CN203148803U - Device for measuring ablation resistant characteristic of material - Google Patents
Device for measuring ablation resistant characteristic of material Download PDFInfo
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- CN203148803U CN203148803U CN 201320162119 CN201320162119U CN203148803U CN 203148803 U CN203148803 U CN 203148803U CN 201320162119 CN201320162119 CN 201320162119 CN 201320162119 U CN201320162119 U CN 201320162119U CN 203148803 U CN203148803 U CN 203148803U
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Abstract
The utility model relates to the field of nuclear fusion, and discloses a device for measuring the ablation resistant characteristic of a material. The device comprises a vacuum system, a laser ablation system, a laser-induced breakdown spectroscopy (LIBS) measuring system and a quartz crystal microbalance (QCM) measuring system. The device provided by the utility model as supplement for bombarding measurement of an ion gun based on the laser ablation technology, LIBS technology and QCM membrane measuring technology evaluates the ablation resistant characteristic of the material by a laser ablation method and can obtain the ablation rate of the components of the material, so that a feasible detection means for evaluating used first wall material and seeking for the first wall material more suitable for Tokamak stable operation is provided.
Description
Technical field
The utility model relates to the nuclear fusion field, and particularly a kind of device of measuring the anti-ablation characteristics of material can be measured the anti-ablation characteristics of material, and the first wall material that is more suitable for tokamak stable operation with searching that has used for assessment provides detection means.
Background technology
In magnetic confinement nuclear fusion device holder gram mark, in the face of being related to the stability of fusionplasma and first wall structured material and element, plasma material avoids problems such as plasma bombardment damage.Its major function enters the impurity of plasma for effective control, effectively removes the thermal power that is radiated material surface, and other parts are avoided plasma bombardment and damaged when protecting improper shutdown.Simultaneously, should be consistent with reactor operation life-span, reliability and maintenance in the face of plasma material.Therefore, be to penetrate etc. with good, the anti-high heat load of plasma compatibility, the low energy ion of anti-high flux the and neutral particle irradiation, the high-energy neutron of anti-high flux irradiation to its general requirement.Still do not have any material at present and satisfy above harsh requirement simultaneously.
Whether can be used as in the face of plasma material for testing a kind of material, following several method is arranged usually: put it among holder gram mark, directly accept the irradiation of fusionplasma; Bombard material with ion gun; Put it in the linear plasma device the capable irradiation experiment of simulation divertor plasma environment opposite article on plasma body material.Directly put into holder gram mark, can provide and carry out the suitable environment that the material irradiation characteristic research needs, but test period is long, required cost is too high; Ion gun is that the research of normal employing is in the face of plasma material Radiation Characteristics method under laboratory condition, and it can obtain high energy or low-energy ion bombardment to effect of material performance, but can't study the influence of neutral particle etc.; Domestic existing linear plasma device can't satisfy the needs of opposite article on plasma body testing of materials.
We propose the method with laser ablation, measure the performance of material with the device of measuring the material ablation characteristic, as replenishing that ion gun bombardment is measured, the first wall material that is more suitable for tokamak stable operation with searching that has used for assessment provides a kind of feasible detection means.
The ablation characteristics of material comprises multiple parameter, for example total ablation amount (g of unit), the ablation amount (g/cm of unit
2), ablating rate (g/s of unit) etc.Wherein, total ablation amount is not only relevant with the performance of material own, ablation source characteristic, and is also relevant with ablation time, ablated area.What the ablation amount obtained is the quality of unit area loss, and what ablating rate obtained then is that ablated material is in the quality of unit interval loss.If with identical ablation source, under identical ablation distance, the ablation characteristics of assessment different materials, ablating rate are best evaluation criterions.Not only can infer total ablation amount by ablating rate, also can obtain the material ablation characteristic over time, normative reference is provided this serviceable life for assessment material.
