CN202794850U - 3-dimensional (3D) exposure device - Google Patents
3-dimensional (3D) exposure device Download PDFInfo
- Publication number
- CN202794850U CN202794850U CN 201220487396 CN201220487396U CN202794850U CN 202794850 U CN202794850 U CN 202794850U CN 201220487396 CN201220487396 CN 201220487396 CN 201220487396 U CN201220487396 U CN 201220487396U CN 202794850 U CN202794850 U CN 202794850U
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- exposure
- base plate
- membrane
- silica gel
- desk
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Abstract
The utility model discloses a 3-dimensional exposure device. The 3D exposure device comprises a machine platform and an exposure area device arranged on the machine platform. The exposure area device comprises a shell body and an exposer arranged on the upper portion in the shell body. Both sides of the exposure area device are respectively provided with an exposure platform which is capable of sliding in or out of the interior of the shell body along the same horizontal plane. Each exposure platform comprises a base plate, a glass platform face arranged on the base plate, and an upper cover with one end in hinge joint with the base plate. A pulling-resistant film is attached to the lower surface of the upper cover in a pressing mode, a vacuumized duct is arranged in the base plate, and edges of the upper cover is connected with edges of the base plate in a sealing mode. The vacuumized duct is connected with a vacuumized device, and the pulling-resistant film in at least one exposure platform is a silica gel pulling-resistant film made of silica gel materials. The 3D exposure device is simple in structure, while 3D accurate exposure is achieved, the high efficient rate of exposure output and the illumination commensuration consistency of light energy of exposure on exposure materials are guaranteed, and the consistency of the quality of the accurate exposure and the quality of output product is guaranteed.
Description
Technical field
The utility model relates to the precision photo etching imaging device, particularly relates to a kind of 3D exposure device.
Background technology
Present exposure device belongs in the precision photo etching imaging device, and it is to adopt UV-irradiation, but makes the material that can accept certain specific wavelength sensitization, is being subject to the on all four device of pattern on the generation formation of light-struck zone and the film.Existing exposure device or be exactly to only have an exposure desk, when in exposure desk enters the exposure region device, exposing, can only wait for its exposure pull out after complete exposure desk take out prepare again material behind the exposing material and vacuumize after push again in the exposure region device and expose.The shortcoming of such exposure device is that the exposure rate of output is lower.Also having a kind of exposure device is that up and down two exposure desks are set, one of them exposure desk such as upper strata exposure desk push when exposing in the exposure region, another exposure desk is that lower floor can do the preliminary work that overlays wheat membrane and aspiration vacuum exposing material and exposure desk are ready to, after complete being drawn out of upper strata exposure desk exposure in the exposure region, ready lower floor exposure desk being pushed carry out exposure-processed in the exposure region again.The advantage of such exposure device is that exposure is produced efficient and doubled, but because exposure desk is positioned at levels, therefore intensity and the time of exposure inhomogeneous, need the additional adjustment time shutter, and can not guarantee that the luminous energy of exposing is to the same amount consistance of exposing material irradiation.And above-mentioned exposure desk all is can only be the exposure of doing the common plane material, accurate exposure-processed that can not 3D.
Summary of the invention
The utility model is finished in order to solve deficiency of the prior art, that the purpose of this utility model provides is simple in structure, when can realizing the accurate exposure of 3D, guarantee the luminous energy of the efficient exposure rate of output and exposure to the same amount consistance of exposing material irradiation, guarantee accurate exposure and produce the conforming a kind of 3D exposure device of product quality.
A kind of 3D exposure device of the present utility model, comprise board and the exposure region device that is arranged on the described board, described exposure region device comprises housing and is arranged on the exposer of described enclosure interior top, described exposure region device both sides arrange respectively one can slip into or skid off exposure desk in the described housing along the same level face, described exposure desk comprises base plate, be arranged on the glass table top on the base plate, one end is articulated in the loam cake on the described base plate, described loam cake lower surface has overlayed anti-membrane, arrange in the described base plate and vacuumize conduit, described cover rim and described bottom edge are tightly connected, the described conduit that vacuumizes is connected with vacuum extractor, and the anti-membrane in described at least one exposure desk is the anti-membrane of silica gel of being made by silica gel material.
