CN203445141U - Impressing apparatus - Google Patents
Impressing apparatus Download PDFInfo
- Publication number
- CN203445141U CN203445141U CN201320544383.XU CN201320544383U CN203445141U CN 203445141 U CN203445141 U CN 203445141U CN 201320544383 U CN201320544383 U CN 201320544383U CN 203445141 U CN203445141 U CN 203445141U
- Authority
- CN
- China
- Prior art keywords
- cavity
- mould
- elastic mould
- bearing part
- elastic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
An impressing apparatus comprises a chamber, a bearing part arranged on the bottom side of the chamber and an elastic die hung inside the chamber. The elastic die has the characteristic of naturally sagging. By means of the bearing part, a substrate arranged on the bearing part is driven to push and press the elastic die upwards so as to make a die pattern of the elastic die naturally applied to and impressed on the substrate. The elastic die is changed from a bending state into a planar state by pressing a gap between the elastic die and the substrate from the center to the sides. No bubbles will be generated between the elastic die and the substrate. The process yield rate can be effectively improved.
Description
Technical field
The utility model relates to a kind of stamping technique, espespecially a kind of imprinting apparatus.
Background technology
Flourish along with electronic industry, it is compact that electronic product is tending towards in kenel, marches toward gradually the R&D direction of high-performance, high function, high-speedization in function.Wherein, the life-span is long, volume is little because having for light-emitting diode (LED), high vibration strength and the advantage such as power consumption is low, so become the development trend of irradiation electronic product.
In making the process of LED, need on the film of chip, form patterning micro-structural, patterning photoresistance for example, to use yellow light lithography mode to carry out patterning process to form this micro-structural in early days, but the processing procedure of yellow light lithography is loaded down with trivial details, and the processing procedure time is tediously long, and only can be used in small size making and cannot be for large-area making, cause the cost of LED to be difficult to reduce.
Therefore, then develop a kind of impression mode, as No. 20110180965 United States Patent (USP), it provides a kind of imprinting apparatus 1 that forms patterning micro-structural, and Figure 1A to Fig. 1 D to be this imprinting apparatus 1 make flowing mode.
As shown in Figure 1A, this imprinting apparatus 1 comprise a cavity 10, be located at these cavity 10 bottom sides movable bearing part 11, be located at these cavity 10 top sides fixture 13, be located at mould 12 on this fixture 13, the air chamber 14 being formed by this fixture 13 and this mould 12, ultraviolet ray (UV) light source 16 of being located at the transmission element 15 on these air chamber 14 top sides and being located at these transmission element 15 tops.These mould 12 downsides have mould shape 120, and the base material 9 that a upside has a colloid 9a is placed on this bearing part 11.
As shown in Figure 1B, under vacuum state, this bearing part 11 is moved up, the colloid 9a of this base material 9 is fitted on the mould shape 120 of this mould 12.
As shown in Figure 1 C, this bearing part 11 is moved down with separated with this base material 9, again in this air chamber 14 and the interior pressurization of this cavity 10, with the upper and lower air pressure that applies on this mould 12 and this base material 9, make this mould 12 and the airtight combination of this base material 9, and it is upper to make this mould shape 120 can impress in this colloid 9a, then via this transmission element 15, irradiate this colloid 9a with this ultraviolet light source 16, make this colloid 9a be solidified into patterning micro-structural 90.
As shown in Fig. 1 D, remove under vacuum state, between this air chamber 14 and this cavity 10, form pressure reduction, to make this mould 12 unclamp this base material 9, this base material with patterning micro-structural 90 9 is landed on this bearing part 11.
In existing imprinting apparatus 1, by applying air pressure mode, this mould shape 120 can be impressed slightly in this colloid 9a upper, then can complete this patterning micro-structural 90 via solidifying, so can overcome the problems such as processing procedure is loaded down with trivial details, the processing procedure time is tediously long, and can be used in large-area making.
