CN202363429U - Megasonic transduction device used in wet etching and cleaning technology - Google Patents
Megasonic transduction device used in wet etching and cleaning technology Download PDFInfo
- Publication number
- CN202363429U CN202363429U CN 201120444552 CN201120444552U CN202363429U CN 202363429 U CN202363429 U CN 202363429U CN 201120444552 CN201120444552 CN 201120444552 CN 201120444552 U CN201120444552 U CN 201120444552U CN 202363429 U CN202363429 U CN 202363429U
- Authority
- CN
- China
- Prior art keywords
- oscillator
- cleaning
- wet etching
- piezoelectric crystal
- frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The utility model discloses a megasonic transduction device used in the wet etching and cleaning technology, and relates to the technical field of sound wave transducers. The megasonic transduction device comprises a transducer (1), an oscillator unit (2), a fixing device (3), a coupling dielectric layer (4) and an impedance transformer (8), wherein the oscillator unit (2) is mounted on the transducer (1) through the fixing device (3); the coupling dielectric layer (4) is arranged between the oscillator unit (2) and the fixing device (3); and the oscillator unit (2) is driven by power output of the impedance transformer (8) and comprises at least two oscillator groups, each oscillator group comprises at least one piezoelectric crystal oscillator, and the inherent mechanical vibration frequencies of the plurality of piezoelectric crystal oscillators in each oscillator group are almost the same. The megasonic transduction device can generate a uniform sound field required by surface wet etching and cleaning, and reduces or removes influence on the etching and cleaning effects of wafers caused by the megasonic sound field interference phenomenon.
Description
Technical field
The utility model relates to the acoustic wave transducer technical field, relates in particular to a kind of mega sonic wave transducing head that is used for wet etching and cleaning.
Background technology
Along with the integrated circuit characteristic size enters into the deep-submicron stage; Wet etching in the IC wafer manufacturing process and clean to the corrosion precision require increasingly high; Requirement to cleaning particle is more and more littler, and therefore the uniformity of corrosion and cleaning becomes a challenging problem.
The employing mega sonic wave carries out chemical corrosion and cleaning helps accelerated corrosion and cleaning, has improved the removal efficient of contamination particle greatly.But because there is interference in the mega sonic wave sound field, on wafer, can form the very high focus of a lot of sound field intensities, also form the very low dead point of a lot of sound field intensities simultaneously, make that the uniformity of sound field intensity is difficult to reach technological requirement on the wafer.
In the existing integrated circuits wafer fabrication process; Usually reduce emerging of focus through frequency scanning; But because frequency scanning is only around a centre frequency; And the scanning that changes around centre frequency only is applied on the mega sonic wave oscillator, and the frequency of the mechanical oscillation of mega sonic wave oscillator is intrinsic (generally equaling the centre frequency of mega sonic wave), and the off-center frequency can cause the minimizing of oscillator amplitude to make the megasonic energy of propagating descend; Thereby the sound energy density that forms in wafer surface changes with the variation of scanning frequency, can't produce the uniform sound field of intensity.
Prior art also has through the frequency stack combinations corrodes and cleans, but because the voltage of frequency stack combinations still is applied on the same mega sonic wave oscillator, oscillator vibration changes the excessive efficient that electroacoustic transforms that influenced, and makes the effect of cleaning descend to some extent.
The utility model content
The technical problem that (one) will solve
The technical problem that the utility model will solve is: a kind of mega sonic wave transducing head that is used for wet etching and cleaning is provided; It can produce the surface wet corrosion and clean needed uniformity sound field; Reduced because focus and the dead point that sound wave interference produces, reduced or removes mega sonic wave sound field interference phenomenon is corroded cleaning performance to wafer influence.
(2) technical scheme
For addressing the above problem; The utility model provides a kind of mega sonic wave transducing head that is used for wet etching and cleaning; Comprise: transducer, oscillator unit, fixture, couplant layer and impedance transformer; Said oscillator unit is installed on the said transducer through said fixture, is provided with said couplant layer between said oscillator unit and the fixture, and said oscillator unit is driven by the power output of said impedance transformer; Said oscillator unit comprises: at least two oscillator groups, and wherein, each oscillator group comprises at least one piezoelectric crystal oscillator, the intrinsic mechanical oscillation frequency of a plurality of piezoelectric crystal oscillators in each oscillator group is suitable.
Preferably, all the piezoelectric crystal oscillators in said each oscillator group connect the output of the secondary coil of same power impedance transformer.
Preferably, said device also comprises the chamber that is used to install and fix said oscillator unit.
