CN203376702U - Touch panel - Google Patents
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- CN203376702U CN203376702U CN201320316887.6U CN201320316887U CN203376702U CN 203376702 U CN203376702 U CN 203376702U CN 201320316887 U CN201320316887 U CN 201320316887U CN 203376702 U CN203376702 U CN 203376702U
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Abstract
The utility model provides a touch panel which is provided with a non-visible area and a visible area corresponding to the non-visible area in a defining mode. The touch panel is characterized by comprising a shielding layer, a sensing electrode layer, a first protection layer and a second protection layer. The shielding layer is arranged on one side of a substrate, and the non-visible area is arranged on the arrangement area of the shielding layer in a defining mode. The sensing electrode layer and the shielding layer are located on the same side of the substrate, and the sensing electrode layer is at least partially arranged on the surface of the substrate and at least located on the visible area. The first protection layer is at least located on the visible area and at least covers the sensing electrode layer. The second protection layer is located on the non-visible are and at least covers the shielding layer. Through improved frameworks of the protection layers matched with processing adjustment, the problem that coating is not even and then chromatic aberration happens because the protection layers sense the level difference between the sensing electrode layer and the shielding layer can not occur.
Description
Technical field
The utility model is about a kind of touch technology, refers to especially a kind of contact panel.
Background technology
Evolution along with touch technology (Touch control), contact panel (touch panel) has been widely used in various consumer electronics devices, such as portable electric products such as intelligent mobile phone, flat computer, camera, e-book, MP3 players, or be applied to the display screen of operational control unit.Contact panel is except facilitating the user operates, and certainly also comprises slim, light and has advantages such as competitive power on price.
Contact panel generally includes substrate, sensing electrode layer, shielding layer and protective seam, and on framework, protective seam is formed on sensing electrode layer and shielding layer, in order to protect the sensing electrode layer, avoids the damage of physical property or chemistry.
Yet; because there is the to a certain degree drop of (about decades of times to hundred times) in the thickness between shielding layer and sensing electrode layer; therefore in the manufacturing process of protective seam, easily because of this thickness drop, cause crawling, allow protective seam generation aberration problem and affect the light transmission of contact panel.
The utility model content
This creation is by the framework improvement collocation processing procedure adjustment of protective seam; design two-part protective seam and carry out corresponding sensing electrode layer and the shielding layer that has the thickness drop respectively; and allow the two-part protective seam be independent formation, can not produce because of the drop between sensing electrode layer and shielding layer the crawling situation.
One embodiment of this creation provides a kind of contact panel, be defined a non-visible area and a pair of visible area that should non-visible area, it is characterized in that, this contact panel comprises: a shielding layer, be arranged at a side of a substrate, wherein the setting area of this shielding layer defines this non-visible area; One sensing electrode layer, be positioned at the homonymy of this substrate with this shielding layer, and wherein this at least part of sensing electrode layer is arranged at the surface of this substrate and at least is positioned at this visible area; One first protective seam, at least be positioned at this visible area, and at least cover this sensing electrode layer; And one second protective seam, be positioned at this non-visible area, and at least cover this shielding layer.
Another embodiment of this creation provides a kind of manufacture method of contact panel, wherein this contact panel is defined a non-visible area and a pair of visible area that should non-visible area, it is characterized in that, the step of the manufacture method of this contact panel comprises: form a shielding layer in a side of a substrate, wherein the formation zone definitions of this shielding layer goes out this non-visible area; Formation one and this shielding layer are positioned at the sensing electrode layer of this substrate homonymy, and wherein this at least part of sensing electrode layer is formed at the surface of this substrate and at least is positioned at this visible area; To being less than formation one first protective seam in this visible area, at least be covered on this sensing electrode layer; And formation one second protective seam at least is covered on this shielding layer in this non-visible area.
