CN202705158U - Ultrapure water manufacturing subsystem - Google Patents
Ultrapure water manufacturing subsystem Download PDFInfo
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- CN202705158U CN202705158U CN 201220101480 CN201220101480U CN202705158U CN 202705158 U CN202705158 U CN 202705158U CN 201220101480 CN201220101480 CN 201220101480 CN 201220101480 U CN201220101480 U CN 201220101480U CN 202705158 U CN202705158 U CN 202705158U
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- water
- ultrapure water
- adsorption unit
- subsystem
- film device
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- Treatment Of Water By Ion Exchange (AREA)
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- Water Treatment By Sorption (AREA)
Abstract
The utility model provides an ultrapure water manufacturing subsystem which is provided with an adsorption apparatus having low pressure loss in a back stage of an ultrafiltration membrane apparatus. The ultrapure water manufacturing subsystem is a subsystem for manufacturing ultrapure water from primary pure water and at least comprises a UV apparatus (13), a degasser (15), an ion exchange resin apparatus (16) and a UF membrane apparatus (17) as well as an adsorption apparatus (18) which is disposed at a back stage of the UF membrane apparatus and filled with granular form adsorbents with a grain size of 1-3 mm, wherein water is supplied to the adsorption apparatus (18) based on outflow water pressure from the UF membrane apparatus (17) instead of by using a booster pump.
Description
Technical field
The utility model relates to the subsystem in a kind of manufacturing installation that is arranged at ultrapure water.
Background technology
In semiconductor fabrication process etc., making the subsystem of ultrapure water from 1 st pure water, adopting and removed the de-gassing vessel that dissolves in the gas in the pure water, the UV device of degradation of organic substances, the continuous electricity regeneration desalination plant of removing ionic substance or Di, the atomic film of removal (MF or UF) device.
Pure water processor as further remove the impurity (particularly metal ion) of trace existence from the ultrapure water of operation manufacturing like this can adopt pleat formula ion-exchange filter or exchange resin tower.This pleat formula ion-exchange filter is that the flat sheet membrane such as non-woven fabrics or porous-film are set as the ion-exchange filter that the pleat formula forms.Pleat formula ion-exchange filter has the little feature of the pressure-losses, and on the other hand, sews generation soon owing to thickness is thin, the problem (patent documentation 1) that average life is short.
On the other hand, for being filled with the exchange resin tower of ion exchange resin (the about 50 μ m of particle diameter), there is the large problem of the pressure-losses.If the pressure-losses of pure water processor is large, then at the pressure decreased that arrives at of place to use, therefore need to use boosting pump.
The prior art document
Patent documentation 1: TOHKEMY 2004-73924 number
The utility model content
The purpose of this utility model is, a kind of ultrapure water manufacturing subsystem that has the low adsorption unit of the pressure-losses in the rear class of UF film device (ultra-filtration membrane device) is provided.
The ultrapure water manufacturing subsystem of the technical solution of the utility model 1, it is the subsystem of making ultrapure water from 1 st pure water, it comprises UV device, de-gassing vessel, Di and UF film device at least, it is characterized in that, in the rear class of this UF film device, have that to have filled particle diameter be the adsorption unit of the granular adsorbent of 1～3mm, by the outflow hydraulic pressure from this UF film device, water flowing in this adsorption unit in the situation of not using boosting pump.
The ultrapure water manufacturing subsystem of the technical solution of the utility model 2, it is to use in the subsystem in technical scheme 1 described ultrapure water manufacturing, described granular adsorbent has ion-exchange group or chelate group.
The ultrapure water manufacturing subsystem of the technical solution of the utility model 3, its be in technical scheme 1 or 2 described ultrapure water manufacturings with in the subsystems, also be provided with MF film device or UF film device in the rear class of described adsorption unit.
In subsystem of the present utility model, in the rear class of UF film device, have and filled the adsorption unit that particle diameter is the above granular adsorbent of 1mm, the water quality of the ultrapure water that obtains by subsystem is good.In the utility model, the particle diameter of adsorbent is more than the 1mm, and the water flowing pressure-losses of adsorption unit is little.Therefore, do not use boosting pump, and pass through the outflow hydraulic pressure of UF film device, can in this adsorption unit, carry out water flowing, and make equipment cost become cheap.And, do not exist the impurity that produces from boosting pump to sneak into phenomenon in the ultrapure water yet.
Description of drawings
Fig. 1 is the schema of Ultrapure Water Purifiers.
Fig. 2 is the schema of Ultrapure Water Purifiers.
Fig. 3 is the schema of Ultrapure Water Purifiers.
