CN203065564U - Target base plate for ion-plating gun - Google Patents
Target base plate for ion-plating gun Download PDFInfo
- Publication number
- CN203065564U CN203065564U CN 201320090951 CN201320090951U CN203065564U CN 203065564 U CN203065564 U CN 203065564U CN 201320090951 CN201320090951 CN 201320090951 CN 201320090951 U CN201320090951 U CN 201320090951U CN 203065564 U CN203065564 U CN 203065564U
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- Prior art keywords
- ion plating
- rifle chassis
- plating rifle
- insulation covering
- target
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- Expired - Fee Related
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- 238000007733 ion plating Methods 0.000 title claims abstract description 207
- 238000007789 sealing Methods 0.000 claims abstract description 26
- 238000009413 insulation Methods 0.000 claims description 76
- 239000013077 target material Substances 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 10
- 229910001220 stainless steel Inorganic materials 0.000 claims description 6
- 239000010935 stainless steel Substances 0.000 claims description 6
- 238000009826 distribution Methods 0.000 abstract description 5
- 238000009776 industrial production Methods 0.000 abstract description 3
- 238000007747 plating Methods 0.000 abstract description 3
- 238000002360 preparation method Methods 0.000 abstract description 3
- 239000011253 protective coating Substances 0.000 abstract description 3
- 238000010891 electric arc Methods 0.000 abstract description 2
- 230000007547 defect Effects 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 235000007516 Chrysanthemum Nutrition 0.000 description 1
- 244000189548 Chrysanthemum x morifolium Species 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 230000003245 working effect Effects 0.000 description 1
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Abstract
The utility model relates to the field of preparation of surface protective coatings and in particular relates to a target base plate for an ion-plating gun device. An ion-plating gun base plate insulating disc, an ion-plating gun base plate, an ion-plating gun base plate fastening plate are arranged at the outer side of a target bottom column insulating sleeve, wherein the ion-plating gun base plate fastening plate is arranged at one side of the ion-plating gun base plate; the ion-plating gun base plate fastening plate is separated from the ion-plating gun base plate by the insulating sleeve disc on the target bottom column insulating sleeve; the lower part of the insulating sleeve disc contacts with the ion-plating gun base plate fastening plate; the upper part of the insulating sleeve disc contacts with the ion-plating gun base plate to form a seal by a sealing ring; and the ion-plating gun base plate insulating disc is arranged at the other side of the ion-plating gun base plate. The target base plate for the ion-plating gun is simple, compact and effective in structure, simple to operate, good in tightness, convenient for integral design and capable of satisfying various requirements of industrial production to vacuum indoor plasma distribution. Moreover, the target base plate for the ion-plating gun can be used for solving the defects that the conventional electric-arc ion-plating arc source is complex in structure, poor in tightness and difficult to realize the special plating needs.
Description
Technical field
The utility model relates to the surface protection coating preparation field, specifically a kind of target base disk for the ion plating gun apparatus.
Background technology
The surface protection coating technology is to improve tool and mould and the important channel in mechanical part quality and work-ing life, PVD technology as one of material surface guard technology, with its functional, favorable environment protection and huge advantages such as synergy widely, can improve the mechanical properties such as wear resistance, solidity to corrosion, thermotolerance and fatigue resistance of tool and mould and machinery part surface, improve added value of product greatly, to guarantee reliably and the constantly operation under high speed, high temperature, high pressure, heavy duty and strong corrosive medium operating mode of modern mechanical parts and tool and mould.PVD mainly is divided into vacuum evaporation, magnetron sputtering and three types of ion plating.In actual applications, high-quality protective coating must have fine and close weave construction, no penetrance pin hole, high rigidity, and characteristics such as matrix bond is firm.Vacuum evaporation and magnetron sputtering be because particle energy and ionization level are low, causes that rete is loose porous, poor mechanical property, is difficult to obtain good coating and the bonding force between the matrix, seriously limited the application of such technology in the protective coating preparation field.
