 and be arranged at the 3rd valve 161 conductings on air draft pipeline 160, the 5th valve 131 being arranged on described fluid pipeline 130 cuts out, liquid container 110 inner body are negative pressure, chemical liquids enters in liquid container 110, and when liquid level arrives liquid level sensor 111, fluid infusion stops.When board operation process (process), the 4th valve 121 being arranged on described feed liquor pipeline 120 cuts out, the first valve 151 and second valve 141 conductings, the 5th valve 131 is opened, liquid container 110 inside are malleation, board is inputted nitrogen (N2) by air inlet pipeline 150, chemical liquids is pressed in the process cavity of board.When board leaves unused (idle), the first valve 151 and the 5th valve 131 are closed, second valve 141 and the 3rd valve 161 conductings, and board is negative pressure, board is discharged the bubble of liquid container 110 liquid level upper ends by air draft (EXH).But negative pressure can be accelerated the volatilization of chemical liquids, affect the concentration of chemical liquids, technique is produced to harmful effect.
Conventionally, during board operation process, chemical liquids flow is very low, and for example, the ammonia vol that batch (lot) consumes when operation process is only 250ml left and right; Fluid flow (flow rate) requires also very low, is only 50ml/min left and right, if bubble too much can affect NH in fluid pipeline
4the flow of OH, if reaching the lower limit technique of warning, flow stops, and the unexpected interruption of this technique together, can introduce some residual defects (residue defect) for wafer, this residual defects is easily blocked hole, cause the tungsten in rear road not fill into, and then cause contact to interrupt affecting WAT and CP test result.
For this reason, need to provide one to prevent that chemical liquids itself from producing bubble and entering pipeline, and prevent that factory's business end from having bubble to enter the chemical liquids supplier of liquid container.
Model utility content
The purpose of this utility model is to provide a kind of and prevents that bubble from entering the chemical liquids supplier of fluid pipeline.
For solving the problems of the technologies described above, the utility model provides a kind of chemical liquids supplier, comprise: liquid container, feed liquor pipeline, fluid pipeline, connecting pipeline, air inlet pipeline and air draft pipeline, described fluid pipeline is connected with the diapire of described liquid container, described feed liquor pipeline and connecting pipeline extend in liquid container, and described air inlet pipeline, air draft pipeline are all communicated with described connecting pipeline.
Optionally, in described chemical liquids supplier, also comprise and be arranged at the first valve on described air inlet pipeline, be arranged at the second valve on described connecting pipeline, be arranged at the 3rd valve on described air draft pipeline, be arranged at the 4th valve on described feed liquor pipeline, and be arranged at the 5th valve on described fluid pipeline.
Optionally, in described chemical liquids supplier, also comprise the liquid level sensor being arranged on described liquid container.
Optionally, in described chemical liquids supplier, also comprise the gas pressure inductive sensor being arranged in liquid container.
Optionally, in described chemical liquids supplier, also comprise the flowmeter being arranged on described fluid pipeline.
Optionally, in described chemical liquids supplier, described fluid pipeline is connected with wet-cleaning board.
Compared with prior art, the position of the utility model change fluid pipeline, makes described fluid pipeline be connected with the diapire of liquid container, that is, use liquid pipeline and access liquid container from below.The bubble producing like this can rise to the upper area of liquid container.So, can prevent that the bubble of factory's business end generation and the bubble that chemical liquids itself produces from entering fluid pipeline, guarantees that the board process operation being attached thereto is normal.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of existing chemical liquids supplier;
Fig. 2 is the schematic diagram of the chemical liquids supplier of the utility model preferred embodiment.
Embodiment
Below in conjunction with the drawings and specific embodiments, chemical liquids supplier of the present utility model is described in further detail.According to the following describes and claims, advantage of the present utility model and feature will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, aid illustration the utility model embodiment's object lucidly.
As shown in Figure 2, the chemical liquids supplier of the present embodiment, comprise: liquid container (tank) 210, feed liquor pipeline 220, fluid pipeline 230, connecting pipeline 240, air inlet pipeline 250, air draft pipeline 260, described feed liquor pipeline 220 stretches in liquid container 210 and supplements chemical liquids to liquid container 210, described fluid pipeline 230 is connected with the diapire of described liquid container 210, described connecting pipeline 240 extend in liquid container 210, and described air inlet pipeline 250, air draft pipeline 260 are all communicated with described connecting pipeline 240.Described fluid pipeline 230 is for to such as NH of board supplying chemical liquid
4oH, described air inlet pipeline 250 is for inputting such as nitrogen of gas by described connecting pipeline 240, described air draft pipeline 260 for air draft to extract bubble out.
Described chemical liquids supplier also comprises and is arranged at the first valve 251 on described air inlet pipeline 250, be arranged at the second valve 241 on described connecting pipeline 240, be arranged at the 3rd valve 261 on described air draft pipeline 260, be arranged at the 4th valve 221 on described feed liquor pipeline 220, and be arranged at the 5th valve 231 on described fluid pipeline 230.By the switching of above-mentioned each pipeline of valve control.Certainly, also can substitute described the first valve 251, second valve 241 and the 3rd valve 261 with a three-way valve, can realize equally the purpose of this utility model.
Described chemical liquids supplier also comprises the fluid flowmeter 232 being arranged on described fluid pipeline 230, for detecting the fluid flow of liquid pipeline 230.
