CN203414731U - Exposure device - Google Patents

Exposure device Download PDF

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Publication number
CN203414731U
CN203414731U CN201220487407.8U CN201220487407U CN203414731U CN 203414731 U CN203414731 U CN 203414731U CN 201220487407 U CN201220487407 U CN 201220487407U CN 203414731 U CN203414731 U CN 203414731U
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CN
China
Prior art keywords
exposure
desk
housing
base plate
exposure device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201220487407.8U
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Chinese (zh)
Inventor
朱婉平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHENZHEN VITAYON SCREEN PRINTING EQUIPMENT CO Ltd
Original Assignee
SHENZHEN VITAYON SCREEN PRINTING EQUIPMENT CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHENZHEN VITAYON SCREEN PRINTING EQUIPMENT CO Ltd filed Critical SHENZHEN VITAYON SCREEN PRINTING EQUIPMENT CO Ltd
Priority to CN201220487407.8U priority Critical patent/CN203414731U/en
Application granted granted Critical
Publication of CN203414731U publication Critical patent/CN203414731U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model discloses an exposure device. The exposure device comprises a machine station and an exposure area device on the machine station, wherein the exposure area device comprises a housing and an exposer at the inner upper part of the housing; an exposure table, which can slide into/out of the housing horizontally, is arranged on each of two sides of the exposure area device; the exposure tables on the two sides of the exposure area device are on the same horizontal plane. The exposure device has the advantages that the structure is simple; exposure time of the left and right exposure tables is not required to be adjusted respectively; on the basis that the exposure yield is efficient, the commensurate consistency of the light energy of exposure to exposure material irradiation is guaranteed, and the precision exposure and produced product quality consistency are guaranteed.

