CN203118903U - Ion convergence device and ion implantation machine - Google Patents
Ion convergence device and ion implantation machine Download PDFInfo
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- CN203118903U CN203118903U CN 201320071347 CN201320071347U CN203118903U CN 203118903 U CN203118903 U CN 203118903U CN 201320071347 CN201320071347 CN 201320071347 CN 201320071347 U CN201320071347 U CN 201320071347U CN 203118903 U CN203118903 U CN 203118903U
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Abstract
The utility model discloses an ion convergence device and an ion implantation machine. The ion convergence device comprises a shell, a composite structure, a magnetic field generator and a fixed ring, wherein the composite structure is fixedly connected to the surface of the shell, the magnetic field generator is configured in the shell, the surface of the shell is configured between the composite structure and the magnetic field generator, the composite structure is configured between the fixed ring and the surface of the shell, the composite structure includes a plurality of plates, each of which has an edge, the edges of the plates enclose an opening, and the fixed ring completely exposes the opening and covers a portion of each plate. In addition, an ion implantation machine including the ion convergence device is further disclosed.
Description
Technical field
The utility model relates to a kind of ion convergence device and ion planting machine, and particularly relates to a kind of ion convergence device and ion planting machine that comprises combining structure.
Background technology
Since the twentieth century, every hard-core technology is as the too development of the computer of science and technology, electronic instrument and various functions of boat, production requirement to semiconductor element and circuit has higher performance, original production technology has limited the further raising of semiconducting behavior, and ion implantation technique reacts this demand just and a kind of semiconductor of developing is out supported by the arm and dyed new technology.It is the method that the ion that will have certain energy is implanted the surface of solids that ion injects, and by atom being introduced the superficial layer of solid pedestal or certain location wherein, makes the surface of material and bulk properties improve.At present, ion implantation technique has been widely used in the category of physics and material science.
Generally speaking, the main structure of ion implantor comprises ion source, ion extractuin device, ion convergence device, ion selector (for example mass spectrometer), accelerates cavity, target chamber (target chamber) etc.Wherein, ion source is for producing the basic equipment of various ions, and its operation principle is that target material is free, makes it form the ion of positively charged or negative electricity, and the ion extractuin device is drawn ion by drawing voltage again.Then, choose required ion via the ion selector, make it enter the acceleration cavity.Enter the interior ion of acceleration cavity after the voltage of acceleration cavity accelerates to required energy, just be sent to target chamber, and by focusing on scanning system the ion beam implantation is installed on the target of target chamber.
In the ion transfer process, the ion rapid wear injures the baffle plate in the contaminated ion convergence device.The operator often needs the baffle plate that ion is restrained in the device is split out cleaning or replacing for this reason.Yet existing baffle plate is one of the forming and the size of baffle plate is bigger than the member in its place ahead, so the operator is when maintenance ion convergence device, and needing earlier, the member in dismounting baffle plate the place ahead can take out baffle plate.This process consumption worker is consuming time, and is accumulated in easy and other members frictions of ion (for example phosphonium ion) on the baffle plate in unloading process, and causes the worker to pacify event.
The utility model content
The purpose of this utility model is to provide a kind of ion planting machine and ion convergence device, and its maintenance is few required man-hour.
For reaching above-mentioned purpose, the utility model provides a kind of ion planting machine.This ion planting machine comprises ion source, ion extractuin device and ion convergence device.Ion source provides a plurality of ions.The ion extractuin device is from ion source extraction ion and make these ions form ion beam.Ion convergence device is disposed on the bang path of ion beam and the convergence ion beam.Ion convergence device comprises housing, combining structure and retainer ring.Combining structure is fixed on the surface of housing and this surperficial contact.Combining structure is disposed between the surface of retainer ring and housing.Retainer ring is between ion extractuin device and combining structure.Combining structure comprises a plurality of plates.Each plate has an edge.The edge of these plates crosses an opening.Retainer ring fully exposes this opening and covers the part of each plate.