(Laser-induced breakdown spectroscopy LIBS) can be used to the sample of principal component is not carried out qualitative and quantitative elemental analysis Laser-induced Breakdown Spectroscopy, can be used for measuring the chemical constitution that laser ablation produces material.When the high intensity pulses laser beam focuses on sample surfaces, extremely preheated material one fritter volume causes being subjected to the irradiation zone top to produce the transient state plasma.The light that plasma plume sends depends on the elemental composition of ablated material, and the spectrum with the spectrometer analysis emission can obtain qualitative or quantitative analysis result.Usually ablated area is less than 1mm, and ablation depth is lower than 100um, and the ablated material that goes out is the microgram magnitude, therefore LIBS can be regarded as accurate nondestructiving detecting means.Its major advantage is: directly measure and need not to prepare sample, can carry out in site measurement, obtain online result.
Compare with other classical way, LIBS can analyze the various aggregative state of various materials and need not specimen preparation.Usually, for the constituent analysis of wall surface, wall analytical approachs such as traditional SIMS, XPS, AES, EDX and RBS are just can realize wall surface constituent analysis task under the condition of work of off-line.By contrast, but the LIBS original position is analyzed multiple element simultaneously, and sample is detected real-time, has become the research focus of current spectrum detection technique.
The LIBS data have been analyzed several different methods.The method of wherein freely calibrating does not need to measure calibration curve by standard model is experimentized, but directly calculates the concentration of analysis component according to the relative intensity of the spectral line that obtains.Advantage: need not to calibrate thing, program simplification, to compare cost lower with additive method; Full elements are contained; The real-time analysis of real realization remote online.Shortcoming: do not consider self absorption effect, can be influential to measurement result; Need all spectral lines are analyzed, workload is relatively large.
QCM (Quartz Crystal Microbalance) (Quartz Crystal Microbalance, QCM or QMB) being is inverting element with the quartz crystal, utilize two effects of quartz crystal, be piezoelectric effect and mass loading effect, convert the quality signal of test substance to frequency signal output, thereby realize the instrument that quality, concentration etc. detect, measuring accuracy can the Da Nake magnitude.But advantages such as that QCM has is simple in structure, cost is low, resolution is high, highly sensitive, the good real time on-line monitoring of specificity are widely used in every field such as physics, biology, chemistry, medical science.QCM has locus and the temporal resolution of well determining.It can provide the valuable data of material acquisition and loss in low heat flux zones.
Summary of the invention
The purpose of this utility model is: for solving above-mentioned technical matters of the prior art, provide a kind of device of measuring the anti-ablation characteristics of material, this device is surveyed the thickness technology based on laser ablation technology, Laser-induced Breakdown Spectroscopy technology, QCM (Quartz Crystal Microbalance).The utility model can assessment material anti-ablation characteristics, draw the ablating rate of each constituent of material, be suitable as the material service of fusion facility first wall material for searching.
For achieving the above object, the technical solution adopted in the utility model is: a kind of device of measuring the anti-ablation characteristics of material is provided, has comprised: vacuum system, laser ablation system, LIBS measuring system, QCM (Quartz Crystal Microbalance) measuring system;
Described vacuum system is used to form measures required experiment condition, comprising: vacuum chamber 1, vacuum pump group 11, vacuum gauge 14; Vacuum pump group 11 and vacuum gauge 14 are installed in vacuum chamber 1 outer end;
Described laser ablation system comprises: pulsed laser 4, electronic two-dimensional stage 6, sample clamp 7, first condenser lens 10; Testing sample is positioned on the sample clamp 7, sample clamp 7 is fixed on the electronic two-dimensional stage 6, and is placed in the vacuum chamber 1; It is interior and corresponding with first quartz window 12 of vacuum chamber 1 that first condenser lens 10 is placed on vacuum chamber 1; Pulsed laser 4 is positioned at vacuum chamber 1 outside; Pulsed laser 4 sends pulse laser, enters vacuum chamber 1 through first quartz window 12, focuses on sample surfaces behind first condenser lens 10, the ablation sample.
