CN203242603U - Apparatus for drying substrate - Google Patents
Apparatus for drying substrate Download PDFInfo
- Publication number
- CN203242603U CN203242603U CN2012206468168U CN201220646816U CN203242603U CN 203242603 U CN203242603 U CN 203242603U CN 2012206468168 U CN2012206468168 U CN 2012206468168U CN 201220646816 U CN201220646816 U CN 201220646816U CN 203242603 U CN203242603 U CN 203242603U
- Authority
- CN
- China
- Prior art keywords
- linear motion
- motion device
- supporting mass
- equipment
- vertical direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02046—Dry cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
Abstract
The utility model relates to an apparatus for drying a substrate, which comprises moving devices (3,4) for making a support (6) descend and ascend. The substrate supported on the support (6) is enabled to be immersed under a liquid level of a treatment liquid and lifted out of the treatment liquid basically along the vertical direction (V) so that the treatment liquid flows off completely from the surface of the substrate. The apparatus further comprises a deflection device (5). By means of the deflection device, the support (6) can be lifted in a way to deflect at predetermined angles (alpha, beta) relative to the vertical direction (V).
Description
Technical field
The utility model relates to a kind of equipment for drying substrates, its have for reducing with the telecontrol equipment that promotes supporting mass, so that be supported under the liquid level that substrate on the supporting mass can be immersed in treat liquid and can from treat liquid, propose along the perpendicular direction, so that treat liquid flows away from the surface of substrate basically fully, wherein said equipment is provided with arrangement for deflecting, and supporting mass can be by means of described arrangement for deflecting angle default with respect to vertical direction deflection when promoting.
Background technology
This method or this equipment is from US4,902,350 or DE10215284A1 in known.
In known method, the substrate that is supported on the supporting mass drops to in container heat, that deionized water is filled.Substrate can be loaded with ultrasonic wave.Next, promote lentamente supporting mass along vertical direction, wherein substrate is proposed from treat liquid, so that treat liquid flows away from substrate surface fully.
In known method, substrate supports is in supported box.Supported box, be configured as in particular for substrate being remained on groove in the vertical position, that be arranged on the described supported box, so that guarantee that treat liquid flows away as far as possible fully when proposing.Yet exist in practice, treat liquid especially remains in groove and is contained in the wedge shape space between the substrate in this groove.The treat liquid of adhering to causes the pollution of substrate surface.Therefore, must sort out and again process relevant substrate.If the pollution of substrate do not realized, this can cause the semiconductor device made thus unavailable so.
The utility model content
The purpose of this utility model is, eliminates the shortcoming according to prior art.Especially should propose to realize the method and apparatus without residue ground drying substrates.That the utility model should keep the conventional process of substrate as much as possible at this according to another purpose of the present utility model.
Described purpose realizes by a kind of method and a kind of device.Suitable expansion scheme of the present utility model is from drawing herein.
According to the utility model, propose in the method that is used for drying substrates, when promoting with respect to vertical direction with default angular deflection supporting mass.Realize by the deflection that proposes according to the utility model of during promoting, carrying out supporting mass: the treat liquid that is attached in the wedge shape space is also flowed away.Therefore, realize the bone dry without residue of substrate.
According to a favourable expansion scheme, when promoting, pass vertically z axle that supporting plane extends in comprising the xz plane of vertical direction with respect to vertical direction deflection the highest ± 20 °, preferred the first angle [alpha] of the highest ± 10 °.
In viewpoint of the present utility model, term " vertical direction " is understood as immutable and basically is equivalent to the direction of gravitational vectors.The yaw motion that the basis of supporting mass the utility model proposes is described with respect to the angle of vertical direction by the z axle that vertically extends through supporting plane.
Term " treat liquid " is usually understood as traditionally the liquid for the treatment of substrate surface.Can be water heat, deionized at this.Heat, deionized water can be added with ozone.In addition, treat liquid can comprise HF, HNO
3, isopropyl alcohol, HCl or KOH.
According to another favourable expansion scheme, the z axle in comprising the yz plane of vertical direction with respect to vertical direction deflection the highest ± 20 °, preferred the second angle beta of the highest ± 10 °.