The utility model provides a kind of ion convergence device.This ion convergence device comprises housing, combining structure, magnetic field producer and retainer ring.Combining structure is fixed on the surface of housing and surface contact therewith.Magnetic field producer is disposed in the housing.The surface configuration of housing is between combining structure and magnetic field producer.Combining structure is disposed between the surface of retainer ring and housing.Combining structure comprises a plurality of plates.Each plate has an edge.The edge of these plates crosses an opening.Retainer ring fully exposes this opening and covers the part of each plate.
In an embodiment of the present utility model, the Breadth Maximum of above-mentioned combining structure integral body is greater than the maximum inner diameter of retainer ring, and the Breadth Maximum of each plate is less than the maximum inner diameter of retainer ring.
In an embodiment of the present utility model, each above-mentioned plate is fixed and has a space between the part that covers of ring and the retainer ring.
In an embodiment of the present utility model, each above-mentioned plate has an inclined-plane.The inclined-plane of one of adjacent plate tilts towards the direction near the surface of housing.The inclined-plane court of another of adjacent plate tilts away from the direction on the surface of housing.The inclined-plane of adjacent plate closely contacts.
In an embodiment of the present utility model, above-mentioned ion extractuin device comprises extractor electrode.Extractor electrode has a slit.Ion forms ion beam by slit.The shape of the opening that the edge of plate crosses is identical with the shape of slit.The size of the opening that the edge of plate crosses is greater than the size of slit.
In an embodiment of the present utility model, the opening that the edge of above-mentioned plate crosses be shaped as a rectangle.This rectangle has two relative long limit and two relative minor faces.Plate comprises first plate, second plate, the 3rd plate and the 4th plate of arranging in regular turn along clockwise direction.The major part on one of rectangular two long limits is the edge of first plate.The major part of one of rectangular two minor faces is the edge of second plate.The major part of another of rectangular two long limits is the edge of the 3rd plate.The major part of another of rectangular two minor faces is the edge of the 4th plate.
Advantage of the present utility model is, based on above-mentioned, in the ion planting machine and ion convergence device of the utility model one embodiment, because combining structure is the design of adopting multiple-piece, therefore the member before the operator can dismantle combining structure when maintenance ion convergence device, just can split out combining structure rapidly, and then shorten maintenance ion convergence device required man-hour.
For above-mentioned feature and advantage of the present utility model can be become apparent, embodiment cited below particularly, and cooperate appended accompanying drawing to be described in detail below.
Description of drawings
Fig. 1 is the schematic diagram of the ion planting machine of the utility model one embodiment;
Fig. 2 illustrates ion source and the ion extractuin device in the ion planting machine of the utility model one embodiment;
Fig. 3 illustrates the extractor electrode of the ion extractuin device of Fig. 2;
Fig. 4 is the schematic perspective view of the ion convergence device in the ion planting machine of the utility model one embodiment;
Fig. 5 is the perspective diagram of the ion convergence device of Fig. 4 of looking along the z direction;
Fig. 6 is the preceding schematic perspective view of combining structure combination of the utility model one embodiment;
Fig. 7 is the schematic perspective view after the combining structure of the utility model one embodiment makes up;
Situation when the combining structure that Fig. 8 illustrates the utility model one embodiment is pulled down from ion convergence device;
Fig. 9 illustrates the section of the combining structure of the utility model one embodiment;
Figure 10 illustrates the part of the ion convergence device of Fig. 4.
Symbol description
1000: ion planting machine
100: ion source
200: the ion extractuin device
210: extractor electrode
212: slit
300,500: ion convergence device
310: housing
312: the surface
320: combining structure
322, A1～A4: plate
322a: edge
322b: the part of plate
330: retainer ring
340: magnetic field producer
400,700: the ion selector
600: the ion beam controller
800: inhibitor
900: target chamber
A-A ': hatching line
F, F1, F2: inclined-plane
G: space
H, K: opening
I: ion
IB: ion beam
S: operator
W1, W3: width
W2: internal diameter
X, y, z: direction
Embodiment
Fig. 1 is the schematic diagram of the ion planting machine of the utility model one embodiment.Please refer to Fig. 1, ion planting machine 1000 comprises ion source 100, ion extractuin device 200 and ion convergence device 300.In the present embodiment, ion planting machine 1000 more comprises ion selector 400, ion convergence device 500, ion beam controller 600, ion selector 700, inhibitor 800 and target chamber 900.