Description

A kind of exposure device
Technical field
The utility model relates to a kind of precision photo etching imaging device, particularly relates to a kind of exposure device.
Background technology
At present exposure device belongs to a kind of in precision photo etching imaging device, and it is a kind of employing UV-irradiation, makes to accept the material that certain specific wavelength can sensitization, be subject to light-struck region produce form with the film on the on all four a kind of device of pattern.Existing exposure device or be exactly to only have an exposure desk, while exposing in exposure desk enters exposure region device, can only wait for after it exposes and pull out after exposure desk takes out exposing material and prepare again material and vacuumize to push again in the device of exposure region afterwards to expose.The shortcoming of such exposure device is that the exposure rate of output is lower.Also having a kind of exposure device is that upper and lower two exposure desks are set, when one of them exposure desk exposes in exposure region as upper strata exposure desk pushes, another exposure desk is that the preliminary work that lower floor can overlay wheat membrane and aspiration vacuum is ready to exposing material and exposure desk, after complete being drawn out of upper strata exposure desk exposure in exposure region, more ready lower floor exposure desk is pushed and in exposure region, carries out exposure-processed.The advantage of such exposure device is that exposure is produced efficiency and doubled, but these two kinds of exposure desk settings, the power of exposure lamp is very high, configure complicated cooling system, and because exposure desk is positioned at levels, therefore expose to the sun light intensity and time is inhomogeneous, needs the additional adjustment time shutter, and can not guarantee the same amount consistance that the luminous energy of exposure is irradiated exposing material.
Summary of the invention
The utility model completes in order to solve deficiency of the prior art, the purpose of this utility model be to provide a kind of simple in structure, do not need respectively left and right exposure desk to regulate respectively the time shutter, guaranteeing under the prerequisite of the efficient exposure rate of output, the same amount consistance that the luminous energy of assurance exposure is irradiated exposing material, assurance is accurate to expose and produces the conforming exposure device of product quality.
A kind of exposure device of the present utility model, comprise board and be arranged on the exposure region device on described board, described exposure region device comprises housing and is arranged on the exposer of described enclosure interior top, device both sides, described exposure region arrange respectively one can level slip into or skid off the exposure desk in described housing, and the exposure desk of device both sides, described exposure region is positioned in same level.
A kind of exposure device of the present utility model can also be:
Guide rail or polished rod are set on described board, and the exposure desk of device both sides, described exposure region is slidably connected with described guide rail or polished rod respectively.
Two polished rods are set on described board, and described each exposure desk bottom arranges four axial sleeve of bushing, and described four axial sleeve of bushing are set on described polished rod symmetrically.
Described exposure desk bottom arranges slide rail or at least one pair of pulley, on described board, pair of guide rails is set, and described slide rail or pulley and described guide rail are slidably connected.
Described exposer is cold ultraviolet light lamp.
Described cold ultraviolet light lamp is arranged in a light gathering reflective housing, and described cold ultraviolet light lamp top arranges exhaust fan.
The bottom of described light gathering reflective housing and the distance of described housing bottom are equal to or greater than the height of described exposure desk.
Glass table top, one end that described exposure desk comprises base plate, be arranged on base plate are articulated with the upper cover on described base plate, described upper cover lower surface has overlayed resistance to membrane, in described base plate, arrange and vacuumize conduit, described cover rim and described bottom edge are tightly connected, described in vacuumize conduit and be connected with vacuum extractor.
Between described upper cover and described base plate, be connected through the hinge.
A kind of exposure device of the present utility model, owing to comprising board and being arranged on the exposure region device on described board, described exposure region device comprises housing and is arranged on the exposer of described enclosure interior top, device both sides, described exposure region arrange respectively one can level slip into or skid off the exposure desk in described housing, being positioned in same level of the exposure desk of device both sides, described exposure region.During use, the exposure desk of exposure region device one side is first ready to push afterwards and in housing, carries out exposure-processed, to being positioned at the exposure desk of the other side of exposure region device, overlaying resistance to membrane and the preliminary work such as vacuumize simultaneously, after having exposed, exposure desk in the device of exposure region is drawn out, then the exposure desk of ready opposite side is pushed in the device of exposure region and exposed, between its exposure period, exposing material after exposure is taken off, and then the preliminary work of next time exposing, so cycling.Like this, the advantage having be in terms of existing technologies relatively simple for structure, improved exposure and produced efficiency, and because two exposure desks are positioned in same level, therefore, distance between exposing material and exposer is changeless, therefore do not need additionally to regulate respectively the time shutter of left and right exposure desk just can guarantee the same amount consistance that the luminous energy of exposure is irradiated exposing material, guaranteed to produce the effect of product and the consistance of quality.
Accompanying drawing explanation
A kind of exposure device embodiment of Fig. 1 the utility model schematic diagram.
Figure number explanation
1 ... board 2 ... exposure region device 3 ... housing
4 ... exposer 5 ... exposure desk 6 ... guide rail
7 ... light gathering reflective housing 8 ... exhaust fan 9 ... base plate
10 ... glass table top 11 ... upper cover 12 ... resistance to membrane
13 ... O-ring seal 14 ... vacuumize conduit 15 ... vacuum extractor
16 ... hinge 21 ... safety light illuminating lamp 22 ... sealing gasket
Embodiment
Fig. 1 below in conjunction with accompanying drawing is described in further detail a kind of exposure device of the present utility model.