And the ion coating plating technology because simple in structure, ionization level is high, projectile energy is high, can easily obtain high rigidity, the ceramic coating of high-wearing feature, compound coating that additive method is difficult to obtain, be applied in instrument, above the mould, life-span is significantly improved, realized effect low-cost, high yield preferably; In addition, the ion coating plating technology has low temperature, two characteristics of high energy, almost can be on any base material film forming, range of application is very wide.The used arc source structure of arc ion plating is cold cathode arc source, the behavior of electric arc is moved about fast by cathode surface is many, highly Ming Liang cathode spot is controlled, and the motion of cathode spot has very big influence to the physical property of arc plasma and plated film characteristic subsequently.And ion plating arc source is the source of arc plasma discharge, is the core component of ion plating technique.In order better to improve the quality of deposit film and effectively to utilize target, improve discharge stability, must reasonably control the motion of arc spot.And effective control of arc spot must have rational physical construction to cooperate with magnetic field structure, and with regard to the small size arc source structure that industry is at present used always, target material structure commonly used has disc, cylindrical, conical, truncated cone-shaped; Magnetic field structure commonly used has axial divergent magnetic field, axial focusing magnetic field, rotatingfield etc.; And the arc source structure that different targets cooperates with magnetic field configuration is all different, and design is complicated, bad adaptability, and function singleness, conversion target and magnetic approach must a complete set ofly be changed whole arc source if desired, have caused greatly waste.
For industrial plated film production, the stability of product, large-area uniformity, high efficiency all are to consider.And because the arc source is point source, the distribution of arc source leading portion plasma body all is inhomogeneous, traditional arc source complicated in mechanical structure, and target generally can not surpass the furnace wall in the stationkeeping of vacuum chamber, is difficult to satisfy for some special producing demands; Part arc source structure volume is excessive, the window diameter is too little, and the plasma body intersection region is not obvious, is difficult to realize the even plated film production of industrialization, product percent of pass and homogeneity reduce greatly, this also is that magnetic filters one of reason of can not industrialization producing, and magnetic filter is bulky, is difficult in a body of heater and realizes intensive distribution, therefore the plasma body transmission window is narrow, be difficult between the window intersect, form the low vacancy district of plasma density easily, it is unfavorable that plated film is produced.
The utility model content
The purpose of this utility model is to provide a kind of ion plating target material base disk, in order to improve the shortcoming that conventional arc ion plating arc source structure complexity, stopping property are poor, be difficult to realize special plated film demand.
To achieve these goals, the technical solution of the utility model is:
A kind of ion plating target material base disk comprises: ion plating rifle chassis binding, target foundation insulation covering, ion plating rifle chassis, ion plating rifle chassis insulating disc, sealing-ring, insulation covering dish, and concrete structure is as follows:
The arranged outside ion plating rifle chassis insulating disc of target foundation insulation covering, ion plating rifle chassis, ion plating rifle chassis binding, one side on ion plating rifle chassis arranges ion plating rifle chassis binding, ion plating rifle chassis binding separates by the insulation covering dish on the target foundation insulation covering and ion plating rifle chassis, insulation covering dish bottom contacts with ion plating rifle chassis binding, insulation covering dish top contacts with ion plating rifle chassis, form sealing by sealing-ring, the opposite side on ion plating rifle chassis arranges ion plating rifle chassis insulating disc.
Described ion plating target material base disk, target foundation insulation covering are arranged at the target foundation outside of ion plating gun apparatus.
Described ion plating target material base disk, ion plating rifle chassis binding is the Stainless Steel Disc of a band center hole, its center-hole diameter is consistent with target foundation insulation covering external diameter, ion plating rifle chassis binding encloses and is enclosed within on the target foundation insulation covering, and binding top, ion plating rifle chassis closely contacts below the insulation covering dish.
Described ion plating target material base disk, ion plating rifle chassis binding keeps to the side and is provided with ion plating rifle chassis binding open holes, ion plating rifle chassis binding open holes is corresponding with lower thread hole, ion plating rifle chassis, by this ion plating rifle chassis binding open holes, the insulation covering dish is fastened between ion plating rifle chassis and the ion plating rifle chassis binding.
Described ion plating target material base disk, binding top, ion plating rifle chassis and insulation covering dish contact surface are provided with ion plating rifle chassis binding sealing groove, seal by closely contact to form between ion plating rifle chassis binding sealing groove inner seal ring and the insulation covering dish.
Described ion plating target material base disk, ion plating rifle chassis is the certain thickness Stainless Steel Disc that has of a band center hole, the chassis outside dimension is consistent with body of heater flange size on the vacuum chamber, center-hole diameter is consistent with target foundation insulation covering external diameter, ion plating rifle chassis is enclosed and is enclosed within on the target foundation insulation covering, closely contacts above the insulation covering dish of bottom, ion plating rifle chassis and target foundation insulation covering.
Described ion plating target material base disk, ion plating rifle chassis keeps to the side and is provided with ion plating rifle chassis open holes, ion plating rifle chassis open holes is corresponding with the body of heater flange mounting hole on the vacuum chamber, and by this ion plating rifle chassis open holes, the ion plating gun apparatus is installed on the vacuum chamber.
Described ion plating target material base disk has sealing groove on the ion plating rifle chassis on the ion plating rifle chassis, in the sealing groove sealing-ring is installed on the ion plating rifle chassis, and ion plating rifle chassis is by described sealing-ring and vacuum chamber sealing; Bottom, ion plating rifle chassis is provided with ion plating rifle chassis lower seal groove cavity near centre hole, ion plating rifle chassis lower seal groove cavity external diameter is less than the insulation covering dish external diameter of target foundation insulation covering, seals by closely contact to form between groove inner seal ring and the target foundation insulating disc.
Described ion plating target material base disk, ion plating rifle chassis is provided with threaded hole near near the sealing groove, the threaded hole preglabellar field is greater than insulation covering dish external diameter, be connected with ion plating rifle chassis binding by this threaded hole, the insulation covering dish is fastened between ion plating rifle chassis and the ion plating rifle chassis binding.
Advantage of the present utility model and beneficial effect are:
1. the utility model simple structure is effectively compact, and easy and simple to handle, good airproof performance is convenient to the complete machine design and is satisfied industrial production to the various demands of plasma distribution in the vacuum chamber.
2. of the present utility modelly can realize multiple special plated film demand, as inwall plated film, polynary composite film coating etc.; Simultaneously, cooperate around the outer various magnetic fields of target flange to arrange, as rotatingfield, axial magnetic field etc., realize multiple composite magnetic controlled plated film mode.
3. each parts can independent fabrication and installation in the utility model, and loading and unloading can be changed separately easily, and regulation range is big, and cost is low, are easy to promote.
Description of drawings
Fig. 1 is structural representation of the present utility model.
Fig. 2 (a)-(c) is the ion plating rifle chassis binding structural representation of the utility model ion plating gun apparatus; Wherein, (a) figure is front view; (b) figure is the B-B sectional view among (a) figure; (c) figure is the A-A sectional view among (a) figure.
Fig. 3 (a)-(c) is the ion plating rifle chassis structure synoptic diagram of the utility model ion plating gun apparatus; Wherein, (a) figure is front view; (b) figure is the D-D sectional view among (a) figure; (c) figure is the C-C sectional view among (a) figure.
Among the figure, 1 ion plating rifle chassis binding; 2 target foundation insulation coverings; 3 ion plating rifle chassis; 4 ion plating rifle chassis insulating discs; 5 sealing-rings; 6 insulation covering dishes; 7 ion plating rifle chassis binding open holess; 8 ion plating rifle chassis binding sealing grooves; 9 ion plating rifle chassis lower seal groove cavities; Sealing groove on the 10 ion plating rifle chassis; 11 ion plating rifle chassis open holess; 12 threaded holes.
Embodiment
Below by embodiment and accompanying drawing the utility model is described in further detail.
As Figure 1-3, the utility model ion plating target material base disk, mainly comprise: sealing groove 10, ion plating rifle chassis open holes 11 etc. on ion plating rifle chassis binding 1, target foundation insulation covering 2, ion plating rifle chassis 3, ion plating rifle chassis insulating disc 4, sealing-ring 5, insulation covering dish 6, ion plating rifle chassis binding open holes 7, ion plating rifle chassis binding sealing groove 8, ion plating rifle chassis lower seal groove cavity 9, the ion plating rifle chassis, concrete structure is as follows:
As shown in Figure 1, the arranged outside ion plating rifle chassis insulating disc 4 of target foundation insulation covering 2, ion plating rifle chassis 3, ion plating rifle chassis binding 1, one side on ion plating rifle chassis 3 arranges ion plating rifle chassis binding 1, ion plating rifle chassis binding 1 separates with ion plating rifle chassis 3 by the insulation covering dish 6 on the target foundation insulation covering 2, insulation covering dish 6 bottoms contact with ion plating rifle chassis binding 1, insulation covering dish 6 tops contact with ion plating rifle chassis 3, form sealing by sealing-ring 5, the opposite side on ion plating rifle chassis 3 arranges ion plating rifle chassis insulating disc 4.The utility model target foundation insulation covering 2 is arranged at the target foundation outside of ion plating gun apparatus, is used for the insulation of target foundation.