Fig. 4 is the stereographic map of obturator, and (a) and (b) wherein are models of particle-filled body, (a) be cylindric, (b) for cylindric.
Fig. 5 is the pie graph of adsorption unit, and, (a) wherein is the sectional view of adsorption unit 18, wherein, in the cylinder-like shell 30 with influx 31 and spout 32, be provided with a plurality of (this example has 2) obturators (obturator of adsorbent) 20 by supporter 21 in coaxial shape mode; (b) be the decomposing section of supporter 21; (c) be the decomposition plan view of supporter 21.
Fig. 6 is the pie graph of adsorption unit, and, wherein, (a) be omitted adsorption unit 18 shell 30 the inflow side end cap (end plate) adsorption unit 18 ', (b) be with this adsorption unit 18 ' be configured in the pressure vessel 40, spout 32 is connected in pressure vessel export department 42, and, water is flowed in the pressure vessel 40 from the supplying opening 41s of pressure vessel 40, from export department 42 take out adsorption units 18 ' processing water.
The explanation of Reference numeral
1 pretreatment system, 18 adsorption units
2 primary pure water systems, 20 obturators
3 subsystems, 30 shells
The 17UF film device
Embodiment
Below, by the reference accompanying drawing, describe embodiment of the present utility model in detail.
Subsystem of the present utility model in rear class one side of UF film device, is provided with and is filled with the adsorption unit that particle diameter is the adsorbent of 1～3mm.The example of an overall flow that will have the Ultrapure Water Purifiers of this subsystem is shown among Fig. 1～Fig. 3.
Each Ultrapure Water Purifiers of Fig. 1～Fig. 3 consists of by pretreatment system 1, primary pure water system 2 and subsystem 3.
In the pretreatment system 1 that suspended (precipitation) by coagulation, pressurization, filtration unit etc. consists of, the suspended matter in the former water or colloidal materials are removed.In the primary pure water system 2 with reverse osmosis (RO) membrane separation unit, de-gassing vessel and ion exchange unit (mixed bed formula, 2 beds 3 tower or 45 tower), the ion in the former water or organic composition are removed.In addition, in the RO membrane separation unit, except removing salt, also TOC ionic, colloidality is removed.In ion exchange unit, except removing salt, also to removing by the TOC composition of ion exchange resin absorption or ion-exchange.In de-gassing vessel (the degassed or vacuum outgas of nitrogen), dissolved oxygen is removed.
In the Ultrapure Water Purifiers of Fig. 1, the 1 st pure water that will obtain by operation like this (generally, TOC concentration is the following pure water of 2ppb), water flowing is used in UF film device 17 and the adsorption unit 18, and the ultrapure water that obtains is flowed to place to use 19 in sub-tank (sub tank) 11, pump P, heat exchanger 12, UV oxidation unit 13, catalyst-type oxidizing substance decomposition apparatus 14, de-gassing vessel 15, mixed bed deionizer (ion exchange unit) 16, micropartical separation successively.Adsorption unit 18 is to be filled with the adsorption unit that particle diameter is the adsorbent of 1～3mm, especially 1～1.5mm, and its water flowing pressure-losses is little.Therefore, between UF film device 17 and adsorption unit 18, boosting pump is not set, and by from the outflow hydraulic pressure of UF film device 17 to adsorption unit 18 water flowings.
As UV oxidation unit 13, can adopt the irradiation that usually is applied in the Ultrapure Water Purifiers to have the UV oxidation unit of the UV of the wavelength the 185nm near, for example used the UV oxidation unit of low pressure mercury lamp.Based on above-mentioned UV oxidation unit 13, make the TOC in the 1 st pure water be degraded to organic acid and then be degraded to CO
2And, in above-mentioned UV oxidation unit 13, in the situation of excessive exposure UV, from water, produce H
2O
2
Then, with the processing water of UV oxidation unit, water flowing in the catalyst-type oxidizing substance decomposition apparatus 14.Oxidizing substance degradation catalyst as catalyst-type oxidizing substance decomposition apparatus 14, the known noble metal catalyst that has as redox catalyst, palladium (Pd) compound or platinum (Pt) such as palladium metal, palladous oxide, palladium hydroxide, wherein, can preferably use the strong palladium catalyst of reductive action power.
Based on above-mentioned catalyst-type oxidizing substance decomposition apparatus 14, make the H that produces in the UV oxidation unit 13
2O
2Reach other oxidizing substance, effectively degrading by catalyzer removes.And, based on H
2O
2Decomposition can generate water, but almost as anionite-exchange resin or gac, do not generate the situation of oxygen, can not become the reason that DO increases.
