CN202786405U - Optical element coating device - Google Patents
Optical element coating device Download PDFInfo
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- CN202786405U CN202786405U CN 201220423536 CN201220423536U CN202786405U CN 202786405 U CN202786405 U CN 202786405U CN 201220423536 CN201220423536 CN 201220423536 CN 201220423536 U CN201220423536 U CN 201220423536U CN 202786405 U CN202786405 U CN 202786405U
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Abstract
The utility model discloses an optical element coating device, which is provided with a vacuum coating chamber, wherein an evaporating source used for evaporating coating raw material and an ion source used for ionizing vapor grains are arranged in the coating chamber; a film thickness controller is arranged at the top of the coating chamber; the film thickness controller is provided with a workpiece disk capable of rotating in the horizontal direction; a to-be-coated substrate is fixed on the workpiece disk and driven to rotate; and a baffle is arranged at a rotating path matched with the substrate, and can shield partial coating zone when the substrate is rotated above the baffle. The coated Ge film has the following parameters: firstly, the resistance is adjustable within 100 mega ohms to 1000 mega ohms; secondly, the effective area is phi 10 cm or 10*10 cm<2>; and thirdly, the resistance consistency within 5% is guaranteed in virtue of the thickness uniformity of a film.
Description
Technical field
The utility model relates to a kind of optical element film coated device, is specifically related to the implement device of the resistive layer of a kind of Large-Area-Uniform plated film.
Background technology
The photon technology imaging not only can detect single electron information, satisfy the requirement that faint light is detected, and have the simultaneously time of electron gain and the advantage of positional information, therefore in fields such as spectral measurement, noclilucence, radiation detection, high energy physics, space explorations special effect is arranged, adopt the photon technology system of position sensitive anode, its imaging electric charge playback mode has two kinds: a kind of is the direct acquisition mode of electric charge; Another kind is the electric charge induction playback mode.When adopting the electric charge induction playback mode, the resistance of electric charge induction layer Ge film is different, electric charge is different in the velocity of diffusion of rete, thereby cause the imaging electric charge to keep the time constant of distribution different, therefore the resistance value influences of Ge film the performance of electronic technology system, be the important parameter of system performance.
The two-dimensional position detector need to use the resistive layer of larger area with the expansion charge signal, thereby can use the metal electrode of large-size to obtain positional information by induced signal.The resistance value of the Ge film that conventional sputter technique is coated with can only guarantee to reach in the useful area of Φ 5cm in the consistence 5%, and this result has limited the larger area of photon technology imaging and used.
The utility model content
For the deficiency that above-mentioned prior art exists, the purpose of this utility model is to provide a kind of novel optical element film coating apparatus, and this device can be realized the realization of big area, even resistive layer plated film.
In order to achieve the above object, a kind of optical element film coated device of the utility model, this device is provided with vacuum film coating chamber, be provided with the raw-material evaporation source of evaporation coating in the described coating chamber, also be provided with the ion source of ionization steam particle, the coating chamber top is provided with film-thickness monitoring, film-thickness monitoring is with the workpiece plate that can rotate in the horizontal direction, substrate to be coated is fixed on the described workpiece plate and is driven to rotate, the rotate path that adapts to substrate is provided with baffle plate, but baffle plate shield portions coating film area when substrate rotates to the baffle plate top.
Further, described evaporation source comprises and holds the raw-material crucible of plated film that the crucible bottom is provided with electron beam gun.
Further, described baffle shapes is determined according to substrate shape to be coated.
A kind of optical element film coated device of the utility model, adopt the method deposition Ge film of Assisted by Ion Beam evaporation, the homogeneity baffle plate is installed in filming equipment, can be coated with for optical element the Ge film of Large-Area-Uniform, solve the large not problem of area homogeneity in the traditional technology, and can realize the different resistance values of processing requirement.Can realize: 1. resistance is adjustable between 100M Ω-1G Ω; 2. useful area reaches Φ 10cm or 10*10cm
2; 3. guarantee the consistence of resistance by the homogeneity of thicknesses of layers, consistence is in 5%.
Description of drawings
Fig. 1 is side-view of the present utility model;
Fig. 2 is front view of the present utility model;
Among the figure: 1. electron beam gun, 2. ion source, 3. crucible, 4. baffle plate, 5. substrate, 6. crystal oscillator controller, 6-1. workpiece plate, 7. coating chamber.
Embodiment
Be to reach technique means and the effect that predetermined goal of the invention is taked for further setting forth the utility model, below in conjunction with accompanying drawing and preferred embodiment, structure of the present utility model, feature and effect be described in detail as follows.
As shown in Figure 1 and Figure 2, this device is provided with vacuum film coating chamber 7, is provided with the raw-material evaporation source of evaporation coating in the coating chamber 7, and evaporation source comprises and hold the raw-material crucible 3 of plated film that crucible 3 bottoms are provided with the electron beam gun 1 as thermal source.
As shown in Figure 1 and Figure 2, in order to improve the adsorption strength of the rear starting material particle of evaporation and substrate, also be provided with the ion source 2 of ionization steam particle in the coating chamber 7.