The yaw motion with respect to the less that proposes of vertical direction of supporting mass z axle is enough to realize with improvement drying substrates.Yaw motion can carry out in the mode of clock pulse during the proposition supporting mass.At this, supporting mass can be along the reciprocal deflection of opposite direction.Suitably, the z axle is with respect to the angle of 3 ° to 8 ° of vertical direction deflections, 4 ° to 6 ° of preferred deflection.
According to an especially favourable expansion scheme, supporting mass is continuously deflection during proposing.Turn out to be especially advantageously, supporting mass when promoting according to default trajectory deflection.For example, the z axle can carry out precessional motion around vertical direction.Therefore, can realize from substrate and hold whole wedge shape space between the groove of described substrate safely and Transformatin liquid reliably.
According to another favourable expansion scheme, the supporting plane of supporting mass is essentially horizontally directed when immersing.Substrate suitably is supported on the supporting mass, so that the upside of described substrate is arranged essentially parallel to the z axle orientation of supporting mass.In the orientation that proposes supporting mass or that be supported on the substrate on the supporting mass, the flow resistance during immersion is minimum.This can be avoided substrate is taken off from supporting mass undesirably when immersing.
According to another favourable expansion scheme, substrate is contained in the supported box, and described supported box places on the supporting mass.This realizes side by side dry a plurality of substrate.In addition, substrate is contained in manipulation and the transportation of having simplified described substrate in the supported box.
Propose according to equipment of the present utility model, be provided with arrangement for deflecting, the angle that supporting mass can be preset with respect to vertical direction deflection when promoting by means of described arrangement for deflecting.The arrangement for deflecting that proposes according to the utility model realization is set: the vertical-lift campaign of supporting mass additionally with the yaw motion stack that changes.Therefore, supporting mass can tilt along different directions when promoting.
Suitably, supporting mass has two short and two long seamed edges.Described supporting mass can have the profile of substantial rectangular.Supporting mass especially can constitute be used to the framework that holds supported box.At this, framework and supported box as one man consist of.In the supported box on being placed in framework, described supported box immovably remains on the framework basically.Therefore guarantee, in the situation that supporting mass deflection also remains on supported box on the supporting mass reliably, prevent lateral sliding.
Advantageously, telecontrol equipment has at least one first linear motion device and at least one second linear motion device.The first and second linear motion devices for example can be installed in the zone of short seamed edge of supporting mass.
According to a favourable expansion scheme, arrangement for deflecting has at least one the 3rd linear motion device that is connected with supporting mass.In this case, advantageously, the first and the 3rd linear motion device hingedly is installed in the angular zone at the first short seamed edge place, and the second linear motion device hingedly is installed in the second short seamed edge place.Come the mounting support body by three linear motion devices by means of at three difference places of supporting mass that propose, described supporting mass can carry out deflection along any direction by the suitable control of linear motion device when promoting.
According to an especially favourable expansion scheme, be provided with the controller for the control linear motion device, so that when immersing, essentially horizontally directed by the short supporting plane that forms with long seamed edge of supporting mass.In addition, the controller that is used for the control linear motion device is configured to, so that when promoting, pass vertically z axle that supporting plane extends in comprising the xz plane of vertical direction with respect to vertical direction deflection the highest ± 20 °, preferred the first angle [alpha] of the highest ± 10 °.In addition, controller can constitute so that the z axle in comprising the yz plane of vertical direction with respect to vertical direction deflection the highest ± 20 °, preferred the second angle beta of the highest ± 10 °.Therefore, supporting plane can be along whole imaginabale direction deflections when promoting.Yaw motion can be selected according to the physical dimension of supporting mass or supported box by rights, so that realize that treat liquid fully flows away from substrate.Especially, the reciprocal deflection by supporting mass also can realize the therewith consistent banking motion of substrate.Therefore, for example can avoid adjacent substrate do not expect adhere to, and then can realize the improved outflow of treat liquid.
Suitably, yaw motion is by following condition restriction: section's section that the proposing of substrate processed on the liquid level of liquid is not immersed in the treat liquid again.That is to say, even when vertical motion is deflected the motion stack, always cause advantageously that also substrate moves upward with respect to treat liquid.