Yet in existing imprinting apparatus 1, this air chamber 14 is consisted of with this mould 12 this fixture 13, so when this fixture 13 of assembling and this mould 12, easily produce gap, thereby cause airtight bad problem, cause the easy error of air pressure in this air chamber 14.
In addition, this mould 12 is fixed on this fixture 13, thus between this mould 12 and this base material 9, directly in face-to-face mode, combine, thereby easily produce bubble between this mould 12 and this base material 9, the bad that causes this patterning micro-structural 90, causes this base material 9 to become defective products.
Again, this mould 12 is fixed on this fixture 13, thereby cannot change, and the impression quality that causes this mould 12 will be with increasing service time and variation makes this base material 9 become defective products.Particularly, after permanent use, this mould 12 can produce wearing and tearing, and even distortion, so that when this mould 12 is separated with this base material 9, the separating force of this patterning micro-structural 90 is inhomogeneous, cause the part material of this patterning micro-structural 90 can residue on this mould shape 120, cause this base material 9 to become defective products, and when fabricating patterned micro-structural next time, residue on this mould shape 120 can affect the pattern of patterning micro-structural, causes next base material to become defective products.
Therefore, how to overcome the variety of problems of above-mentioned prior art, become in fact the problem of desiring most ardently at present solution.
Utility model content
Because the disadvantages of above-mentioned prior art, the utility model provides a kind of imprinting apparatus, can make can not produce bubble between elastic mould and base material, so can effectively promote process rate.
Imprinting apparatus of the present utility model, comprising: cavity, and it has the first relative inner side and the second inner side; Movable bearing part, it is located on the first inner side of this cavity; And elastic mould, it is suspended in this cavity, and between the second inner side of this bearing part and this cavity, and there is gap between the second inner side of this elastic mould and this cavity.
This elastic mould is suspended in this cavity, and between this elastic mould and this cavity top side, there is gap and do not form air chamber, with when bearing part drive base material moves up, this base material can fit on this elastic mould, and make mould shape naturally impress on this base material, to form patterning micro-structural on this base material.Afterwards, then make this base material depart from this elastic mould.
Preferably, this bearing part has displacement structure, for the displacement between the first inner side of this cavity and the second inner side of this bearing part.
Preferably, this bearing part has displacement structure, to drive this elastic mould displacement.
Preferably, this bearing part has location structure, for the object being fixedly placed on this bearing part.
Preferably, this elastic mould is crooked towards the first interior side direction of this cavity.
Preferably, this device also comprises strutting piece, and it is located on this cavity, to suspend this elastic mould in midair.
Preferably, this device also comprises disassembly and assembly structure, and it is in order to this elastic mould of dismounting.
Preferably, this device also comprises lid, and it is located on the second inner side of this cavity, and this lid has the opening towards this first inner side, and this opening is to position that should bearing part.
Preferably, this device also comprises conducting piece, and it is located on the second inner side of this cavity.
Preferably, this device also comprises source of supply, and it is to should elastic mould and establish.
As from the foregoing, the imprinting apparatus of the present utility model or characteristic that naturally droop flexible by this elastic mould, to utilize this bearing part to push, make the mould shape of this elastic mould naturally fit and impress on this base material, make between this elastic mould and this base material so that by point, the mode to face combines, and make between this elastic mould and this base material by centre to side pressing, so between this elastic mould and this base material, can not produce bubble, thereby can effectively promote process rate.
In addition, between this elastic mould and this cavity top side, there is gap, and do not need to form air chamber, so without airtight bad problem.
Again, this elastic mould, because not forming air chamber, so this elastic mould can be installed on disassembly and assembly structure, to change this elastic mould, thereby can overcome in prior art because mould cannot change the problem that makes this base material become defective products.
