CN202785677U - Dedusting system used for production of trichlorosilane - Google Patents
Dedusting system used for production of trichlorosilane Download PDFInfo
- Publication number
- CN202785677U CN202785677U CN201220489930.4U CN201220489930U CN202785677U CN 202785677 U CN202785677 U CN 202785677U CN 201220489930 U CN201220489930 U CN 201220489930U CN 202785677 U CN202785677 U CN 202785677U
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- CN
- China
- Prior art keywords
- washing tower
- trichlorosilane
- scrubbing tower
- venturi scrubber
- dust
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Abstract
The utility model relates to a dedusting system used for the production of trichlorosilane. The dedusting system used for the production of the trichlorosilane comprises a scrubbing tower and a condenser on the top portion of the scrubbing tower, and further comprises a venturi scrubber, a knockout drum and a circulating pump, wherein one end of the knockout drum is connected with the venturi scrubber, and the other two ends are respectively connected with a gas inlet and a liquid inlet; one end of the circulating pump is connected with the venturi scrubber, and the other end is connected with a liquid outlet. The diameter of the upper portion of the scrubbing tower is smaller than the lower portion of the scrubbing tower, the upper portion of the scrubbing tower is of a structural style which is formed by combination of a flow-through plate and a sifting plate, and the lower portion of the scrubbing tower is provided with an inner part baffle. The dedusting system further processes reactant gas which undergoes cyclone dust removal, high-boiling residues, metal chloride and a small amount of fine ganister sand in the reactant gas are removed in a device, so the reactant gas does not block a pipeline and equipment when enters a condensing system, and therefore, pollution of the metal chloride and the high-boiling residues in the trichlorosilane is relieved, and the continuous and stable run of the device is guaranteed.
Description
Technical field
The utility model relates to the dust-removal system of fluidized-bed reactor exit gas in a kind of trichlorosilane synthesizer and the cold hydrogenation apparatus (silicon tetrachloride hydrogenation).
Background technology
Polysilicon is the important foundation stone of Information of Development industry and New Energy Industry as the main raw material of the products such as manufacturing integration circuitry substrate, solar cell.At present, what the production polysilicon mainly adopted both at home and abroad is improved Siemens, and the polysilicon that the every production of the method is 1 ton need to consume 19 ~ 24 tons trichlorosilane, the silicon tetrachloride that the while by-product is 15 ~ 20 tons, silicon tetrachloride very easily generates hydrogenchloride with the water reaction, directly emission of serious pollution of environment.
Trichlorosilane all is to carry out gas-solid phase reaction by silica flour and hydrogenchloride in fluidized-bed reactor to produce as the main raw material of production of polysilicon at present.Silicon tetrachloride is as the Main By product of production of polysilicon, and effective means is to adopt cold hydrogenation technology to process the most at present, is converting silicon tetrachloride trichlorosilane, has realized the sealing and circulating of device inside and the zero release of pollutent.
In trichlorosilane synthesizer and cold hydrogenation apparatus, contain silicon tetrachloride, trichlorosilane, hydrogen, dichloro-dihydro silicon, high boiling material, metal chloride, light component and a small amount of silica flour from fluidized-bed reactor reactant gases out.After cyclone dust removal, heat recuperation (trichlorosilane synthesizer does not generally contain heat recuperation), wet dedusting, condensation, chlorosilane is condensed, and the chlorosilane that condensation is got off carries out rectifying, isolates silicon tetrachloride and trichlorosilane.
In traditional wet scrubbing process, reactant gases after cyclone dust removal or heat recuperation directly enters into washing tower tower reactor liquid phase and washs, because the momentary fluctuation of reaction gas flow and temperature, cause level fluctuation larger, wayward, simultaneously the vaporization gas in uphill process very easy carry secretly silica flour and sublimate under metal chloride, cause washing tower top condenser blocked, affect the continuous and steady operation of device.In addition since reactant gases at the continuous bubbling of tower reactor, silica flour, metal chloride and high boiling material are in the process of tower reactor neither one deposition, so that the foreign matter contents such as silica flour, metal chloride and high boiling material are low in the liquid of being discharged by tower reactor, increased the load of follow-up chlorosilane recovery system.