As shown in Figure 1 and Figure 2, coating chamber 7 tops are provided with crystal oscillator controller 6, crystal oscillator controller 6 is with the workpiece plate 6-1 that can rotate in the horizontal direction, substrate 5 to be coated is fixed on the workpiece plate 6-1, crystal oscillator controller 6 can be controlled the thickness that rete is coated with at substrate 5, realize the Ge film of deposition different thickness, realized that resistance is adjustable between 100M Ω-1G Ω.
As shown in Figure 1 and Figure 2, substrate 5 is cooked the horizontal direction rotation under the drive of workpiece plate 6-1, and the rotate path that adapts to substrate 5 is provided with baffle plate 4, but baffle plate 4 shield portions coating film area when substrate 5 rotates to baffle plate 4 top.
Reason to substrate 5 implementation section regional occlusions is: because the each point position on the large size substrate and evaporation source distance are different, thickness can change along with the substrate surface change in location in the coating process, therefore baffle plate need to be set reduces the part film layer thickness, to reach the conforming purpose of film thickness uniformity.
The on-deformable metallic substance of baffle plate 4 general employings is made, and its shape is determined according to the shape of substrate 5 to be coated.Baffle plate 4 is installed between substrate 5 and the evaporation source, generally is positioned at the rear side of coating chamber 7, apart from coating chamber 7 bottom 40-100cm, apart from evaporation source 10-100cm, apart from substrate 5-40cm, baffle plate 4 is set can realizes Ge rete Φ 10cm or 10*10cm
2Useful area internal resistance value consistence 5% with interior effect.
Above describedly be construed as the utility model and be not limited to above embodiment just for the utility model is described, meet the various flexible form of the utility model thought all within protection domain of the present utility model.
Claims (3)
1. optical element film coated device, this device is provided with vacuum film coating chamber, it is characterized in that, be provided with the raw-material evaporation source of evaporation coating in the described coating chamber, also be provided with the ion source of ionization steam particle, the coating chamber top is provided with film-thickness monitoring, film-thickness monitoring is with the workpiece plate that can rotate in the horizontal direction, substrate to be coated is fixed on the described workpiece plate and is driven to rotate, the rotate path that adapts to substrate is provided with baffle plate, but baffle plate shield portions coating film area when substrate rotates to the baffle plate top.
2. film coating apparatus as claimed in claim 1 is characterized in that, described evaporation source comprises and hold the raw-material crucible of plated film that the crucible bottom is provided with electron beam gun.
3. film coating apparatus as claimed in claim 1 is characterized in that, described baffle shapes is determined according to substrate shape to be coated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220423536 CN202786405U (en) | 2012-08-24 | 2012-08-24 | Optical element coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220423536 CN202786405U (en) | 2012-08-24 | 2012-08-24 | Optical element coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202786405U true CN202786405U (en) | 2013-03-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220423536 Expired - Fee Related CN202786405U (en) | 2012-08-24 | 2012-08-24 | Optical element coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202786405U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105887020A (en) * | 2016-06-30 | 2016-08-24 | 光驰科技(上海)有限公司 | Coating device with multiple evaporation sources and coating method thereof |
| CN107678081A (en) * | 2017-09-14 | 2018-02-09 | 利达光电股份有限公司 | A kind of low haze cutoff filter and its film plating process |
| CN111394700A (en) * | 2020-04-22 | 2020-07-10 | 深圳恒泰克科技有限公司 | Evaporation coating manufacturing device and method |
| CN112501562A (en) * | 2020-11-30 | 2021-03-16 | 深圳恒泰克科技有限公司 | Multi-source electron beam evaporation coating device and film thickness uniformity correction method |
| CN113373415A (en) * | 2021-04-25 | 2021-09-10 | 江苏微纳光膜科技有限公司 | Optical coating cutting device |
| CN114990516A (en) * | 2022-06-15 | 2022-09-02 | 深圳市三束镀膜技术有限公司 | Film thickness correction baffle mechanism of evaporation coating machine and coating machine |
-
2012
- 2012-08-24 CN CN 201220423536 patent/CN202786405U/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105887020A (en) * | 2016-06-30 | 2016-08-24 | 光驰科技(上海)有限公司 | Coating device with multiple evaporation sources and coating method thereof |
| CN105887020B (en) * | 2016-06-30 | 2019-04-02 | 光驰科技(上海)有限公司 | Multi-vaporizing-source coating apparatus and its film plating process |
| CN107678081A (en) * | 2017-09-14 | 2018-02-09 | 利达光电股份有限公司 | A kind of low haze cutoff filter and its film plating process |
| CN107678081B (en) * | 2017-09-14 | 2024-02-23 | 南阳利达光电有限公司 | Low-haze infrared cut-off filter and film coating method thereof |
| CN111394700A (en) * | 2020-04-22 | 2020-07-10 | 深圳恒泰克科技有限公司 | Evaporation coating manufacturing device and method |
| CN112501562A (en) * | 2020-11-30 | 2021-03-16 | 深圳恒泰克科技有限公司 | Multi-source electron beam evaporation coating device and film thickness uniformity correction method |
| CN113373415A (en) * | 2021-04-25 | 2021-09-10 | 江苏微纳光膜科技有限公司 | Optical coating cutting device |
| CN114990516A (en) * | 2022-06-15 | 2022-09-02 | 深圳市三束镀膜技术有限公司 | Film thickness correction baffle mechanism of evaporation coating machine and coating machine |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130313 Termination date: 20150824 |
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| EXPY | Termination of patent right or utility model |