Accompanying drawing explanation
Figure 1A to Fig. 1 D is the front-view schematic diagram of making flowing mode of existing imprinting apparatus;
Fig. 2 A to Fig. 2 G is the front-view schematic diagram of making flowing mode of the utility model imprinting apparatus; And
Fig. 3 A to Fig. 3 C is the schematic side view of making flowing mode of the dismounting mould of the utility model imprinting apparatus; Fig. 3 A ' is the front-view schematic diagram of Fig. 3 A.
Symbol description
1,2 imprinting apparatus
10,20 cavitys
11,21 bearing parts
12 moulds
120,220 mould shapes
13 fixtures
14 air chambers
15 transmission elements
16 ultraviolet light sources
20a the first inner side
20b the second inner side
210 first displacement structures
211 second displacement structures
212 location structures
213 spleniums
22 elastic moulds
23 lids
230 openings
24 spaces
25 conducting pieces
26 sources of supply
27 strutting pieces
28 disassembly and assembly structures
280 tracks
281 saddles
282 supporting bodies
7,8,9 base materials
8a UV resin
80,90 patterning micro-structurals
9a colloid
S gap.
Embodiment
By particular specific embodiment, execution mode of the present utility model is described below, the personage who is familiar with this skill can understand other advantage of the present utility model and effect easily by content disclosed in the present specification.
Notice, appended graphic the illustrated structure of this specification, ratio, size etc., equal contents in order to coordinate specification to disclose only, for understanding and the reading of being familiar with the personage of this skill, not in order to limit the enforceable qualifications of the utility model, so technical essential meaning of tool not, the adjustment of the modification of any structure, the change of proportionate relationship or size, do not affecting under the effect that the utility model can produce and the object that can reach, all should still drop on the technology contents that the utility model discloses and obtain in the scope that can contain.Simultaneously, in this specification, quote as " on ", the term such as D score, " top ", " end ", " first ", " second " and " ", also only for ease of understanding of narrating, but not in order to limit the enforceable scope of the utility model, the change of its relativeness or adjustment, under without essence change technology contents, when being also considered as the enforceable category of the utility model.
According to impression mode of the present utility model, the utility model provides a kind of imprinting apparatus 2, and as shown in Figure 2 A, it comprises: the movable bearing part 21 of a cavity 20, one and an elastic mould 22.
Described cavity 20 has the bottom side in the first relative inner side 20a(figure) with the second inner side 20b(figure in top side).
Described bearing part 21 is located on the first inner side 20a of this cavity 20.
In the present embodiment, this bearing part 21 also has first and second displacement structure 210,211, elevation type displacement structure for example, these the first displacement structure 210 use are for the displacement between the first inner side 20a of this cavity 20 and the second inner side 20b of this bearing part 21, and this second displacement structure 211 is in order to drive this elastic mould 22 displacements.Relevant displacement structure of a great variety, is not limited to above-mentioned.
In addition, this bearing part 21 has location structure 212, as vacuum suction system or Electrostatic Absorption system, for the object being fixedly placed on this bearing part 21.Relevant location structure 212 of a great variety, is not limited to above-mentioned.
Again, this bearing part 21 is also provided with splenium 213, in order to the sidepiece against this elastic mould 22.
Described elastic mould 22 is suspended in this cavity 20, and between the second inner side 20b of this bearing part 21 and this cavity 20, and between the second inner side 20b of this elastic mould 22 and this cavity 20, there is gap, namely these elastic mould 22 tops do not become secret room.In the present embodiment, the material of this elastic mould 22 is poly-to dimethyl siloxane (poly-dimethylsiloxane, PDMS), but not as limit, as long as make the material that these elastic mould 22 energy are crooked or naturally droop.
Described imprinting apparatus 2 also comprises that a lid 23, a conducting piece 25, a source of supply 26(are as shown in Figure 2 C) and a plurality of strutting pieces 27.
It is upper that described lid 23 is located at the second inner side 20b of this cavity 20, and this lid 23 has the opening 230 towards this first inner side 20a, the position that 230 pairs of this openings should bearing part 21.