Suitably, the controller that is used for the control linear motion device is configured to, so that supporting mass continuously deflection during proposing.It illustrates, and can realize that therefore treat liquid fully flows out from wedge shape space.
Be proved to be especially advantageously, supporting mass when promoting according to default trajectory deflection.Controller can be programmable.Therefore, track can be preset according to default program.Rule of thumb, determine track for the supporting mass of every kind of use or the physical dimension of supported box.
Being proved to be suitable is that substrate is supported on the supporting mass with arrangement basically parallel to each other.Advantageously, substrate supports is on supporting mass, so that the upside of described substrate is arranged essentially parallel to the z axle orientation of supporting mass.Especially, substrate can be contained in the supported box, and described supported box places on the supporting mass.
Description of drawings
Below illustrate in detail with reference to the accompanying drawings embodiment of the present utility model.Illustrate:
Fig. 1 illustrates the three-dimensional view for the equipment of drying substrates;
Fig. 2 illustrates according to the supporting mass of Fig. 1 and the stereogram of telecontrol equipment; And
Fig. 3 illustrates the stereogram according to Fig. 2, wherein shows the direction of yaw motion.
Embodiment
Fig. 1 illustrates the equipment that is used for drying substrates that usually represents with Reference numeral T.Equipment is contained in the housing that represents with Reference numeral 1.Be provided with in housing 1 be used to the container 2 that holds treat liquid (not illustrating at this), equipment T extend in the described container.
That equipment T has the first linear motion device 3, the second linear motion device 4 and the 3rd linear motion device 5 as especially visible from Fig. 2 and 3.Usually with Reference numeral 6 expression supporting masses, described supporting mass is at this type constitution according to the framework with two longerons 7 and two crossbeam 8a, 8b.Longeron 7 forms two longitudinal edges of rectangular frame, and crossbeam 8a, 8b form two short seamed edges of rectangular frame.The first longitudinal adjustment mechanism 9 of the first linear motion device 3 hingedly is installed in the zone of first end of first crossbeam 8a.The second longitudinal adjustment mechanism 10 of the second linear motion device 4 hingedly roughly is installed in the middle part of second cross beam 8b.The 3rd longitudinal adjustment mechanism 11 of the 3rd linear motion device 5 hingedly is installed in the second end place of first crossbeam 8a.With Reference numeral 12 expression the first longitudinal guides and with Reference numeral 13 expressions the second longitudinal guide.
Especially referring to Fig. 3 in detail illustrate the function of equipment from now on.
Longeron 7 and crossbeam 8a, 8b form supporting plane xy.At this, longeron 7 is parallel to x axle x extension and crossbeam 8a, 8b are parallel to y axle y extension.Z axle z is perpendicular to supporting plane xy.V represents vertical direction with Reference numeral, and described vertical direction for example is equivalent to one direction in the vertical seamed edge of the housing 1 shown in Fig. 1.Vertical direction is arranged essentially parallel to gravitational vectors and extends.Described vertical direction is constant and is used as the datum quantity of the yaw motion of describing supporting mass 6.
For drying, substrate (not illustrating at this) is inserted in the supported box, known from DE10215284 such as it.Supported box places on the supporting mass 6.At this, supporting mass 6 is arranged in the position on the liquid level of the treat liquid that is contained in container 2.Supporting plane xy at this advantageously perpendicular to vertical direction V.Next, supporting mass 6 reduces by suitably controlling linear motion device 3,4 and 5, until substrate is immersed in the treat liquid fully.At this, the motion of supporting mass 6 is preferably so carried out, and is approximately perpendicular to vertical direction V so that supporting plane xy remains.
For drying substrates, supporting mass 6 is by suitably controlling linear motion device 3,4 and 5 and promote lentamente.At this, linear motion device 3,4 and 5 speed can relative to each other change, so that supporting plane xy is with respect to vertical direction V deflection.Therefore, z axle and the vertical direction perpendicular to supporting plane xy for example forms the first angle [alpha].The first angle [alpha] is the angle that is arranged in the zx plane.By linear motion device 3,4 and 5 suitable relative motion, the z axle obviously also can deflection in the yz plane.Therefore draw (not illustrating at this) second angle beta.Drawn possible yaw motion is represented by the arrow among Fig. 3.The oscillating motion that especially, also can produce supporting plane xy by suitable relative motion when promoting supporting mass 6.Also can carry out in order linear motion device 3,4 and 5 motion, wherein supporting mass 6 tilts or deflection along different directions in succession.