Fig. 2 illustrates ion source and the ion extractuin device in the ion planting machine of the utility model one embodiment.Please refer to Fig. 2, the ion I that ion source 100 provides can be subjected to the effect of ion extractuin device 200 and form ion beam IB.In detail, the ion extractuin device 200 of present embodiment comprises extractor electrode (extraction electrode) 210.Fig. 3 illustrates the extractor electrode of the ion extractuin device of Fig. 2.Please refer to Fig. 2 and Fig. 3, the attraction that the ion I that ion source 100 provides can be subjected to extractor electrode 210 forms ion beam IB by one of them slit 212 of extractor electrode 210.
Fig. 4 is the schematic perspective view of the ion convergence device in the ion planting machine of the utility model one embodiment.Fig. 5 is the perspective diagram of the ion convergence device of Fig. 4 of looking along the z direction.Please refer to Fig. 1, Fig. 4 and Fig. 5, ion convergence device 300 comprises housing 310, combining structure 320 and retainer ring 330.Combining structure 320 is fixed on the surface 312 of housing 310 and with the surface 312 of housing 310 and contacts.Combining structure 320 is disposed between the surface 312 of retainer ring 330 and housing 310.Retainer ring 330 is between ion extractuin device 200 and combining structure 320.
Fig. 6 is the preceding schematic perspective view of combining structure combination of the utility model one embodiment.Fig. 7 is the schematic perspective view after the combining structure of the utility model one embodiment makes up.Please refer to Fig. 5, Fig. 6 and Fig. 7, combining structure 320 comprises a plurality of plates 322.Each plate 322 has edge 322a.The edge 322a of these plates 322 crosses opening H.As shown in Figure 5, retainer ring 330 fully exposes opening H and covers the part 322b of each plate 322.The Breadth Maximum W1 of combining structure 320 integral body is greater than the maximum inner diameter W2 of retainer ring 330.Each plate 322 Breadth Maximum W3 less than the maximum inner diameter W2 of retainer ring 330.As shown in Figure 4, each plate 322 is fixed and has space G between the ring 330 part 322b that cover and the retainer ring 330.
Situation when the combining structure that Fig. 8 illustrates the utility model one embodiment is pulled down from ion convergence device.Please refer to Fig. 4, Fig. 5 and Fig. 8, when operator S desire maintenance ion convergence device 300, can be earlier the plate 322 of combining structure 320 be pulled outward along-z direction haply, and plate 322 is tilted with respect to the surface 312 of housing 310.At this moment, the plate 322 ring 330 part 322b that cover that originally are fixed can leave the surface 312 of housing 310 and are distributed among the G of space, and operator S can extract plate 322 out in the G of space.Thus, when maintenance ion convergence device 300, operator S just can dismantle the member (for example retainer ring 330) before the combining structure 320, and split out the combining structure 320 of vulnerable to pollution and damage easily, and then shorten required man-hour of maintenance ion convergence device 300 and increase the spendable time of ion planting machine.
Fig. 9 illustrates the section of the combining structure of the utility model one embodiment.Particularly, Fig. 9 is the hatching line AA ' corresponding to Fig. 7.Please refer to Fig. 4, Fig. 7 and Fig. 9, in the present embodiment, each plate 322 has inclined-plane F.The inclined-plane F1 of one of adjacent plate A1, A2 A1 tilts towards the direction z near the surface 312 of housing 310.The inclined-plane F2 court of another A2 of adjacent plate A1, A2 tilts away from the direction-z on the surface 312 of housing 310.Adjacent plate A1, A2 can contact more closely by inclined-plane F1, F2, and operator S can more firmly be assembled in combining structure 320 in the ion convergence device 300.