Described LIBS measuring system is used to form and stores the LIBS spectrum of laser splash target plasma plume, comprising: fiber spectrometer 2, second condenser lens 16, optical fiber 13, computing machine 15; It is interior and corresponding with second quartz window 17 of vacuum chamber 1 that described second condenser lens 16 is placed on vacuum chamber 1; Described fiber spectrometer 2 is gathered LIBS spectrum by optical fiber 13; Described computing machine 15 is connected with pulsed laser 4, fiber spectrometer 2 circuits respectively;
Pulsed laser 4 sends pulse laser, enters vacuum chamber 1 through first quartz window 12, focuses on target material surface through first condenser lens 10, and the ablation target forms plasma plume 8; The light that second condenser lens 16 sends plasma plume 8 focuses on optical fiber 13 and accepts face; Optical fiber 13 transmission LIBS spectrum; Fiber spectrometer 2 is gathered LIBS spectrum; The sequential of computing machine 15 regulating impulse laser instruments 4 and fiber spectrometer 2 stores LIBS spectrum.
Described QCM (Quartz Crystal Microbalance) measuring system is used for measuring material ablation amount always, comprising: quartz crystal film thickness monitor 3, oscillator 5, quartz crystal sensor 9, quartz crystal 18; Quartz crystal 18 is fixed on the quartz crystal sensor 9, and with corresponding being placed in the vacuum chamber 1 of sample on the electronic two-dimensional stage 6; By the cable that can be used for vacuum chamber quartz crystal sensor 9 is connected with oscillator 5; With the BNC cable oscillator 5 is connected with quartz crystal film thickness monitor 3, described quartz crystal film thickness monitor 3 is connected with computing machine 15 circuits.
Quartz crystal 18 is collected the material that laser splash goes out, and quartz crystal sensor 9 is used for the electric current that transmission oscillator 5 is given quartz crystal 18, makes quartz crystal 18 vibration at high speed, and the electric signal that quartz crystal 18 is produced is transferred to oscillator 5; Oscillator 5 is delivered to quartz crystal film thickness monitor 3 with electronic signal; Quartz crystal film thickness monitor 3 control quartz crystal sensors 9, and the variation of record thickness;
Analyze the LIBS signal that fiber spectrometer 2 spreads out of with computing machine 15, obtain each percentage composition information that the laser ablation sample produces; Also be used for obtaining the film thickness information that quartz crystal film thickness monitor 3 spreads out of, further obtain total ablation amount information of sample; The measurement result of the two combines the most at last, draws the ablating rate information of each composition.
Wherein, described pulsed laser 4, first quartz window 12, first condenser lens 10 are point-blank.
Wherein, described first quartz window 12, second quartz window 17, vacuum gauge 14 are installed on the flange of vacuum chamber 1.
The beneficial effects of the utility model are: the utility model is surveyed the thickness technology based on laser ablation technology, LIBS technology, QCM, what bombardment was measured as ion gun replenishes, utilize the anti-ablation characteristics of the method assessment material of laser ablation, can draw the ablating rate of each constituent of material, the first wall material that is more suitable for tokamak stable operation with searching that has used for assessment provides a kind of feasible detection means.
Description of drawings
Fig. 1 is a kind of structural representation of measuring the device of the anti-ablation characteristics of material of the utility model.
Accompanying drawing sign: 1-vacuum chamber, 2-fiber spectrometer, 3-quartz crystal film thickness monitor, the 4-pulsed laser, 5-oscillator, the electronic two-dimensional stage of 6-, the 7-sample clamp, 8-plasma plume, 9-quartz crystal sensor, 10-first condenser lens, 11-vacuum pump group, 12-first quartz window, 13-optical fiber, 14-vacuum gauge, 15-computing machine, 16-second condenser lens, 17-second quartz window, 18-quartz crystal.
Embodiment
Below in conjunction with drawings and Examples the utility model is elaborated.
With reference to Fig. 1, a kind of device of measuring the anti-ablation characteristics of material of the utility model is surveyed the thickness technology based on laser ablation technology, Laser-induced Breakdown Spectroscopy technology, QCM (Quartz Crystal Microbalance), comprising: vacuum system, laser ablation system, LIBS measuring system, QCM (Quartz Crystal Microbalance) measuring system;
Described vacuum system comprises: vacuum chamber 1, vacuum pump group 11, vacuum gauge 14; Vacuum pump group 11 and vacuum gauge 14 are installed in vacuum chamber 1 outer end; Vacuum pump group 11 is evacuated to vacuum state with vacuum chamber 1, and in experimentation, keep the stability of its vacuum state, described vacuum system is used to form measures required experiment condition, in vacuum environment, measure, can reduce airborne impurity component to the interference of LIBS spectral signal, reduce in the air composition and go out the material reaction with ablated, improve the accuracy of measurement.
