CN202453522U - Novel antireflection film system structure - Google Patents
Novel antireflection film system structure Download PDFInfo
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- CN202453522U CN202453522U CN2011205433190U CN201120543319U CN202453522U CN 202453522 U CN202453522 U CN 202453522U CN 2011205433190 U CN2011205433190 U CN 2011205433190U CN 201120543319 U CN201120543319 U CN 201120543319U CN 202453522 U CN202453522 U CN 202453522U
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- refractive index
- index film
- film
- low refractive
- high refractive
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Abstract
The utility model provides an antireflection film system structure with high strength. The antireflection film system structure comprises a base material S-BSM81 and an AR (Antireflection) film which is plated on the base material, wherein the AR film is an antireflection film, which includes the following nine layers of film structures from inside to outside: a first low refractive index film (L1), a medium refractive index film (M), a second low refractive index film (L2), a first high refractive index film (H1), a third low refractive index film (L3), a second high refractive index film (H2), a fourth low refractive index film (L4), a third high refractive index film (H3) and a fifth low refractive index film (L5). The antireflection film system structure with high strength, provided by the utility model, has the advantage of high temperature resistance and can be used for a long time; a survival possibility is provided for the stable performance of an optical instrument under the requirement of an extreme environment; and convenience is provided for the design and manufacture of optical lenses.
Description
Invention field
The utility model relates to a kind of film structure of special soft material, relates in particular to a kind of novel antireflective film architecture.
Background technology
In the use of the application of single reflective imaging and other projection display device, under the situation of considering factors such as cost and imaging definition, the producer can use various special materials in a large number and make all size, the spheric glass of radian.Generally contain different rare earth metal prescriptions in the above-mentioned material potpourri, and characteristics such as the material require in the camera lens is high temperature resistant, high humidity, resistance to oxidation.This material possesses good optical performance-be embodied in characteristics such as high chromatic dispersion, low-refraction.
S-BSM81 is exactly general adopted material in a kind of optical design (it has lower refractive index n d=1.64000 and higher chromatic dispersion vd=60.09), and this material abrasion degree (abrasion degree is commonly used to illustrative material soft or hard characteristic) is 84.Because S-BSM81 reflection in visible-range when not having plated film less (transmitance is about 80% at λ o=370nm place).
In this case, the producer will plate multilayer AR film usually in order to increase the transmitance of light quantity on eyeglass, and existing AR film processing procedure is normally used one or more layers film of vacuum evaporation technique deposition in the both sides of base material, to increase the transmitance of light quantity.The deficiency of the existence of above-mentioned technology is:
(1), AR film non-refractory, high humidity, also not wear-resisting wiping, common high temperature plated film can't satisfy requirement harsh in the use;
(2), the AR film under the situation of general vacuum plating, film forming is firm inadequately, can not prolongedly use, and particularly under some exceedingly odious environmental baselines, can't use.
More than two point defects bring difficulty for optics design and manufacture process.
Summary of the invention
The purpose of the utility model is exactly in order to solve the problems of the technologies described above, and a kind of high strength antireflective film architecture is provided, and comprises base material and is plated in the AR film on the base material; Wherein the AR film is a kind of antireflective film, comprises nine tunic structures from inside to outside: first low refractive index film, middle refractive index film, second low refractive index film, first high refractive index film, the 3rd low refractive index film, second high refractive index film, the 4th low refractive index film, the 3rd high refractive index film, the 5th low refractive index film.
Preferably, the coating materials of said first low refractive index film is MgF
2, the coating materials of said middle refractive index film is AL
2O
3
Preferably, the coating materials of said first high refractive index film (H1) is SV
7(H
4).
Preferably, the coating materials of described first low refractive index film and middle refractive index film is respectively MgF
2And AL
2O
3
Preferably, described base material is S-BSM81, by SIO
2, GaCO
3, Na
2CO
3And REE high melt cycle annealing forms.
Preferably, first low refractive index film, middle refractive index film, second low refractive index film, first high refractive index film, the 3rd low refractive index film, second high refractive index film, the 4th low refractive index film, the 3rd high refractive index film, the used Coating Materials of the 5th low refractive index film are respectively MgF
2, AL
2O
3, MgF
2, H
4, MgF
2, H
4, MgF
2, H
4, MgF
2Corresponding thicknesses of layers is respectively 28.93nm, 45nm, 80.09nm, 20.85nm, 43.92nm, 69.18nm, 12nm, 49nm, 103.5nm.
