CN203281553U - Washing box with flat plate ultraviolet radiation light source capable of field emission array excitation - Google Patents
Washing box with flat plate ultraviolet radiation light source capable of field emission array excitation Download PDFInfo
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- CN203281553U CN203281553U CN2013201391287U CN201320139128U CN203281553U CN 203281553 U CN203281553 U CN 203281553U CN 2013201391287 U CN2013201391287 U CN 2013201391287U CN 201320139128 U CN201320139128 U CN 201320139128U CN 203281553 U CN203281553 U CN 203281553U
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Abstract
The utility model relates to the field of ultraviolet ultraprecise washing, in particular to a washing box with a flat plate ultraviolet radiation light source capable of field emission array excitation. The washing box comprises an ultraviolet washing box body which comprises a box wall. The box wall defines a washing cavity. A washing execution system is arranged in the washing cavity and is connected with the ultraviolet light source and a control system. The ultraviolet light source is the flat plate ultraviolet radiation light source capable of field emission array excitation. The light source is placed in the washing cavity. The light source comprises an anode plate. An ultraviolet fluorescent powder layer is arranged on the anode plate. The light source further comprises a field emission cathode array which is toward the anode plate. Due to the fact that the flat plate ultraviolet radiation light source capable of field emission array excitation uses the field emission cathode array, the whole light source is in a plate shape and can be directly used as a box cover, the volume of the washing box is increased, the plate-shaped light source evenly irradiates the washing cavity, blocking caused by the plate-shaped light source can be lowered, and washing effect is improved.
Description
Technical field
The utility model relates to the Precision Machining field, is specifically related to ultraviolet excess precision cleaning field.
Background technology
Ultraviolet wavelength is shorter than visible light, but the electromagnetic radiation longer than X ray.Ultraviolet light range of wavelength in electromagnetic spectrum is 10-400nm.Start from the Shortwave Limit of visible light in this scope, and with the wavelength overlaid of long wave X ray.Ultraviolet light is divided into A ray, beta radiation and C ray (being called for short UVA, UVB and UVC), and wave-length coverage is respectively 400-315nm, 315-280nm, 280-190nm.
In recent years, progress due to high-power ultra high power low pressure UV discharge tube exploitation, and along with the ultra micro refinement of the products such as microelectronics, in the manufacture process of the products such as microelectronics, ultraprecise device, by the ozone of short wavelength ultraviolet and generation thereof, the surface of its product is carried out that ultraprecise cleans or then the practical of dry type optical surface treatment technology of property, tack of improving its surface is made progress very soon.Now, need the semiconductor devices, the liquid crystal that improve yield rate to represent that in the manufacturings such as element, optical goods, the dry type optical surface treatment technology of ultraviolet (UV) and O3 ozone and use has become indispensable technological means.As the substitute technology in fluorine Lyons, the optical surface cleaning technique will replace the conventional art of wet type gradually.
Light intensity is weak, the deficiencies such as power consumption is high, failure rate is low but applied ultraviolet source still exists.
The utility model content
The purpose of this utility model is, a kind of cleaning case that adopts the dull and stereotyped uv radiation source that field emission array excites is provided, and solves above technical problem.
The technical problem that the utility model solves can realize by the following technical solutions:
The cleaning case of the dull and stereotyped uv radiation source that the employing field emission array excites, comprise ultraviolet cleaning case main body, described ultraviolet cleaning case main body comprises tank wall, described tank wall surrounds a cleaning chambers, be provided with the cleaning executive system in described cleaning chambers, described cleaning executive system connects a ultraviolet source, and a control system, it is characterized in that:
The dull and stereotyped uv radiation source that described ultraviolet source adopts a field emission array to excite, the dull and stereotyped uv radiation source that described field emission array excites is positioned at described cleaning chambers;
Described light source comprises a positive plate, and described positive plate is provided with a Ultraluminescence bisque;
Described light source also comprises a field emission cathode array, and described field emission cathode array is towards described positive plate.Replace with by the ultraviolet source in the accurate device purging system with traditional the dull and stereotyped uv radiation source that novel field emission array excites, what the dull and stereotyped uv radiation source that excites due to field emission array adopted is field emission cathode array, therefore light source integral body is tabular, can directly as case lid, use, increased the volume of cleaning chambers, and tabular light source uniform irradiation cleaning chambers, can reduce the occlusion issue that tubular light source causes, improve cleaning performance.
