CN203474892U - Gas mixer - Google Patents
Gas mixer Download PDFInfo
- Publication number
- CN203474892U CN203474892U CN201320601602.3U CN201320601602U CN203474892U CN 203474892 U CN203474892 U CN 203474892U CN 201320601602 U CN201320601602 U CN 201320601602U CN 203474892 U CN203474892 U CN 203474892U
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- CN
- China
- Prior art keywords
- hollow ball
- gas
- inlet pipe
- gas mixer
- air outlet
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Abstract
The utility model discloses a gas mixer. The gas mixer comprises a first hollow ball and a second hollow ball, wherein a first gas inlet pipe and at least one second gas inlet pipe are arranged on one side of the first hollow ball, the tail end of the first gas inlet pipe is positioned at a gas outlet of the first hollow ball, the gas outlet of the first hollow ball is connected with a gas inlet of the second hollow ball by a pipeline, and the direction of a gas outlet of the second hollow ball and the direction of the gas inlet of the second hollow ball form certain included angle. The gas mixer can rapidly and fully mix gas, the concentration of the mixed gas is difficult to fluctuate, the quality of the mixed gas is stable and reliable, and the semiconductor growth quality can be effectively improved and controlled.
Description
Technical field
The utility model belongs to gas reaction device field, is specifically related to a kind of gas mixer.
Background technology
In semicon industry, vapour deposition process is to prepare the method that semiconductor film material is conventional, gas used while growing is comprised of carrier gas and multiple reaction gas conventionally, the mode of existing importing gas normally directly passes into respectively reaction chamber by the inlet pipe of each gas, because the flow velocity of each gas is not identical, intake pressure is also different, less air inlet produces certain squeezing action to flow to make air inlet meeting that flow is large, and gas is very short in the reaction chamber residence time, multiple gases cannot fully be mixed at reaction chamber, cause gas to occur fluctuation in the concentration of reaction chamber, affect Semiconductor Film Growth quality.
Utility model content
The purpose of this utility model is for existing vapour deposition process, to enter gas to mix inhomogeneous problem, and a kind of gas mixer is provided.
It is as follows that the utility model is realized the technical scheme that above-mentioned purpose adopts:
A gas mixer, comprises the first hollow ball and the second hollow ball,
A side at described the first hollow ball is provided with the first inlet pipe and at least one second inlet pipe, the air outlet place of the end of described the first inlet pipe in the first hollow ball;
The air outlet of described the first hollow ball is connected by pipeline with the inlet mouth of described the second hollow ball;
The air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball keep certain angle.
Further, described the first hollow ball is (1～1.5) with the diameter ratio of the second hollow ball: 1.
Further, the angle between described the first inlet pipe and the second inlet pipe is 20～80 degree.
Further, the angle between described the first inlet pipe and the second inlet pipe is 50～60 degree.
Further, described the first inlet pipe latter end is contraction-like.
Further, described the first inlet pipe latter end is conial tube.
Further, the angle of the air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball is 90～150 degree.
Further, the angle of the air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball is 120 degree.
Further, described the first hollow ball is provided with 2～3 the second inlet pipe.
Adopt gas mixer of the present utility model can realize mixing fast fully of gas, mixed gas concentration is difficult for producing fluctuation, and the steady quality of mixed gas is reliable, effectively improves and controls semiconductor growing quality.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model gas mixer.
Embodiment
Below in conjunction with accompanying drawing, preferred embodiment of the present utility model is described, should be appreciated that preferred embodiment described herein is only for description and interpretation the utility model, and be not used in restriction the utility model.
embodiment 1
As shown in Figure 1, the diameter that described gas mixer comprises the first hollow ball 3 and the second hollow ball 4, the first hollow balls 3 and the second hollow ball 4 is than being 1.2:1.A side at the first hollow ball 3 is provided with the first inlet pipe 1 and two the second inlet pipe 2, and wherein, the latter end of the first inlet pipe 1 stretches to the inside of the first hollow ball 3, and makes the end of the first inlet pipe 1 at the place, air outlet of the first hollow ball 3.The first inlet pipe 1 latter end is preferably contraction-like, as is conial tube, is conducive to so further to improve in this inlet pipe flow velocity when gas is given vent to anger, and two the second inlet pipe 2 respectively and between the first inlet pipe 1, keep the angle of 60 degree.The air outlet of the first hollow ball 3 is connected with the inlet mouth of the second hollow ball 4 by pipeline 6, at the opposite side of the second hollow ball 4, sets out gas port, and makes the air outlet direction of the second hollow ball 4 and the inlet mouth direction of the second hollow ball 4 keep the angles of 120 degree.The quantity of the second inlet pipe 2 can be determined according to the number of real reaction use gas kind.