Then, with the processing water of catalyst-type oxidizing substance decomposition apparatus 14, to de-gassing vessel 15 water flowings.As de-gassing vessel 15, can use vacuum degasser, nitrogen de-gassing vessel or Filtertype Air Extractor.By this de-gassing vessel 15, can effectively remove DO, CO in the water
2
Then, with the processing water of de-gassing vessel 15, water flowing in the mixed bed ion switch 16.As mixed bed ion switch 16, used a kind of non-renewable type mixed bed ion switch of having filled anionite-exchange resin and Zeo-karb of loading to mix according to ion.By this mixed bed ion switch 16 make a return journey positively charged ion and negatively charged ion in dewatering, improved the purity of water.
Then, with the processing water of mixed bed ion switch 16 to 17 water flowings of UF film device.In this UF film device 17, the micropartical that remove micropartical in the water, flows out such as the ion exchange resin from mixed bed ion switch 16 etc., then water flowing in the adsorption unit 18.
In addition, adsorbent in situation about setting as purpose with the removal ion, adopts ion exchange resin.As ion-exchange group, can enumerate sulfo group, carboxyl, 1～4 grade of ammonium (primary amine groups, secondary amine, tertiary amine groups, quaternary ammonium group).In addition, adsorbent is to remove in the situation that Neutral Solute or organism set as purpose, to adopt the resin of having given non-electric charge functional group.Also can use by mixture iron exchange resin and resin.As the base material of resin, can enumerate polystyrene (Port リ ス リ ス チ レ Application), polyolefine, polysulfones etc.; As its structure, can enumerate gel, cavernous structure.
The formation of Fig. 1 is an example of Ultrapure Water Purifiers of the present utility model, Ultrapure Water Purifiers of the present utility model, with in the past device similarly, consisted of by pretreatment system, primary pure water system, subsystem, get final product so long as be provided with adsorption unit 18 in the rear class of UF film device 17 in the subsystem in its a series of Component units device, can carry out combination collocation with various instruments.For example, as shown in Figure 2, also the UV radiation treatment water from UV oxidation unit 13 directly can be imported in the mixed bed deionizer 16.As shown in Figure 3, anion exchange tower 19 also can be set and replace catalyst-type oxidizing substance decomposition apparatus 14.
And, also RO membrane separation unit (not shown) can be set in the back of mixed bed ion switch.In addition, can also be integrated such as lower device: it,, then carries out deionization and processes so that the urea in the former water and other TOC composition are degraded by adding the former water of thermo-degradation under the acidic conditions below the pH4.5 and in the presence of oxygenant.Can also carry out multistage setting to UV oxidation unit, mixed bed ion switch, de-gassing vessel etc.And, for pretreatment system 1 or primary pure water system 2, all be not subjected to these illustrated any restrictions yet, can adopt the combination collocation with other various devices.
As the separation membrane device in adsorption unit 18 downstreams, MF film device, UF film device can be set also.When improving the particle removal capacity, the aperture of setting film is 0.02～1 μ m, is preferably set to 0.05～0.1 μ m.Preferred thickness is 0.01～1mm.For material, can enumerate: polyolefine, polystyrene, polysulfones, polyester, polymeric amide, cellulose family, polyvinylidene difluoride (PVDF), tetrafluoroethylene etc.
Then, the particle diameter that the granular adsorbent by setting adsorption unit 18 is shown be 1mm with on reduce the calculated examples of the water flowing pressure-losses.
Fig. 4 (a) and (b) are models of particle-filled body, (a) be cylindric, (b) for cylindric.(a) in, water from periphery to the inner peripheral surface water flowing, is taken out through endoporus.L is the poor of external diameter (radius) and internal diameter (radius), D
sBe diameter of bore, D
cBe the obturator diameter.(b) in, with water from an end face to the other end water flowing.L
cThe height of expression cylinder.
In the pure water device for as shown in Figure 4 particle-filled body and water flowing direction, studied the relation of particle diameter and the pressure-losses.
Usually, the resistance of particle-filled body (R[1/m]) can be obtained according to the Kozeny-Carman equation.Symbol is: the voidage of particle-filled body (ε [-]), flow channel length (L[m]), particle diameter (d[m]).
R=180(1-ε)
2L/(ε
3d
2)（1）
The pressure-losses (Δ P[Pa]), can be according to viscosity (μ [Pas]), the flow (Q[m of resistance and water
3/ s]), sectional area (A[m
2]) obtain by following formula.