The exiting surface of described Ultraluminescence bisque is towards described cleaning chambers.In order to carry out precision cleaning.
Described exiting surface place is provided with an electric adjustable optical mechanism, and described electric adjustable optical mechanism connects described control system.In order to adjust the optical parametrics such as light intensity, focus by control system.
Described ultraviolet cleaning case main body also comprises case lid, described case lid connects described tank wall by a rotating shaft, the dull and stereotyped uv radiation source that described field emission array excites is positioned at described case lid below, the dull and stereotyped uv radiation source that described field emission array excites connects described control system, described control system is provided with a power switch controlling organization, described power switch controlling organization and described rotating shaft interlock.When opening case lid, described power-off, when closing case lid, described power supply allows to open.
As a kind of preferred version, the Ultraluminescence bisque that described Ultraluminescence bisque is conductive doped particulate, the below of the Ultraluminescence bisque of described conductive doped particulate is fixed with an anode quartz glass layer;
The top of described field emission cathode array also is provided with a negative electrode quartz glass layer, and described field emission cathode array is fixed on described negative electrode with on the lower surface of quartz glass layer.
As another kind of preferred version, the top of described Ultraluminescence bisque is fixed with a conductive layer, and the below of described Ultraluminescence bisque is fixed with an anode quartz glass layer;
The top of described field emission cathode array also is provided with a negative electrode quartz glass layer, and described field emission cathode array is fixed on described negative electrode with on the lower surface of quartz glass layer.
Described light source also comprises a glass dust sinter layer, and the top of described glass dust sinter layer connects described field emission cathode array, and the below of described glass dust sinter layer connects described conductive layer or described Ultraluminescence bisque.
For the Convenient switch electron beam or change electron beam intensity, thereby realize the switch of light source or the change of the intensity of light source, also be provided with a grid layer that is formed by grid between described glass dust sinter layer and described field emission cathode array.So just can the switch electronic bundle or change electron beam intensity by adjusting grid potential, and then switch light source or change light source send the intensity of ultraviolet.
The negative electrode of described field emission cathode array preferably is the negative electrode of needle-like.The electron beam that described field emission cathode array produces can be short pulse electron beam or DC electronic bundle.
During this light source normal operation, minus earth, grid connect negative potential-50V～-100V, aluminum membranous layer connects 5kV～10kV positive high voltage, anode high voltage emission needle point negative electrode on the scene place forms highfield, field emission needle point divergent bundle, through the penetration of electrons aluminium film bombardment ultraviolet fluorescence powder that high voltage electric field accelerates, the ultraviolet light that inspires corresponding wave band transmits from quartz glass.Adjusting grid potential can the switch electronic bundle or change electron beam intensity, and then switch light source or change light source and send the intensity of ultraviolet.
Description of drawings
Fig. 1 is a kind of structural representation of the major part of light source of the present utility model.
The specific embodiment
For technological means, creation characteristic that the utility model is realized, reach purpose with effect is easy to understand, below in conjunction with the further elaboration the utility model of concrete diagram.
