CN203265197U - Self-cleaning cavity - Google Patents
Self-cleaning cavity Download PDFInfo
- Publication number
- CN203265197U CN203265197U CN 201320150997 CN201320150997U CN203265197U CN 203265197 U CN203265197 U CN 203265197U CN 201320150997 CN201320150997 CN 201320150997 CN 201320150997 U CN201320150997 U CN 201320150997U CN 203265197 U CN203265197 U CN 203265197U
- Authority
- CN
- China
- Prior art keywords
- cleaning
- cavity
- housing
- self
- water spray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model relates to the field of silicon wafer cleaning, in particular to a self-cleaning cavity. The cavity comprises a housing, upper and lower rows of water spray nozzles and liquid outlets, wherein the water spray nozzles are mounted outside the housing; the liquid outlets are formed at the bottom of the housing; the upper row of water spray nozzles are over against the lower row of water spray nozzles face to face; one end of a liquid inlet hose is arranged in each water spray nozzle; pressure regulating valves are mounted at the parts, not extending into the water spray nozzles, of the liquid inlet hoses; at least one hand valve or at least one pneumatic valve is arranged at the front of each pressure regulating valve; and exhaust pipes are arranged at the upper part of the housing. According to the cavity, flow rates of liquid inlets are controlled by the pressure regulating valves, so that different cleaning effects are achieved; the nozzles are arranged on the upper side and the lower side of the housing, so that uniform cleaning can be achieved; exhaust holes are increased, so that polluted air is exhausted, a polluted level of the cavity is reduced, the cleaning efficiency of a silicon wafer is improved, and the self-cleaning frequency is reduced; the liquid outlets are increased, so that liquid waste after cleaning can be directly discharged through the liquid outlets; and the cleaning of the cavity without dismounting is achieved finally.
Description
Technical field
The utility model relates to the Wafer Cleaning field, relates in particular to a kind of self-cleaning cavity.
Background technology
Along with the development of large scale integrated circuit, the improving constantly of integrated level, constantly the reducing of live width requires more and more higher to the surface quality of silicon chip.Wafer Cleaning has become most important step the most frequently in the semiconductor manufacturing.
During semiconductor devices is produced, silicon chip must be through strict cleaning.Micropollution also can cause component failure.The purpose of cleaning is to remove surface contamination impurity, comprises organic matter and inorganic matter.These impurity have with state of atom or ionic condition, what have is present in silicon chip surface with form of film or particle form.Organic contamination comprises grease or the fiber that photoresist, organic solvent residual thing, synthetic wax and people's contact devices, instrument, vessel bring.Inorganic pollution comprises heavy metal gold, copper, iron, chromium etc., has a strong impact on minority carrier lifetime and surface conductance; Alkali metal such as sodium etc. cause serious electric leakage; Particle contamination comprises white residue, dust, bacterium, microorganism, organic colloid fiber etc., can cause various defectives.The method of remove polluting has two kinds of physical cleaning and Chemical cleaning.
Physical cleaning has three kinds of methods.1. scrub or clean: can remove particle contamination and most of film that is bonded on slice, thin piece.2. high-pressure wash: be to spray the sheet sub-surface with liquid, the pressure of nozzle is up to a hundreds of atmospheric pressure.High-pressure wash is by jet-action, and slice, thin piece is difficult for producing cut and damage.But the high-pressure injection meeting produces electrostatic interaction, by regulating nozzle to distance, the angle of slice, thin piece or adding antistatic agent to be avoided.3. Ultrasonic Cleaning: ultrasonic wave acoustic energy imports solution into, washes pollution on slice, thin piece off by cavitation effect.But, remove less than 1 micron particles more difficult from the slice, thin piece that figure is arranged.Frequency is brought up to ultra-high frequency band, and cleaning performance is better.
Chemical cleaning is for except removal atom, the sightless pollution of ion, and method is more, and solvent extraction, pickling (sulfuric acid, nitric acid, chloroazotic acid, various mixed acid etc.) and plasma method etc. are arranged.
Silicon wafer cleaning method commonly used is wet-chemical cleaning at present, and the Wafer Cleaning equipment that adopts wet chemistry methods to clean all needs process cavity, no matter be closed cavity or open cavity.Wafer Cleaning is according to the different liquid of the different needs of operation stage, and after the long-time use of cavity, the various liquids that adhere on its inwall can produce crystallization, and the cleaning of environment is cleaned in impact, and this situation of the process cavity of sealing can be more serious.Therefore in order to improve the cleaning quality of silicon chip, must carry out cleaning to the process cavity inwall after using a period of time.But existing cleaning equipment process cavity cleaning operation is all first cavity just can be carried out after the equipment dismounting, this method wastes time and energy, and cavity cleaning complete reinstall after, certain variation all can occur in the initial position that originally mixed up etc., need to re-start and adjust and arrange, also can affect operating efficiency, the difficult problem that therefore urgent need will a kind ofly save time, the solution of labor-saving cavity cleaning method is present.