By technique scheme, the advantage and the beneficial effect of the utility model are:
The said high strength antireflective film of the embodiment of the utility model architecture can be at high temperature (300 ℃ of actual temperatures), high vacuum 2.8X10
-3Be splashed to coating materials on the base material through electron gun under the state, and the film of working it out is very firm, can satisfies exacting terms, can use for a long time.
The AR film can not come off through once test and rete in the middle of hot and humid environment test, and the AR film optical property conformance with standard regulation after the test requires:
(1) ,-40 ℃ (2H) ,+80 ℃ (2H) 25 times circulation;
(2) ,-30 1 circulation of ℃ (32H) ~+65 ℃ 80%RH (32H);
(3), 3M (P-24) or equal No.610 belt stripping test;
(4) ,+60 ℃ of 90%RH, the 1000H high temperature and humidity test;
(5) ,+80 ℃ no humidification 168H test;
(6), reciprocal 50 frictions of surperficial frotton abrasion test 200gf.
Description of drawings
Accompanying drawing shows the embodiment of the utility model, and with instructions, is used for explaining the principle of the utility model.Through the detailed description of doing below in conjunction with accompanying drawing, can more be expressly understood purpose, advantage and the characteristic of the utility model, wherein:
Fig. 1 is the film layer structure figure of the said high strength antireflective film of the embodiment of the utility model architecture.
Embodiment
Further specify the embodiment of the utility model below in conjunction with accompanying drawing.
Embodiment one
See also shown in Figure 1, the described a kind of high strength antireflective film architecture of the utility model, it comprises base material S-FPL51 and is plated in the AR film on the base material.Wherein the AR film is a kind of antireflective film, comprises nine tunic structures from inside to outside: first low refractive index film (L1), middle refractive index film (M), second low refractive index film (L2), first high refractive index film (H1), the 3rd low refractive index film (L3), second high refractive index film (H2), the 4th low refractive index film (L4), the 3rd high refractive index film (H3), the 5th low refractive index film (L5).
Wherein the coating materials of first low refractive index film (L1) and middle refractive index film (M) is MgF
2And AL
2O
3The coating materials of first high refractive index film (H1) is SV
7(H
4).Base material is S-FPL51, by SIO
2, GaCO
3, Na
2CO
3And mineral compound high melt such as REE interpolation forms.The thickness of corresponding each tunic of first low refractive index film (L1), middle refractive index film (M), second low refractive index film (L2), first high refractive index film (H1), the 3rd low refractive index film (L3), second high refractive index film (H2), the 4th low refractive index film (L4), the 3rd high refractive index film (H3) and the 5th low refractive index film (L5) is respectively 36.34nm, 25.5nm, 57.15nm, 26.58nm, 31.73nm, 80.66nm, 12.46nm, 40.27nm, 103.68nm.
Embodiment two
The described a kind of high strength antireflective film architecture of the utility model, it comprises base material S-BSM81 and is plated in the AR film on the base material.Wherein the AR film is a kind of antireflective film, comprises nine tunic structures from inside to outside: first low refractive index film (L1), middle refractive index film (M), second low refractive index film (L2), first high refractive index film (H1), the 3rd low refractive index film (L3), second high refractive index film (H2), the 4th low refractive index film (L4), the 3rd high refractive index film (H3), the 5th low refractive index film (L5).
Wherein the coating materials of first low refractive index film (L1) and middle refractive index film (M) is MgF
2And AL
2O
3The coating materials of first high refractive index film (H1) is SV
7(H
4).Base material is S-FSL5, by SIO
2, GaCO
3, Na
2CO
3And mineral compound high melt such as REE interpolation forms.The thickness of corresponding each tunic of first low refractive index film (L1), middle refractive index film (M), second low refractive index film (L2), first high refractive index film (H1), the 3rd low refractive index film (L3), second high refractive index film (H2), the 4th low refractive index film (L4), the 3rd high refractive index film (H3) and the 5th low refractive index film (L5) is respectively 28.93nm, 45nm, 80.09nm, 20.85nm, 43.92nm, 69.18nm, 12nm, 49nm, 103.5nm.
Embodiment three
The described a kind of high strength antireflective film architecture of the utility model, it comprises base material LAK10 and is plated in the AR film on the base material.Wherein the AR film is a kind of antireflective film, comprises nine tunic structures from inside to outside: first low refractive index film (L1), middle refractive index film (M), second low refractive index film (L2), first high refractive index film (H1), the 3rd low refractive index film (L3), second high refractive index film (H2), the 4th low refractive index film (L4), the 3rd high refractive index film (H3), the 5th low refractive index film (L5).