A kind of exposure device of the present utility model, please refer to Fig. 1, comprise board 1 and be arranged on the exposure region device 2 on described board 1, described exposure region device 2 comprises housing 3 and is arranged on the exposer 4 of described housing 3 inner upper, device 2 both sides, described exposure region arrange respectively one can level slip into or skid off the exposure desk 5 in described housing 3, being positioned in same level of the exposure desk 5 of device 2 both sides, described exposure region.During use, the exposure desk 5 of exposure region device 2 one sides is first ready to push afterwards and in housing 3, carries out exposure-processed, to being positioned at the exposure desk 5 of the other side of exposure region device 2, overlaying resistance to membrane 12 and the preliminary work such as vacuumize simultaneously, after having exposed, exposure desk 5 in exposure region device 2 is drawn out, then the exposure desk of ready opposite side 5 is pushed in exposure region device 2 and exposed, between its exposure period, exposing material after exposure is taken off, and then the preliminary work of next time exposing, so cycling.Concrete exposure region device 2 can be current general exposure region device 2.Like this, the advantage having be in terms of existing technologies relatively simple for structure, improved exposure and produced efficiency, and because two exposure desks 5 are positioned in same level, therefore, distance between exposing material and exposer 4 is changeless, therefore do not need additionally to regulate respectively the time shutter of left and right sides exposure desk just can guarantee the same amount consistance that the luminous energy of exposure is irradiated exposing material, guaranteed to produce the effect of product and the consistance of quality.
A kind of exposure device of the present utility model, please refer to Fig. 1, can be specifically, on described board 1, guide rail 6 or polished rod are set on the basis of previous technique scheme, and the exposure desk 5 of device 2 both sides, described exposure region is slidably connected with described guide rail 6 or polished rod respectively.Like this, two exposure desks 5 horizontally slip and then are pushed in exposure region device 2 or in described exposure region device 2 and are drawn out on same guide rail 6, guarantee that the horizontal level of two exposure desks 5 in exposure region device 2 is identical, can realize Bidirectional slide, structure is simple again, and guarantees that two exposure desks 5 are in same level.Further preferred technical scheme is to pulley, on described board 1, pair of guide rails 6 is set, and described slide rail or pulley and described guide rail 6 are slidably connected.The same amount consistance that pair of guide rails 6 further guarantees that exposure desk 5 stationarities of slip and the luminous energy of exposure are irradiated exposing material is set.And the slide rail of exposure desk 5 bottoms or at least one pair of pulley are realized the slip of exposure desk 5 on guide rail 6.Comparative optimization be that two polished rods are set on described board 1, described each exposure desk 5 bottom arrange four axial sleeve of bushing, described four axial sleeve of bushing are set on described polished rod symmetrically.Two exposure desks 5 in left and right just can slide on polished rod like this.Certainly can also adopt the device of other structures to make exposure desk 5 flatly to slip into or to skid off in housing 3.
A kind of exposure device of the present utility model, please refer to Fig. 1, can also be that described exposer 4 is cold ultraviolet light lamp on the basis of previous technique scheme.Like this, owing to using cold ultraviolet light lamp, when guaranteeing exposure effect, avoid distributing a large amount of heats, and then saved the cooling system of a whole set of complex and expensive in existing exposure device, reduce the cost of exposure device, energy-saving and cost-reducing, low-carbon environment-friendly.Further preferred technical scheme is that described cold ultraviolet light lamp is arranged in a light gathering reflective housing 7, and described cold ultraviolet light lamp top arranges exhaust fan 8.Light gathering reflective housing 7 is fixed with housing 3 inner upper inwalls, and described exhaust fan 8 is arranged on described housing top.The effect that light gathering reflective housing 7 is set is that light that cold ultraviolet light lamp is sent converges and reflex to that housing 3 is interior that exposing material on exposure desk 5 is irradiated, and shortens the time shutter, improves exposure output efficiency.And the effect of exhaust fan 8 is heats that cold ultraviolet light lamp is distributed, drain, avoid cold ultraviolet light lamp overheated.Further preferred technical scheme is the height that the bottom of described light gathering reflective housing 7 and the distance of described housing 3 bottoms are equal to or greater than described exposure desk 5.When the bottom of light gathering reflective housing 7 and the distance of described housing 3 bottoms equal the height of described exposure desk 5, exposure desk 5 pushes after housing, and the light that light gathering reflective housing 7 distributes all exposers all reflexes to exposure desk 5 surfaces, further improves exposure efficiency.And when the bottom of light gathering reflective housing 7 and the distance of described housing 3 bottoms are greater than the height of described exposure desk 5, light gathering reflective housing 7 is positioned at exposure bar 5 tops, light is reflexed on exposure desk 5, only have part to leak, but the rate that leaks is lower.Guarantee exposure efficiency.Can also be, between described exposure desk 5 and described housing 3, safety light illuminating lamp 21 is all set in addition.Safety light illuminating lamp 21 for work time illumination use.
A kind of exposure device of the present utility model, please refer to Fig. 1, on the basis of previous technique scheme, can also be that described exposure desk 5 comprises base plate 9, glass table top 10, one end of being arranged on base plate 9 are articulated with the upper cover 11 on described base plate 9, described upper cover 11 lower surfaces have overlayed resistance to membrane 12, the interior setting of described base plate 9 vacuumizes conduit 14, described upper cover 11 edges are connected with described base plate 9 edge seals, described in vacuumize conduit 14 and be connected with vacuum extractor 15.Upper cover 11 is set on base plate 9, glass table top 10 is set on base plate 9, exposing material is placed on glass table top 10, then covering the rear resistance to membrane 12 of upper cover 11 is adjacent on exposing material, by vacuumizing conduit, will in exposure desk 5, be evacuated, resistance to membrane 12 is close on exposing material, complete the preliminary work of exposing material on exposure desk 5, facilitate follow-up exposure, and being tightly connected of upper cover 11 and base plate 9 edges can be by described upper cover 11 edges and O-ring seal 13 is set respectively at described base plate 10 edges and sealing gasket 22 is realized.Can be specifically described upper cover 11 with described base plate 9 between by hinge 16, be connected.
Above-mentionedly only several specific embodiments in the utility model are illustrated; but can not be as protection domain of the present utility model; every equivalence variation of having done according to the design spirit in the utility model or modification or equal proportion zoom in or out etc., all should think and fall into protection domain of the present utility model.