By this, this creation can effectively be avoided producing aberration and be reduced the factor that affects the contact panel light transmission.In addition, this creation is divided into two-part protective seam and more can further adopts respectively different materials to design, and the first protective seam that allows correspondence be positioned at the sensing electrode layer, except defencive function is provided, has more the effect of compensation of refractive index and coupling; Corresponding the second protective seam that is positioned at shielding layer, except defencive function is provided, more can promote the adhesion with shielding layer effectively.Generally speaking more can improve the quality of contact panel.
Technology, method and the effect in order further to understand this creation, by reaching set purpose, taked, refer to the following detailed description about this creation, graphic, believe purpose, feature and the characteristics of this creation, when being goed deep into thus and concrete understanding, yet appended graphic and annex only provide with reference to and explanation use, not be used for this is created in addition limitr.
For the feature of this creation can be become apparent, special embodiment below, and coordinate appended graphicly, be described in detail below:
The accompanying drawing explanation
Fig. 1 shows that this creates the diagrammatic cross-section of the contact panel of the first embodiment.
Fig. 2 shows the partial enlarged drawing of the first protective seam in this creation Fig. 1.
Fig. 3 shows that this creates the diagrammatic cross-section of the contact panel of the second embodiment.
Fig. 4 shows the diagrammatic cross-section of the contact panel of this creation the 3rd embodiment.
Fig. 5 shows the manufacture method process flow diagram of the contact panel of this creation embodiment.
Embodiment
Alleged orientation in this instructions " upper and " under, be only for meaning relative position relationship, for this instructions graphic, the top of contact panel is away from the user, below approaches the user.In addition, the contact panel of the present embodiment is defined the visible area of a non-visible area and a corresponding non-visible area.In general, non-visible area can be at least one side of corresponding design at visible area, and the non-visible area of each embodiment in this instructions is all for example with the aspect that is centered around the visible area periphery, to describe.
Please refer to Fig. 1, Fig. 1 shows that this creates the diagrammatic cross-section of the contact panel of the first embodiment.The contact panel 100 of the present embodiment comprises substrate 110, shielding layer 130, sensing electrode layer 120, the first protective seam 151 and the second protective seam 152.Wherein, substrate 110 can adopt such as transparent materials such as glass, and substrate 110 has relative lower surface 110a and upper surface 110b.Lower surface 110a, as the surface of accepting user's touching, is used for forming all parts of contact panel 100 on upper surface 110b, detailed aspects will be illustrated in subsequent content.In addition, in the present embodiment, the lower surface 110a of substrate 110 can be such as first through surface treatments such as strengthening, scratch resistant, anti-dizzy, antibiotic and/or antireflections, so that substrate 110 has the function of carrying and protection concurrently.
Sensing electrode layer 120 is sides of being positioned at the same upper surface 110b of substrate the same as shielding layer 130, and have at least the sensing electrode layer 120 of part be arranged at the upper surface 110b of substrate 110 and at least be positioned at visible area 100A, allow sensing electrode layer 120 that the function of user's touch sensing at least is provided in the visible area 100A of contact panel 100.More specifically, sensing electrode layer 120 comprises a plurality of arrangements the first electrode 121 in column, a plurality of the second electrode (not shown) that are arranged in rows, and the plural connecting portion 124 that connects the second adjacent electrode (not shown).Plural number cross-over connection section 123 can be in order to be connected to same listing and the first adjacent electrode 121.A plurality of insulation divisions 122 can be arranged between connecting portion 124 and cross-over connection section 123, in order to connecting portion 124 and the cross-over connection section 123 of being electrically insulated.By this, whole installation can be divided into etching region 120A and two parts of non-etching region 120B by the electrode pattern of sensing electrode layer 120.