It is upper that described conducting piece 25 is located at the second inner side 20b of this cavity 20, and to position that should opening 230, and arrange according to the kind of this source of supply 26.In the present embodiment, this conducting piece 25 is light-transmitting materials.
26 pairs of described sources of supply should elastic mould 22 position and arrange, can be located at these cavity 20 outsides (as shown in Figure 2 C) or this cavity 20 inside, and this source of supply 26 can be thermal source or light source (for example ultraviolet ray), but is not limited to this.
Described strutting piece 27 is located on the first inner side 20a of this cavity 20, to suspend this elastic mould 22 in midair.In the present embodiment, this strutting piece 27 is positioned at the arranged on left and right sides of this elastic mould 22, and for example, when this elastic mould 22 is cuboid, this strutting piece 27 can suspend four corners of this elastic mould 22 in midair.Moreover this strutting piece 27 is also in order to set up this second displacement structure 211.Again in other embodiment, this strutting piece 27 also can be located on upper or other sidewall of the second inner side 20b of this cavity 20, and there is no particular restriction.
Fig. 2 A to Fig. 2 F is the flowing mode of doing of this imprinting apparatus 2.
As shown in Figure 2 A, a base material 8 is placed on this bearing part 21, and this elastic mould 22 naturally droops, this elastic mould 22 also has a mould shape 220 in the side towards this bearing part 21 (being downside).
In the present embodiment, the material of this base material 8 is silicon (monocrystalline or polycrystalline), sapphire, GaAs, glass or quartz, but not as limit, and the film of this base material 8 (figure slightly) material is binary brilliant (or doping) of heap of stone, ternary brilliant (or doping) of heap of stone, quaternary brilliant (or doping) of heap of stone, silica or indium tin oxide (Indium Tin Oxide, ITO), but not as limit.
In addition, on the film of this base material 8 and have a preform material, in the present embodiment, this preform material is UV resin 8a, but not as limit.
Again, by this location structure 212, fix this base material 8, can avoid this base material 8 that the skew of front, rear, left and right direction occurs when upper and lower displacement.
In addition, this this cavity 20 of lid 23 internal communication, and do not form confined space, and can will in this cavity 20, reduce pressure or form vacuum state on demand, to reduce the air in this cavity 20.
As shown in Figure 2 B, by this first displacement structure 210, drive this bearing part 21 to move (as the direction of arrow in figure) towards the direction of this second inner side 20b, and drive in the lump this base material 8 to top offset, make the middle part of UV resin 8a of this base material 8 by touching the mould shape 220 of this elastic mould 22.
As shown in Figure 2 C, this base material 8 continues to top offset, and this base material 8 is fitted on this elastic mould 22 completely, and by this base material 8 to top offset active force, make this mould shape 220 be printed on this UV resin 8a upper, to make this UV resin 8a be embossed into patterning micro-structural 80.
In the present embodiment, by this elastic mould 22, naturally droop, again by these base material 8 these elastic moulds 22 of pushing, make between this elastic mould 22 and this base material 8 so that by point, the mode to face fits, make between this mould shape 220 and this UV resin 8a by centre to side pressing, so the air between this mould shape 220 and this UV resin 8a can be extruded to side by centre, to avoid residual air (being bubble) between this mould shape 220 and this UV resin 8a.
In addition, can on demand, by reducing pressure in this cavity 20, to reduce air capacity, and can assist, avoid residual air between this mould shape 220 and this UV resin 8a; Preferably supplementary mode, makes in this cavity 20 and is vacuum state.
As shown in Figure 2 D, this elastic mould 22 covers this opening 230 and forms a space 24.
In the present embodiment, by pushing away this elastic mould 22 on this splenium 213 to cover this opening 230, for example, the mode of adsorbing by electromagnetism between this splenium 213 and this lid 23, namely after power supply, magnetic picture between this splenium 213 and this lid 23 is inhaled, make this splenium 213 can on push away this elastic mould 22.
In addition the sidepiece of this splenium 213 and sandwiched this elastic mould 22 of this lid 23.