ΔP=(Q/A)μR （2）
Calculate such as particle diameter and the pressure-losses under two kinds of water flowing modes of the (a) and (b) of Fig. 4 based on formula (1), (2), and will try to achieve and the results are shown in the table 1.Water temperature is made as 25 ℃, flow is made as 20L/min, the size of the obturator of standard is made as 8cm diameter, 22.4cm length.Shown in (a), during from periphery to the center water flowing, be that 130 μ m also can make the pressure-losses remain on below the 50kPa even set particle diameter.But structurally can't set flow channel length is more than the 4cm, and surface-area is large, the problem that water quality treatment reduced when average life problem or bias current occured.On the other hand, shown in (b), when carrying out water flowing from an end face to other end face, can set flow channel length is 22.4cm, and this is favourable from the life-span viewpoint.In order to make the pressure-losses at this moment below 50kPa, particle diameter is reached more than the 1mm.
Table 1
(from periphery to the center water flowing time)
Table 2
(from an end face to the other end water flowing time)
In addition, if the particle diameter of particle is more than the 3mm, pressure-losses step-down then, but contact area reduces and the removal Efficiency Decreasing of impurity.Therefore, preferable particle size is 1～3mm, more preferably 1.0～1.5mm.
Then, an example of the structure by adsorption unit 18 is described with reference to figure 5.
(a) is the sectional view of adsorption unit 18 among Fig. 5, wherein, in the cylinder-like shell 30 with influx 31 and spout 32, be provided with a plurality of (this example has 2) obturators (obturator of adsorbent) 20 by supporter 21 in coaxial shape mode; (b) is the decomposing section of supporter 21 among Fig. 5; (c) is the decomposition plan view of supporter 21 among Fig. 5.In Fig. 5, be provided with 2 obturators 20, but can be more than 3, usually be preferably about 1～5.
In shell 30, be provided with a plurality of obturators 20 with series system, therefore, even current smoothly part and the not smooth part of current and when causing short circuit and/or bias current in an obturator 20, occur, also can be at the interflow of the obturator 20 front generation water that flow into the downstream side, therefore, short circuit and/or bias current can not involve on the whole length of adsorption unit 18.
In addition, be provided with supporter 21 by the front and back at obturator 20, can mix, regulate to water current, and can control discharge according to the water flowing resistance of supporter 21.Thus, can further reduce short circuit, bias current.
As the material of porous plate 22, can enumerate: polyolefine (polyethylene, polypropylene), tetrafluoroethylene etc.
As net 23, preferred polyolefm (polyethylene, polypropylene), polyester etc. are made, and preferably its thickness is 0.05mm～3mm, is particularly preferably 0.1～2mm, and preferably its micro-pore diameter is the above (meshes: scope 30%～90%) of 10 μ m.
As the material of microfiltration membrane 24, can enumerate: polyvinylidene difluoride (PVDF), tetrafluoroethylene, polysulfones, polymeric amide, cellulose family.The thickness of microfiltration membrane 24 is 0.05mm～0.5mm, be preferably 0.1～0.3mm, and preferably its micropore diameter is 0.02～1 μ m, is particularly preferably the scope of 0.02～0.45 μ m.
Shown in (a) among Fig. 6, with omitted above-mentioned adsorption unit 18 shell 30 the inflow side end cap (end plate) adsorption unit 18 ' setting example be shown in (b) among Fig. 6.In addition, shell 30 ' except the end cap that omits the inflow side has the structure identical with shell 30.Adsorption unit 18 ' other structure, identical with adsorption unit 18, and identical Reference numeral represents identical part.
Shown in (b) among Fig. 6, with this adsorption unit 18 ' be configured in the pressure vessel 40, spout 32 is connected in pressure vessel export department 42.And, water is flowed in the pressure vessel 40 from the supplying opening 41s of pressure vessel 40, from export department 42 take out adsorption units 18 ' processing water.Adsorption unit 18 ' the number of obturator 30, it also can be a plurality of both can being one.
As the size of obturator 20, diameter 8cm, length 22.4cm become one of them benchmark.Above-mentioned size, identical with existing pleat formula ion-exchange filter, can use existing filter container.Compare with this size, if increase then pressure-losses reduction of diameter, if increase then pressure-losses rising of length, therefore need to determine by considering equilibrium problem.
For flow into adsorption unit 18 ' in water for, preferred resistivity more than 10M Ω cm, the more preferably ultrapure water of resistivity more than 15M Ω cm.
Embodiment
Below, describe for experimental example.