A kind of 3D exposure device of the present utility model can also be:
Anti-membrane all is anti-membranes of silica gel of being made by silica gel material in described two exposure desks.
Anti-membrane in the described exposure desk is the anti-membrane of silica gel of being made by silica gel material, and the anti-membrane in another exposure desk is the anti-membrane of Polyvinylchloride of being made by Polyvinylchloride.
Described cover rim and described bottom edge arrange respectively O-ring seal and sealing gasket, described loam cake and described base plate cover, described O-ring seal and described sealing gasket jam-packed are at described loam cake and described bottom edge place, and the surface elasticity of described O-ring seal and described sealing gasket offsets.
Described O-ring seal is the soft rubber O-ring seal, and described sealing gasket is the soft rubber sealing gasket.
Be connected through the hinge between described loam cake and the described base plate.
Described cover rim is provided with stainless steel frame.
Described exposer is the cold ultraviolet light lamp.
Described cold ultraviolet light lamp is arranged in the light gathering reflective housing, and described cold ultraviolet light lamp top arranges exhaust fan.
Between described exposure desk and the described housing safety light illuminating lamp is set all.
A kind of 3D exposure device of the present utility model, owing to comprise board and the exposure region device that is arranged on the described board, described exposure region device comprises housing and is arranged on the exposer of described enclosure interior top, described exposure region device both sides arrange respectively one can slip into or skid off exposure desk in the described housing along the same level face, described exposure desk comprises base plate, be arranged on the glass table top on the base plate, one end is articulated in the loam cake on the described base plate, described loam cake lower surface has overlayed anti-membrane, arrange in the described base plate and vacuumize conduit, described cover rim and described bottom edge are tightly connected, the described conduit that vacuumizes is connected with vacuum extractor, and the anti-membrane in described at least one exposure desk is the anti-membrane of silica gel of being made by silica gel material.During use, the exposure desk of exposure region device one side is ready to first push afterwards and carries out exposure-processed in the housing, simultaneously the exposure desk that is positioned at the other side of exposure region device is overlayed anti-membrane and the preliminary work such as vacuumizes, after finishing, the exposure of the exposure desk in the exposure region device is drawn out, then the exposure desk of ready opposite side is pushed in the exposure region device and expose, between its exposure period, exposing material after the exposure is taken off, and then the preliminary work of next time exposing, so cycling.Simultaneously because the anti-membrane of at least one exposure desk is the anti-membrane of silica gel of being made by silica gel material, and the anti-membrane of silica gel is high resiliency, high transparent and have an anti-membrane of height pull resistance, its Wear-resistant, high-temperature resistant, so the 3D rendering that can expose, realization overall exposing device can be realized the accurate exposure of 3D.Like this, the advantage that has in terms of existing technologies is relatively simple for structure, when realizing accurate 3D exposure, improve exposure and produced efficient, and because two exposure desks are positioned on the same level face, therefore, the distance between exposing material and the exposer is changeless, therefore do not need luminous energy that the additional adjustment time shutter just can guarantee to expose to the same amount consistance that exposing material shines, guaranteed to produce the effect of product and the consistance of quality.
Description of drawings
A kind of 3D exposure device of Fig. 1 the utility model embodiment synoptic diagram.
The figure number explanation
1 ... board 2 ... exposure region device 3 ... housing
4 ... exposer 5 ... exposure desk 6 ... guide rail
7 ... light gathering reflective housing 8 ... exhaust fan 9 ... base plate
10 ... glass table top 11 ... loam cake 12 ... anti-membrane
13 ... O-ring seal 14 ... vacuumize conduit 15 ... vacuum extractor
16 ... hinge 21 ... safety light illuminating lamp 22 ... sealing gasket
Embodiment
Fig. 1 below in conjunction with accompanying drawing is described in further detail a kind of 3D exposure device of the present utility model.