Referring again to Fig. 3, Fig. 5 and Fig. 7, in the present embodiment, the shape of the opening H that the edge 322 of plate 322 crosses can be identical with the shape of slit 212, and the size of opening H can be greater than the size of slit 212.Say that further the shape of the opening H that the edge 322a of plate 322 crosses can be the rectangle identical with slit 212 shapes.This rectangle has two relative long limit and two relative minor faces.As shown in Figure 7, a plurality of plates 322 comprise the first plate A1, the second plate A2, the 3rd plate A3 and the 4th plate A4 that arranges in regular turn along clockwise direction.Most of E1 on one of rectangular two long limits is the edge 322a of the first plate A1.Most of E2 of one of rectangular two minor faces is the edge 322a of the second plate A2.Most of E3 of another of rectangular two long limits is the edge 322a of the 3rd plate A3.Most of E4 of another of rectangular two minor faces is the edge 322a of the 4th plate A4.
Because the slit 212 of extractor electrode 210 is elongated shape, two minor faces of the ion transport that passes from slit 212 easy damaged oblong openings H during to ion convergence device 300, and two of easy damaged oblong openings H long limits more not.Combining structure 320 by the described particular design of epimere, when two minor faces of oblong openings H damage, the replaceable second plate A2 of operator S and the 4th plate A4, and do not change the first plate A1 and the 3rd plate A3, just can repair the combining structure 320 of ion convergence device 300.Thus, the cost of maintenance ion planting machine just can reduce.
Figure 10 illustrates the part of the ion convergence device of Fig. 4.Please refer to Fig. 4 and Figure 10, in the present embodiment, ion convergence device 300 more comprises magnetic field producer 340.Magnetic field producer 340 is disposed in the housing 310.The surface 312 of housing 310 is disposed between combining structure 320 and the magnetic field producer 340.The surface 312 of housing 310 has another opening K.Opening K is communicated with opening H.The opening H that ion beam crosses by plate 322 edges in regular turn and the opening K of housing enter in the magnetic field producer 340.It should be noted that in the present embodiment the edge 322a of each plate 322 can surpass the edge of opening H.In other words, the opening H that plate 322 edges cross can be slightly larger than the opening K of housing, and makes plate 322 more positively protect main member in the ion convergence device 300.
In sum, in the ion planting machine and ion convergence device of the utility model one embodiment, because combining structure is the design of adopting multiple-piece, therefore the member before the operator can dismantle combining structure when maintenance ion convergence device, just can split out combining structure rapidly, and then shorten maintenance ion convergence device required man-hour.
Claims (11)
1. an ion planting machine is characterized in that, this ion planting machine comprises:
Ion source provides a plurality of ions;
The ion extractuin device, this ion source extracts those ions and makes those ions form an ion beam certainly; And
Ion convergence device is disposed on the bang path of this ion beam and restrains this ion beam, and this ion convergence device comprises:
Housing;
Combining structure, a surface that is fixed in this housing is gone up and is contacted with this surface of this housing; And
Retainer ring, this combining structure is disposed between this surface of this retainer ring and this housing, this retainer ring is between this ion extractuin device and this combining structure, this combining structure comprises a plurality of plates, each this plate has an edge, the edge of those plates crosses an opening, and this retainer ring fully exposes this opening and covers the part of each this plate.
2. ion planting machine as claimed in claim 1 it is characterized in that the Breadth Maximum of this combining structure integral body is greater than the maximum inner diameter of this retainer ring, and the Breadth Maximum of each this plate is less than the maximum inner diameter of this retainer ring.
3. ion planting machine as claimed in claim 1 is characterized in that, there is a space in each this plate between this part that this retainer ring covered and this retainer ring.