Described laser ablation system comprises: pulsed laser 4, electronic two-dimensional stage 6, sample clamp 7, first condenser lens 10; Testing sample is positioned on the sample clamp 7, sample clamp 7 is fixed on the electronic two-dimensional stage 6, and is placed in the vacuum chamber 1; It is interior and corresponding with first quartz window 12 of vacuum chamber 1 that first condenser lens 10 is placed on vacuum chamber 1; Pulsed laser 4 is positioned at vacuum chamber 1 outside; Pulsed laser 4 sends pulse laser, enters vacuum chamber 1 through first quartz window 12, focuses on sample surfaces behind first condenser lens 10, the ablation sample.Electronic two-dimensional stage 6 can be used in the vacuum environment, and can two dimension move, and is convenient to us the measurement of anti-ablation characteristics under the different laser power densities is carried out at a plurality of positions of sample; Also need not to readjust the collection light path and need not to open vacuum chamber; This has reduced measures required setup time.
Described LIBS measuring system is used to form and stores the LIBS spectrum of laser splash target plasma plume, comprising: fiber spectrometer 2, second condenser lens 16, optical fiber 13, computing machine 15; It is interior and corresponding with second quartz window 17 of vacuum chamber 1 that described second condenser lens 16 is placed on vacuum chamber 1; Described fiber spectrometer 2 is gathered LIBS spectrum by optical fiber 13; Described computing machine 15 is connected with pulsed laser 4, fiber spectrometer 2 circuits respectively.
Pulsed laser 4 sends pulse laser, enters vacuum chamber 1 through first quartz window 12, focuses on target material surface through first condenser lens 10, and the ablation target forms plasma plume 8; The light that second condenser lens 16 sends plasma plume 8 focuses on optical fiber 13 and accepts face; Optical fiber 13 transmission LIBS spectrum; Fiber spectrometer 2 is gathered LIBS spectrum; The sequential of computing machine 15 regulating impulse laser instruments 4 and fiber spectrometer 2 stores LIBS spectrum.Pulsed laser 4 and fiber spectrometer 2 the time ordered pair LIBS signal intensity very big influence is arranged, for obtaining optimum signal-noise ratio, need repeatedly debug this value.
Described QCM (Quartz Crystal Microbalance) measuring system is used for measuring material ablation amount always, comprising: quartz crystal film thickness monitor 3, oscillator 5, quartz crystal sensor 9, quartz crystal 18; Quartz crystal 18 is fixed on the quartz crystal sensor 9, and with corresponding being placed in the vacuum chamber 1 of sample on the electronic two-dimensional stage 6; By the cable that can be used for vacuum chamber quartz crystal sensor 9 is connected with oscillator 5; With the BNC cable oscillator 5 is connected with quartz crystal thick film monitor 3, described quartz crystal film thickness monitor 3 is connected with computing machine 15 circuits.
Quartz crystal 18 is collected the material that laser splash goes out, and quartz crystal sensor 9 is used for the electric current that transmission oscillator 5 is given quartz crystal 18, makes quartz crystal 18 vibration at high speed, and the electric signal that quartz crystal 18 is produced is transferred to oscillator 5; Oscillator 5 is delivered to quartz crystal film thickness monitor 3 with electronic signal; Quartz crystal film thickness monitor 3 control quartz crystal sensors 9, and the variation of record thickness; High temperature, high heat load all can reduce the performance of quartz crystal 18, in order to keep the life-span of quartz crystal 18, and when not needing to measure, should be with the baffle plate closure of quartz crystal sensor 9, and quartz crystal 18 become certain distance with detected materials.