The first protective seam 151 at least is positioned at visible area 100A in design, and is covered in the sensing electrode layer 120 that is positioned at equally visible area 100A, uses the damage that protection sensing electrode layer 120 avoids being subject to physical property or chemistry.Certainly; because 120 differentiation of sensing electrode layer have etching region 120A and non-etching region 120B; therefore the first protective seam 151, except the non-etching region 120B that is covered in sensing electrode layer 120, more can be covered in the part substrate 110 come out because of etching region 120A simultaneously.The second protective seam 152 is to be positioned at non-visible area 100B in design; and be covered on shielding layer 130; because the shielding layer 130 that is used for defining non-visible area 100B in the present embodiment is to arrange around visible area 100A, so second protective seam 152 of the present embodiment will present the structure aspect of frame type.
From the above; the present embodiment is by the independent design of the first protective seam 151 and the second protective seam 152; allow in the whole framework of contact panel 100, belong to back segment and make the protective seam formed and can not be subject to shielding layer 130 (thickness is 1.5 μ m to 20 μ m approximately) and sensing electrode layer 120 (thickness approximately 250
to 300
) between the thickness drop impact and produce the situation of crawling on processing procedure, effectively avoid producing because of crawling the problem of aberration, reduce the factor that affect the contact panel light transmission, and then the production yield of lifting contact panel 100.
Further illustrate, the present embodiment is the process sequence that shielding layer 130 forms sensing electrode layer 120 more first to be set illustrate, and sensing electrode layer 120 is further to lie along non-visible area 100B and the upper surface that is formed at shielding layer 130.In one embodiment, sensing electrode layer 120 can be that whole directly making extends non-visible area 100B as shown in Figure 1.In another embodiment, the part that sensing electrode layer 120 extends non-visible area 100B can be also a connecting portion independently, and forms in different fabrication steps, at this, not by this creation, is limited.
The contact panel 100 of the present embodiment more comprises signal transport layer 160, is arranged between shielding layer 130 and the second protective seam 152, is used for being electrically connected sensing electrode layer 120, transmits the signal between sensing electrode layer 120 and a peripheral control unit (not shown).Thus, the present embodiment designs the effect of the second protective seam 152 at non-visible area 100B, can be covered in signal transport layer 160 simultaneously, is used for guard signal transport layer 160 to avoid being subject to the damage of physical property or chemistry.Lift an example, suppose that signal transport layer 160 adopts the metal laminated structure of molybdenum aluminium molybdenum, because there is the existence of aluminium lamination centre, the activity of aluminium is strong, easily oxidized and form the nonconducting aluminum oxide film of one deck in air, therefore the second protective seam 152 can be used for signal transport layer 160 and air are completely cut off, anti-oxidation; Also can reduce in addition molybdenum layer simultaneously and be exposed the chance of aluminium lamination by scratch.
It is worth mentioning that, first protective seam 151 of the present embodiment more can be designed to a compensation of refractive index layer, and the second protective seam 152 can be designed to an adhesion layer.Thus, allow correspondence be covered in the first protective seam 151 of sensing electrode layer 120 except defencive function is provided, have more the effect of compensation of refractive index and coupling, prevent that in sensing electrode layer 120, the etching line between etching region 120A and non-etching region 120B is visual; Corresponding the second protective seam 152 that is covered in shielding layer 130 and signal transport layer 160 except defencive function is provided, more can effectively promote and shielding layer between adhesion.
About the compensation of refractive index layer, in one embodiment, the compensation of refractive index layer can adopt metal oxide, nonmetal oxide, silica-base material or its potpourri, and on framework, can be the design of single layer structure or lamination layer structure.The refractive index of supposing the compensation of refractive index layer of the present embodiment is n1, and the refractive index of sensing electrode layer is n2, and the design of the present embodiment is to allow the refractive index n of compensation of refractive index layer 1 be more than or equal to the refractive index n 2 of induction electrode layer.Use and reduce etching region 120A and the difference of non-etching region 120B to ray refractive index, thereby effectively avoid the problems such as the image qualities that cause because of the refractive index difference are not good, make contact panel 100 there is good exterior quality.