Preferably, said chamber is provided with the outlet that is used to introduce the inlet of air cooling fluid and is used to derive the air cooling fluid.
Preferably, the shape of said piezoelectric crystal oscillator comprises: annular, fan-shaped, honeycomb fashion and combination thereof.
Preferably, said couplant layer comprises: fusing point is 20 degrees centigrade～100 degrees centigrade a glue.
The effect of couplant: can be used as acoustic filter, produce the sound wave that maximum is passed through the megasonic frequency of efficient that has that meets cleaning requirement.
Preferably, said transducer is quartz or ruby transducer.
Preferably, said piezoelectric crystal oscillator is prepared from the lead zirconate titanate of handling through polarization.
Preferably; Said each piezoelectric crystal oscillator adopts two or more million acoustic frequencies; One of them million acoustic frequency works in the intrinsic mechanical oscillation frequency of piezoelectric crystal oscillator, and at least one other million acoustic frequency is in the certain positive and negative frequency separation interscan around the setting centre frequency.
Preferably; The different primary coil of the impedance transformer of power amplifier is exported and be connected respectively to the power of two or more million acoustic frequencies that said each piezoelectric crystal oscillator adopts; The corresponding primary coil of each frequency, each oscillator group all has the different capacity amplifier of corresponding its required different frequency and the impedance transformer of a synthetic usefulness.
(3) beneficial effect
The utility model adopts many group mega sonic wave oscillators; Each oscillator to any one group of oscillator adopts two or more million acoustic frequencies; One of them million acoustic centre of source frequency is in the intrinsic mechanical oscillation frequency of this piezoelectric crystal oscillator; And make other at least one frequencies center on the certain positive and negative frequency separation interscan of setting centre frequency; The sound field of a phase-unstable variation is feasible can't to form focus and the dead point that sound wave interference produces to the mega sonic wave that is excited by different mega sonic wave oscillator groups because the distortion of phase shift that synthetic mixing is caused after the synthetic formed phase shift of sound wave and the frequency scanning and synthetic waveform has produced in the medium sound field that corrosion is cleaned; Thereby produce the surface wet corrosion and clean needed uniformity sound field; Reduced because focus and the dead point that sound wave interference produces, reduced or removes of the influence of mega sonic wave sound field interference phenomenon, can also reduce or remove violent cavitation erosion by the focus generation the characteristic size structural damage to wafer corrosion cleaning performance.
Description of drawings
Fig. 1 is for being used for the structural representation of the mega sonic wave transducing head of wet etching and cleaning described in the utility model execution mode;
Fig. 2 is for being used for the drive principle figure of the mega sonic wave transducing head of wet etching and cleaning described in the utility model execution mode.
Embodiment
Below in conjunction with accompanying drawing and embodiment, the embodiment of the utility model is described in further detail.Following examples are used to explain the utility model, but are not used for limiting the scope of the utility model.
As shown in Figure 1; The described mega sonic wave transducing head that is used for wet etching and cleaning of the utility model; Comprise: transducer 1, oscillator unit 2, fixture 3, couplant layer 4 and impedance transformer 8; Said oscillator unit 2 is installed on the said transducer 1 through said fixture 3, is provided with said couplant layer 4 between said oscillator unit 2 and the fixture 3.Said oscillator unit 2 is driven by the power output of said impedance transformer 8; Impedance transformer 8 as shown in Figure 2, the output that is used for the power amplifier of different frequency signals driving is synthesized.
Said oscillator unit 2 comprises: at least two oscillator groups, and wherein, each oscillator group comprises at least one piezoelectric crystal oscillator, the intrinsic mechanical oscillation frequency of a plurality of piezoelectric crystal oscillators in each oscillator group is suitable.
Preferably, all the piezoelectric crystal oscillators in said each oscillator group connect the output of the secondary coil of same power impedance transformer.
Preferably, said device also comprises the chamber 5 that is used to install and fix said oscillator unit.
Preferably, said chamber is provided with the inlet 6 and the outlet 7 that is used to derive the air cooling fluid that is used to introduce the air cooling fluid.
Preferably, the shape of said piezoelectric crystal oscillator comprises: annular, fan-shaped, honeycomb fashion and combination thereof.
Preferably, said couplant layer comprises: fusing point is 20 degrees centigrade～100 degrees centigrade a glue.
The effect of couplant: can be used as acoustic filter, produce the sound wave that maximum is passed through the megasonic frequency of efficient that has that meets cleaning requirement.
Preferably, said transducer 1 is quartz or ruby transducer.
Preferably, said piezoelectric crystal oscillator is prepared from the lead zirconate titanate of handling through polarization.