Again, can be on demand, for example, and during distant between this splenium 213 and this lid 23, can be by auxiliary this elastic mould 22 that drives of this second displacement structure 211 to top offset (as the direction of arrow in figure).
In addition, can for example, when the sagging radian of this elastic mould 22 is excessive, can drive this base material 8 to top offset (as the direction of arrow in figure) by this first displacement structure 210 on demand, to promote this elastic mould 22, upwards cover this opening 230.
As shown in Figure 2 E, using this space 24 as air chamber, to make this air chamber and this cavity 20 form draught head, the middle of this elastic mould 22 is bent upwards, make between this elastic mould 22 and this base material 8 and produce gap S, namely this mould shape 220 is separated with the middle contact-making surface between this patterning micro-structural 80, so in successive process, can delamination this mould shape 220 and this patterning micro-structural 80.
In the present embodiment, the pressure of this cavity 20 is greater than the pressure of this air chamber, more than pushes away this elastic mould 22, makes this base material 8 be separated with the most contact-making surface between this elastic mould 22.For example, if leading portion step in the interior formation vacuum state of this cavity 20, now can remove the vacuum state in this cavity 20, and in this air chamber, still keep vacuum state, so the pressure of this cavity 20 can on push away this elastic mould 22.Or, can remove the vacuum state in this cavity 20 and this air chamber simultaneously, then provide larger pressure in this cavity 20, more than push away this elastic mould 22.
In other embodiment, can make the pressure of this air chamber adsorb this this elastic mould 22 and be bent upwards again.
In addition, about the mode of this air chamber and this cavity 20 formation draught heads is various, be not limited to above-mentioned.
As shown in Figure 2 F, by this first displacement structure 210, drive this bearing part 21 to move (as the direction of arrow in figure) towards the direction of this first inner side 20a, to drive completely separated this elastic mould 22 of this base material with patterning micro-structural 80 8.
As shown in Figure 2 G, this elastic mould 22 is opened to this opening 230, and this elastic mould 22 naturally droops, make this this cavity 20 of lid 23 internal communication.Then, take out this base material with patterning micro-structural 80 8, to place another base material 7.
In the present embodiment, by removing electromagnetism absorption, to unclamp this splenium 213 and this lid 23, and make this elastic mould 22 can open this opening 230.
In other embodiment, can towards the direction of this first inner side 20a, move (as the direction of arrow in figure) by this second displacement structure 211, to assist this splenium 213 to unclamp the sidepiece of this elastic mould 22.
In impression mode of the present utility model, flexible by this elastic mould 22 or naturally droop characteristic, so that this elastic mould 22 is naturally fitted and is impressed on this base material 8, make this elastic mould 22 by the bending face that flattens, namely between this elastic mould 22 and this base material 8, in the mode by putting to face (or from the inside to the outside), complete whole covering, make between this elastic mould 22 and this base material 8 by centre to side pressing, and do not need by air chamber and cavity 20, to push up and down this base material 8 as prior art, so can not produce bubble between this elastic mould 22 and this base material 8, thereby can effectively promote process rate.
In addition, between the second inner side 20b of this elastic mould 22 and this cavity 20, have gap, namely this elastic mould 22 does not need to form air chamber, so the sus-pension of this elastic mould 22 is quite simple and easy, and without airtight bad problem, thereby do not need to carry out airtight processing.
Fig. 3 A and Fig. 3 A ' are for providing the another kind of embodiment of the utility model imprinting apparatus 2, and it also comprises disassembly and assembly structure 28, so that this elastic mould 22 of dismounting.Fig. 3 B to Fig. 3 C is the illustrative view of this disassembly and assembly structure 28.
As shown in Fig. 3 A and Fig. 3 A ', this disassembly and assembly structure 28 is for drawer type designs, and it comprises track 280, saddle 281 and supporting body 282.Yet relevant disassembly and assembly structure 28 of a great variety, is not limited to this.