Experiment 1
Filling particle diameter in the adsorption unit of Fig. 5 is that the Zeo-karb (ピ ユ ロ ラ イ ト manufacturing) of 0.5mm and the water flowing of carrying out ultrapure water come the measuring stress loss.Particle-filled body is of a size of diameter 8cm, length (comprising back up pad) 22.4cm.For the water flowing condition, water temperature is that 25 ℃, flow are that 20L/min, Na concentration are 1ppt.Consequently, the pressure-losses is 175kPa.The Na concentration of 2 hours aftertreatment water of water flowing and is held more than 1 month below 0.1ppt.
Experiment 2
Except being filled with the Zeo-karb that particle diameter is 1.0mm (ピ ユ ロ ラ イ ト manufacturing), with similarly measuring stress loss in the experiment 1.The pressure-losses is 45kPa.The Na concentration of 2 hours aftertreatment water of water flowing and is held more than 1 month below 0.1ppt.
Experiment 3
Except being filled with the Zeo-karb that particle diameter is 1.5mm (ピ ユ ロ ラ イ ト manufacturing), with similarly measuring stress loss in the experiment 1.The pressure-losses is 22kPa.The Na concentration of 2 hours aftertreatment water of water flowing and is held more than 1 month below 0.1ppt.
Experiment 4
Except being filled with the Zeo-karb that particle diameter is 3.0mm (ピ ユ ロ ラ イ ト manufacturing), with similarly measuring stress loss in the experiment 1.The pressure-losses is 7kPa.The Na concentration of 2 hours aftertreatment water of water flowing and becomes 0.15ppt after 1 month below 0.1ppt.This can think the leakage that the problem of internal divergence causes.
Claims (2)
1. ultrapure water manufacturing subsystem, it is the subsystem of making ultrapure water from 1 st pure water, it comprises UV device, de-gassing vessel, Di and UF film device at least, it is characterized in that,
In the rear class of this UF film device, have that to have filled particle diameter be the adsorption unit of the granular adsorbent of 1～3mm;
By the outflow hydraulic pressure from this UF film device, can be in the situation of not using boosting pump water flowing in this adsorption unit.
2. ultrapure water manufacturing subsystem as claimed in claim 1 is characterized in that, also is provided with MF film device or UF film device in the rear class of described adsorption unit.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-060592 | 2011-03-18 | ||
| JP2011060592A JP5842347B2 (en) | 2011-03-18 | 2011-03-18 | Subsystem for ultrapure water production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202705158U true CN202705158U (en) | 2013-01-30 |
Family
ID=47179366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220101480 Expired - Fee Related CN202705158U (en) | 2011-03-18 | 2012-03-14 | Ultrapure water manufacturing subsystem |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5842347B2 (en) |
| CN (1) | CN202705158U (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7192519B2 (en) * | 2019-01-22 | 2022-12-20 | 栗田工業株式会社 | Ultra-pure boron-removed ultra-pure water production apparatus and ultra-pure boron-removed ultra-pure water production method |
| JP7368310B2 (en) | 2020-05-20 | 2023-10-24 | オルガノ株式会社 | Boron removal equipment and boron removal method, and pure water production equipment and pure water production method |
| CN112759031A (en) * | 2020-12-17 | 2021-05-07 | 苏州业华环境科技有限公司 | Ultrapure water treatment process and system |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04202203A (en) * | 1990-11-29 | 1992-07-23 | Mitsui Toatsu Chem Inc | Production of ion exchange resin |
| JPH0755319B2 (en) * | 1992-08-03 | 1995-06-14 | 荏原インフィルコ株式会社 | Method and apparatus for producing ultra-ultra pure water from primary pure water |
| JP2000352097A (en) * | 1999-06-09 | 2000-12-19 | Toto Ltd | Private part cleaning device |
| JP4355113B2 (en) * | 2001-06-19 | 2009-10-28 | 三井化学株式会社 | Recovery method of inorganic acids |
| JP3985500B2 (en) * | 2001-11-06 | 2007-10-03 | 栗田工業株式会社 | Ultrapure water supply method |
| JP5604143B2 (en) * | 2009-03-18 | 2014-10-08 | オルガノ株式会社 | Dissolved oxygen-removed water production method, dissolved oxygen-removed water production device, dissolved oxygen treatment tank, ultrapure water production method, hydrogen-dissolved water production method, hydrogen-dissolved water production device, and electronic component cleaning method |
-
2011
- 2011-03-18 JP JP2011060592A patent/JP5842347B2/en not_active Expired - Fee Related
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2012
- 2012-03-14 CN CN 201220101480 patent/CN202705158U/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| JP5842347B2 (en) | 2016-01-13 |
| JP2012196591A (en) | 2012-10-18 |
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|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130130 Termination date: 20180314 |
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| CF01 | Termination of patent right due to non-payment of annual fee |