The utility model content
The technical problem that (one) will solve
Avoid first problem that cavity just can be cleaned after the equipment dismounting, energy is time saving and energy saving, avoid when cleaning silicon chip to cavity carry out again adjustment and the problem of setting.
(2) technical scheme
In order to solve the problems of the technologies described above, the utility model provides a kind of self-cleaning cavity, and it comprises housing, water spout and leakage fluid dram.
Wherein, water spout is arranged on hull outside, and leakage fluid dram is at housing bottom.
Wherein, water spout has two rows, and its upper-lower position face-to-face over against.
Wherein, an end of feed liquor flexible pipe stretches in water spout.
Wherein, the feed liquor flexible pipe part that do not stretch into water spout is equipped with pressure regulator valve.
Wherein, at least one hand valve or pneumatic operated valve are arranged before pressure regulator valve.
Wherein, blast pipe is arranged at housing top.
The step of its self-cleaning is:
1) open hand valve and pneumatic operated valve, regulate pressure regulator valve and control water flow, begin to clean housing;
2) clean complete after, close hand valve, pneumatic operated valve and pressure regulator valve.
(3) beneficial effect
Technique scheme of the present utility model has following advantage: control the flow of inlet by pressure regulator valve, reach different cleaning effects; The housing upper and lower sides all arranges nozzle, can realize even cleaning; Increase steam vent, discharge contaminated air, reduce the pollution level of cavity, improve the cleaning efficiency of silicon chip, reduce the self-cleaning frequency; Increase leakage fluid dram, the waste liquid that cleans after completing can directly be discharged by leakage fluid dram.Finally realize the not disassembly, cleaning of cavity.
Description of drawings
Fig. 1 is the fundamental diagram of the utility model embodiment.
Fig. 2 is the cavity outline drawing of the utility model embodiment.
Fig. 3 is the cavity cutaway view of the utility model embodiment.
Fig. 4 is the working state schematic representation of the utility model embodiment.
In figure, 1: housing; 2: blast pipe; 3: the feed liquor flexible pipe in upside tributary; 4: the water spout in upside tributary; 5: the water spout in downside tributary; 6: the feed liquor flexible pipe in downside tributary; 7: silicon chip; 8: rotary chuck; 9: leakage fluid dram.
The specific embodiment
Below in conjunction with drawings and Examples, the specific embodiment of the present utility model is described in further detail.Following examples are used for explanation the utility model, but are not used for limiting scope of the present utility model.
In description of the present utility model, need to prove, orientation or the position relationship of the indications such as term " " center ", " on ", D score, " top ", " end " " interior ", " outward " be based on orientation shown in the drawings or position relationship; be only the utility model and simplified characterization for convenience of description; rather than the device of indication or hint indication or element must have specific orientation, with specific orientation structure and operation, so can not be interpreted as restriction of the present utility model.
In description of the present utility model, need to prove, unless clear and definite regulation and restriction are separately arranged, term " installation ", " being connected ", " connection " should be done broad understanding, for example, can be to be fixedly connected with, and can be also to removably connect, or connect integratedly; Can be mechanical connection, can be also to be electrically connected to; Can be directly to be connected, also can indirectly be connected by intermediary, can be the connection of two element internals.For the ordinary skill in the art, can concrete condition understand the concrete meaning of above-mentioned term in the utility model.
In addition, in description of the present utility model, except as otherwise noted, the implication of " a plurality of " is two or more.
In order to carry out easily and fast the cleaning of cleaning equipment process cavity, the utility model provides a kind of self-cleaning cavity, and it comprises housing, the main body of self-cleaning housing; Water spout, the delivery port during cleaning; Leakage fluid dram, the liquid when being used for discharging cleaning silicon chip and housing.
Wherein, water spout is arranged on hull outside, and leakage fluid dram is at housing bottom.
Wherein, water spout has two rows, and its upper-lower position face-to-face over against.
Be preferred embodiment, the two rows water spout is all a plurality of, and all evenly distributes along the circumferencial direction of housing body structure.