In the present embodiment, this track 280 is located on the strutting piece 27 of arranged on left and right sides of this elastic mould 22, and this saddle 281 is located on this track 280, and this supporting body 282 is located on this saddle 281 and link the left and right two ends of this elastic mould 22.
As shown in Figure 3 B, these saddle 281 slippages are on this track 280, so that this supporting body 282 is delivered to outside this cavity 20 with this elastic mould 22.
As shown in Figure 3 C, take out this supporting body 282 and this elastic mould 22, then by this elastic mould 22 by removing on this supporting body 282, to replace the operation of this elastic mould 22.
Space 24(of the present utility model or air chamber) form on demand, so this elastic mould 22 can be installed on this disassembly and assembly structure 28, and do not need to be fixed on lid 23.
In addition, elastic mould 22 of the present utility model is because not needing to form air chamber, so this elastic mould 22 can be installed on this disassembly and assembly structure 28.After this imprinting apparatus 2 of permanent use, this elastic mould 22 can be changed by this disassembly and assembly structure 28, to maintain the impression quality of this elastic mould 2.Therefore, compared to prior art, the elastic mould 22 of imprinting apparatus 2 of the present utility model can not only conveniently take out, and is easy to check and changes, so can avoid this base material 8 to become defective products.
In another embodiment, when the processing procedure of Fig. 2 C, can form processing procedure according to the material characteristic of this preform material, for example, when this preform material is light solid material (as UV resin 8a), can be by the source of supply 26(that is located at these cavity 20 outsides as light source) through this conducting piece 25, irradiate this UV resin 8a, to solidify this UV resin 8a, in order to do becoming patterning micro-structural 80 for auxiliary this UV resin 8a.Or, if this preform material is thermosetting shape material, source of supply 26 can be located to this cavity 20 inside, as these elastic mould 22 belows, to heat this UV resin 8a, be cured, this conducting piece 25 can be set.
In other embodiment, when Fig. 2 D processing procedure, in this space 24 and the interior pressurization of this cavity 20, with the upper and lower air pressure that applies, on this elastic mould 22 and this base material 8, to assist to impress, form this patterning micro-structural 80.
Above-described embodiment is only in order to illustrative principle of the present utility model and effect thereof, but not for limiting the utility model.Any personage who has the knack of this skill all can, under spirit of the present utility model and category, modify to above-described embodiment.So rights protection scope of the present utility model, should be as listed in claims.
Claims (10)
1. an imprinting apparatus, is characterized in that, comprising:
Cavity, it has the first relative inner side and the second inner side;
Movable bearing part, it is located on the first inner side of this cavity; And
Elastic mould, it is suspended in this cavity, and between the second inner side of this bearing part and this cavity, and there is gap between the second inner side of this elastic mould and this cavity.
2. imprinting apparatus according to claim 1, is characterized in that, this bearing part has displacement structure, for the displacement between the first inner side of this cavity and the second inner side of this bearing part.
3. imprinting apparatus according to claim 1, is characterized in that, this bearing part has displacement structure, to drive this elastic mould displacement.
4. imprinting apparatus according to claim 1, is characterized in that, this bearing part has location structure, for the object being fixedly placed on this bearing part.
5. imprinting apparatus according to claim 1, is characterized in that, this elastic mould is crooked towards the first interior side direction of this cavity.
6. imprinting apparatus according to claim 1, is characterized in that, this device also comprises strutting piece, and it is located on this cavity, to suspend this elastic mould in midair.
7. imprinting apparatus according to claim 1, is characterized in that, this device also comprises disassembly and assembly structure, and it is in order to this elastic mould of dismounting.
8. imprinting apparatus according to claim 1, is characterized in that, this device also comprises lid, and it is located on the second inner side of this cavity, and this lid has the opening towards this first inner side, and this opening is to position that should bearing part.
9. imprinting apparatus according to claim 1, is characterized in that, this device also comprises conducting piece, and it is located on the second inner side of this cavity.
