CN202610319U - 用于实现原子层沉积工艺的设备 - Google Patents
用于实现原子层沉积工艺的设备 Download PDFInfo
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- CN202610319U CN202610319U CN 201220174020 CN201220174020U CN202610319U CN 202610319 U CN202610319 U CN 202610319U CN 201220174020 CN201220174020 CN 201220174020 CN 201220174020 U CN201220174020 U CN 201220174020U CN 202610319 U CN202610319 U CN 202610319U
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CN 201220174020 CN202610319U (zh) | 2012-04-20 | 2012-04-20 | 用于实现原子层沉积工艺的设备 |
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CN 201220174020 CN202610319U (zh) | 2012-04-20 | 2012-04-20 | 用于实现原子层沉积工艺的设备 |
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CN202610319U true CN202610319U (zh) | 2012-12-19 |
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CN 201220174020 Expired - Lifetime CN202610319U (zh) | 2012-04-20 | 2012-04-20 | 用于实现原子层沉积工艺的设备 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104032280A (zh) * | 2013-03-06 | 2014-09-10 | 夏洋 | 原子层沉积系统 |
CN108431296A (zh) * | 2015-09-21 | 2018-08-21 | 应用材料公司 | 卷材基板处理系统 |
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2012
- 2012-04-20 CN CN 201220174020 patent/CN202610319U/zh not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104032280A (zh) * | 2013-03-06 | 2014-09-10 | 夏洋 | 原子层沉积系统 |
CN104032280B (zh) * | 2013-03-06 | 2016-08-24 | 夏洋 | 原子层沉积系统 |
CN108431296A (zh) * | 2015-09-21 | 2018-08-21 | 应用材料公司 | 卷材基板处理系统 |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 100015 Jiuxianqiao Chaoyang District, East Beijing Road, building M2, floor 1, No. 2 Patentee after: North China Science and technology group Limited by Share Ltd. Address before: 100015 Jiuxianqiao Chaoyang District, East Beijing Road, building M2, floor 1, No. 2 Patentee before: BEIJING SEVENSTAR ELECTRONIC Co.,Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20180424 Address after: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee after: BEIJING NAURA MICROELECTRONICS EQUIPMENT Co.,Ltd. Address before: 100015 Jiuxianqiao Chaoyang District, East Beijing Road, building M2, floor 1, No. 2 Patentee before: North China Science and technology group Limited by Share Ltd. |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20121219 |