Described chemical liquids supplier also comprises the liquid level sensor 211 being arranged in described liquid container 210, and described liquid level sensor 211 is connected with a controller.When factory's business end benefit chemical liquids is entered liquid container 210, controller control the 4th valve 221 is opened, second valve 241 and the 3rd valve 261 conductings, the 5th valve 231 cuts out, liquid container 210 inner body are negative pressure, and chemical liquids enters in liquid container 210, and when liquid level arrives liquid level sensor 211, fluid infusion stops.
Described chemical liquids supplier also comprises the gas pressure inductive sensor (not shown) being arranged in liquid container 210, and described gas pressure inductive sensor is connected with described controller.At board, do not carry out in the process of technique, the first valve 251, second valve 241, the 3rd valve 261, the 4th valve 221, the 5th valve 231 are closed simultaneously, or second valve 241, the 4th valve 221, the 5th valve 231 are closed simultaneously, keep confined space, prevent that negative pressure from causing chemical liquids volatilization.When liquid container 210 internal pressures exceed predefined value, described gas pressure inductive sensor sends a signal to controller and reports to the police.By adding gas pressure inductive sensor to detect, prevent because the first valve 251, second valve 241, the 4th valve 221 damage and cause liquid container 210 to explode.
The chemical liquids supplier working method of the present embodiment is as follows: when board operation process (process), the 4th valve 221 cuts out, the first valve 251 and second valve 241 conductings, the 5th valve 231 is opened, liquid container 210 inside are malleation, board is inputted nitrogen (N2) by air inlet pipeline 250, chemical liquids is pressed in the process cavity of board.At board, do not carry out in the process of technique, maintenance liquid container is confined space.
In the present embodiment, described fluid pipeline 230 is connected with a wet-cleaning board, that is, described chemical liquids supplier is to such as NH of wet-cleaning board supplying chemical liquid
4oH, certainly, described chemical liquids supplier can also be supplied such as HCL of other chemical liquids etc. to wet-cleaning board, or need use the board supplying chemical liquid of chemical liquids to other.
In sum, the position of the utility model change fluid pipeline, makes described fluid pipeline be connected with the diapire of liquid container, that is, use liquid pipeline and access liquid container from below.The bubble producing like this can rise to the upper area of liquid container.So, can prevent that the bubble of factory's business end generation and the bubble that chemical liquids itself produces from entering fluid pipeline, guarantees that the board process operation being attached thereto is normal.Further, by adding gas pressure inductive sensor to detect, prevent from causing liquid container blast because the first valve, second valve, the 4th valve damage.
Foregoing description is only the description to the utility model preferred embodiment; the not any restriction to the utility model scope; any change, modification that the those of ordinary skill in the utility model field does according to above-mentioned disclosure, all belong to the protection domain of claims.
Claims (6)
1. a chemical liquids supplier, it is characterized in that, comprise: liquid container, feed liquor pipeline, fluid pipeline, connecting pipeline, air inlet pipeline and air draft pipeline, described fluid pipeline is connected with the diapire of described liquid container, described feed liquor pipeline and connecting pipeline extend in described liquid container, and described air inlet pipeline, air draft pipeline are all communicated with described connecting pipeline.
2. chemical liquids supplier as claimed in claim 1, it is characterized in that, described chemical liquids supplier also comprises and is arranged at the first valve on described air inlet pipeline, be arranged at the second valve on described connecting pipeline, be arranged at the 3rd valve on described air draft pipeline, be arranged at the 4th valve on described feed liquor pipeline, and be arranged at the 5th valve on described fluid pipeline.
3. chemical liquids supplier as claimed in claim 1, is characterized in that, described chemical liquids supplier also comprises the liquid level sensor being arranged on described liquid container.
4. chemical liquids supplier as claimed in claim 1, is characterized in that, described chemical liquids supplier also comprises the gas pressure inductive sensor being arranged in described liquid container.
5. chemical liquids supplier as claimed in claim 1, is characterized in that, described chemical liquids supplier also comprises the flowmeter being arranged on described fluid pipeline.
6. chemical liquids supplier as claimed in claim 1, is characterized in that, described fluid pipeline is connected with a wet-cleaning board.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320717101.1U CN203549395U (en) | 2013-11-13 | 2013-11-13 | Chemical liquid supply device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320717101.1U CN203549395U (en) | 2013-11-13 | 2013-11-13 | Chemical liquid supply device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203549395U true CN203549395U (en) | 2014-04-16 |
Family
ID=50467509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320717101.1U Expired - Lifetime CN203549395U (en) | 2013-11-13 | 2013-11-13 | Chemical liquid supply device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203549395U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103939739A (en) * | 2014-04-18 | 2014-07-23 | 无锡尚德太阳能电力有限公司 | Concentrated strong acid feeding system |
| CN109089848A (en) * | 2018-09-20 | 2018-12-28 | 江苏苏润种业有限公司 | A kind of cultivation system |
| WO2019119594A1 (en) * | 2017-12-20 | 2019-06-27 | 武汉华星光电半导体显示技术有限公司 | Developing device and developing solution supply system therefor |
-
2013
- 2013-11-13 CN CN201320717101.1U patent/CN203549395U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103939739A (en) * | 2014-04-18 | 2014-07-23 | 无锡尚德太阳能电力有限公司 | Concentrated strong acid feeding system |
| CN103939739B (en) * | 2014-04-18 | 2017-01-11 | 无锡尚德太阳能电力有限公司 | Concentrated strong acid feeding system |
| WO2019119594A1 (en) * | 2017-12-20 | 2019-06-27 | 武汉华星光电半导体显示技术有限公司 | Developing device and developing solution supply system therefor |
| CN109089848A (en) * | 2018-09-20 | 2018-12-28 | 江苏苏润种业有限公司 | A kind of cultivation system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140416 |