Please refer to Fig. 2, show the partial enlarged drawing of the first protective seam 151 in Fig. 1.Specifically, the present embodiment the first protective seam 151 comprises first refractive rate layer 1511 and the second index layer 1512, allows the first protective seam 151 be the aspect that is lamination layer structure when being designed to the compensation of refractive index layer.Wherein, first refractive rate layer 1511 is covered on sensing electrode layer 120, and the second index layer 1512 is located on first refractive rate layer 1511.In addition, for refractive index n 1 design of the compensation of refractive index layer of lamination layer structure, please with further reference to following explanation:
The refractive index of supposing first refractive rate layer 1511 is n3; The refractive index of the second index layer 1512 is n4.Wherein:
n3=sin?a/sin?b；
n4=sin?b/sin?c；
n3*n4=(sin?a/sin?b)*(sin?b/sin?c)=sin?a/sin?c；
Therefore meet relational expression between the refractive index n 1 of compensation of refractive index layer and n3 and n4:
n3=n1*n2。
The present embodiment is by the stacked arrangement of first refractive rate layer 1511 and the second index layer 1512, and the refractive index that reaches the compensation of refractive index layer of lamination layer structure is more than or equal to the refractive index that is arranged at the sensing electrode layer 120 in visible area 100A.
In one embodiment, the refractive index n 3 of first refractive rate layer 1511 is less than the refractive index of sensing electrode layer 120, and the refractive index n 4 of the second index layer 1512 is greater than the refractive index of sensing electrode layer 120.Particularly, if the first electrode 121 of sensing electrode layer 120 and the second conductive pattern (not shown) layer are all the tin indium oxide patterned layer, refractive index is 1.86, first refractive rate layer 1511 can be the rete that a refractive index is less than 1.86, for example: silicon dioxide layer, refractive index is 1.46, and thickness is 30nm to 50nm.The second index layer 1512 can be the rete that refractive index is greater than 1.86, for example: the niobium pentaoxide layer, refractive index is 2.35, thickness is to 5nm to 10nm.In another embodiment, first refractive rate layer 1511 is the niobium pentaoxide layer, and the second index layer 1512 is silicon dioxide layer.In other words, the compensation of refractive index layer of lamination layer structure can be for example in response to the refractive index of the sensing electrode layer 120 of actual design and be composited by a silicon dioxide layer and a niobium pentaoxide layer.
About adhesion layer, in one embodiment, adhesion layer is an organic material layer, because adhesion layer has adopted the organic material identical or similar with shielding layer 130 character, therefore adhesion layer can and light shield layer 130 between produce reasonable adhesion, the adhesion layer consisted of organic material is under adhesive tape hundred lattice tests (ASTM D3359-93), and adhesion layer at least is greater than 4B with respect to the adhesion of shielding layer 130, and the disengaging rate of appearance is not more than 5%.By this, allow be arranged at signal transport layer 160 between adhesion layer and shielding layer 130 and can obtain and adequately protect and isolated with air, reduce oxidized chance.
In one embodiment, this organic material is can be polyimide material, ink material, alcohols material or its potpourri.Wherein the constituent of polyimide layer comprises silane and acryl.The constituent of ink material comprises pigment, resin and auxiliary agent, and wherein pigment can be titanium white or carbon dust, and auxiliary agent can be hardening agent or thickening agent.The alcohols material can be ethylene glycol, propyleneglycoles, ethanol, isopropyl alcohol or its potpourri.Can improve sticky limit by the content of adjusting each component in actual processing procedure, thereby obtain and the better adhesion effect of shielding layer 130.
Next, please refer to Fig. 3, show that this creates the diagrammatic cross-section of the contact panel of the second embodiment.As shown in Figure 3; the framework of the contact panel of the present embodiment is roughly identical with the first embodiment shown in Fig. 1; discrepancy is, the first protective seam 151 of the contact panel 100 shown in the present embodiment is further to lie along non-visible area 100B, and is formed at the surface of the second protective seam 152.By this, can further avoid coming off of the second protective seam 152.First protective seam 151 of the present embodiment is that holomorphism is formed on the surface of the second protective seam 152.Certainly, according to the actual design demand, the first protective seam 151 also can only be formed at the surface of the second protective seam 152 of part, at this, not by this creation, is limited.