A kind of 3D exposure device of the present utility model, please refer to Fig. 1, comprise board 1 and the exposure region device 2 that is arranged on the described board 1, described exposure region device 2 comprises housing 3 and is arranged on the exposer 4 of described housing 3 inner and upper, described exposure region device 2 both sides arrange respectively one can slip into or skid off exposure desk 5 in the described housing 3 along the same level face, described exposure desk 5 comprises base plate 9, be arranged on the glass table top 10 on the base plate 9, one end is articulated in the loam cake 11 on the described base plate 9, described loam cake 11 lower surfaces have overlayed anti-membrane 12, described base plate 9 interior settings vacuumize conduit 14, described loam cake 11 edges are connected with described base plate 9 edge seals, the described conduit 14 that vacuumizes is connected with vacuum extractor 15, and the anti-membrane 12 in described at least one exposure desk 5 is anti-membranes 12 of silica gel of being made by silica gel material.During use, the exposure desk 5 of exposure region device 2 one sides is ready to first push afterwards and carries out exposure-processed in the housing 3, the preliminary work the such as simultaneously exposure desk 5 that is positioned at exposure region device 2 other sides is overlayed anti-membrane 12 and vacuumize, after finishing, exposure desk 5 exposures in the exposure region device 2 are drawn out, then the exposure desk 5 of ready opposite side is pushed in the exposure region device 2 and expose, between its exposure period, exposing material after the exposure is taken off, and then the preliminary work of next time exposing, so cycling.Simultaneously because at least one exposure desk 5 anti-membrane 12 is anti-membranes 12 of silica gel of being made by silica gel material, and the anti-membrane 12 of silica gel is superelevation elasticity, high transparent and have an anti-membrane 12 of superelevation pull resistance, it can be under the state that vacuumizes, fully closely wrap the 3D face of exposing material, and the anti-membrane of tygon can't be realized, its Wear-resistant, high-temperature resistant, the 3D rendering that therefore can expose, thus realization overall exposing device can be realized the accurate exposure of 3D.Like this, the advantage that has in terms of existing technologies is relatively simple for structure, when realizing accurate 3D exposure, improve exposure and produced efficient, and because two exposure desks 5 are positioned on the same level face, therefore, the distance between exposing material and the exposer 4 is changeless, therefore do not need luminous energy that the additional adjustment time shutter just can guarantee to expose to the same amount consistance that exposing material shines, guaranteed to produce the effect of product and the consistance of quality.
A kind of 3D exposure device of the present utility model please refer to Fig. 1, specifically can be that described two exposure desks, 5 interior anti-membranes 12 all are anti-membranes 12 of silica gel of being made by silica gel material in front on the basis of technical scheme.Like this, anti-membrane 12 all is the anti-membrane 12 of silica gel of being made by silica gel material in the exposure desk 5 on both sides, can guarantee that two exposure desks 5 can realize accurate 3D exposure, improves the exposure efficiency of 3D exposure.Can also be that a described exposure desk 5 interior anti-membranes 12 are anti-membranes 12 of silica gel of being made by silica gel material in addition, the anti-membranes 12 in another exposure desk 5 be anti-membranes 12 of Polyvinylchloride of being made by Polyvinylchloride.Such exposure desk 5 is the anti-membranes 12 of silica gel, can realize accurate 3D exposure, is the anti-membrane 12 of Polyvinylchloride in the another one exposure desk 5, and this exposure desk 5 is realized exposure common plane material, and efficient is higher, saves the energy.
A kind of 3D exposure device of the present utility model please refer to Fig. 1, can be on the described board 1 guide rail 6 to be set in front on the basis of technical scheme, and the exposure desk 5 that is arranged on exposure region device 2 both sides is slidingly connected with described guide rail 6 respectively.Like this, two exposure desks 5 horizontally slip and then are pushed in the exposure region device 2 or in described exposure region device 2 at same guide rail 6 and are drawn out, guarantee that the horizontal level of two exposure desks 5 in exposure region device 2 is identical, namely can realize Bidirectional slide, structure is simple again, and guarantees that two exposure desks 5 are on the same level face.Further preferred technical scheme is to pulley, on the described board 1 pair of guide rails 6 or polished rod is set, and described slide rail or pulley and described guide rail 6 or polished rod are slidingly connected.The luminous energy of stationarity that pair of guide rails 6 guarantees that further exposure desks 5 slide and exposure is set to the same amount consistance of exposing material irradiation.And the slide rail of exposure desk 5 bottoms or at least one pair of pulley are realized the slip of exposure desk 5 on guide rail 6.Comparative optimization be that two polished rods are set on the described board 1, described each exposure desk 5 bottom arrange four axial sleeve of bushing, described four axial sleeve of bushing are set on the described polished rod symmetrically.Two exposure desks 5 just can slide at polished rod like this.Certainly can also adopt other structures device so that exposure desk 5 can flatly slip into or skid off in the housing 3.