By computing machine 15, according to measuring the energy that needs regulating impulse laser instrument 4 sends laser, the sequential of pulsed laser 4 and fiber spectrometer 2 is set according to the exciting characteristic of testing sample.Computing machine 15 is analyzed the LIBS signal that fiber spectrometer 2 spreads out of, and obtains each percentage composition information that the laser ablation sample produces; Also be used for obtaining the film thickness information that quartz crystal film thickness monitor 3 spreads out of, further obtain total ablation amount information of sample; The measurement result of the two combines the most at last, draws the ablating rate information of each composition.
Described pulsed laser 4, first quartz window 12, first condenser lens 10 are point-blank.
Described first quartz window 12, second quartz window 17, vacuum gauge 14 are installed on the flange of vacuum chamber 1.
Described fiber spectrometer 2(is example with the LIBS2500+ of U.S. marine optics company), can gather spectral range 200-980 nm, resolution 0.1 nm (FWHM) surveys 14,336 pixel CCD, and frame speed is controlled 10 Hz by computer; Trigger delay in 500ns-121us is to+135us, by the OOILIBS software control, is used for gathering LIBS spectrum, can carry out real-time observational measurement, has ppb and pieck stage sensitivity.Optical fiber 13 transfers to fiber spectrometer with collected light, and resulting spectral information is stored and analyzed to the duty of computing machine 15 control fiber spectrometers 2.
Described quartz crystal film thickness monitor 3(is example with the SQM of INFICON company 160), use speed and thickness in the quartz crystal sensor 9 commercial measurement film deposition processes, frequency resolution under 10 values of reading/second is 0.03Hz, and temperature stability is 2 ppm in the whole service scope.Quartz crystal 18 is positioned on baffled quartz crystal sensor 9, is used for collecting the material that laser splash goes out.
Described pulsed laser 4(is example with the French Quantel Brilliant EaZy of company model Nd:YAG ps pulsed laser and ns pulsed laser device) the high-energy ps pulsed laser and ns pulsed laser of 1064nm, 532nm, three kinds of wavelength of 355nm can be provided, as the lasing light emitter of laser ablation material and LIBS.
Detected materials is placed in the vacuum chamber, and laser is with the arbitrarily angled sample surfaces that is incident between 0 ° ~ 90 °, simulates in the fusion facility high energy neutral particle to the irradiation of material.Collect optical fiber and become arbitrarily angled with incident laser.For the particle that obtains to sputter as much as possible, QCM is placed in the face of detected materials, measure the weight that each laser pulse produces material.But in order to keep the life-span of quartz crystal 18, it should be become certain distance with detected materials.
Measuring process of the present utility model may further comprise the steps:
Step 1: sample is placed on the sample clamp 7, sample clamp 7 is placed on the electronic two-dimensional stage 6.
Step 2: regulate the position of electronic two-dimensional stage 6, condenser lens, make sample face quartz crystal 18 and place, and be positioned at the focus place of condenser lens; Make optical fiber 13 be positioned at the focus place of second condenser lens 16, to obtain the strongest LIBS signal intensity.
Step 3: with vacuum chamber 1 state that is evacuated, be beneficial to the length that prolongs plasma plume 8 with vacuum pump group 11, reduce airborne composition to the interference of LIBS signal; With vacuum gauge 14 measurement of vacuum, until air pressure less than 10
-3Mbar.
Step 4: pulse laser is incident to sample surfaces with 0 ° ~ 90 ° angles, with computing machine 15 gating pulse laser instruments 4, and input laser pulse number, control ablation time.
Step 5: vertical plasma plume 8 is collected spectral signal, and with computing machine 15 control fiber spectrometers, the sequential of regulating impulse laser instrument 4 and fiber spectrometer 2 obtains optimum signal intensity; Store the LIBS spectrum of gathering with computing machine 15.
Step 6: with computing machine 15 control quartz crystal monitors 3, when fiber spectrometer 2 and pulsed laser 4 are started working, the variation of quartz crystal monitor 2 record quartz crystals 18 resonant frequencies.Also available computers 15 demonstration in real time and record quartz crystal 18 resonant frequencies are with the variation of laser ablation time.
Step 7: with the method for freely calibrating, analyze the LIBS signal that collects, calculate the number percent of each component content in the sample.
Step 8: analyze the variation of quartz crystal 18 resonant frequencies, calculate total deposition.