Referring again to Fig. 4, show the diagrammatic cross-section of the contact panel of this creation the 3rd embodiment.As shown in Figure 4, the framework of the contact panel of the present embodiment is roughly identical with the first embodiment shown in Fig. 1, and discrepancy is, the sensing electrode layer 120 of the contact panel 100 shown in the present embodiment and the laminated layer sequence relation between shielding layer 130.The present embodiment is the process sequence that sensing electrode layer 120 forms shielding layer 130 more first to be set design.In other words, the sensing electrode layer 120 of the present embodiment is formed in the lower surface of shielding layer 160 at non-visible area 100B.Yet, architecture design based on the present embodiment, in order to allow the sensing electrode layer 120 first arranged reach electric connection with signal transport layer 160, the shielding layer 130 of the present embodiment further offers a perforated portion, and fill the electric connection layer 140 formed by conductive materials at perforated portion, allow sensing electrode layer 120 and signal transport layer 160 reach electric connection by the electric connection layer 140 in perforated portion.
Please refer to Fig. 5, show the manufacture method of the contact panel of this creation embodiment.At first, in step S1, provide a substrate.Then, in step S2, form a shielding layer in a side of substrate, wherein the formation zone of shielding layer is used for defining the non-visible area of contact panel.
In step S3, form one and be positioned at the sensing electrode layer of substrate homonymy with shielding layer.Wherein, in the present embodiment, except the sensing electrode layer that has part at least is be formed at the surface of substrate and at least be positioned at the visible area of contact panel, the sensing electrode layer further lies along non-visible area especially, and is at non-visible area the upper surface that is positioned at the shielding layer that abovementioned steps 2 formed.
Certainly, in another embodiment, the order of abovementioned steps 2 and step 3 can be exchanged, and namely first forms the sensing electrode layer, forms afterwards shielding layer again.By this, the part that allows the sensing electrode layer extend in non-visible area is the lower surface that is positioned at shielding layer.
In step S4, form a signal transport layer on shielding layer, in order to be electrically connected the sensing electrode layer.
In step S5, at least in visible area, form one first protective seam and be covered on the sensing electrode layer.
In step S6, form one second protective seam and be covered in shielding layer and signal transport layer in non-visible area.Be accomplished the making of the contact panel of the present embodiment by the execution of above-mentioned steps.
In another embodiment, the order of abovementioned steps 5 and step 6 also can be exchanged, and namely first is formed with the second protective seam, forms afterwards the first protective seam again.Thus, the first protective seam just formed afterwards is not only and is positioned at visible area, more can design to lie along non-visible area and the surface that is formed on the second protective seam, further prevents the disengaging of the second protective seam.
Finally remark additionally, when preparing insulation division, can sequentially prepare with coating, micro-shadow and etch process by aforementioned each embodiment.In addition, insulation division is such as being epoxy resin layer, polyimide layer or methyl olefin(e) acid methyl esters layer etc.In addition, when preparation the first electrode, the second electrode or signal transport layer, also can prepare by processing procedures such as deposition, micro-shadow and etchings by aforementioned each embodiment.
Aforementioned mentioned deposition manufacture process is for example physical vapor Shen long-pending (physical vapor deposition, PVD) or chemical gaseous phase Shen long-pending (chemical vapor deposition).Physical vapor Shen is long-pending can comprise for example evaporation (evaporation), sputter (sputtering), and the long-pending technology in chemical gaseous phase Shen can comprise for example Low Pressure Chemical Vapor Deposition (low pressure chemical vapor deposition, LPCVD), Metalorganic chemical vapor deposition method (metal-organic chemical vapor deposition, MOCVD), Plasma Enhance Chemical Vapor Deposition (plasma-enhanced chemical vapor deposition, PECVD) or light irradiation type chemical vapour deposition technique (photo chemical vapor deposition, PHOTO CVD)).Aforesaid etch process can adopt chemical etching or laser etching.