Claims (9)

1. an exposure device, it is characterized in that: comprise board and be arranged on the exposure region device on described board, described exposure region device comprises housing and is arranged on the exposer of described enclosure interior top, device both sides, described exposure region arrange respectively one can level slip into or skid off the exposure desk in described housing, and the exposure desk of device both sides, described exposure region is positioned in same level.
2. a kind of exposure device according to claim 1, is characterized in that: guide rail or polished rod are set on described board, and the exposure desk of device both sides, described exposure region is slidably connected with described guide rail or polished rod respectively.
3. a kind of exposure device according to claim 2, is characterized in that: described exposure desk bottom arranges slide rail or at least one pair of pulley, on described board, pair of guide rails is set, and described slide rail or pulley and described guide rail are slidably connected.
4. a kind of exposure device according to claim 2, is characterized in that: two polished rods are set on described board, and described each exposure desk bottom arranges four axial sleeve of bushing, and described four axial sleeve of bushing are set on described polished rod symmetrically.
5. according to a kind of exposure device described in claim 1 or 2 or 3 or 4, it is characterized in that: described exposer is cold ultraviolet light lamp.
6. a kind of exposure device according to claim 5, is characterized in that: described cold ultraviolet light lamp is arranged in a light gathering reflective housing, and described cold ultraviolet light lamp top arranges exhaust fan.
7. a kind of exposure device according to claim 6, is characterized in that: the bottom of described light gathering reflective housing and the distance of described housing bottom are equal to or greater than the height of described exposure desk.
8. according to a kind of exposure device described in claim 1 or 2 or 3 or 4, it is characterized in that: glass table top, one end that described exposure desk comprises base plate, be arranged on base plate are articulated with the upper cover on described base plate, described upper cover lower surface has overlayed resistance to membrane, in described base plate, arrange and vacuumize conduit, described cover rim and described bottom edge are tightly connected, described in vacuumize conduit and be connected with vacuum extractor.
9. a kind of exposure device according to claim 8, is characterized in that: between described upper cover and described base plate, be connected through the hinge.
CN201220487407.8U 2012-09-21 2012-09-21 Exposure device Expired - Fee Related CN203414731U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201220487407.8U CN203414731U (en) 2012-09-21 2012-09-21 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201220487407.8U CN203414731U (en) 2012-09-21 2012-09-21 Exposure device

Publications (1)

Publication Number Publication Date
CN203414731U true CN203414731U (en) 2014-01-29

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201220487407.8U Expired - Fee Related CN203414731U (en) 2012-09-21 2012-09-21 Exposure device

Country Status (1)

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CN (1) CN203414731U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116841136A (en) * 2023-08-31 2023-10-03 光科芯图(北京)科技有限公司 Five adjusting device and exposure system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116841136A (en) * 2023-08-31 2023-10-03 光科芯图(北京)科技有限公司 Five adjusting device and exposure system
CN116841136B (en) * 2023-08-31 2023-11-24 光科芯图(北京)科技有限公司 Five adjusting device and exposure system

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C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20140129

Termination date: 20160921