The utility model content
The purpose of this utility model is to overcome the deficiency that above-mentioned dedusting method exists, and a kind of dust-removal system for trichlorosilane production is provided, and solves the problem of blockage of condenser, guarantees the smooth discharge of tower reactor.
The technical solution of the utility model is: a kind of dust-removal system for trichlorosilane production, the condenser that comprises washing tower and washing tower top, wherein washing tower is grouped into the subsidence part that is positioned at the bottom by superposed washing part, it is characterized in that, also comprise Venturi scrubber, knockout drum and recycle pump, described washing tower top is provided with pneumatic outlet and washings import, and the washing tower bottom is provided with gas feed, liquid-inlet and liquid exit, and wash tower bottoms is provided with slurry outlet; Knockout drum one end is connected with Venturi scrubber, and two ends are connected with liquid-inlet with gas feed respectively in addition; Recycle pump one end is connected with Venturi scrubber, and the other end is connected with liquid exit.
Described washing tower top is the form that turbogrid tray and sieve plate combine.
The diameter of described washing tower bottom is greater than the diameter on top, and wash tower bottoms is taper.
Described washing tower bottom is provided with the internals baffle plate.
Described washings import is one or more.
Described liquid-inlet is positioned at the baffle plate below, and liquid exit is positioned at the baffle plate top.
In the dust-removal system that the utility model provides, reactant gases was introduced into Venturi scrubber and carries out preliminary washing before entering washing tower, to remove the silica flour of the overwhelming majority in the gas, simultaneously reactant gases is lowered the temperature, alleviated the load of subsequent wash tower, improve washing effect, so that gas can blocking pipe and equipment when entering condenser, guaranteed the operation of device continous-stable.Entered from the gas phase of washing tower bottom by knockout drum gas out in addition, the big ups and downs of tower reactor liquid level have been avoided, be conducive to simultaneously deposition and the discharge of the impurity such as tower reactor silica flour, metal chloride and high boiling material, alleviated the load of follow-up chlorosilane recovery system.
Description of drawings
Fig. 1 is system architecture synoptic diagram of the present utility model.
Embodiment
In order further to understand the utility model, below in conjunction with accompanying drawing the utility model is described in detail.
As shown in Figure 1, after cyclone dust removal or heat recuperation, enter Venturi scrubber 2 from the dust-laden reactant gases 1 of fluidized-bed, by recycle pump 13 washing tower 7 tower bottomss 6 are delivered to Venturi scrubber 2 simultaneously, finish the preliminary washing of reactant gases.After Venturi scrubber 2 washings, the silica flour that particle is larger in the gas is removed, and simultaneous reactions gas has obtained cooling.Gas-liquid two-phase after the washing separates in knockout drum 3, and gas 4 enters washing tower 7 from the gas feed of washing tower 7 bottoms, and liquid 5 enters washing tower 7 from the liquid-inlet of washing tower 7 bottoms.Enter gas 4 bottom-up the flowing of washing tower 7, washing tower 7 tops are provided with the washings import, washings 11 enters washing tower 7 from the washings import, from up to down flow, with dusty gas generation mass transfer and the heat transfer of rising, dusty gas has obtained further washing and cooling in this process, for the effect of reinforcing mass transfer, heat transfer and washing, is provided with wide-aperture turbogrid tray 15 and sieve plate 14 on washing tower 7 tops.Discharged by the pneumatic outlet of washing part through the gas behind the washing, purifying, go out the gas 8 of washing tower 7 through condenser 9 condensations, a part of lime set reenters washing tower 7 as the washings 11 of washing tower 7 by the top, and a part of lime set 10 is sent to rectifier unit in addition.