The position of water spout determines according to shell dimension, and at housing upper and lower sides marginal position, the expansion spraying range of trying one's best realizes cleaning more fully, as shown in Figure 4.
Wherein, an end of feed liquor flexible pipe stretches in water spout.
Clean water stream enters in housing by the feed liquor flexible pipe and cleans.
The water spout of upper and lower sides distributes face-to-face, and the upside water spout cleans the downside inwall, and the downside water spout cleans upper inside walls, is used for satisfying the purpose of evenly cleaning.And work simultaneously in tributary, both sides, up and down, this makes the inwall of process shell to be cleaned fully.
Wherein, the feed liquor flexible pipe part that do not stretch into water spout is equipped with pressure regulator valve.
Be preferred embodiment that at least one hand valve or pneumatic operated valve are arranged before pressure regulator valve.
Can be also that a hand valve and a pneumatic operated valve are arranged, can better control like this switch of current, also can guarantee to work on when a hand valve goes wrong.
Be preferred embodiment, housing has blast pipe.
Because this device is to use the chemical agent cleaning silicon chip, therefore enclosure interior has air pollution unavoidably, as small floating dust of washing down on silicon chip etc.Therefore, add blast pipe on housing, utilize air exhausting device by blast pipe, contaminated air to be discharged from enclosure interior, can also reduce like this pollution level of cavity, improve the cleaning efficiency of silicon chip, reduce the self-cleaning frequency.
When opening the cavity cleaning by this kind mode, housing top can be covered with flat board, in order to avoid cleaning water is sprayed at hull outside, other parts be drenched, cause and get rusty or pollute; Do not need when being used for the closure casing cleaning.
Its operation principle as shown in Figure 1, wherein hand valve MV1 and hand valve MV2 left end are the activity of housing cleaning water, are divided into to be two-way tributary, up and down.When cleaning equipment is in silicon wafer cleaning process, to regulate hand valve MV1 and MV2, pneumatic operated valve AOV1 and AOV2 and be normally off, the housing cleaning water is not supplied.
When needing to carry out the cavity cleaning after cavity uses a period of time, regulate hand valve MV1 and MV2, pneumatic operated valve AOV1 and AOV2 and be in normally open, supply cavity cleaning water, and utilize pressure regulator valve PRG1 to control the flow in upside tributary, utilize pressure regulator valve PRG2 to control the flow in downside tributary, water spout by tributary, both sides, up and down sprays cleaning water to inner walls, reaches the purpose of cleaning cavity.
This kind method reaches by controlling the flow of cleaning water the purpose of controlling the clean-up performance size.
Cavity is regulated hand valve MV1 and MV2, pneumatic operated valve AOV1 and AOV2 and is set to normally off after cleaning and completing, and the supply of blocking-up cavity cleaning water restarts Wafer Cleaning work.
This device can in the situation that not carry out structure dismounting, carry out the cleaning of inner walls, and can reach the purpose of even cleaning.
The step of its self-cleaning is:
1) open hand valve and pneumatic operated valve, regulate pressure regulator valve and control water flow, begin to clean housing;
2) clean complete after, close hand valve, pneumatic operated valve and pressure regulator valve.
As shown in Figure 4, in technical process, silicon chip is fixed on rotary chuck, silicon chip is along with rotary chuck rotates together, and by spray arm spray liquid cleaning silicon chip, the effect of cleaning like this is even.In the cleaning process, regulate hand valve MV1 and MV2, pneumatic operated valve AOV1 and AOV2 and be normally off.
When cavity uses a period of time to carry out cleaning, regulate hand valve MV1 and MV2, pneumatic operated valve AOV1 and AOV2 and be set to normally open, the water in water supply hose can be supplied always, control the flow of supply water by pressure regulator valve PRG1 and PRG2, after adjusting, spray to inner walls with certain flow by water spout, under the hydro-peening effect in tributary, both sides, can reach cleaning more fully of cavity.
In the present embodiment, the water spout of upper and lower sides is respectively 12 herein.The uninterrupted that cleans can be regulated according to actual needs.
After cleaning is completed, regulate hand valve MV1 and MV2, pneumatic operated valve AOV1 and AOV2 and be set to normally off, no longer include water and supply with, there is no current in the feed liquor flexible pipe, the water spout in tributary, up and down stops water spray, and the waste water that cleans after using can directly be discharged by leakage fluid dram.
In the cleaning process of silicon chip and cavity, the lid of housing should cover, and has prevented that liquid from spilling, and people around or object are impacted.