Although only illustrate the utility model according to the equipment that illustrates in an embodiment, be used for realizing that other equipment of the present utility model also are fit to.For example supporting mass also can be supported on the bearing that can move both vertically, unique.The yaw motion of supporting mass for example can be by means of being arranged on the adjustable swinging turntable between bearing and the supporting mass or producing by the actuator that is hinged to the supporting mass place.
Reference numerals list
1 housing
2 treatment ponds
3 first linear motion devices
4 second linear motion devices
5 the 3rd linear motion devices
6 supporting masses
7 longerons
The 8a first crossbeam
The 8b second cross beam
9 first lengthwise movement elements
10 second lengthwise movement elements
11 the 3rd lengthwise movement elements
12 first longitudinally guiding devices
13 second longitudinally guiding devices
T is used for dry equipment
The V vertical direction
α the first angle
X x axle
Y y axle
Z z axle
Claims (17)
1. be used for the equipment of drying substrates, have:
For reducing with the telecontrol equipment (3 that promotes supporting mass (6), 4), so that be supported under the liquid level that substrate on the described supporting mass (6) can be immersed in treat liquid and can from described treat liquid, propose along perpendicular direction (V), so that described treat liquid flows away from the surface of described substrate basically fully
It is characterized in that,
Be provided with arrangement for deflecting (5), described supporting mass (6) can be by means of described arrangement for deflecting angle (α, β) default with respect to described vertical direction (V) deflection when promoting.
2. equipment according to claim 1, wherein said supporting mass (6) has two short seamed edges (8a, 8b) and two long seamed edges (7), and described seamed edge forms supporting plane (xy).
3. equipment according to claim 1, wherein said supporting mass (6) is configured to hold the framework of supported box.
4. equipment according to claim 2, wherein said supporting mass (6) is configured to hold the framework of supported box.
5. according to claim 1 to one of 4 described equipment, wherein said telecontrol equipment has at least one first linear motion device (3) and at least one the second linear motion device (4).
6. equipment according to claim 5, wherein said arrangement for deflecting has at least one the 3rd linear motion device (5) that is connected with described supporting mass (6).
7. equipment according to claim 6, wherein said the first linear motion device (3) and described the 3rd linear motion device (5) hingedly are installed in the angular zone of the first short seamed edge (8a), and described the second linear motion device (4) hingedly is installed in the second short seamed edge (8b) and locates.
8. equipment according to claim 6, wherein be provided be used to the controller of controlling described the first linear motion device, the second linear motion device and the 3rd linear motion device (3,4,5), so that when immersing, described supporting plane (xy) is essentially horizontally directed.
9. equipment according to claim 6, wherein be provided be used to controlling described the first linear motion device, the second linear motion device and the 3rd linear motion device (3,4,5) controller, so that when promoting, pass vertically z axle (z) that described supporting plane (xy) extends in the xz plane that comprises described vertical direction (V) with respect to described vertical direction (V) deflection the highest ± the first angle (α) of 20 °.
10. equipment according to claim 6, wherein be provided be used to controlling described the first linear motion device, the second linear motion device and the 3rd linear motion device (3,4,5) controller, so that when promoting, pass vertically z axle (z) that described supporting plane (xy) extends in the xz plane that comprises described vertical direction (V) with respect to described vertical direction (V) deflection the highest ± the first angle (α) of 10 °.
11. according to claim 1 to one of 4 described equipment, wherein said z axle (z) in the yz plane that comprises described vertical direction (V) with respect to described vertical direction (V) deflection the highest ± the second angle (β) of 20 °.
12. according to claim 1 to one of 4 described equipment, wherein said z axle (z) in the yz plane that comprises described vertical direction (V) with respect to described vertical direction (V) deflection the highest ± the second angle (β) of 10 °.
13. equipment according to claim 6 wherein is provided be used to the controller of controlling described the first linear motion device, the second linear motion device and the 3rd linear motion device (3,4,5) so that during proposing the described supporting mass of deflection (6) continuously.