10. imprinting apparatus according to claim 1, is characterized in that, this device also comprises source of supply, and it is to should elastic mould and establish.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320544383.XU CN203445141U (en) | 2013-09-03 | 2013-09-03 | Impressing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320544383.XU CN203445141U (en) | 2013-09-03 | 2013-09-03 | Impressing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203445141U true CN203445141U (en) | 2014-02-19 |
Family
ID=50096164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320544383.XU Expired - Fee Related CN203445141U (en) | 2013-09-03 | 2013-09-03 | Impressing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203445141U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104425656A (en) * | 2013-09-03 | 2015-03-18 | 和椿科技股份有限公司 | Imprinting device and imprinting method |
| WO2017059828A1 (en) * | 2015-10-10 | 2017-04-13 | 青岛博纳光电装备有限公司 | Large-size wafer entire nanoimprinting device and imprinting method therefor |
| CN110764363A (en) * | 2018-07-27 | 2020-02-07 | 奇景光电股份有限公司 | Imprinting system, glue supply device and imprinting method |
-
2013
- 2013-09-03 CN CN201320544383.XU patent/CN203445141U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104425656A (en) * | 2013-09-03 | 2015-03-18 | 和椿科技股份有限公司 | Imprinting device and imprinting method |
| CN104425656B (en) * | 2013-09-03 | 2018-01-19 | 和椿科技股份有限公司 | Imprinting apparatus and impressing mode |
| WO2017059828A1 (en) * | 2015-10-10 | 2017-04-13 | 青岛博纳光电装备有限公司 | Large-size wafer entire nanoimprinting device and imprinting method therefor |
| CN110764363A (en) * | 2018-07-27 | 2020-02-07 | 奇景光电股份有限公司 | Imprinting system, glue supply device and imprinting method |
| CN110764363B (en) * | 2018-07-27 | 2023-09-22 | 奇景光电股份有限公司 | Embossing system, glue supply device and embossing method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203445141U (en) | Impressing apparatus | |
| JP5744590B2 (en) | Imprint method, mold, and manufacturing method of article using them | |
| JP5395306B1 (en) | Bonding device manufacturing apparatus and bonding device manufacturing method | |
| CN105584030A (en) | Imprint method, imprint apparatus, mold, and product manufacturing method | |
| TW200700809A (en) | Cassette and method for fabricating liquid crystal display device using the same | |
| CN103793096A (en) | Touch screen and production method thereof | |
| JP5822597B2 (en) | Imprint apparatus and article manufacturing method using the same | |
| CN104425656B (en) | Imprinting apparatus and impressing mode | |
| CN202399613U (en) | Laminating equipment for display devices | |
| CN103257524A (en) | Imprint apparatus and imprint method | |
| CN105954905A (en) | Large-size soft-pressurizing full laminating device | |
| CN102241136B (en) | Nano-imprinting apparatus and nano-imprinting method | |
| TW201022791A (en) | Device for hot pressing light guide plate | |
| TWI578848B (en) | Embossing device and embossing method | |
| CN202025291U (en) | Thin computer keyboard | |
| CN202584082U (en) | Full-automatic mobile phone capacitive screen optical cement vacuum pressing machine | |
| CN106502462A (en) | Touch-control display panel and its manufacture method, touch control display apparatus | |
| CN101930168A (en) | Vacuum forming apparatus and method for vacuum forming of substrate | |
| CN202230270U (en) | Silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure | |
| CN207327718U (en) | Hollow compound ingot and making apparatus | |
| CN108957949A (en) | A kind of nano-imprinting method | |
| JP2007294364A (en) | Manufacturing method of switch guard | |
| TWI618106B (en) | Manufacturing method of keyswitch | |
| CN212860160U (en) | Mould for preparing curved surface protective film and device comprising same | |
| CN214795564U (en) | Wafer nanoimprint device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140219 Termination date: 20180903 |