Wherein the coating materials of first low refractive index film (L1) and middle refractive index film (M) is MgF
2And AL
2O
3The coating materials of first high refractive index film (H1) is SV
7(H
4).Base material is LAK10, by SIO
2, GaCO
3, Na
2CO
3And mineral compound high melt such as REE interpolation forms.The thickness of corresponding each tunic of first low refractive index film (L1), middle refractive index film (M), second low refractive index film (L2), first high refractive index film (H1), the 3rd low refractive index film (L3), second high refractive index film (H2), the 4th low refractive index film (L4), the 3rd high refractive index film (H3) and the 5th low refractive index film (L5) is respectively 21.97nm, 40.94nm, 110.31nm, 13.87nm, 47.34nm, 60.71nm, 12.86nm, 49.44nm, 100.46nm.
The said high strength antireflective film of the utility model architecture is high temperature resistant, can use for a long time, brings help for optics design and manufacturing.
Claims (5)
1. an antireflective film architecture is characterized in that, comprises base material and is plated in the AR film on the base material; Described AR film is a kind of antireflective film, comprises nine tunic structures from inside to outside: first low refractive index film, middle refractive index film, second low refractive index film, first high refractive index film, the 3rd low refractive index film, second high refractive index film, the 4th low refractive index film, the 3rd high refractive index film, the 5th low refractive index film.
2. an antireflective film architecture according to claim 1 is characterized in that, said antireflective film is nine layer films, and its gross thickness is 400 ~ 480nm.
3. antireflective film architecture according to claim 1; It is characterized in that the thicknesses of layers of said first low refractive index film, middle refractive index film, second low refractive index film, first high refractive index film, the 3rd low refractive index film, second high refractive index film, the 4th low refractive index film, the 3rd high refractive index film, the 5th low refractive index film correspondence is respectively 36.34nm, 25.5nm, 57.15nm, 26.58nm, 31.73nm, 80.66nm, 12.46nm, 40.27nm, 103.68nm.
4. antireflective film architecture according to claim 1; It is characterized in that the thicknesses of layers of said first low refractive index film, middle refractive index film, second low refractive index film, first high refractive index film, the 3rd low refractive index film, second high refractive index film, the 4th low refractive index film, the 3rd high refractive index film, the 5th low refractive index film correspondence is respectively 28.93nm, 45nm, 80.09nm, 20.85nm, 43.92nm, 69.18nm, 12nm, 49nm, 103.5nm.
5. antireflective film architecture according to claim 1; It is characterized in that the thicknesses of layers of said first low refractive index film, middle refractive index film, second low refractive index film, first high refractive index film, the 3rd low refractive index film, second high refractive index film, the 4th low refractive index film, the 3rd high refractive index film, the 5th low refractive index film correspondence is respectively 21.97nm, 40.94nm, 110.31nm, 13.87nm, 47.34nm, 60.71nm, 12.86nm, 49.44nm, 100.46nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011205433190U CN202453522U (en) | 2011-12-22 | 2011-12-22 | Novel antireflection film system structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011205433190U CN202453522U (en) | 2011-12-22 | 2011-12-22 | Novel antireflection film system structure |
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| Publication Number | Publication Date |
|---|---|
| CN202453522U true CN202453522U (en) | 2012-09-26 |
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ID=46869377
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011205433190U Expired - Lifetime CN202453522U (en) | 2011-12-22 | 2011-12-22 | Novel antireflection film system structure |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109061785A (en) * | 2018-08-06 | 2018-12-21 | 信阳舜宇光学有限公司 | AR film layer and optical filter for near-infrared narrow band filter |
| CN110208885A (en) * | 2019-06-28 | 2019-09-06 | 浙江舜宇光学有限公司 | Plated film lens, optical lens and the method for forming plated film lens |
-
2011
- 2011-12-22 CN CN2011205433190U patent/CN202453522U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109061785A (en) * | 2018-08-06 | 2018-12-21 | 信阳舜宇光学有限公司 | AR film layer and optical filter for near-infrared narrow band filter |
| CN110208885A (en) * | 2019-06-28 | 2019-09-06 | 浙江舜宇光学有限公司 | Plated film lens, optical lens and the method for forming plated film lens |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: PHENIX OPTICS CO., LTD. Free format text: FORMER OWNER: PHENIX OPTICAL INSTRUMENT (SHANGHAI) CO., LTD. Effective date: 20150722 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20150722 Address after: 334100 No. 197, West Avenue, Shangrao, Jiangxi Patentee after: Phenix Optical Co.,Ltd. Address before: 200001, 2199, Xin Xin Bei Road, Shanghai, Jiading District Patentee before: Phenix Optical (Shanghai) Co., Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20120926 |
|
| CX01 | Expiry of patent term |