Step 9: the result of LIBS and the result of QCM are combined, obtain each composition ablation amount.
Step 10: repeating step 4 ~ 9 obtains the change curve of sample ablation loss quality with the time of ablation; And then obtain the ablating rate of each composition.
Step 11: change laser energy, regulate the used energy density of ablation sample, repeating step 4 ~ 10 can obtain sample with the laser energy density difference, and whether the different ablating rates that produce are applicable to that for passing judgment on this material tokamak device provides a kind of normative reference.
In step 7, described free calibrating method, based on following hypothesis:
The first, think that the material that the composition of atom in the laser plasma can the actual response analytic target forms;
The second, think that laser plasma is in local thermodynamic equilibrium's state;
Three, do not consider the self absorption effect of plasma, think that this laser plasma is an optically thin plasma.
The characteristic spectral line intensity of the particle that records can be expressed as:
Wherein,
Be line strength of measuring, k, i are respectively the high and low energy level of the electronic transition of characteristic wavelength correspondence, and λ is the wavelength of the characteristic spectral line of selection analysis; F is test parameters, C
SBe the corresponding atom content of selected emission line; g
kBe high level degeneracy, A
KiBe the transition probability of k energy level to the i energy level, E
kBe high level energy, k
BBe Boltzmann constant, T is plasma temperature, U
S(T) be partition function.E
k, g
kAnd A
KiCan check in from atomic spectrum standard and technical data library NIST; F, T and
The result determines by experiment.
Definition x=E
k,
,
,
, y=mx+q then
sDraw (x, relation curve y) is used least square fitting, the slope reactive plasma temperature that obtains, the intercept that obtains is reacted the concentration of institute's amalyzing substances.
Constant F is determined by normalization:
In step 8, the variation of described analysis quartz crystal resonant frequency calculates total deposition, the following principle of foundation:
The natural resonance frequency f of the quartz chip piezoelectric effect of AT cutting is:
(1)
Wherein, n is harmonic number, n=1, and 3,5, d
QBe the thickness of quartz crystal, c is the shear elasticity coefficient; ρ is the density (2.65 * 10 of quartz crystal
3Kg/m
3);
Can Hua Wei ﹕ for first-harmonic (n=1) (1) formula commonly used
?(2)
Wherein,
(AT cutting) is called the frequency constant of crystal; d
QThickness for crystal.
(2) declined get:
The physical significance of following formula is, if thickness is d
QQuartz crystal increase thickness deltat d
Q, then the vibration frequency of crystal has changed Δ f, and the negative sign in the formula represents that the frequency of crystal reduces along with the increase of thickness.The rete of supposing deposit does not change the quartz crystal mode of oscillation, with quartz crystal thickness increment Delta d
QBe shown as by the quality map table and be thicknesses of layers increment Delta d
mThen:
And in fact the rete of deposit has changed quartzy vibration mode own, by the vibration mode of homogenous material, becomes the mixing vibration pattern of two kinds of materials; Consider after quartz crystal is by the rete deposit to become the mixing vibration pattern formula of the following calculating thickness of having derived:
(4)
Wherein, A
fBe film thickness, unit dust (); N
q-AT-cut crystal frequency constant, 1.668 * 10
13Hertz. dust (Hz; D
qBe quartzy density, 2.648g/cm
3π is constant, 3.1415926; D
fBe film material density, the g/cm of unit
3Z is material Z coefficient,
, Z
mThe acoustic impedance of the deposition membrane (gcm of unit
2S), Z
qThe acoustic impedance of the quartz crystal (gcm of unit
2S); F
qResonant frequency for quartz crystal; F
cCrystal frequency behind the deposition materials.
In step 9, described the result of LIBS and the result of QCM are combined, obtain each composition ablation amount, concrete grammar is:
Produce n kind material behind the assumes samples laser ablation, the i kind material concentration (relative concentration) that LIBS measures is C
SiQCM records crystal frequency behind the deposition materials
, then total ablation amount M is:
By Σ
iΜ
i=Μ and Σ
sC
s=1, can obtain the ablation amount of various ablation products
In step 10, the described method that obtains the ablating rate of each composition is: each composition ablation loss quality of sample is differentiated with the change curve of the time of ablation, can obtain ablating rate information.