A kind of 3D exposure device of the present utility model, please refer to Fig. 1, the basis of technical scheme can also be that described loam cake 11 edges and described base plate 9 edges arrange respectively O-ring seal 13 and sealing gasket 22 in front, described loam cake 11 covers with described base plate 9, described O-ring seal 13 and described sealing gasket 22 jam-packeds are in described loam cake 11 and described base plate 9 edges, and described O-ring seal 13 offsets with the surface of described sealing gasket 22.This spline structure can realize that described loam cake 11 edges are connected with described base plate 9 edge seals.Both being tightly connected guarantees that exposure desk 5 vacuumizing of interior exposing material preparatory stage are achieved.O-ring seal 13 is set and sealing gasket 22 surface elasticities offset, guarantees both elasticity jam-packeds after loam cake 11 and base plate 9 cover, guarantee sealing effectiveness.Further preferred technical scheme is that described O-ring seal 13 is soft rubber O-ring seal 13, and described sealing gasket 22 is soft rubber sealing gasket 22.Can guarantee like this resilient seal between O-ring seal 13 and the sealing gasket 22, and sealing effectiveness is relatively good, cost is low.
A kind of 3D exposure device of the present utility model please refer to Fig. 1, can also be described loam cake 11 in front on the basis of technical scheme with described base plate 9 between be connected by hinge 16.Loam cake 11 can be opened or cover along hinge 16 upsets like this.Certainly can also adopt the mode that is connected by jointed shaft between described loam cake 11 and the described base plate 9 to realize hinged between loam cake 11 and the base plate 9.In addition, can also be that described loam cake 11 edges are provided with stainless steel frame.The advantage of stainless steel frame is to be not easy oxidation, and is not easy to get rusty.In addition, described exposer 4 is the cold ultraviolet light lamp.Like this, owing to use the cold ultraviolet light lamp, when guaranteeing exposure effect, avoid distributing a large amount of heat, and then saved the cooling system of a whole set of complex and expensive in existing a kind of 3D exposure device, reduce a kind of cost of 3D exposure device, energy-saving and cost-reducing, low-carbon environment-friendly.Further preferred technical scheme is that described cold ultraviolet light lamp is arranged in the light gathering reflective housing 7, and described cold ultraviolet light lamp top arranges exhaust fan 8.Light gathering reflective housing 7 is fixed with housing 3 inner upper inwalls, and described exhaust fan 8 is installed in described housing top.The effect that light gathering reflective housing 7 is set is the light that the cold ultraviolet light lamp sends to be converged and be tending towards directional light to reflex to that housing 3 is interior to be shone the exposing material on the exposure desk 5, shortens the time shutter, improves the exposure output efficiency.And the effect of exhaust fan 8 is that the heat that the cold ultraviolet light lamp distributes is drained, and avoids the cold ultraviolet light lamp overheated.The bottom that further preferred technical scheme is described light gathering reflective housing 7 and the distance of described housing 3 bottoms are equal to or greater than the height of described exposure desk 5.When the distance of the bottom of light gathering reflective housing 7 and described housing 3 bottoms equaled the height of described exposure desk 5, after exposure desk 5 pushed housing, the light that light gathering reflective housing 7 distributes all exposers all reflexed to exposure desk 5 surfaces, further improves exposure efficiency.And when the distance of the bottom of light gathering reflective housing 7 and described housing 3 bottoms during greater than the height of described exposure desk 5, light gathering reflective housing 7 is positioned at exposure bar 5 tops, and light is reflexed on the exposure desk 5, only has part to leak, but the rate that leaks is lower.Guarantee exposure efficiency.Can also be between described exposure desk 5 and the described housing 3 safety light illuminating lamp 21 to be set all in addition.Safety light illuminating lamp 21 for work time illumination use.