Washing tower 7 bottoms are provided with internals baffle plate 16, liquid-inlet is positioned at baffle plate 16 belows, liquid exit is positioned at baffle plate 16 tops, back-mixing and the turbulence of tower bottoms avoided in the setting of this internals baffle plate 16 and mouth of pipe height effectively, guaranteed the smooth sedimentation of silica flour, metal chloride and high boiling material in the tower bottoms, reduce simultaneously the content of silica flour in the tower bottoms 6, prolonged the work-ing life of recycle pump 13 and Venturi scrubber 2.Washing tower 7 bottoms are provided with slurry outlet, and through deposition, the slag slurry 12 that contains high density silica flour, metal chloride and high boiling material is discharged by the slurry mouth.Because the setting of internals baffle plate 16 is starched 12 impurity concentration content height by the slag that the slurry mouth is discharged, and has alleviated the load of follow-up chlorosilane recovery system.
Venturi scrubber is a kind of high efficiency wet scrubber, has simple in structure, cheap, easy to operate, purification efficiency advantages of higher, conveniently has unique superiority removing fine dusts.The dust removal process of Venturi scrubber can be divided into atomizing, two links of cohesion.Dusty gas is increased gradually by flow velocity after entering pipe and entering collapsible tube, reaches maximum value at the trunnion gas flow rate.Relative velocity in collapsible tube and trunnion between the gas-liquid two-phase reaches maximum value.From nozzle ejection drop out, atomizing under high velocity air impacts, gas fully contacts with drop at the trunnion place, and reaches capacity, and the air film of grit surface attachment is broken through, and makes grit moistening by liquid, and fierce cohesion occurs.Gas flow rate reduces in diffuser tube, and pressure gos up, and the cohesion take grit as the nucleus of condensation forms, and is condensed into the larger dust-laden drop of particle diameter, is easier to be removed.
By the system that the utility model provides, dusty gas has obtained good washing and cooling, has avoided the obstruction of e-quipment and pipe, has guaranteed the operation of device continous-stable, has alleviated simultaneously the load of follow-up chlorosilane recovery system.
Claims (6)
1. one kind is used for the dust-removal system that trichlorosilane is produced, the condenser (9) that comprises washing tower (7) and washing tower top, wherein washing tower (7) is grouped into the subsidence part that is positioned at the bottom by superposed washing part, it is characterized in that, also comprise Venturi scrubber (2), knockout drum (3) and recycle pump (13), described washing tower top is provided with pneumatic outlet and washings import, the washing tower bottom is provided with gas feed, liquid-inlet and liquid exit, and wash tower bottoms is provided with slurry outlet; Knockout drum (3) one ends are connected with Venturi scrubber (2), and two ends are connected with liquid-inlet with gas feed respectively in addition; Recycle pump (13) one ends are connected with Venturi scrubber (2), and the other end is connected with liquid exit.
2. dust-removal system according to claim 1 is characterized in that, described washing tower top is the form that turbogrid tray (15) and sieve plate (14) combine.
3. dust-removal system according to claim 1 is characterized in that, the diameter of described washing tower bottom is greater than the diameter on top, and wash tower bottoms is taper.
4. dust-removal system according to claim 1 is characterized in that, described washing tower bottom is provided with internals baffle plate (16).
5. dust-removal system according to claim 1 is characterized in that, described washings import is one or more.
6. dust-removal system according to claim 1 is characterized in that, described liquid-inlet is positioned at baffle plate (16) below, and liquid exit is positioned at baffle plate (16) top.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201220489930.4U CN202785677U (en) | 2012-09-24 | 2012-09-24 | Dedusting system used for production of trichlorosilane |
Applications Claiming Priority (1)
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CN201220489930.4U CN202785677U (en) | 2012-09-24 | 2012-09-24 | Dedusting system used for production of trichlorosilane |
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CN202785677U true CN202785677U (en) | 2013-03-13 |
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CN201220489930.4U Expired - Lifetime CN202785677U (en) | 2012-09-24 | 2012-09-24 | Dedusting system used for production of trichlorosilane |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113019036A (en) * | 2021-03-29 | 2021-06-25 | 中国恩菲工程技术有限公司 | Wet dust removal system for trichlorosilane production |
-
2012
- 2012-09-24 CN CN201220489930.4U patent/CN202785677U/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113019036A (en) * | 2021-03-29 | 2021-06-25 | 中国恩菲工程技术有限公司 | Wet dust removal system for trichlorosilane production |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20130313 |