Preferably; Said each piezoelectric crystal oscillator adopts two or more million acoustic frequencies; One of them million acoustic frequency works in the intrinsic mechanical oscillation frequency of piezoelectric crystal oscillator, and at least one other million acoustic frequency is in the certain positive and negative frequency separation interscan around the setting centre frequency.
Preferably; The power output of two or more million acoustic frequencies that said each piezoelectric crystal oscillator adopts; And be connected respectively to the different primary coil of the impedance transformer of power amplifier; The corresponding primary coil of each frequency, each oscillator group all has the different capacity amplifier of corresponding its required different frequency and the impedance transformer of a synthetic usefulness.
The operation principle of the utility model: adopt many group mega sonic wave oscillators; Each oscillator to any one group of oscillator adopts two or more million acoustic frequencies; One of them million acoustic centre of source frequency is in the intrinsic mechanical oscillation frequency of this piezoelectric crystal oscillator, and makes other at least one frequencies can be around the certain positive and negative frequency separation interscan of setting centre frequency.To different oscillator groups, million acoustic centre of source frequencies are different around setting centre frequency with scanning, and the coupling first, inferior coil through the different impedance transformer is loaded into respectively on the different oscillator groups respectively.The mega sonic wave that is excited by different oscillator groups; Because the phase shift that synthetic mixing is caused after the synthetic formed phase shift of sound wave, the frequency scanning and the distortion of synthetic waveform; The sound field that in the medium sound field that corrosion is cleaned, has produced a phase-unstable variation makes and can't form focus and the dead point that sound wave interference produces; Thereby produce the surface wet corrosion and clean needed uniformity sound field, reduce and eliminated the violent cavitation erosion that produces by focus the characteristic size structural damage.
As shown in Figure 2, the impedance transformer that is used to drive the piezoelectric crystal oscillator of an oscillator group has at least two primary coils, and each primary coil all can be controlled its break-make by a digital switch S.On at least one primary coil, apply near the pulse voltage signal of frequency scan variations centre frequency; Because the synthesis of a plurality of primary coils; On secondary coil, will produce all unsettled sound wave voltage of a frequency and phase place; Be loaded into each oscillator of an oscillator group of the said mega sonic wave transducing head that is used for wet etching and cleaning of the utility model; Will in clean surface medium sound field produces, produce unsettled sound field, reduce the focus and the dead point that produce owing to sound wave interference, thereby made cleaning performance more even.Each oscillator group all has the different capacity amplifier of corresponding its required different frequency and the impedance transformer of a synthetic usefulness.
The primary part of the impedance transformer of the power amplifier shown in the figure is merely sketch map; Emphasical the elementary of transformer is made up of a plurality of coils; And the frequency of the pulse voltage on each primary coil is also inequality; And near pulse repetition frequency scan variations centre frequency that has a primary coil at least, for example 1M ± 20KHz.On primary coil, produce the pulse voltage of certain frequency as for how, can have low power pulse voltage signal to amplify and obtain, have the signal amplification circuit of a lot of standards at present, class AB push-pull circuit for example, full-bridge circuit etc.
Above execution mode only is used to explain the utility model; And be not the restriction to the utility model; The those of ordinary skill in relevant technologies field under the situation of spirit that does not break away from the utility model and scope, can also be made various variations and modification; Therefore all technical schemes that are equal to also belong to the category of the utility model, and the scope of patent protection of the utility model should be defined by the claims.
Claims (10)
1. mega sonic wave transducing head that is used for wet etching and cleaning; It is characterized in that; Comprise: transducer (1), oscillator unit (2), fixture (3), couplant layer (4) and impedance transformer (8); Said oscillator unit (2) is installed on the said transducer (1) through said fixture (3), is provided with said couplant layer (4) between said oscillator unit (2) and the fixture (3), and said oscillator unit (2) is driven by the power output of said impedance transformer (8); Said oscillator unit (2) comprising: at least two oscillator groups, and wherein, each oscillator group comprises at least one piezoelectric crystal oscillator, the intrinsic mechanical oscillation frequency of a plurality of piezoelectric crystal oscillators in each oscillator group is suitable.
2. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 1 is characterized in that, all the piezoelectric crystal oscillators in said each oscillator group connect the output of the secondary coil of same power impedance transformer.
3. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 1 is characterized in that, also comprises the chamber (5) that is used to install and fix said oscillator unit (2).
4. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 3 is characterized in that, said chamber (5) is provided with inlet (6) that is used to introduce the air cooling fluid and the outlet (7) that is used to derive the air cooling fluid.
5. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 1 is characterized in that the shape of said piezoelectric crystal oscillator comprises: annular, fan-shaped, honeycomb fashion and combination thereof.
6. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 1 is characterized in that, said couplant layer (4) comprising: fusing point is 20 degrees centigrade～100 degrees centigrade a glue layer.
7. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 1 is characterized in that, said transducer (1) is quartz or ruby transducer.
8. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 1 is characterized in that, said piezoelectric crystal oscillator is prepared from the lead zirconate titanate of handling through polarization.
9. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 1; It is characterized in that; Said each piezoelectric crystal oscillator adopts two or more million acoustic frequencies; One of them million acoustic frequency works in the intrinsic mechanical oscillation frequency of piezoelectric crystal oscillator, and at least one other million acoustic frequency is in the certain positive and negative frequency separation interscan around the setting centre frequency.
10. the mega sonic wave transducing head that is used for wet etching and cleaning as claimed in claim 1; It is characterized in that; The different primary coil of the impedance transformer of power amplifier is exported and be connected respectively to the power of two or more million acoustic frequencies that said each piezoelectric crystal oscillator adopts; The corresponding primary coil of each frequency, each oscillator group all has the different capacity amplifier of corresponding its required different frequency and the impedance transformer of a synthetic usefulness.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120444552 CN202363429U (en) | 2011-11-10 | 2011-11-10 | Megasonic transduction device used in wet etching and cleaning technology |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120444552 CN202363429U (en) | 2011-11-10 | 2011-11-10 | Megasonic transduction device used in wet etching and cleaning technology |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202363429U true CN202363429U (en) | 2012-08-01 |
Family
ID=46574592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201120444552 Expired - Fee Related CN202363429U (en) | 2011-11-10 | 2011-11-10 | Megasonic transduction device used in wet etching and cleaning technology |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202363429U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102509713A (en) * | 2011-11-10 | 2012-06-20 | 北京七星华创电子股份有限公司 | MHz sound wave transducer device for wet etching and cleaning process |
-
2011
- 2011-11-10 CN CN 201120444552 patent/CN202363429U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102509713A (en) * | 2011-11-10 | 2012-06-20 | 北京七星华创电子股份有限公司 | MHz sound wave transducer device for wet etching and cleaning process |
| CN102509713B (en) * | 2011-11-10 | 2014-06-25 | 北京七星华创电子股份有限公司 | MHz sound wave transducer device for wet etching and cleaning process |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7247977B2 (en) | Ultrasonic processing method and apparatus with multiple frequency transducers | |
| US9610617B2 (en) | Megasonic multifrequency apparatus with matched transducer | |
| MX2008011778A (en) | Megasonic processing apparatus with frequency sweeping of thickness mode transducers. | |
| US7104268B2 (en) | Megasonic cleaning system with buffered cavitation method | |
| US20130008473A1 (en) | Ultrasonic cleaning apparatus and ultrasonic cleaning method | |
| CN102509713B (en) | MHz sound wave transducer device for wet etching and cleaning process | |
| CN202363429U (en) | Megasonic transduction device used in wet etching and cleaning technology | |
| CN201862594U (en) | Wafer cleaning device | |
| CN202638797U (en) | Chip cleaning device | |
| Yaralioglu et al. | Lamb wave devices using capacitive micromachined ultrasonic transducers | |
| KR20200133701A (en) | Ultrasonic cleaning station using dual frequency | |
| KR102209002B1 (en) | Ultrasonic cleaning station responding cleansing environmental change | |
| CN202290529U (en) | Random phase shift frequency-mixing type piezoelectric vibrator combined ultrasonic transducer device | |
| Buasri et al. | Comparison of switching strategies for an ultrasonic cleaner | |
| JP2007311379A (en) | Ultrasonic cleaning apparatus | |
| CN102468117B (en) | Wafer cleaning apparatus | |
| CN102397838B (en) | Random phase-shifting hybrid frequency type piezoelectric vibrator combination mega soundwave transducer device | |
| CN202356279U (en) | Megasonic transducer | |
| CN102500540B (en) | Mega acoustic wave transduction device | |
| JP5517227B2 (en) | Ultrasonic precision cleaning equipment | |
| CN110508566A (en) | Surface descaling method based on multifrequency leakage supersonic guide-wave | |
| Eiras et al. | Vibration modes in ultrasonic Bessel transducer | |
| JPH09199464A (en) | Ultrasonic cleaning device | |
| Asemi et al. | Using a High frequency LC Resonant Inverter for Ultrasonic Cleaning Applications | |
| CN203265142U (en) | Control circuit board adopting ultrasonic frequency sweep technique |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120801 Termination date: 20171110 |