With reference to Fig. 1, the cleaning case of the dull and stereotyped uv radiation source that the employing field emission array excites, comprise ultraviolet cleaning case main body, ultraviolet cleaning case main body comprises tank wall, and tank wall surrounds a cleaning chambers, is provided with the cleaning executive system in cleaning chambers, clean executive system and connect a ultraviolet source, and a control system, the dull and stereotyped uv radiation source that ultraviolet source adopts a field emission array to excite, the dull and stereotyped uv radiation source that field emission array excites is positioned at cleaning chambers; Light source comprises a positive plate, and positive plate is provided with a Ultraluminescence bisque 6; Light source also comprises a field emission cathode array 2, and field emission cathode array 2 is towards positive plate.
Replace with by the ultraviolet source in the accurate device purging system with traditional the dull and stereotyped uv radiation source that novel field emission array excites, what the dull and stereotyped uv radiation source that excites due to field emission array adopted is field emission cathode array 2, therefore light source integral body is tabular, can directly as case lid, use, increased the volume of cleaning chambers, and tabular light source uniform irradiation cleaning chambers, can reduce the occlusion issue that tubular light source causes, improve cleaning performance.
The exiting surface of Ultraluminescence bisque 6 is towards cleaning chambers.In order to carry out precision cleaning.The exiting surface place is provided with an electric adjustable optical mechanism, electric adjustable optical mechanism connection control system.In order to adjust the optical parametrics such as light intensity, focus by control system.
Ultraviolet cleaning case main body also comprises case lid, case lid connects tank wall by a rotating shaft, the dull and stereotyped uv radiation source that field emission array excites is positioned at the case lid below, the dull and stereotyped uv radiation source that field emission array excites connects a control system, control system is provided with a power switch controlling organization, power switch controlling organization and rotating shaft interlock.When opening case lid, power-off, when closing case lid, power supply allows to open.
Light source also comprises a glass dust sinter layer, and the top of glass dust sinter layer connects field emission cathode array 2, the below connecting conductive layer of glass dust sinter layer or the Ultraluminescence bisque of conductive doped particulate.During production, conductive layer and field emission cathode array 2 interval 1～2mm, by vacuumizing after the glass dust sintering on exhaust station.
For the Convenient switch electron beam or change electron beam intensity, thereby realize the switch of light source or the change of the intensity of light source, also be provided with a grid layer that is formed by grid between glass dust sinter layer and field emission cathode array 2.So just can the switch electronic bundle or change electron beam intensity by adjusting grid potential, and then switch light source or change light source send the intensity of ultraviolet.
The top of field emission cathode array 2 also is provided with negative electrode quartz glass layer 1, and field emission cathode array 2 is fixed on negative electrode with on the lower surface of quartz glass layer 1.Negative electrode forms a minus plate with quartz glass layer 1, field emission cathode array 2, grid layer.Than the ultraviolet source that traditional thermal electron rifle excites, the utility model profile is frivolous, and being easy to should be in different purposes, and an emitting structural design simultaneously is easy to large-scale production., if without transferring the ultraviolet ray intensity demand, can omit grid to simplify production and processing.
In Fig. 1, light source is followed successively by negative electrode quartz glass layer 1, field emission cathode array 2, grid layer 3, glass dust sinter layer 4, aluminum membranous layer 5, Ultraluminescence bisque 6, anode quartz glass layer 7 from top to bottom.
The negative electrode of field emission cathode array 2 preferably is the negative electrode of needle-like.The electron beam that field emission cathode array 2 produces can be short pulse electron beam or DC electronic bundle.
During this light source normal operation, minus earth, grid connect negative potential-50V～-100V, aluminum membranous layer connects 5kV～10kV positive high voltage, anode high voltage emission needle point negative electrode on the scene place forms highfield, field emission needle point divergent bundle, through the penetration of electrons aluminium film bombardment ultraviolet fluorescence powder that high voltage electric field accelerates, the ultraviolet light that inspires corresponding wave band transmits from quartz glass.Adjusting grid potential can the switch electronic bundle or change electron beam intensity, and then switch light source or change light source and send the intensity of ultraviolet.