During use, gas mixer is connected with reaction unit with source of the gas respectively, wherein, the gas of flow maximum (this gas is carrier gas under normal conditions) enters from the first inlet pipe 1, the gas that other flow is relatively little enters from the second inlet pipe 2 respectively, the gas of flow maximum is accelerated to enter the second hollow ball 4 after ejection by the first inlet pipe 1, at first hollow ball 3 centre ofs sphere, produce a negative pressure simultaneously, thereby can not push the γ-ray emission of the second inlet pipe 2, make second to enter the gas of being managed in 2 and enter smoothly the first hollow ball 3, each gas enters after the second hollow ball 4, utilize the unexpected change of volume large, gas is mixed at the second hollow ball 4, the air outlet of the second hollow ball 4 and air intake are certain angle, avoid the air-flow that enters the second hollow ball 4 directly facing to air outlet, like this, gas forms certain eddy flow at the interior energy of the second hollow ball 4, gas mixes fully, evenly.Mixed gas escapes and enter reaction unit by the escape pipe 5 being connected on the second hollow ball 4 air outlets again.
Finally it should be noted that: the foregoing is only preferred embodiment of the present utility model, be not limited to the utility model, although the utility model is had been described in detail with reference to previous embodiment, for a person skilled in the art, its technical scheme that still can record aforementioned each embodiment is modified, or part technical characterictic is wherein equal to replacement.All within spirit of the present utility model and principle, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection domain of the present utility model.
Claims (9)
1. a gas mixer, comprises the first hollow ball and the second hollow ball,
A side at described the first hollow ball is provided with the first inlet pipe and at least one second inlet pipe, the air outlet place of the end of described the first inlet pipe in the first hollow ball;
The air outlet of described the first hollow ball is connected by pipeline with the inlet mouth of described the second hollow ball;
The air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball keep certain angle.
2. gas mixer according to claim 1, is characterized in that: described the first hollow ball is (1～1.5) with the diameter ratio of the second hollow ball: 1.
3. gas mixer according to claim 1, is characterized in that: the angle between described the first inlet pipe and the second inlet pipe is 20～80 degree.
4. gas mixer according to claim 3, is characterized in that: the angle between described the first inlet pipe and the second inlet pipe is 50～60 degree.
5. gas mixer according to claim 1, is characterized in that: described the first inlet pipe latter end is contraction-like.
6. gas mixer according to claim 5, is characterized in that: described the first inlet pipe latter end is conial tube.
7. gas mixer according to claim 1, is characterized in that: the angle of the air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball is 90～150 degree.
8. gas mixer according to claim 7, is characterized in that: the angle of the air outlet direction of described the second hollow ball and the inlet mouth direction of the second hollow ball is 120 degree.
9. gas mixer according to claim 1, is characterized in that: described the first hollow ball is provided with 2～3 the second inlet pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320601602.3U CN203474892U (en) | 2013-09-28 | 2013-09-28 | Gas mixer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320601602.3U CN203474892U (en) | 2013-09-28 | 2013-09-28 | Gas mixer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203474892U true CN203474892U (en) | 2014-03-12 |
Family
ID=50223254
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320601602.3U Expired - Lifetime CN203474892U (en) | 2013-09-28 | 2013-09-28 | Gas mixer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203474892U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103510073A (en) * | 2013-09-28 | 2014-01-15 | 无锡荣能半导体材料有限公司 | Gas mixer |
| CN110694497A (en) * | 2019-11-07 | 2020-01-17 | 国网黑龙江省电力有限公司电力科学研究院 | Gas mixer for carbon tetrafluoride and sulfur hexafluoride |
-
2013
- 2013-09-28 CN CN201320601602.3U patent/CN203474892U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103510073A (en) * | 2013-09-28 | 2014-01-15 | 无锡荣能半导体材料有限公司 | Gas mixer |
| CN110694497A (en) * | 2019-11-07 | 2020-01-17 | 国网黑龙江省电力有限公司电力科学研究院 | Gas mixer for carbon tetrafluoride and sulfur hexafluoride |
| CN110694497B (en) * | 2019-11-07 | 2021-08-27 | 国网黑龙江省电力有限公司电力科学研究院 | Gas mixer for carbon tetrafluoride and sulfur hexafluoride |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140312 |
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| CX01 | Expiry of patent term |