Cavity can directly carry out the silicon wafer cleaning process process after cleaning and completing, and can guarantee like this to carry out Wafer Cleaning in good environment, improves the quality of Wafer Cleaning.This self-cleaning cavity body structure has been realized dismantling in the situation that do not carry out structure the internal washing that carries out cavity, and is time saving and energy saving.
The above is only preferred embodiment of the present utility model; should be understood that; for those skilled in the art; under the prerequisite that does not break away from the utility model know-why; can also make some improvement and modification, these improve and modification also should be considered as protection domain of the present utility model.
Claims (6)
1. a self-cleaning cavity, is characterized in that, it comprises housing, water spout and leakage fluid dram, and wherein, water spout is arranged on hull outside, and leakage fluid dram is at housing bottom.
2. self-cleaning cavity according to claim 1, is characterized in that, described water spout has two rows, wherein, described water spout upper-lower position face-to-face over against.
3. self-cleaning cavity according to claim 2, is characterized in that, an end of feed liquor flexible pipe stretches in water spout.
4. self-cleaning cavity according to claim 3, is characterized in that, the part that described feed liquor flexible pipe does not stretch into water spout is equipped with pressure regulator valve.
5. self-cleaning cavity according to claim 4, is characterized in that, at least one hand valve or pneumatic operated valve are arranged before described pressure regulator valve.
6. self-cleaning cavity according to claim 1, is characterized in that, blast pipe is arranged at described housing top.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320150997 CN203265197U (en) | 2013-03-29 | 2013-03-29 | Self-cleaning cavity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320150997 CN203265197U (en) | 2013-03-29 | 2013-03-29 | Self-cleaning cavity |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203265197U true CN203265197U (en) | 2013-11-06 |
Family
ID=49495691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320150997 Expired - Fee Related CN203265197U (en) | 2013-03-29 | 2013-03-29 | Self-cleaning cavity |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203265197U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103170486A (en) * | 2013-03-29 | 2013-06-26 | 北京七星华创电子股份有限公司 | Self-cleaning cavity |
-
2013
- 2013-03-29 CN CN 201320150997 patent/CN203265197U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103170486A (en) * | 2013-03-29 | 2013-06-26 | 北京七星华创电子股份有限公司 | Self-cleaning cavity |
| CN103170486B (en) * | 2013-03-29 | 2016-01-06 | 北京七星华创电子股份有限公司 | A kind of self-cleaning cavity |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103170486B (en) | A kind of self-cleaning cavity | |
| CN103028570B (en) | Intelligent robot cleaning center | |
| CN106409717B (en) | A kind of wafer tears gold and removes photoresist cleaning device | |
| CN208815145U (en) | A kind of spray equipment in electrophoresis coating technique | |
| CN104190652A (en) | Cleaning device and method for medium and large-sized sapphire wafers after patterned etching process | |
| CN102107197B (en) | Wafer cleaning device and wafer cleaning mode | |
| CN110694985A (en) | Gas-liquid-sand mixed high-voltage electrified cleaning system | |
| CN203265197U (en) | Self-cleaning cavity | |
| CN104741279A (en) | Ultrasonic spraying equipment | |
| CN206793936U (en) | Cyclone separator with cleaning device | |
| CN203778258U (en) | Ultrasonic spraying device | |
| CN102921676A (en) | Novel normal pressure plasma free radical cleaning spray gun with exhaust function | |
| CN210966073U (en) | Gas-liquid-sand mixed high-voltage electrified cleaning system | |
| CN205730619U (en) | A kind of full-automatic reciprocating type central air-conditioning filtering net cleaning drying device | |
| CN206676807U (en) | A kind of silicon wafer turnover flusher | |
| CN215430695U (en) | Semiconductor device for cleaning wafer transmission box | |
| CN201188173Y (en) | Apparatus for removing glass substrate edge photo resist | |
| CN208189541U (en) | A kind of wet process equipment dynamic etch medicine liquid spray device | |
| CN202803086U (en) | Online cleaning device for desulfurization flue gas heat exchanger | |
| CN206273357U (en) | A kind of reactor | |
| CN104707815A (en) | Convection type cleaning tank for solid materials | |
| CN210179655U (en) | Flue gas pipeline convenient to maintenance | |
| CN215748565U (en) | Liquid discharge device and chemical mechanical polishing device | |
| CN220678338U (en) | High-speed railway spraying robot revolves cup belt cleaning device | |
| CN221079946U (en) | Cleaning equipment and alkali polishing device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131106 Termination date: 20180329 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |