CN202870441U - Array substrate, display device and line width measuring device - Google Patents
Array substrate, display device and line width measuring device Download PDFInfo
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- CN202870441U CN202870441U CN 201220620090 CN201220620090U CN202870441U CN 202870441 U CN202870441 U CN 202870441U CN 201220620090 CN201220620090 CN 201220620090 CN 201220620090 U CN201220620090 U CN 201220620090U CN 202870441 U CN202870441 U CN 202870441U
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- strip shaped
- electric poles
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Abstract
The utility model provides an array substrate, a display device and a line width measuring device, and relates to the field of liquid crystal display. According to the array substrate, the display device and the line width measuring device, accurate line width of a strip electrode can be measured and acquired. The array substrate comprises a transparent substrate, a grid metal layer, a grid insulator layer, an active layer, a drain-source metal layer and a passivating layer, wherein the grid metal layer, the grid insulator layer, the active layer, the drain-source metal layer and the passivating layer are arranged on the transparent substrate. The grid metal layer comprises a grid line pattern and a grid electrode pattern. The drain-source metal layer comprises a data line pattern, a source electrode pattern and a drain electrode pattern. The array substrate further comprises first strip electrodes arranged in a pixel region and second strip electrodes arranged in a line width measuring region. The array substrate further comprises a non-transparent pattern arranged in the line width measuring region, wherein the non-transparent pattern is located below the second strip electrodes, and part of borders of two sides of at least one second strip electrode are located in a region where the non-transparent pattern is located. The passivating layer at least covers the pixel region.
Description
Technical field
The utility model relates to field of liquid crystal, relates in particular to a kind of array base palte, display device and wire width measuring device.
Background technology
At TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-LCD) in the manufacturing industry, CD (Critical Dimension, critical size) control measurement is extremely important, and the accuracy of its measurement result will have influence on the performance of whole display device.In the array base palte of ADS (Advanced-Super Dimension Switch, a senior super dimension switch technology) type, the live width of strip shaped electric poles spaced apart is exactly the critical size of array base palte, will have influence on the performances such as transmitance of display device.At described array base palte wire width measuring district, one place is arranged, be used for measuring the live width of strip shaped electric poles.But, because each strip shaped electric poles limit of distribution of wire width measuring district is fuzzy, exist the strip shaped electric poles wire width measuring less than the problem excessively poor with measurement accuracy always.
The utility model content
Embodiment of the present utility model provides a kind of array base palte, display device and wire width measuring device, can measure to obtain the accurately live width of strip shaped electric poles.
For achieving the above object, embodiment of the present utility model adopts following technical scheme:
A kind of array base palte comprises: transparency carrier, and metal level and passivation layer are leaked in the grid metal level, gate insulation layer, active layer, the source that are arranged on the described transparency carrier; Wherein, described grid metal level comprises: the pattern of grid line and grid, described source leak metal level and comprise: the pattern of data line, source electrode, drain electrode; Described array base palte also comprises: be arranged on the first strip shaped electric poles and the second strip shaped electric poles that is arranged on the wire width measuring district in the pixel region; Also comprise:
Be arranged on the opaque pattern in described wire width measuring district, the border, part both sides that described opaque pattern is positioned at the below of described the second strip shaped electric poles and at least one the second strip shaped electric poles is positioned at the zone at described opaque pattern place;
Described passivation layer covers described pixel region at least.
Preferably, the pattern of described opaque pattern and described grid line and grid arranges with layer; Or the pattern of described opaque pattern and described data line, source electrode, drain electrode arranges with layer.
Preferably, the whole described wire width measuring of described opaque pattern covers district.
Preferably, described passivation layer only covers described pixel region.
A kind of display device comprises the color membrane substrates behind the box and array base palte, and described array base palte is the described array base palte of above-mentioned any one.
A kind of wire width measuring device comprises:
Measuring unit, be used for to measure obtain the width value CD1 of arbitrary the second strip shaped electric poles in wire width measuring district, the boundary of described the second strip shaped electric poles in its downside raceway groove with the downside border of the width value CD2 on the non-conterminous border of described the second strip shaped electric poles and described the second strip shaped electric poles in its upside raceway groove with the width value CD3 on the non-conterminous border of described the second strip shaped electric poles;
The comparison process unit, the CD2 and the CD3 that are used for measuring at described measuring unit meet the following conditions: during desired value-undulating quantity＜CD2＜desired value+undulating quantity and desired value-undulating quantity＜CD3＜desired value+undulating quantity, determine that described CD1 is the wire width measuring exact value; When described CD2 and CD3 do not satisfy described condition, determine that described CD1 is inaccurate.
The array base palte that technique scheme provides, display device and wire width measuring device, by under described the second strip shaped electric poles, opaque pattern being set, increase the boundary contrast of described the second strip shaped electric poles, so that described the second strip distribution of electrodes boundary is clear, thereby measure the accurately live width that obtains described the second strip shaped electric poles.The other line width measuring method and the device that provide of technique scheme, by increasing the restrictive condition to CD2 and CD3, whether the boundary line of selecting when determining to measure has accurately, thereby judges whether the live width CD1 that records is accurate, and then increases the accuracy of wire width measuring.
Description of drawings
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art, apparently, accompanying drawing in the following describes only is embodiment more of the present utility model, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
The cross-sectional view of a kind of array base palte that Fig. 1 provides for the utility model embodiment;
The cross-sectional view of the another kind of array base palte that Fig. 2 provides for the utility model embodiment;
The plan structure synoptic diagram in a kind of wire width measuring district that Fig. 3 provides for the utility model embodiment;
The structured flowchart of a kind of wire width measuring device that Fig. 4 provides for the utility model embodiment.
Description of drawings:
The 1-transparency carrier, the pattern of 2-grid line and grid, 3-insulation course, 4-active layer, the pattern of 5-data line, source electrode, drain electrode, 6-passivation layer, 7-the first strip shaped electric poles, 8-the second strip shaped electric poles, the opaque pattern of 9-.
Embodiment
Below in conjunction with the accompanying drawing among the utility model embodiment, the technical scheme among the utility model embodiment is clearly and completely described, obviously, described embodiment only is the utility model part embodiment, rather than whole embodiment.
The utility model embodiment provides a kind of array base palte, and as shown in Figure 1 and Figure 2, described array base palte comprises: transparency carrier 1, and metal level and passivation layer 6 are leaked in the grid metal level, gate insulation layer 3, active layer 4, the source that are arranged on the described transparency carrier 1; Wherein, described grid metal level comprises: the pattern 2 of grid line and grid, described source leak metal level and comprise: the pattern 5 of data line, source electrode, drain electrode; Described array base palte also comprises: be arranged on the first strip shaped electric poles 7 and the second strip shaped electric poles 8 that is arranged on wire width measuring district B1-B2 in the pixel region A1-A2.Also comprise at array base palte described in the utility model embodiment: be arranged on the opaque pattern 9 in described wire width measuring district, the border, part both sides that described opaque pattern 9 is positioned at the below of described the second strip shaped electric poles 8 and at least one the second strip shaped electric poles 8 is positioned at the zone at described opaque pattern 9 places; Described passivation layer 6 covers described pixel region A1-A2 at least.
Be positioned at the zone at described opaque pattern 9 places on the border, part both sides that described the second strip shaped electric poles arranges opaque pattern and at least one the second strip shaped electric poles 8 for 8 times, can increase like this contrast on the border, part both sides of at least one the second strip shaped electric poles in the second strip shaped electric poles 8.Just can guarantee that it is obvious having the border, part both sides of a strip shaped electric poles at least in described the second strip shaped electric poles 8.At this moment, just can use the CD measuring equipment and measure this obvious strip shaped electric poles in border, both sides, thereby obtain the comparatively accurately live width of strip shaped electric poles.
Optionally, described opaque pattern 9 can be the opaque pattern that is produced on described the second strip shaped electric poles below by opaque material arbitrarily.Preferably, as shown in Figure 1, described opaque pattern 9 can arrange with layer with the pattern of described grid line and grid; Or as shown in Figure 2, described opaque pattern 9 arranges with layer with the pattern of described data line, source electrode, drain electrode.
Described together layer arranges at least two kinds of patterns; At least two kinds of patterns refer to layer setting: same film is formed at least two kinds of patterns by composition technique.For example, the pattern of opaque pattern 9 and described grid line and grid refers to layer setting: form opaque pattern and described grid line and grid by the grid film by composition technique.
The pattern of described opaque pattern 9 with described grid line and grid arranged with layer; Or when arranging with layer with the pattern of described data line, source electrode, drain electrode, produce described opaque pattern 9 when can or make the pattern of described data line, source electrode, drain electrode at the pattern of making described grid line and grid, compared with prior art do not increase manufacture craft.
Preferably, such as Fig. 1 or shown in Figure 2, described opaque pattern 9 covers whole described wire width measuring district B1-B2.As shown in Figure 3, plan structure synoptic diagram for live width measurement zone B1-B2 among Fig. 2, described opaque pattern 9 covers whole described wire width measuring district B1-B2, the both sides of all the second strip shaped electric poles 8 in the described wire width measuring district B1-B2 all have very significantly border, the CD measuring equipment is measured the live width of any one the second strip shaped electric poles, can obtain the comparatively accurately live width of strip shaped electric poles.
Optionally, described passivation layer 6 can cover described pixel region A1-A2 and wire width measuring district B1-B2 as shown in Figure 1, also can only cover as shown in Figure 2 described pixel region A1-A2, and not cover wire width measuring district B1-B2.Preferably, 6 of described passivation layers cover described pixel region A1-A2, and do not cover wire width measuring district B1-B2.Described like this second strip shaped electric poles 8 just is set directly at the top of described opaque pattern 9, and described the second strip shaped electric poles 8 has more significantly border, the CD measuring equipment is measured obtained the more accurately live width of strip shaped electric poles.
The utility model embodiment also provides a kind of manufacture method of array base palte, is included in and forms grid metal level, gate insulation layer, active layer, source leakage metal level and passivation layer on the transparency carrier; Wherein, described grid metal level comprises: the pattern of grid line and grid, described source leak metal level and comprise: the pattern of data line, source electrode, drain electrode; In pixel region and wire width measuring district, form respectively the first strip shaped electric poles and the second strip shaped electric poles; In the pattern of the grid line that forms described grid metal level and grid, form opaque pattern; Or in the pattern of the data line that forms described source leakage metal level, source electrode, drain electrode, form opaque pattern; Described opaque pattern is positioned at the below of described the second strip shaped electric poles, and the continuous length of described opaque pattern on the live width direction of described the second strip shaped electric poles is more than or equal to desired value+undulating quantity.When forming passivation layer, make formed passivation layer cover at least described pixel region.Preferably, when forming passivation layer, by composition technique the passivation layer in the described wire width measuring district is etched away.
Take array base palte shown in Figure 2 as example, its manufacture method can be with reference to following steps:
S1, make the grid metallic film at transparency carrier, form at least pattern 2 and the opaque pattern 9 of grid line and grid by composition technique.
S2, form at least the pattern 2 of grid line and grid and the transparency carrier of opaque pattern 9 is made grid insulating film described, form gate insulation layer 3 by composition technique.
S3, make semiconductive thin film at the transparency carrier of described formation gate insulation layer 3, and form active layer 4 by composition technique.
S4, make transparent conductive film at the transparency carrier of described formation active layer 4, form public electrode by composition technique.
S5, make the first passivation layer film at the transparency carrier of described formation public electrode, form the first passivation layer by composition technique.
S6, metallic film is leaked in the making source on the transparency carrier of described formation the first passivation layer, forms at least the pattern 5 of data line, source electrode, drain electrode by composition technique.
S7, make the passivation layer film at the described transparency carrier that forms at least described source-drain electrode metal level 5, and form passivation layer 6 with via hole by composition technique.
S8, make transparent conductive film at the transparency carrier of described formation passivation layer 6, form the first strip shaped electric poles 7 and the second strip shaped electric poles 8 by composition technique, described the first strip shaped electric poles 7 links to each other with drain electrode by the via hole on the described passivation layer 6.
Method for making for array base palte shown in Figure 3 can only need above-mentioned steps S1, S6 and S7 are carried out according to following step Q1, Q6 and Q7 with reference to above-mentioned method for making shown in Figure 2, and other steps can be with reference to the corresponding steps among real Fig. 2.
Q1, make the grid metallic film at transparency carrier, form at least the pattern 2 of grid line and grid by composition technique.
Q6, metallic film is leaked in the making source on the transparency carrier of described formation the first passivation layer, forms at least pattern 5 and the opaque pattern 9 of data line, source electrode, drain electrode by composition technique.
Q7, make the passivation layer film at the described transparency carrier that forms at least described source-drain electrode metal level 5, then by composition technique the passivation layer in the described wire width measuring district B1-B2 is etched away and in pixel region, form the passivation layer 6 with via hole.
The utility model embodiment provides a kind of manufacture method of array base palte, is included in and forms grid metal level, gate insulation layer, active layer, source leakage metal level and passivation layer on the transparency carrier; Wherein, described grid metal level comprises: the pattern of grid line and grid, described source leak metal level and comprise: the pattern of data line, source electrode, drain electrode; In pixel region and wire width measuring district, form respectively the first strip shaped electric poles and the second strip shaped electric poles; In described wire width measuring district, form before described the second strip shaped electric poles, also form opaque pattern in described wire width measuring district, described opaque pattern is positioned at the below of described the second strip shaped electric poles, and the continuous length of described opaque pattern on the live width direction of described the second strip shaped electric poles is more than or equal to desired value+undulating quantity; When forming passivation layer, formed passivation layer covers described pixel region at least.
Concrete, its method for making can be with reference to the method for making of figure 2 or array base palte shown in Figure 3.
During with reference to the method for making of array base palte shown in Figure 2, only need step S1 is revised as step S1*, makes the grid metallic film at transparency carrier, form at least the pattern 2 of grid line and grid by composition technique; And before step S8, carry out step S7*, make the film that is consisted of by opaque material at the transparency carrier of described formation passivation layer 6, form opaque pattern 9 by composition technique in described wire width measuring district.
During with reference to the method for making of array base palte shown in Figure 3, only need with step Q6 be revised as step Q6*, metallic film is leaked in the making source on the transparency carrier of described formation the first passivation layer, forms at least the pattern 5 of data line, source electrode, drain electrode by composition technique; And before step S8, carry out step S7*, make the film that is consisted of by opaque material at transparency carrier, form opaque pattern 9 by composition technique in described wire width measuring district.
The utility model embodiment also provides a kind of display device, comprises the color membrane substrates behind the box and array base palte, and wherein, described array base palte can be any above-mentioned TFT-LCD array base palte.Described display device can have for liquid crystal display, LCD TV, digital camera, mobile phone, panel computer etc. product or the parts of any Presentation Function.
The utility model embodiment also provides a kind of line width measuring method, as shown in Figure 3, described method comprises: measure to obtain the width value CD1 of arbitrary the second strip shaped electric poles in wire width measuring district, the boundary of described the second strip shaped electric poles in its downside raceway groove with the downside border of the width value CD2 on the non-conterminous border of described the second strip shaped electric poles and described the second strip shaped electric poles in its upside raceway groove with the width value CD3 on the non-conterminous border of described the second strip shaped electric poles; If described CD2 and CD3 meet the following conditions: desired value-undulating quantity＜CD2＜desired value+undulating quantity and desired value-undulating quantity＜CD3＜desired value+undulating quantity, then described CD1 is accurate, determines that it is the wire width measuring exact value; If do not satisfy, then described CD1 is inaccurate, remeasures the live width of described the second strip shaped electric poles, until measure described wire width measuring exact value.
Strip shaped electric poles added the width value of the raceway groove of the above strip shaped electric poles when described desired value referred to design, and described undulating quantity refers to the width maximum fluctuation value between the strip shaped electric poles of the strip shaped electric poles made and design.If the border when measuring is correct, then the CD2 and the CD3 that record of CD measuring equipment equals described desired value in theory, and the CD2 that namely records and CD3 should be between desired value+undulating quantity and desired value-undulating quantitys.So application restric-tion condition here: desired value-undulating quantity＜CD2＜desired value+undulating quantity and desired value-undulating quantity＜CD3＜desired value+undulating quantity, if the result who surveys satisfies restrictive condition, the boundary line of selecting when then proof is measured is no problem, the CD1 that records is accurate, determines that it is the wire width measuring exact value.If the result who records does not satisfy restrictive condition, then described CD1 is inaccurate, remeasures the live width of described the second strip shaped electric poles, until measure described wire width measuring exact value.
The utility model embodiment also provides a kind of wire width measuring device, and as shown in Figure 4, described wire width measuring device comprises: measuring unit 401 and comparison process unit 402.
Described measuring unit 401 is used for measuring the width value CD1 that obtains arbitrary the second strip shaped electric poles in wire width measuring district, the boundary of described the second strip shaped electric poles in its downside raceway groove with the downside border of the width value CD2 on the non-conterminous border of described the second strip shaped electric poles and described the second strip shaped electric poles in its upside raceway groove with the width value CD3 on the non-conterminous border of described the second strip shaped electric poles; Comparison process unit 402, the CD2 and the CD3 that are used for recording at described measuring unit 401 meet the following conditions: during desired value-undulating quantity＜CD2＜desired value+undulating quantity and desired value-undulating quantity＜CD3＜desired value+undulating quantity, determine that described CD1 is the wire width measuring exact value; When described CD2 and CD3 do not satisfy described condition, determine that described CD1 is inaccurate.
The line width measuring method that the utility model embodiment provides and device, by increasing the restrictive condition to CD2 and CD3, whether the boundary line of selecting when determining to measure has problem, thereby judges whether the live width CD1 that records is accurate, and then increases the accuracy of wire width measuring.
The above; it only is embodiment of the present utility model; but protection domain of the present utility model is not limited to this; anyly be familiar with those skilled in the art in the technical scope that the utility model discloses; the variation that can expect easily or replacement all should be encompassed within the protection domain of the present utility model.Therefore, protection domain of the present utility model should be as the criterion with the protection domain of described claim.
Claims (6)
1. array base palte comprises: transparency carrier, and metal level and passivation layer are leaked in the grid metal level, gate insulation layer, active layer, the source that are arranged on the described transparency carrier; Wherein, described grid metal level comprises: the pattern of grid line and grid, described source leak metal level and comprise: the pattern of data line, source electrode, drain electrode; Described array base palte also comprises: be arranged on the first strip shaped electric poles and the second strip shaped electric poles that is arranged on the wire width measuring district in the pixel region; It is characterized in that, also comprise:
Be arranged on the opaque pattern in described wire width measuring district, the border, part both sides that described opaque pattern is positioned at the below of described the second strip shaped electric poles and at least one the second strip shaped electric poles is positioned at the zone at described opaque pattern place;
Described passivation layer covers described pixel region at least.
2. array base palte according to claim 1 is characterized in that,
The pattern of described opaque pattern and described grid line and grid arranges with layer; Or the pattern of described opaque pattern and described data line, source electrode, drain electrode arranges with layer.
3. array base palte according to claim 1 and 2 is characterized in that,
The whole described wire width measuring of described opaque pattern covers district.
4. array base palte according to claim 1 and 2 is characterized in that, described passivation layer only covers described pixel region.
5. a display device is characterized in that, comprises the color membrane substrates behind the box and array base palte, it is characterized in that, described array base palte is the described array base palte of the claims 1～4 any one.
6. a wire width measuring device is characterized in that, comprising:
Measuring unit, be used for to measure obtain the width value CD1 of arbitrary the second strip shaped electric poles in wire width measuring district, the boundary of described the second strip shaped electric poles in its downside raceway groove with the downside border of the width value CD2 on the non-conterminous border of described the second strip shaped electric poles and described the second strip shaped electric poles in its upside raceway groove with the width value CD3 on the non-conterminous border of described the second strip shaped electric poles;
The comparison process unit, the CD2 and the CD3 that are used for measuring at described measuring unit meet the following conditions: during desired value-undulating quantity＜CD2＜desired value+undulating quantity and desired value-undulating quantity＜CD3＜desired value+undulating quantity, determine that described CD1 is the wire width measuring exact value; When described CD2 and CD3 do not satisfy described condition, determine that described CD1 is inaccurate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220620090 CN202870441U (en) | 2012-11-21 | 2012-11-21 | Array substrate, display device and line width measuring device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220620090 CN202870441U (en) | 2012-11-21 | 2012-11-21 | Array substrate, display device and line width measuring device |
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| CN202870441U true CN202870441U (en) | 2013-04-10 |
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| CN 201220620090 Expired - Lifetime CN202870441U (en) | 2012-11-21 | 2012-11-21 | Array substrate, display device and line width measuring device |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102981332A (en) * | 2012-11-21 | 2013-03-20 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof, display device, line-width measuring method and device |
| CN103400822A (en) * | 2013-08-01 | 2013-11-20 | 京东方科技集团股份有限公司 | Array substrate and display device |
| CN104730789A (en) * | 2012-11-21 | 2015-06-24 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method thereof and display device |
-
2012
- 2012-11-21 CN CN 201220620090 patent/CN202870441U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102981332A (en) * | 2012-11-21 | 2013-03-20 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof, display device, line-width measuring method and device |
| CN104730789A (en) * | 2012-11-21 | 2015-06-24 | 京东方科技集团股份有限公司 | Array substrate, manufacturing method thereof and display device |
| CN102981332B (en) * | 2012-11-21 | 2015-07-08 | 京东方科技集团股份有限公司 | Line-width measuring method and device |
| CN104730789B (en) * | 2012-11-21 | 2018-01-30 | 京东方科技集团股份有限公司 | Array base palte and its manufacture method, display device |
| CN103400822A (en) * | 2013-08-01 | 2013-11-20 | 京东方科技集团股份有限公司 | Array substrate and display device |
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Granted publication date: 20130410 |