Shown in Fig. 2 (a)-(c), ion plating rifle chassis binding 1 is the certain thickness Stainless Steel Disc that has of a band center hole, ion plating rifle chassis binding 1 outside dimension is more bigger than insulation covering dish 6 outside dimensions, center-hole diameter is consistent with target foundation insulation covering external diameter, ion plating rifle chassis binding 1 encloses and is enclosed within on the target foundation insulation covering, and binding 1 top, ion plating rifle chassis closely contacts below insulation covering dish 6; Ion plating rifle chassis binding 1 keeps to the side and is provided with 6-8 ion plating rifle chassis binding open holes 7, ion plating rifle chassis binding open holes 7 is corresponding with 3 lower thread holes, ion plating rifle chassis, by this ion plating rifle chassis binding open holes 7 insulation covering dish 6 is fastened between ion plating rifle chassis 3 and the ion plating rifle chassis binding 1; Binding 1 top, ion plating rifle chassis and insulation covering dish 6 contact surfaces are provided with ion plating rifle chassis binding sealing groove 8, by closely contact the formation effective seal between ion plating rifle chassis binding sealing groove 8 inner seal rings and the insulation covering dish 6.
Shown in Fig. 3 (a)-(c), ion plating rifle chassis 3 is the certain thickness Stainless Steel Disc that has of a band center hole, the chassis outside dimension is consistent with the body of heater flange size, center-hole diameter is consistent with target foundation insulation covering 2 external diameters, ion plating rifle chassis 3 is enclosed and is enclosed within on the target foundation insulation covering 2, closely contacts above the insulation covering dish 6 of 3 bottoms, ion plating rifle chassis and target foundation insulation covering 2; Ion plating rifle chassis 3 keeps to the side and is provided with 6-8 ion plating rifle chassis open holes 11, ion plating rifle chassis open holes 11 is corresponding with the body of heater flange mounting hole on the vacuum chamber, by this ion plating rifle chassis open holes 11 the ion plating gun apparatus is installed on the vacuum chamber, have sealing groove 10 on the ion plating rifle chassis on the ion plating rifle chassis 3, in the sealing groove 10 sealing-ring is installed on the ion plating rifle chassis, ion plating rifle chassis 3 is by described sealing-ring and vacuum chamber sealing; 3 bottoms, ion plating rifle chassis are provided with ion plating rifle chassis lower seal groove cavity 9 near centre hole, ion plating rifle chassis lower seal groove cavity 9 external diameters are less than insulation covering dish 6 external diameters of target foundation insulation covering 2, closely contacts the formation effective seal by between groove inner seal ring and the target foundation insulating disc 4; Ion plating rifle chassis 3 is provided with 6-8 threaded hole 12 near near the sealing groove, threaded hole 12 preglabellar fields are greater than insulation covering dish 6 external diameters, be connected with ion plating rifle chassis binding 1 by this threaded hole 12, insulation covering dish 6 is fastened between ion plating rifle chassis 3 and the ion plating rifle chassis binding 1.
In the utility model, target foundation insulation covering 2 is certain thickness polymer pipe box, target foundation insulation covering 2 internal diameters are consistent with target foundation external diameter, target foundation annular seal groove by target foundation outer wall carries out insulated enclosure, pipe box encloses and is enclosed within around the target foundation, and pipe box top is concordant with the target foundation; Target foundation insulation covering is provided with an insulation covering dish 6 outward, and insulation covering dish 6 tops contact with ion plating rifle chassis 3, forms effective seal by ion plating rifle chassis lower seal groove cavity 9.
In ion plating rifle when work,, the insulated wire corral is enclosed within around the target foundation insulation covering 2 of target base rear end, and contacts by a dead ring (ion plating rifle chassis insulating disc 4) between the ion plating rifle chassis 3, and solenoid leads to direct current, by the intensity in voltage magnetic field.The magnetic field that solenoid produces axial magnetic flux formation is the rotational symmetry divergent magnetic field, form the acute angle that points to the target edge with the disc target, under this action of a magnetic field, the arc spot is done the chrysanthemum shape motion of continuous contraction and expansion, and stronger magnetic field can be pushed the arc spot to the edge of target.The utility model simple structure is effectively compact, the length of watercooling jacket can freely be set, the position of free adjustment target in vacuum chamber, easy and simple to handle, target are changed easily, the position adjustability is good, be convenient to the complete machine design and satisfy industrial production to the various demands of plasma distribution in the vacuum chamber.