14. according to claim 1 to one of 4 described equipment, wherein said supporting mass (6) when mentioning according to default trajectory deflection.
15. to one of 4 described equipment, wherein said substrate is supported on the described supporting mass (6) with arrangement basically parallel to each other according to claim 1.
16. to one of 4 described equipment, wherein said substrate supports is on described supporting mass (6), so that the upside of described substrate is arranged essentially parallel to described z axle (z) orientation of described supporting mass (6) according to claim 1.
17. to one of 4 described equipment, wherein said substrate is contained in the supported box according to claim 1, described supported box places on the described supporting mass (6).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011087348.1 | 2011-11-29 | ||
| DE102011087348A DE102011087348A1 (en) | 2011-11-29 | 2011-11-29 | Method for drying substrates of semiconductor component, involves lifting support at predetermined angle in vertical direction |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203242603U true CN203242603U (en) | 2013-10-16 |
Family
ID=48287806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012206468168U Expired - Lifetime CN203242603U (en) | 2011-11-29 | 2012-11-29 | Apparatus for drying substrate |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR200486679Y1 (en) |
| CN (1) | CN203242603U (en) |
| DE (2) | DE202011110123U1 (en) |
| TW (1) | TWM468772U (en) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4902350A (en) | 1987-09-09 | 1990-02-20 | Robert F. Orr | Method for rinsing, cleaning and drying silicon wafers |
| DE4133561C2 (en) * | 1991-10-10 | 1994-02-03 | Reinhard Kissler Gmbh | Method and device for electroplating goods |
| DE19637875C2 (en) * | 1996-04-17 | 1999-07-22 | Steag Micro Tech Gmbh | Plant for the wet treatment of substrates |
| KR19980033656U (en) * | 1996-12-09 | 1998-09-05 | 문정환 | Wafer Transfer Device of Wafer Dryer |
| US6164297A (en) * | 1997-06-13 | 2000-12-26 | Tokyo Electron Limited | Cleaning and drying apparatus for objects to be processed |
| KR100431186B1 (en) * | 2002-02-28 | 2004-05-12 | 주식회사 에이텍 | Cleaning and drying method for wafer |
| DE10215284B4 (en) | 2002-04-05 | 2007-05-31 | Astec Halbleitertechnologie Gmbh | Method and apparatus for drying substrates |
| KR100497999B1 (en) * | 2002-11-08 | 2005-07-01 | (주)케이.씨.텍 | Method and apparatus for drying a wafer |
| KR20050062029A (en) * | 2003-12-19 | 2005-06-23 | 삼성전자주식회사 | Apparatus of wafer transfer robot to prevent drying errors in ipa dryer |
| JP4758846B2 (en) * | 2005-11-18 | 2011-08-31 | 東京エレクトロン株式会社 | Drying apparatus, drying method, and drying program, and substrate processing apparatus, substrate processing method, and substrate processing program having the same |
| KR20100066010A (en) * | 2008-12-09 | 2010-06-17 | 세메스 주식회사 | Method and apparatus for cleaning and drying substrates |
-
2011
- 2011-11-29 DE DE202011110123U patent/DE202011110123U1/en not_active Expired - Lifetime
- 2011-11-29 DE DE102011087348A patent/DE102011087348A1/en not_active Ceased
-
2012
- 2012-11-29 KR KR2020120011055U patent/KR200486679Y1/en active IP Right Grant
- 2012-11-29 CN CN2012206468168U patent/CN203242603U/en not_active Expired - Lifetime
- 2012-11-29 TW TW101223139U patent/TWM468772U/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR20130003387U (en) | 2013-06-07 |
| KR200486679Y1 (en) | 2018-07-20 |
| DE202011110123U1 (en) | 2013-02-21 |
| TWM468772U (en) | 2013-12-21 |
| DE102011087348A1 (en) | 2013-05-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180705 Address after: Gu ten Bach, Germany Patentee after: Core technology Ltd. Address before: Gu ten Bach, Germany Patentee before: Rena GmbH |
|
| TR01 | Transfer of patent right | ||
| CX01 | Expiry of patent term |
Granted publication date: 20131016 |
|
| CX01 | Expiry of patent term |