Above-mentionedly only several specific embodiments in the utility model are illustrated; but can not be as protection domain of the present utility model; every equivalence variation of having done according to the design spirit in the utility model or modification or equal proportion zoom in or out etc., all should think to fall into protection domain of the present utility model.
Claims (10)
1. 3D exposure device, it is characterized in that: comprise board and the exposure region device that is arranged on the described board, described exposure region device comprises housing and is arranged on the exposer of described enclosure interior top, described exposure region device both sides arrange respectively one can slip into or skid off exposure desk in the described housing along the same level face, described exposure desk comprises base plate, be arranged on the glass table top on the base plate, one end is articulated in the loam cake on the described base plate, described loam cake lower surface has overlayed anti-membrane, arrange in the described base plate and vacuumize conduit, described cover rim and described bottom edge are tightly connected, the described conduit that vacuumizes is connected with vacuum extractor, and the anti-membrane in described at least one exposure desk is the anti-membrane of silica gel of being made by silica gel material.
2. a kind of 3D exposure device according to claim 1 is characterized in that: anti-membrane all is anti-membranes of silica gel of being made by silica gel material in described two exposure desks.
3. a kind of 3D exposure device according to claim 1 is characterized in that: the anti-membrane in the described exposure desk is the anti-membrane of silica gel of being made by silica gel material, and the anti-membrane in another exposure desk is the anti-membrane of Polyvinylchloride of being made by Polyvinylchloride.
4. according to claim 1 and 2 or 3 described a kind of 3D exposure devices, it is characterized in that: described cover rim and described bottom edge arrange respectively O-ring seal and sealing gasket, described loam cake and described base plate cover, described O-ring seal and described sealing gasket jam-packed are at described loam cake and described bottom edge place, and the surface elasticity of described O-ring seal and described sealing gasket offsets.
5. a kind of 3D exposure device according to claim 4, it is characterized in that: described O-ring seal is the soft rubber O-ring seal, described sealing gasket is the soft rubber sealing gasket.
6. it is characterized in that: be connected through the hinge between described loam cake and the described base plate according to claim 1 and 2 or 3 described a kind of 3D exposure devices.
7. according to claim 1 and 2 or 3 described a kind of 3D exposure devices, it is characterized in that: described cover rim is provided with stainless steel frame.
8. according to claim 1 and 2 or 3 described a kind of 3D exposure devices, it is characterized in that: described exposer is the cold ultraviolet light lamp.
9. a kind of 3D exposure device according to claim 8, it is characterized in that: described cold ultraviolet light lamp is arranged in the light gathering reflective housing, and described cold ultraviolet light lamp top arranges exhaust fan.
10. it is characterized in that: between described exposure desk and the described housing safety light illuminating lamp is set all according to claim 1 and 2 or 3 described a kind of 3D exposure devices.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220487396 CN202794850U (en) | 2012-09-21 | 2012-09-21 | 3-dimensional (3D) exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220487396 CN202794850U (en) | 2012-09-21 | 2012-09-21 | 3-dimensional (3D) exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202794850U true CN202794850U (en) | 2013-03-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220487396 Expired - Fee Related CN202794850U (en) | 2012-09-21 | 2012-09-21 | 3-dimensional (3D) exposure device |
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| CN (1) | CN202794850U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106353975A (en) * | 2016-11-25 | 2017-01-25 | 天津津芯微电子科技有限公司 | LDI (Laser Direct Image) exposure device and LDI exposure system |
-
2012
- 2012-09-21 CN CN 201220487396 patent/CN202794850U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106353975A (en) * | 2016-11-25 | 2017-01-25 | 天津津芯微电子科技有限公司 | LDI (Laser Direct Image) exposure device and LDI exposure system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130313 Termination date: 20160921 |
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| CF01 | Termination of patent right due to non-payment of annual fee |