Moreover the first electrode in aforementioned each embodiment, the second electrode can be for example to adopt transparent conductive material.Transparent conductive material can comprise tin indium oxide (indium tin oxide, ITO), indium zinc oxide (indium zinc oxide, IZO), cadmium tin (cadmium tin oxide, CTO), aluminum zinc oxide (aluminum zinc oxide, AZO), indium oxide zinc-tin (indium tin zinc oxide, ITZO), zinc paste (zinc oxide), cadmium oxide (cadmium oxide), hafnia (hafnium oxide, HfO), indium oxide gallium zinc (indium gallium zinc oxide, InGaZnO), indium oxide gallium zinc-magnesium (indium gallium zinc magnesium oxide, InGaZnMgO), indium oxide gallium magnesium (indium gallium magnesium oxide, InGaMgO) or indium oxide gallium aluminium (indium gallium aluminum oxide, InGaAlO) etc.In addition, the material of signal transport layer 160 can be selected gold, silver, copper, nickel, aluminium, chromium or above-mentioned combination in any (as molybdenum aluminium molybdenum rhythmo structure, wherein aluminium lamination is between two molybdenum layers).
In sum, this creation can effectively be avoided producing aberration and be reduced the factor that affects the contact panel light transmission.In addition, this creation is divided into two-part protective seam and more can further adopts respectively different materials to design, and the first protective seam that allows correspondence be positioned at the sensing electrode layer, except defencive function is provided, has more the effect of compensation of refractive index and coupling; Corresponding the second protective seam that is positioned at shielding layer, except defencive function is provided, more can promote the adhesion with shielding layer effectively.Generally speaking more can improve the quality of contact panel.
The foregoing is only the embodiment of this creation, it is not in order to limit the scope of patent protection of this creation.Anyly have the knack of alike skill person, in the spirit that does not break away from this creation and scope, the change of doing and the equivalence of retouching are replaced, and are still in the scope of patent protection of this creation.
Claims (13)
1. a contact panel, be defined a non-visible area and a pair of visible area that should non-visible area, it is characterized in that, this contact panel comprises:
One shielding layer, be arranged at a side of a substrate, and wherein the setting area of this shielding layer defines this non-visible area;
One sensing electrode layer, be positioned at the homonymy of this substrate with this shielding layer, and wherein this at least part of sensing electrode layer is arranged at the surface of this substrate and at least is positioned at this visible area;
One first protective seam, at least be positioned at this visible area, and at least cover this sensing electrode layer; And
One second protective seam, be positioned at this non-visible area, and at least cover this shielding layer.
2. contact panel according to claim 1, is characterized in that, this first protective seam is a compensation of refractive index layer, and this second protective seam is an adhesion layer.
3. contact panel according to claim 2, is characterized in that, this compensation of refractive index layer is a kind of in metal oxide, nonmetal oxide, silica-base material.
4. contact panel according to claim 2, is characterized in that, this compensation of refractive index layer is a lamination layer structure.
5. contact panel according to claim 4, is characterized in that, this compensation of refractive index layer is composited by a silicon dioxide layer and a niobium pentaoxide layer.
6. contact panel according to claim 5, is characterized in that, the thickness of this silicon dioxide layer is 30nm to 50nm, and the thickness of this niobium pentaoxide layer is 5nm to 10nm.
7. contact panel according to claim 2, is characterized in that, the refractive index of this compensation of refractive index layer is more than or equal to the refractive index of this sensing electrode layer.
8. contact panel according to claim 2, is characterized in that, this adhesion layer is organic material.
9. contact panel according to claim 8, is characterized in that, this organic material is a kind of in polyimide material, ink material, alcohols material.
10. contact panel according to claim 1, is characterized in that, this shielding layer is a polyimide layer or an ink layer.
11. contact panel according to claim 1, is characterized in that, this first protective seam further lies along this non-visible area, and is formed at the surface of this second protective seam.