Claims (9)
1. an ion plating target material base disk is characterized in that, comprising: ion plating rifle chassis binding, target foundation insulation covering, ion plating rifle chassis, ion plating rifle chassis insulating disc, sealing-ring, insulation covering dish, and concrete structure is as follows:
The arranged outside ion plating rifle chassis insulating disc of target foundation insulation covering, ion plating rifle chassis, ion plating rifle chassis binding, one side on ion plating rifle chassis arranges ion plating rifle chassis binding, ion plating rifle chassis binding separates by the insulation covering dish on the target foundation insulation covering and ion plating rifle chassis, insulation covering dish bottom contacts with ion plating rifle chassis binding, insulation covering dish top contacts with ion plating rifle chassis, form sealing by sealing-ring, the opposite side on ion plating rifle chassis arranges ion plating rifle chassis insulating disc.
2. according to the described ion plating target of claim 1 material base disk, it is characterized in that target foundation insulation covering is arranged at the target foundation outside of ion plating gun apparatus.
3. according to the described ion plating target of claim 1 material base disk, it is characterized in that, ion plating rifle chassis binding is the Stainless Steel Disc of a band center hole, its center-hole diameter is consistent with target foundation insulation covering external diameter, ion plating rifle chassis binding encloses and is enclosed within on the target foundation insulation covering, and binding top, ion plating rifle chassis closely contacts below the insulation covering dish.
4. according to the described ion plating target of claim 3 material base disk, it is characterized in that, ion plating rifle chassis binding keeps to the side and is provided with ion plating rifle chassis binding open holes, ion plating rifle chassis binding open holes is corresponding with lower thread hole, ion plating rifle chassis, by this ion plating rifle chassis binding open holes, the insulation covering dish is fastened between ion plating rifle chassis and the ion plating rifle chassis binding.
5. according to the described ion plating target of claim 3 material base disk, it is characterized in that, binding top, ion plating rifle chassis and insulation covering dish contact surface are provided with ion plating rifle chassis binding sealing groove, seal by closely contact to form between ion plating rifle chassis binding sealing groove inner seal ring and the insulation covering dish.
6. according to the described ion plating target of claim 1 material base disk, it is characterized in that, ion plating rifle chassis is the certain thickness Stainless Steel Disc that has of a band center hole, the chassis outside dimension is consistent with body of heater flange size on the vacuum chamber, center-hole diameter is consistent with target foundation insulation covering external diameter, ion plating rifle chassis is enclosed and is enclosed within on the target foundation insulation covering, closely contacts above the insulation covering dish of bottom, ion plating rifle chassis and target foundation insulation covering.
7. according to the described ion plating target of claim 6 material base disk, it is characterized in that, ion plating rifle chassis keeps to the side and is provided with ion plating rifle chassis open holes, ion plating rifle chassis open holes is corresponding with the body of heater flange mounting hole on the vacuum chamber, by this ion plating rifle chassis open holes, the ion plating gun apparatus is installed on the vacuum chamber.
8. according to the described ion plating target of claim 6 material base disk, it is characterized in that, have sealing groove on the ion plating rifle chassis on the ion plating rifle chassis, in the sealing groove sealing-ring is installed on the ion plating rifle chassis, ion plating rifle chassis is by described sealing-ring and vacuum chamber sealing; Bottom, ion plating rifle chassis is provided with ion plating rifle chassis lower seal groove cavity near centre hole, ion plating rifle chassis lower seal groove cavity external diameter is less than the insulation covering dish external diameter of target foundation insulation covering, seals by closely contact to form between groove inner seal ring and the target foundation insulating disc.
9. according to the described ion plating target of claim 6 material base disk, it is characterized in that, ion plating rifle chassis is provided with threaded hole near near the sealing groove, the threaded hole preglabellar field is greater than insulation covering dish external diameter, be connected with ion plating rifle chassis binding by this threaded hole, the insulation covering dish is fastened between ion plating rifle chassis and the ion plating rifle chassis binding.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320090951 CN203065564U (en) | 2013-02-28 | 2013-02-28 | Target base plate for ion-plating gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320090951 CN203065564U (en) | 2013-02-28 | 2013-02-28 | Target base plate for ion-plating gun |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203065564U true CN203065564U (en) | 2013-07-17 |
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ID=48764378
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320090951 Expired - Fee Related CN203065564U (en) | 2013-02-28 | 2013-02-28 | Target base plate for ion-plating gun |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203065564U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112002440A (en) * | 2020-10-14 | 2020-11-27 | 大连理工大学 | Device for replacing linear plasma source |
-
2013
- 2013-02-28 CN CN 201320090951 patent/CN203065564U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112002440A (en) * | 2020-10-14 | 2020-11-27 | 大连理工大学 | Device for replacing linear plasma source |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130717 Termination date: 20160228 |
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| CF01 | Termination of patent right due to non-payment of annual fee |