Above demonstration and described basic principle of the present utility model and principal character and advantage of the present utility model.The technical staff of the industry should understand; the utility model is not restricted to the described embodiments; that describes in above-described embodiment and specification just illustrates principle of the present utility model; under the prerequisite that does not break away from the utility model spirit and scope; the utility model also has various changes and modifications, and these changes and improvements all fall in claimed the utility model scope.The claimed scope of the utility model is defined by appending claims and equivalent thereof.
Claims (10)
1. adopt the cleaning case of the dull and stereotyped uv radiation source that field emission array excites, comprise ultraviolet cleaning case main body, described ultraviolet cleaning case main body comprises tank wall, described tank wall surrounds a cleaning chambers, be provided with the cleaning executive system in described cleaning chambers, described cleaning executive system connects a ultraviolet source, and a control system, it is characterized in that:
The dull and stereotyped uv radiation source that described ultraviolet source adopts a field emission array to excite, the dull and stereotyped uv radiation source that described field emission array excites is positioned at described cleaning chambers;
Described light source comprises a positive plate, and described positive plate is provided with a Ultraluminescence bisque;
Described light source also comprises a field emission cathode array, and described field emission cathode array is towards described positive plate.
2. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 1, it is characterized in that: the exiting surface of described Ultraluminescence bisque is towards described cleaning chambers.
3. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 2, it is characterized in that: described exiting surface place is provided with an electric adjustable optical mechanism, and described electric adjustable optical mechanism connects described control system.
4. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 1, it is characterized in that: described ultraviolet cleaning case main body also comprises case lid, described case lid connects described tank wall by a rotating shaft, the dull and stereotyped uv radiation source that described field emission array excites is positioned at described case lid below, the dull and stereotyped uv radiation source that described field emission array excites connects described control system, described control system is provided with a power switch controlling organization, described power switch controlling organization and described rotating shaft interlock.
5. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 1, it is characterized in that: the below of described Ultraluminescence bisque is fixed with an anode quartz glass layer;
The top of described field emission cathode array also is provided with a negative electrode quartz glass layer, and described field emission cathode array is fixed on described negative electrode with on the lower surface of quartz glass layer.
6. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 1, it is characterized in that: the top of described Ultraluminescence bisque is fixed with a conductive layer, and the below of described Ultraluminescence bisque is fixed with an anode quartz glass layer;
The top of described field emission cathode array also is provided with a negative electrode quartz glass layer, and described field emission cathode array is fixed on described negative electrode with on the lower surface of quartz glass layer.
7. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 6, it is characterized in that: described light source also comprises a glass dust sinter layer, the top of described glass dust sinter layer connects described field emission cathode array, and the below of described glass dust sinter layer connects described conductive layer or described Ultraluminescence bisque.
8. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 7 is characterized in that: also be provided with a grid layer that consists of grid between described glass dust sinter layer and described field emission cathode array.
9. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 8, it is characterized in that: the negative electrode of described field emission cathode array is the negative electrode that is needle-like.
10. the cleaning case of the dull and stereotyped uv radiation source that excites of employing field emission array according to claim 8, it is characterized in that: the electron beam that described field emission cathode array produces is short pulse electron beam or DC electronic bundle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013201391287U CN203281553U (en) | 2013-03-25 | 2013-03-25 | Washing box with flat plate ultraviolet radiation light source capable of field emission array excitation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013201391287U CN203281553U (en) | 2013-03-25 | 2013-03-25 | Washing box with flat plate ultraviolet radiation light source capable of field emission array excitation |
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| CN203281553U true CN203281553U (en) | 2013-11-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2013201391287U Expired - Fee Related CN203281553U (en) | 2013-03-25 | 2013-03-25 | Washing box with flat plate ultraviolet radiation light source capable of field emission array excitation |
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| Country | Link |
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| CN (1) | CN203281553U (en) |
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2013
- 2013-03-25 CN CN2013201391287U patent/CN203281553U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131113 Termination date: 20160325 |