Above content be in conjunction with optimal technical scheme to further describing that the present invention does, can not assert that the concrete enforcement of invention only limits to these explanations.Concerning the general technical staff of the technical field of the invention, under the prerequisite that does not break away from design of the present invention, can also make simple deduction and replacement, all should be considered as protection scope of the present invention.
Claims (3)
1. a device of measuring the anti-ablation characteristics of material is characterized in that, described a kind of device of measuring the anti-ablation characteristics of material comprises: vacuum system, laser ablation system, LIBS measuring system, QCM (Quartz Crystal Microbalance) measuring system;
Described vacuum system comprises: vacuum chamber (1), vacuum pump group (11), vacuum gauge (14); Vacuum pump group (11) and vacuum gauge (14) are installed in vacuum chamber (1) outer end;
Described laser ablation system comprises: pulsed laser (4), electronic two-dimensional stage (6), sample clamp (7), first condenser lens (10); Testing sample is positioned on the sample clamp (7), sample clamp (7) is fixed on the electronic two-dimensional stage (6), and is placed in the vacuum chamber (1); It is interior and corresponding with first quartz window (12) of vacuum chamber (1) that first condenser lens (10) is placed on vacuum chamber (1); Pulsed laser (4) is positioned at vacuum chamber (1) outside;
Described LIBS measuring system comprises: fiber spectrometer (2), second condenser lens (16), optical fiber (13), computing machine (15); It is interior and corresponding with second quartz window (17) of vacuum chamber (1) that described second condenser lens (16) is placed on vacuum chamber (1); Described fiber spectrometer (2) is gathered LIBS spectrum by optical fiber (13); Described computing machine (15) is connected with pulsed laser (4), fiber spectrometer (2) circuit respectively;
Described QCM (Quartz Crystal Microbalance) measuring system comprises: quartz crystal film thickness monitor (3), oscillator (5), quartz crystal sensor (9), quartz crystal (18); Quartz crystal (18) is fixed on the quartz crystal sensor (9), and with corresponding being placed in the vacuum chamber (1) of sample on the electronic two-dimensional stage (6); By the cable that can be used for vacuum chamber quartz crystal sensor (9) is connected with oscillator (5); With the BNC cable oscillator (5) is connected with quartz crystal film thickness monitor (3), described quartz crystal film thickness monitor (3) is connected with computing machine (15) circuit.
2. a kind of device of measuring the anti-ablation characteristics of material according to claim 1 is characterized in that, described pulsed laser (4), first quartz window (12), first condenser lens (10) are point-blank.
3. a kind of device of measuring the anti-ablation characteristics of material according to claim 1 is characterized in that, described first quartz window (12), second quartz window (17), vacuum gauge (14) are installed on the flange of vacuum chamber (1).
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| CN 201320162119 CN203148803U (en) | 2013-04-03 | 2013-04-03 | Device for measuring ablation resistant characteristic of material |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103196774A (en) * | 2013-04-03 | 2013-07-10 | 大连理工大学 | Device for measuring ablation resistance of material |
| CN105066865A (en) * | 2015-07-19 | 2015-11-18 | 张昌金 | Ablative thickness sensor using membrane technology |
| CN105548015A (en) * | 2016-01-13 | 2016-05-04 | 中国科学院合肥物质科学研究院 | Small-pore-diameter long-distance optical compatible vacuum sample cavity |
-
2013
- 2013-04-03 CN CN 201320162119 patent/CN203148803U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103196774A (en) * | 2013-04-03 | 2013-07-10 | 大连理工大学 | Device for measuring ablation resistance of material |
| CN105066865A (en) * | 2015-07-19 | 2015-11-18 | 张昌金 | Ablative thickness sensor using membrane technology |
| CN105066865B (en) * | 2015-07-19 | 2017-06-16 | 张昌金 | A kind of ablative thickness sensor of use membrane process |
| CN105548015A (en) * | 2016-01-13 | 2016-05-04 | 中国科学院合肥物质科学研究院 | Small-pore-diameter long-distance optical compatible vacuum sample cavity |
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