12. contact panel according to claim 1, is characterized in that, this sensing electrode layer further lies along this non-visible area, and is formed at upper surface or the lower surface of this shielding layer.
13. contact panel according to claim 1, is characterized in that, also comprises a signal transport layer, is arranged between this shielding layer and this second protective seam, and is electrically connected this sensing electrode layer.
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| CN201320316887.6U CN203376702U (en) | 2013-06-04 | 2013-06-04 | Touch panel |
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| CN201320316887.6U CN203376702U (en) | 2013-06-04 | 2013-06-04 | Touch panel |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014194776A1 (en) * | 2013-06-04 | 2014-12-11 | 宸鸿科技(厦门)有限公司 | Touch control panel and manufacturing method therefor |
| CN104699342A (en) * | 2015-03-27 | 2015-06-10 | 深圳市深越光电技术有限公司 | Novel G1-cell capacitive touch screen module and manufacturing method thereof |
| CN104699343A (en) * | 2015-03-27 | 2015-06-10 | 深圳市深越光电技术有限公司 | G1-cell capacitive touch panel module and manufacturing method thereof |
| CN104714709A (en) * | 2015-03-27 | 2015-06-17 | 深圳市深越光电技术有限公司 | Novel GX-cell capacitive touch screen module and manufacturing method thereof |
| CN104714710A (en) * | 2015-03-27 | 2015-06-17 | 深圳市深越光电技术有限公司 | GX-cell capacitive touch screen module and manufacturing method thereof |
| CN105404435A (en) * | 2014-06-12 | 2016-03-16 | 宸鸿科技(厦门)有限公司 | SNW conducting laminated structure and capacitive touch panel |
| CN105807968A (en) * | 2014-12-29 | 2016-07-27 | 南昌欧菲光学技术有限公司 | Touch panel with black bezel, cover plate of touch panel and manufacturing method for cover plate |
| TWI698691B (en) * | 2018-10-05 | 2020-07-11 | 凌巨科技股份有限公司 | Display device and method for adjusting optical structure of display device |
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2013
- 2013-06-04 CN CN201320316887.6U patent/CN203376702U/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014194776A1 (en) * | 2013-06-04 | 2014-12-11 | 宸鸿科技(厦门)有限公司 | Touch control panel and manufacturing method therefor |
| CN104216547A (en) * | 2013-06-04 | 2014-12-17 | 宸鸿科技(厦门)有限公司 | Touch panel and manufacturing method thereof |
| CN104216547B (en) * | 2013-06-04 | 2017-12-01 | 宸鸿科技(厦门)有限公司 | A kind of contact panel and its manufacture method |
| CN105404435A (en) * | 2014-06-12 | 2016-03-16 | 宸鸿科技(厦门)有限公司 | SNW conducting laminated structure and capacitive touch panel |
| CN105807968A (en) * | 2014-12-29 | 2016-07-27 | 南昌欧菲光学技术有限公司 | Touch panel with black bezel, cover plate of touch panel and manufacturing method for cover plate |
| CN104699342A (en) * | 2015-03-27 | 2015-06-10 | 深圳市深越光电技术有限公司 | Novel G1-cell capacitive touch screen module and manufacturing method thereof |
| CN104699343A (en) * | 2015-03-27 | 2015-06-10 | 深圳市深越光电技术有限公司 | G1-cell capacitive touch panel module and manufacturing method thereof |
| CN104714709A (en) * | 2015-03-27 | 2015-06-17 | 深圳市深越光电技术有限公司 | Novel GX-cell capacitive touch screen module and manufacturing method thereof |
| CN104714710A (en) * | 2015-03-27 | 2015-06-17 | 深圳市深越光电技术有限公司 | GX-cell capacitive touch screen module and manufacturing method thereof |
| TWI698691B (en) * | 2018-10-05 | 2020-07-11 | 凌巨科技股份有限公司 | Display device and method for adjusting optical structure of display device |
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