4. ion planting machine as claimed in claim 1, it is characterized in that, each this plate has an inclined-plane, the inclined-plane of one of those adjacent plates tilts towards this surperficial direction near this housing, the inclined-plane of another of those adjacent plates tilts towards this surperficial direction away from this housing, and those inclined-planes of those adjacent plates closely contact.
5. ion planting machine as claimed in claim 1, it is characterized in that, this ion extractuin device comprises an extractor electrode, this extractor electrode has a slit, those ions form this ion beam by this slit, the shape of this opening that the edge of those plates crosses is identical with the shape of this slit, and the size of this opening of crossing of the edge of those plates is greater than the size of this slit.
6. ion planting machine as claimed in claim 1, it is characterized in that, this opening that the edge of those plates crosses be shaped as a rectangle, this rectangle has two relative long limit and two relative minor faces, those plates comprise first plate of arranging in regular turn along clockwise direction, second plate, the 3rd plate and the 4th plate, the major part on one of these rectangular those long limits is the edge of this first plate, the major part of one of these rectangular those minor faces is the edge of this second plate, the major part of another of these rectangular those long limits is the edge of the 3rd plate, and the major part of another of these rectangular those minor faces is the edge of the 4th plate.
7. an ion is restrained device, comprising:
Housing;
Combining structure, a surface that is fixed in this housing is gone up and is contacted with this surface of this housing;
Magnetic field producer is disposed in this housing, and this surface configuration of this housing is between this combining structure and this magnetic field producer; And
Retainer ring, this combining structure is disposed between this surface of this retainer ring and this housing, and this combining structure comprises a plurality of plates, and each this plate has an edge, the edge of those plates crosses an opening, and this retainer ring fully exposes this opening and covers the part of each this plate.
8. ion convergence device as claimed in claim 7 it is characterized in that the Breadth Maximum of this combining structure integral body is greater than the maximum inner diameter of this retainer ring, and the Breadth Maximum of each this plate is less than the maximum inner diameter of this retainer ring.
9. ion as claimed in claim 7 convergence device is characterized in that, each this plate is by existence one space between this part that this retainer ring covered and this retainer ring.
10. ion as claimed in claim 7 is restrained device, it is characterized in that, each this plate has an inclined-plane, the inclined-plane of one of those adjacent plates tilts towards this surperficial direction near this housing, the inclined-plane of another of those adjacent plates tilts towards this surperficial direction away from this housing, and those inclined-planes of adjacent those plates closely contact.
11. ion convergence device as claimed in claim 7, it is characterized in that, this opening that the edge of those plates crosses be shaped as a rectangle, this rectangle has two relative long limit and two relative minor faces, those plates comprise first plate of arranging in regular turn along clockwise direction, second plate, the 3rd plate and the 4th plate, the major part on one of these rectangular those long limits is the edge of this first plate, the major part of one of these rectangular those minor faces is the edge of this second plate, the major part of another of these rectangular those long limits is the edge of the 3rd plate, and the major part of another of these rectangular those minor faces is the edge of the 4th plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320071347 CN203118903U (en) | 2013-02-07 | 2013-02-07 | Ion convergence device and ion implantation machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320071347 CN203118903U (en) | 2013-02-07 | 2013-02-07 | Ion convergence device and ion implantation machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203118903U true CN203118903U (en) | 2013-08-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320071347 Expired - Lifetime CN203118903U (en) | 2013-02-07 | 2013-02-07 | Ion convergence device and ion implantation machine |
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| CN (1) | CN203118903U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105092689A (en) * | 2014-05-20 | 2015-11-25 | 中国科学院大连化学物理研究所 | Real time on-line expired air monitor |
-
2013
- 2013-02-07 CN CN 201320071347 patent/CN203118903U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105092689A (en) * | 2014-05-20 | 2015-11-25 | 中国科学院大连化学物理研究所 | Real time on-line expired air monitor |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190625 Address after: Hsinchu Science Park, Taiwan, China Patentee after: Powerchip Technology Corp. Address before: Hsinchu Science Park, Taiwan, China Patentee before: Powerchip Technology Corp. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130807 |